公开(公告)号：US09190311B2

公开(公告)日：2015-11-17

申请号：US13351653

申请日：2012-01-17

申请人： Jiro Higashijima ,  Yosuke Hachiya ,  Kazuhiro Aiura ,  Norihiro Itoh ,  Naoki Shindo ,  Yuki Ito

发明人： Jiro Higashijima ,  Yosuke Hachiya ,  Kazuhiro Aiura ,  Norihiro Itoh ,  Naoki Shindo ,  Yuki Ito

IPC分类号： H01L21/687 ,  B08B3/04 ,  H01L21/67

CPC分类号： H01L21/68728 ,  B08B3/04 ,  B08B3/041 ,  H01L21/67017 ,  H01L21/67051 ,  H01L21/6719 ,  H01L21/68742

摘要： Disclosed are a liquid processing apparatus and a liquid processing method that can prevent a substrate in a processing chamber from being contaminated due to contamination attached to a nozzle supporting arm that supports a nozzle. The liquid processing apparatus of the present disclosure includes: a processing chamber having a substrate holding unit configured to hold a substrate and a cup disposed around the substrate holding unit; a nozzle configured to supply a fluid to the substrate held by the substrate holding unit; and a nozzle supporting arm configured to support the nozzle. An arm cleaning unit configured to clean the nozzle supporting arm is installed in the liquid processing apparatus.

摘要翻译： 公开了一种液体处理装置和液体处理方法，其可以防止处理室中的基板由于附着到支撑喷嘴的喷嘴支撑臂上的污染而被污染。 本公开的液体处理装置包括：处理室，具有被配置为保持基板的基板保持单元和设置在基板保持单元周围的杯子; 喷嘴，被配置为将流体供给到由所述基板保持单元保持的所述基板; 以及配置成支撑喷嘴的喷嘴支撑臂。 构造成清洁喷嘴支撑臂的手臂清洁单元安装在液体处理装置中。

公开(公告)号：US20120180828A1

公开(公告)日：2012-07-19

申请号：US13351653

申请日：2012-01-17

申请人： Jiro HIGASHIJIMA ,  Yosuke Hachiya ,  Kazuhiro Aiura ,  Norihiro Itoh ,  Naoki Shindo ,  Yuki Ito

发明人： Jiro HIGASHIJIMA ,  Yosuke Hachiya ,  Kazuhiro Aiura ,  Norihiro Itoh ,  Naoki Shindo ,  Yuki Ito

IPC分类号： B08B3/00

CPC分类号： H01L21/68728 ,  B08B3/04 ,  B08B3/041 ,  H01L21/67017 ,  H01L21/67051 ,  H01L21/6719 ,  H01L21/68742

摘要： Disclosed are a liquid processing apparatus and a liquid processing method that can prevent a substrate in a processing chamber from being contaminated due to contamination attached to a nozzle supporting arm that supports a nozzle. The liquid processing apparatus of the present disclosure includes: a processing chamber having a substrate holding unit configured to hold a substrate and a cup disposed around the substrate holding unit; a nozzle configured to supply a fluid to the substrate held by the substrate holding unit; and a nozzle supporting arm configured to support the nozzle. An arm cleaning unit configured to clean the nozzle supporting arm is installed in the liquid processing apparatus.

摘要翻译： 公开了一种液体处理装置和液体处理方法，其可以防止处理室中的基板由于附着到支撑喷嘴的喷嘴支撑臂上的污染而被污染。 本公开的液体处理装置包括：处理室，具有被配置为保持基板的基板保持单元和设置在基板保持单元周围的杯子; 喷嘴，被配置为将流体供给到由所述基板保持单元保持的所述基板; 以及配置成支撑喷嘴的喷嘴支撑臂。 构造成清洁喷嘴支撑臂的手臂清洁单元安装在液体处理装置中。

公开(公告)号：US20130180659A1

公开(公告)日：2013-07-18

申请号：US13823205

申请日：2012-08-01

申请人： Norihiro Itoh ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya

发明人： Norihiro Itoh ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya

IPC分类号： H01L21/02 ,  H01L21/465

CPC分类号： H01L21/02041 ,  H01L21/465 ,  H01L21/67051 ,  H01L21/6719 ,  H01L21/68785 ,  H01L21/68792

摘要： A liquid treatment apparatus includes a substrate holder (21) that holds a substrate horizontally and rotates the substrate, a treatment liquid nozzle (82) that supplies a treatment liquid to the substrate held by the substrate holder, a cup (40) that is arranged outside of a peripheral edge of the substrate held by the substrate holder and receives the treatment liquid which has been supplied to the substrate by the treatment liquid nozzle, a top plate (32) that covers the substrate held by the substrate holder from above, a top plate rotation driving mechanism that rotates the top plate, and a liquid receiving member (130) that surrounds a peripheral edge of the top plate and has a circular liquid receiving space (132).

