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    Imaging system for emulation of a high aperture scanning system
    5.
    发明申请
    Imaging system for emulation of a high aperture scanning system 有权
    用于高光圈扫描系统仿真的成像系统

    公开(公告)号：US20060007541A1

    公开(公告)日：2006-01-12

    申请号：US10923551

    申请日：2004-08-20

    申请人： Michael Totzeck ,  Ulrich Stroessner ,  Joern Greif-Wuestenbecker

    发明人： Michael Totzeck ,  Ulrich Stroessner ,  Joern Greif-Wuestenbecker

    IPC分类号： G02B5/30

    CPC分类号： G03F7/70566 ,  G02B21/002 ,  G02B27/286 ,  G03F7/70666

    摘要： The present invention is directed to an optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The imaging system, according to the invention, for emulating high-aperture scanner systems comprises imaging optics, a detector and an evaluating unit, wherein at least one polarization-active optical element is arranged as desired in the imaging beam path for selection of different polarization components of the imaging beam, an optical element with intensity attenuation function can be introduced in the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing. With the proposed solution, it is possible in particular to examine lithography masks for defects in spite of increasingly smaller structures and increasingly higher image-side numerical apertures of the imaging systems by means of inspection microscopes with high magnifications. Realistic images of the stepper systems can be generated by emulating the occurring vector effects.

    摘要翻译： 本发明涉及一种用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。 根据本发明的用于模拟高光圈扫描器系统的成像系统包括成像光学器件，检测器和评估单元，其中至少一个偏振有源光学元件根据需要在成像光束路径中布置以选择不同的极化 成像光束的成分，具有强度衰减功能的光学元件可以被引入到成像光束路径中，掩模和/或样品的图像由检测器接收以用于不同偏振的光束分量，并被传送到评估单元进行进一步处理 。 利用所提出的解决方案，可以通过借助于具有高放大率的检查显微镜，检查光刻掩模的缺陷，尽管结构越来越小，成像系统的图像侧数值孔径越来越高。 可以通过仿真出现的矢量效应来生成步进系统的现实图像。

    Imaging system for emulation of a high aperture scanning system
    6.
    发明授权
    Imaging system for emulation of a high aperture scanning system 有权
    用于高光圈扫描系统仿真的成像系统

    公开(公告)号：US07535640B2

    公开(公告)日：2009-05-19

    申请号：US10923551

    申请日：2004-08-20

    申请人： Michael Totzeck ,  Ulrich Stroessner ,  Joern Greif-Wuestenbecker

    发明人： Michael Totzeck ,  Ulrich Stroessner ,  Joern Greif-Wuestenbecker

    IPC分类号： G02B27/28

    CPC分类号： G03F7/70566 ,  G02B21/002 ,  G02B27/286 ,  G03F7/70666

    摘要： An optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems is provided. The imaging system for emulating high-aperture scanner systems includes imaging optics, a detector and an evaluating unit, wherein at least one polarization-active optical element is arranged as desired in the imaging beam path for selection of different polarization components of the imaging beam, an optical element with intensity attenuation function can be introduced in the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing. It is possible to examine lithography masks for defects in spite of increasingly smaller structures and increasingly higher image-side numerical apertures of the imaging systems Realistic images of the stepper systems can be generated by emulating the occurring vector effects.

    摘要翻译： 提供了一种用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。 用于模拟高光圈扫描仪系统的成像系统包括成像光学器件，检测器和评估单元，其中至少一个偏振有源光学元件根据需要在成像光束路径中布置以选择成像光束的不同偏振分量， 可以在成像光束路径中引入具有强度衰减功能的光学元件，由检测器接收掩模和/或样品的图像以用于不同偏振的光束分量，并被传送到评估单元进行进一步处理。 尽管结构越来越小，成像系统的图像侧数值孔径越来越高，可以检查光刻掩模的缺陷。可以通过仿真出现的矢量效应来生成步进系统的现实图像。

    Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection
    7.
    发明申请
    Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection 有权
    用于模拟高光圈成像系统的显微镜成像系统和方法，特别是用于掩模检查

    公开(公告)号：US20060012873A1

    公开(公告)日：2006-01-19

    申请号：US10917626

    申请日：2004-08-13

    申请人： Michael Totzeck ,  Heiko Feldmann ,  Toralf Grunder ,  Karl-Heinz Schuster ,  Joern Greif-Wuestenbecker ,  Thomas Scheruebl ,  Wolfgang Harnisch ,  Norbert Rosenkranz ,  Ulrich Stroessner

