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公开(公告)号：US07057702B2
公开(公告)日：2006-06-06
申请号：US10873650
申请日：2004-06-23
申请人： Joeri Lof , Johannes Catharinus Hubertus Mulkens , Jeroen Johannes Sophia Maria Mertens , Antonius Johannes Van Der Net , Ronald Van Der Ham , Nicolas Lallemant , Marcel Beckers
发明人： Joeri Lof , Johannes Catharinus Hubertus Mulkens , Jeroen Johannes Sophia Maria Mertens , Antonius Johannes Van Der Net , Ronald Van Der Ham , Nicolas Lallemant , Marcel Beckers
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70341 , G03F7/70808
摘要： A lithographic projection apparatus is disclosed. The apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate, and a fluid supply system configured to provide a fluid to a volume. The volume includes at least a portion of the projection system and/or at least a portion of the illumination system. The apparatus further includes a coupling device configured to couple the fluid supply system to the substrate table, substrate, support structure, patterning device, or any combination thereof.
摘要翻译： 公开了一种光刻投影装置。 该装置包括被配置为调节辐射束的照明系统和被配置为支撑图案形成装置的支撑结构。 图案形成装置用于使辐射束在其横截面上具有图案。 该设备还包括被配置为保持基板的基板台，配置成将图案化的光束投影到基板的目标部分上的投影系统以及被配置成向流体提供流体的流体供应系统。 体积包括投影系统的至少一部分和/或照明系统的至少一部分。 该装置还包括配置成将流体供应系统耦合到衬底台，衬底，支撑结构，图案形成装置或其任何组合的耦合装置。
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公开(公告)号：US20050286032A1
公开(公告)日：2005-12-29
申请号：US10873650
申请日：2004-06-23
申请人： Joeri Lof , Johannes Catharinus Mulkens , Jeroen Johannes Mertens , Antonius Van Der Net , Ronald Van Der Ham , Nicolas Lallemant , Marcel Beckers
发明人： Joeri Lof , Johannes Catharinus Mulkens , Jeroen Johannes Mertens , Antonius Van Der Net , Ronald Van Der Ham , Nicolas Lallemant , Marcel Beckers
CPC分类号： G03F7/70933 , G03F7/70341 , G03F7/70808
摘要： A lithographic projection apparatus is disclosed. The apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate, and a fluid supply system configured to provide a fluid to a volume. The volume includes at least a portion of the projection system and/or at least a portion of the illumination system. The apparatus further includes a coupling device configured to couple the fluid supply system to the substrate table, substrate, support structure, patterning device, or any combination thereof.
摘要翻译： 公开了一种光刻投影装置。 该装置包括被配置为调节辐射束的照明系统和被配置为支撑图案形成装置的支撑结构。 图案形成装置用于使辐射束在其横截面上具有图案。 该设备还包括被配置为保持基板的基板台，配置成将图案化的光束投影到基板的目标部分上的投影系统以及被配置成向流体提供流体的流体供应系统。 体积包括投影系统的至少一部分和/或照明系统的至少一部分。 该装置还包括配置成将流体供应系统耦合到衬底台，衬底，支撑结构，图案形成装置或其任何组合的耦合装置。
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公开(公告)号：US20060087631A1
公开(公告)日：2006-04-27
申请号：US10972292
申请日：2004-10-25
申请人： Nicolas Lallemant , Marcel Beckers , Stephan Koelink , Rob Jansen , Wladimir Fransiscus Hertog , David Van Der Plas
发明人： Nicolas Lallemant , Marcel Beckers , Stephan Koelink , Rob Jansen , Wladimir Fransiscus Hertog , David Van Der Plas
IPC分类号： G03B27/42
CPC分类号： G03F7/70933
摘要： A lithographic apparatus includes a radiation system for providing a beam of radiation, and a first support for supporting a patterning device. The patterning device serves to pattern the beam of radiation. The apparatus includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and an interferometer measurement system for providing an interferometric measurement beam extending along an axis in an elongated volume of gas extending below the projection system. The apparatus also includes a gas conditioning structure for providing a conditioned gas flow in the volume. The gas conditioning structure includes a plurality of gas guiding vanes disposed at an outlet of the structure for guiding the gas flow to the volume. The gas guiding vanes are shaped continuously and are oriented diverging away from the axis of the volume.
