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1.发明授权公开(公告)号：US06709568B2
公开(公告)日：2004-03-23
申请号：US10064125
申请日：2002-06-13
IPC分类号： G01N2742
CPC分类号： G01N27/4161 , G01N27/42
摘要： The present invention relates to a method for determining concentration of brightener and leveler contained in an aqueous acid metal electroplating solution, by firstly determining the concentration of the brightener at a first set of measurement conditions, and secondly determining the concentration of the leveler at a second set of measurement conditions, provided that the first set of measurement conditions differ from the second set of measurement conditions on the rotation speed of a rotating disc electrode used for measuring plating potential of said aqueous acid metal electroplating solution, and optionally, the electroplating duration at which the plating potential of said aqueous acid metal electroplating solution is measured, provided that the first rotation speed is lower than the second rotation speed, and that the first electroplating duration is shorter than the second electroplating duration.
摘要翻译： 本发明涉及一种通过首先在第一组测量条件下确定增白剂的浓度来确定含酸的酸性金属电镀溶液中所含的增白剂和矫正剂的浓度的方法，其次在第二次测定矫光器的浓度 条件是第一组测量条件与第二组测量条件不同，所述第二组测量条件对于用于测量所述酸性金属电镀水溶液的电镀电位的旋转盘电极的旋转速度，以及可选地，电镀持续时间在 测量所述含水酸性金属电镀溶液的电镀电位，条件是所述第一转速低于所述第二转速，并且所述第一电镀持续时间短于所述第二电镀持续时间。
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2.发明申请VESSEL INCORPORATING FILM WITH ENHANCED ANTI-STATIC PROPERTIES AND RELATED METHODS 审中-公开具有增强抗静电性能的VESSEL INCORPORA FILM和相关方法公开(公告)号：US20120175283A1
公开(公告)日：2012-07-12
申请号：US13496282
申请日：2010-09-16
申请人： Vishwas Pethe , Richard Bhella , Steven Vanhamel , Els Meesters
发明人： Vishwas Pethe , Richard Bhella , Steven Vanhamel , Els Meesters
CPC分类号： B32B27/32 , B32B1/02 , B32B7/02 , B32B27/08 , B32B27/18 , B32B27/20 , B32B2250/24 , B32B2270/00 , B32B2307/21 , B32B2307/412 , B32B2307/546 , B32B2439/06 , B32B2439/46 , B32B2439/80 , Y10T428/31913
摘要： An apparatus for use in material processing takes the form of a vessel including a wall at least partially formed of a flexible film The film includes at least two layers having an anti-static agent and sandwiching an intermediate layer. Related methods are also disclosed.
摘要翻译： 用于材料加工的装置采取包括至少部分地由柔性膜形成的壁的容器的形式。该膜包括至少两层具有抗静电剂并夹持中间层的层。 还公开了相关方法。
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公开(公告)号：US07153690B2
公开(公告)日：2006-12-26
申请号：US10278449
申请日：2002-10-23
CPC分类号： H01L21/67253 , G05D11/138 , H01L21/67017 , Y10T436/115831 , Y10T436/116664
摘要： A multicomponent fluid composition monitoring and compositional control system, in which a component analysis is effected by titration or other analytical procedure, for one or more components of interest, and a computational means then is employed to determine and responsively adjust the relative amount or proportion of the one or more components in the multicomponent fluid composition, to maintain a predetermined compositional character of the multicomponent fluid composition. The system is usefully employed in semiconductor manufacturing photoresist and post-etch residue removal, in which the cleaning medium is a semi-aqueous solvent composition, and water is the monitored and responsively adjusted component.
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4.发明授权Sampling management for a process analysis tool to minimize sample usage and decrease sampling time 有权用于过程分析工具的抽样管理，以最小化样本使用量并减少采样时间公开(公告)号：US07157051B2
公开(公告)日：2007-01-02
申请号：US10658948
申请日：2003-09-10
IPC分类号： G01N31/00
CPC分类号： G01N35/1097 , C25D21/12 , G01N2001/205 , Y10T436/118339
摘要： A method and system for analysis of additives in electrolysis plating solutions, using a flow management system that minimizes loss of plating solutions and decreases sampling time. The system includes at least one analysis chamber, a sampling duct connected to processing tool, a four-way valve positioned between the processing tool and the sampling duct, at least one carrier fluid duct connected to the analysis chamber, at least one actuatable multi-port valve that provides a transference platform between the sampling duct and the at least one carrier fluid duct, and a flow sensor connected to the sampling duct and positioned downstream from the at least one actuatable multi-port valve.
摘要翻译： 一种用于分析电解电镀溶液中添加剂的方法和系统，使用最小化电镀溶液损失并减少采样时间的流量管理系统。 该系统包括至少一个分析室，连接到处理工具的采样管道，位于处理工具和采样管道之间的四通阀，连接到分析室的至少一个载体流体管道，至少一个可致动的多通道， 在所述采样管道和所述至少一个载体流体管道之间提供转移平台的端口阀，以及连接到所述采样管道并且位于所述至少一个可致动多通阀的下游的流量传感器。
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5.发明申请Sampling management for a process analysis tool to minimize sample usage and decrease sampling time 有权用于过程分析工具的抽样管理，以最小化样本使用量并减少采样时间公开(公告)号：US20050053522A1
公开(公告)日：2005-03-10
申请号：US10658948
申请日：2003-09-10
IPC分类号： C25D21/12 , G01N20060101 , G01N1/20 , G01N33/00 , G01N35/00
CPC分类号： G01N35/1097 , C25D21/12 , G01N2001/205 , Y10T436/118339
摘要： A method and system for analysis of additives in electrolysis plating solutions, using a flow management system that minimizes loss of plating solutions and decreases sampling time. The system includes at least one analysis chamber, a sampling duct connected to processing tool, a four-way valve positioned between the processing tool and the sampling duct, at least one carrier fluid duct connected to the analysis chamber, at least one actuatable multi-port valve that provides a transference platform between the sampling duct and the at least one carrier fluid duct, and a flow sensor connected to the sampling duct and positioned downstream from the at least one actuatable multi-port valve.
摘要翻译： 一种用于分析电解电镀溶液中添加剂的方法和系统，使用最小化电镀溶液损失并减少采样时间的流量管理系统。 该系统包括至少一个分析室，连接到处理工具的采样管道，位于处理工具和采样管道之间的四通阀，连接到分析室的至少一个载体流体管道，至少一个可致动的多通道， 在所述采样管道和所述至少一个载体流体管道之间提供转移平台的端口阀，以及连接到所述采样管道并且位于所述至少一个可致动多通阀的下游的流量传感器。
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