摘要翻译： 液体处理装置包括：水平地保持基板并旋转基板的基板保持件（21），将处理液体供给到由基板保持件保持的基板的处理液喷嘴（82），布置 在由基板保持器保持的基板的周缘的外侧，接收由处理液喷嘴供给到基板的处理液，从上方覆盖基板保持体的基板的顶板（32）， 旋转顶板的顶板旋转驱动机构和围绕顶板的周缘的液体接收构件（130），并具有圆形的液体容纳空间（132）。

公开(公告)号：US09177838B2

公开(公告)日：2015-11-03

申请号：US13546394

申请日：2012-07-11

申请人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya ,  Takashi Nagai

发明人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya ,  Takashi Nagai

IPC分类号： B08B3/00 ,  H01L21/67 ,  G03F7/42

CPC分类号： H01L21/67051 ,  G03F7/423

摘要： A top plate 32 is provided to be moved in a horizontal direction between an advanced position, in which the top plate 32 covers from above a substrate W held by a substrate holding unit 21, and a retracted position that is retracted from the advanced position. An air hood 70 configured to supply a purified gas downward is provided to be lifted between a lower position, in which the air hood covers from above the substrate W held by the substrate holding unit 21, and an upper position located above the lower position.

摘要翻译： 顶板32设置成在顶板32从由基板保持单元21保持的基板W上方覆盖的前进位置和从前进位置缩回的缩回位置之间沿水平方向移动。 被配置为向下供给净化气体的空气罩70被设置为在从由基板保持单元21保持的基板W的上方覆盖着空气罩的下部位置和位于下部位置上方的上部位置之间提升。

公开(公告)号：US09691602B2

公开(公告)日：2017-06-27

申请号：US13546372

申请日：2012-07-11

申请人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya ,  Takashi Nagai

发明人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya ,  Takashi Nagai

IPC分类号： H01L21/02 ,  H01L21/67

CPC分类号： H01L21/02041 ,  H01L21/67051 ,  H01L21/6719 ,  Y02E60/34 ,  Y10T137/0318 ,  Y10T137/598

摘要： A top plate is provided with a top plate rotation mechanism configured to rotate the top plate in a horizontal plane. An outside cup peripheral case disposed around a cup is configured to move between an upper position, in which a top end of the cylinder is positioned above the cup, and a lower position located below the upper position. A nozzle support arm configured to support a nozzle is moved, in a horizontal direction, between an advanced position, in which the arm is advanced into the outside cup peripheral case via a side opening formed in a side surface of the outside cup peripheral case when the cylinder is located in the upper position, and a retracted position, in which the arm is retracted outward from the outside cup peripheral case.

公开(公告)号：US20130014786A1

公开(公告)日：2013-01-17

申请号：US13546372

申请日：2012-07-11

申请人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya ,  Takashi Nagai

发明人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya ,  Takashi Nagai

IPC分类号： B08B3/04 ,  F17D1/00

CPC分类号： H01L21/02041 ,  H01L21/67051 ,  H01L21/6719 ,  Y02E60/34 ,  Y10T137/0318 ,  Y10T137/598

摘要： A top plate 32 is provided with a top plate rotation mechanism configured to rotate the top plate 32 in a horizontal plane. An outside cup peripheral case 50 disposed around a cup 40 is configured to move between an upper position, in which a top end of the cylinder 50 is positioned above the cup 40, and a lower position located below the upper position. A nozzle support arm 82 configured to support a nozzle 82a is moved, in a horizontal direction, between an advanced position, in which the arm 82 is advanced into the outside cup peripheral case 50 via a side opening 50m formed in a side surface of the outside cup peripheral case 50 when the cylinder 50 is located in the upper position, and a retracted position, in which the arm 82 is retracted outward from the outside cup peripheral case 50.

摘要翻译： 顶板32设置有顶板旋转机构，其被配置为使顶板32在水平面中旋转。 设置在杯40周围的外杯周边壳体50被构造成在缸体50的上端位于杯40的上方的位置和位于上部位置下方的下部位置之间移动。 构造成支撑喷嘴82a的喷嘴支撑臂82在水平方向上在前进位置之间移动，在前进位置，臂82经由形成在外侧杯外周壳50的侧面中的侧开口50m前进到外杯外壳50 当圆筒50位于上部位置时，外侧杯形外壳50以及从外侧杯状外壳50向外侧缩回的缩回位置。