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公开(公告)号：US07148951B2
公开(公告)日：2006-12-12
申请号：US10972292
申请日：2004-10-25
申请人： Nicolas Lallemant , Marcel Beckers , Stephan Koelink , Rob Jansen , Wladimir Fransiscus Gerardus Maria Hertog , David Theodorus Willy Van Der Plas
发明人： Nicolas Lallemant , Marcel Beckers , Stephan Koelink , Rob Jansen , Wladimir Fransiscus Gerardus Maria Hertog , David Theodorus Willy Van Der Plas
CPC分类号： G03F7/70933
摘要： A lithographic apparatus includes a radiation system for providing a beam of radiation, and a first support for supporting a patterning device. The patterning device serves to pattern the beam of radiation. The apparatus includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and an interferometer measurement system for providing an interferometric measurement beam extending along an axis in an elongated volume of gas extending below the projection system. The apparatus also includes a gas conditioning structure for providing a conditioned gas flow in the volume. The gas conditioning structure includes a plurality of gas guiding vanes disposed at an outlet of the structure for guiding the gas flow to the volume. The gas guiding vanes are shaped continuously and are oriented diverging away from the axis of the volume.
摘要翻译： 光刻设备包括用于提供辐射束的辐射系统和用于支撑图案形成装置的第一支撑件。 图案形成装置用于对辐射束进行图案化。 该装置包括用于支撑基板的第二支撑件，用于将图案化的光束投影到基板的目标部分上的投影系统，以及干涉计测量系统，用于提供沿着轴延伸的细长体积的气体延伸的干涉测量光束 投影系统。 该装置还包括用于在体积中提供经调节的气流的气体调节结构。 气体调节结构包括设置在结构的出口处的多个气体导向叶片，用于将气体流引导到体积。 气体导向叶片被连续地成形并且定向为远离体积的轴线发散。
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公开(公告)号：US20060232754A1
公开(公告)日：2006-10-19
申请号：US11437745
申请日：2006-05-22
申请人： Nicolas Lallemant , Martinus Verhagen , Marcel Beckers , Ronald Stultiens , Pascal Smits , Wladimir Fransiscus Hertog , David Van Der Plas , Stephan Koelink , Henk Krus
发明人： Nicolas Lallemant , Martinus Verhagen , Marcel Beckers , Ronald Stultiens , Pascal Smits , Wladimir Fransiscus Hertog , David Van Der Plas , Stephan Koelink , Henk Krus
IPC分类号： G03B27/52
CPC分类号： G03F7/70933
摘要： A lithographic apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and a first support for supporting a patterning device that serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and at least one gas generator for generating a conditioned gas flow. The gas generator includes a guiding element for guiding the gas flow to a lower volume generally located below a lower surface of the projection system and to a volume between the lower surface and the substrate. The guiding element directs the gas flow in a generally downward direction and then in a direction generally parallel to the lower surface.
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公开(公告)号：US20050254025A1
公开(公告)日：2005-11-17
申请号：US10876760
申请日：2004-06-28
申请人： Nicolas Lallemant , Martinus Verhagen , Marcel Beckers , Ronald Stultiens , Pascal Smits , Wladimir Fransiscus Hertog , David Theodorus Van Der Plas , Stephan Koelink , Henk Krus
发明人： Nicolas Lallemant , Martinus Verhagen , Marcel Beckers , Ronald Stultiens , Pascal Smits , Wladimir Fransiscus Hertog , David Theodorus Van Der Plas , Stephan Koelink , Henk Krus
IPC分类号： G03F7/20 , H01L21/027 , G03B27/52
CPC分类号： G03F7/70933
摘要： A lithographic apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and a first support for supporting a patterning device that serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and at least one gas generator for generating a conditioned gas flow. The gas generator includes a guiding element for guiding the gas flow to a lower volume generally located below a lower surface of the projection system and to a volume between the lower surface and the substrate. The guiding element directs the gas flow in a generally downward direction and then in a direction generally parallel to the lower surface.