公开(公告)号：US09768010B2

公开(公告)日：2017-09-19

申请号：US13823205

申请日：2012-08-01

申请人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya

发明人： Norihiro Ito ,  Kazuhiro Aiura ,  Naoki Shindo ,  Yosuke Hachiya

IPC分类号： H01L21/02 ,  H01L21/465 ,  H01L21/67 ,  H01L21/687

CPC分类号： H01L21/02041 ,  H01L21/465 ,  H01L21/67051 ,  H01L21/6719 ,  H01L21/68785 ,  H01L21/68792

摘要： A liquid treatment apparatus includes a substrate holder (21) that holds a substrate horizontally and rotates the substrate, a treatment liquid nozzle (82) that supplies a treatment liquid to the substrate held by the substrate holder, a cup (40) that is arranged outside of a peripheral edge of the substrate held by the substrate holder and receives the treatment liquid which has been supplied to the substrate by the treatment liquid nozzle, a top plate (32) that covers the substrate held by the substrate holder from above, a top plate rotation driving mechanism that rotates the top plate, and a liquid receiving member (130) that surrounds a peripheral edge of the top plate and has a circular liquid receiving space (132).

公开(公告)号：US09064908B2

公开(公告)日：2015-06-23

申请号：US13490799

申请日：2012-06-07

申请人： Norihiro Itoh ,  Kazuhiro Aiura

发明人： Norihiro Itoh ,  Kazuhiro Aiura

IPC分类号： H01L21/67 ,  H01L21/677

CPC分类号： H01L21/67051 ,  H01L21/6708 ,  H01L21/67748

摘要： There is provided a liquid processing apparatus capable of efficiently processing a pattern formation surface of a wafer, while preventing diffusion of a chemical-liquid atmosphere which might possibly occurs during a chemical-liquid process.

摘要翻译： 提供了一种能够有效地处理晶片的图案形成表面的液体处理装置，同时防止在药液处理期间可能发生的药液气氛的扩散。

公开(公告)号：US20140352726A1

公开(公告)日：2014-12-04

申请号：US14241574

申请日：2012-10-23

申请人： Norihiro Itoh ,  Kazuhiro Aiura

发明人： Norihiro Itoh ,  Kazuhiro Aiura

IPC分类号： H01L21/67 ,  B05C11/10 ,  B08B3/04 ,  B05B15/12 ,  B05D1/02 ,  B05C9/06 ,  B05B3/18

CPC分类号： H01L21/67051 ,  B05B3/18 ,  B05B15/80 ,  B05C9/06 ,  B05C11/1039 ,  B05C11/1044 ,  B05D1/02 ,  B08B3/04 ,  B60B17/00 ,  B60B17/0068 ,  B60B2900/325 ,  B61H5/00 ,  G01B11/306 ,  G01B21/20 ,  H01L21/02057 ,  H01L21/6715

摘要： A liquid processing apparatus includes a substrate retaining part that retains a substrate in a horizontal position and rotates the substrate, first and second processing liquid supply nozzles disposed to supply first and second processing liquids, respectively, to the substrate, liquid receiving cups disposed to appropriately position an upper end thereof above the substrate and to receive the first or second processing liquid that has been supplied to the substrate, a first tubular outer cup including an upper opening and disposed around the liquid receiving cup, vertically movable between a lifted position to which the first tubular outer cup is lifted so that its upper end is positioned above the liquid receiving cup, and a lowered position lower than the lifted position, and a second tubular outer cup disposed externally to the first tubular outer cup. The tubular outer cup is selected according to the kind of processing liquid.

摘要翻译： 液体处理装置包括：基板保持部，其将基板保持在水平位置并旋转基板;第一和第二处理液体供给喷嘴，分别设置成将第一和第二处理液供给到基板;适当地设置的液体接收杯 将其上端定位在基板上方并且接收已经供应到基板的第一或第二处理液体，第一管状外杯，其包括上开口并设置在液体接收杯周围，可在提升位置 第一管状外杯被提升，使得其上端位于液体接收杯的上方，并且位于低于提升位置的降低位置，以及设置在第一管状外杯外侧的第二管状外杯。 管状外杯根据处理液的种类选择。

公开(公告)号：US09640383B2

公开(公告)日：2017-05-02

申请号：US13985679

申请日：2012-07-11

申请人： Kazuhiro Aiura ,  Norihiro Ito ,  Takashi Nagai

发明人： Kazuhiro Aiura ,  Norihiro Ito ,  Takashi Nagai

IPC分类号： H01L21/02 ,  H01L21/67 ,  G03F7/42

CPC分类号： H01L21/02057 ,  G03F7/42 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/67115

摘要： A liquid treatment apparatus includes a substrate holding member that holds a substrate horizontally, a rotation mechanism that rotates the substrate holding member; a chemical liquid nozzle that supplies a chemical liquid to the substrate held by the substrate holding member; a top plate that covers the substrate held by the substrate holding member from above the substrate; and at least one LED lamp that heats the substrate during a chemical liquid treatment by irradiating the substrate with light of a predetermined wavelength through the top plate from above the top plate.