摘要翻译： 公开了一种光刻设备。 该装置包括用于调节辐射束的照明器，以及用于支撑用于根据期望图案对辐射束进行图案化的图案形成装置的第一支撑件。 该装置还包括用于支撑基板的第二支撑件，用于将图案化的光束投影到基板的目标部分上的投影系统，以及用于产生经调节的气流的至少一个气体发生器。 气体发生器包括用于将气流引导到通常位于投影系统的下表面下方的下部体积并且在下表面和基底之间的体积的引导元件。 引导元件将气流大致向下的方向引导，然后在大致平行于下表面的方向上引导。
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公开(公告)号：US20070132980A1
公开(公告)日：2007-06-14
申请号：US11296871
申请日：2005-12-08
申请人： Carolus Johannes Schoormans , Emiel Jozef Eussen , Willem Herman Koenen , Nicolas Lallemant , Engelbertus Antonius Van Der Pasch , Johannes Mathias Adriaens
发明人： Carolus Johannes Schoormans , Emiel Jozef Eussen , Willem Herman Koenen , Nicolas Lallemant , Engelbertus Antonius Van Der Pasch , Johannes Mathias Adriaens
IPC分类号： G03B27/58
CPC分类号： G03F7/70775
摘要： A device manufacturing method includes projecting a patterned beam of radiation onto a substrate, wherein the position of a movable object is determined in a number of degrees of freedom using a number of sensors, the number of sensors being larger than the number of degrees of freedom, wherein the position of the movable object in the number of degrees of freedom is determined using signals of each of the sensors, wherein the signals of the sensors are weighed on the basis of the difference between noise levels of each of the sensors. Accuracy of the position measurement of movable object and/or overlay and focus performance are improved in lithographic apparatus.
摘要翻译： 一种器件制造方法包括将图案化的辐射束投射到衬底上，其中可移动物体的位置使用多个传感器以多个自由度确定，传感器的数量大于自由度的数量 其中，利用每个传感器的信号来确定可移动物体的位置，其中，所述传感器的信号是基于每个传感器的噪声水平之差而被称重的。 在光刻设备中，可移动物体的位置测量精度和/或覆盖和聚焦性能得到改善。
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公开(公告)号：US20060250617A1
公开(公告)日：2006-11-09
申请号：US11120193
申请日：2005-05-03
IPC分类号： G01B11/02
CPC分类号： G03F7/70858 , G03F7/70775
摘要： A lithographic apparatus includes a position quantity determination system to determine a position quantity of a movable part which is in operation at least partly surrounded by an area comprising a fluid. The position quantity determination system includes an interferometer system, a global sensor to determine a global value of a physical quantity of the fluid in the area, and a local sensor to determine a local value of the physical quantity of the fluid in the part of the area. The position quantity determination system is configured to determine the position quantity from an output of the interferometer, the global value of the physical quantity and the local value of the physical quantity. The physical quantity may include a pressure, a temperature, etc. The local physical quantity determination system may include a sensor, such as a high-speed sensor, a computational fluid dynamics model or a linear approximation model.
摘要翻译： 光刻设备包括位置量确定系统，用于确定至少部分地被包括流体的区域包围的可操作部件的位置量。 位置量确定系统包括干涉仪系统，用于确定该区域中的流体的物理量的总体值的全局传感器，以及局部传感器，用于确定该部分中的流体的物理量的局部值 区。 位置量确定系统被配置为从干涉仪的输出，物理量的总体值和物理量的局部值确定位置量。 物理量可以包括压力，温度等。局部物理量确定系统可以包括传感器，例如高速传感器，计算流体动力学模型或线性近似模型。
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公开(公告)号：US20070211233A1
公开(公告)日：2007-09-13
申请号：US11373493
申请日：2006-03-13
IPC分类号： G03B27/52
CPC分类号： G03F7/70858 , G03F7/70258 , G03F7/70341 , G03F7/705 , G03F7/70575 , G03F7/706
摘要： Lithographic Apparatus, Control System and Device Manufacturing Method An immersion lithographic apparatus is disclosed that has a measurement system or a prediction system for measuring and/or predicting, respectively, an effect associated with a temperature fluctuation of the immersion liquid, and a control system for controlling the or another effect associated with the temperature of the immersion liquid, on the basis of the measurement and/or prediction obtained by the measurement system and/or prediction system, respectively. An associated control system and device manufacturing method is also disclosed.
摘要翻译： 光刻设备，控制系统和设备制造方法公开了一种浸没式光刻设备，其具有测量系统或预测系统，用于分别测量和/或预测与浸液的温度波动相关的影响，以及用于 基于由测量系统和/或预测系统获得的测量和/或预测，分别控制与浸液的温度相关联的或另一效应。 还公开了一种相关的控制系统和设备制造方法。
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