    发明人： Michael Totzeck ,  Heiko Feldmann ,  Toralf Grunder ,  Karl-Heinz Schuster ,  Joern Greif-Wuestenbecker ,  Thomas Scheruebl ,  Wolfgang Harnisch ,  Norbert Rosenkranz ,  Ulrich Stroessner

    IPC分类号： G02B21/06

    CPC分类号： G03F7/70566 ,  G02B5/3025 ,  G02B21/0016 ,  G03F7/70666 ,  Y10S359/90

    摘要： The present invention is directed to an optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The microscope imaging system for emulating high-aperture imaging systems comprises imaging optics, a detector and an evaluating unit, wherein polarizing optical elements are selectively arranged in the illumination beam path for generating different polarization states of the illumination beam and/or in the imaging beam path for selecting different polarization components of the imaging beam, an optical element with a polarization-dependent intensity attenuation function can be introduced into the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing. With the proposed solution, it is possible in particular to examine lithography masks for defects by means of inspection microscopes in spite of increasingly smaller structures and increasingly higher image-side numerical apertures of the imaging systems. Realistic images of the scanner systems can be generated by emulating the occurring vector effects.

    摘要翻译： 本发明涉及一种用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。 用于模拟高光圈成像系统的显微镜成像系统包括成像光学器件，检测器和评估单元，其中偏振光学元件选择性地布置在照明光束路径中，用于产生照明光束和/或成像光束的不同偏振状态 用于选择成像光束的不同偏振分量的路径，具有偏振相关强度衰减功能的光学元件可以被引入到成像光束路径中，掩模和/或采样的图像被检测器接收用于不同偏振光束分量， 被传送到评估单元进行进一步处理。 利用所提出的解决方案，尽管越来越小的结构和成像系统的图像侧数值孔径越来越高，但是可以通过检查显微镜检查用于缺陷的光刻掩模。 可以通过模拟出现的矢量效应来生成扫描仪系统的现实图像。

    Method and device for analysing the imaging behavior of an optical imaging element
    8.
    发明授权
    Method and device for analysing the imaging behavior of an optical imaging element 有权
    用于分析光学成像元件的成像行为的方法和装置

    公开(公告)号：US07626689B2

    公开(公告)日：2009-12-01

    申请号：US12158403

    申请日：2006-12-15

    申请人： Ulrich Stroessner ,  Joern Greif-Wuestenbecker

    发明人： Ulrich Stroessner ,  Joern Greif-Wuestenbecker

    IPC分类号： G01B9/00 ,  G01B11/00

    CPC分类号： G01M11/0285 ,  G03F7/705 ,  G03F7/70566 ,  G03F7/70591 ,  G03F7/7085

    摘要： A method for analyzing the imaging behavior of a first optical imaging element, in which an object is imaged by a second optical imaging element and light in the image plane is detected in a spatially resolved manner. The two optical imaging elements differ in at least one imaging characteristic. Values are determined for intensity and at least one second characteristic and then stored in image points, and processed in an emulation step. An emulation image is produced, taking into account the influence of the second characteristic. A series of images is produced by dividing a range of values of the second characteristic into subdomains, associating an image with each subdomain, and associating the corresponding intensity value with the image points of each image, in case the value of the second characteristic, associated with the image point, falls in the subdomain associated with the respective image.

    摘要翻译： 以空间分辨的方式检测第一光学成像元件的成像行为的方法，其中物体被第二光学成像元件成像，并且在图像平面中的光被检测。 两个光学成像元件在至少一个成像特征上不同。 根据强度和至少一个第二特性确定值，然后存储在图像点中，并在仿真步骤中进行处理。 考虑到第二特性的影响，产生仿真图像。 通过将第二特性的值的范围分为子域，将图像与每个子域相关联，并且将相应的强度值与每个图像的图像点相关联，产生一系列图像，在第二特征的值相关联的情况下 与图像点一起落在与相应图像相关联的子域中。

    METHOD AND APPARATUS FOR MEASURING STRUCTURES ON PHOTOLITHOGRAPHY MASKS
    9.
    发明申请
    METHOD AND APPARATUS FOR MEASURING STRUCTURES ON PHOTOLITHOGRAPHY MASKS 有权
    用于测量光刻胶掩模结构的方法和装置

    公开(公告)号：US20110242544A1

    公开(公告)日：2011-10-06

    申请号：US13062566

    申请日：2009-09-18

    申请人： Ulrich Stroessner ,  Gerd Klose ,  Michael Totzeck

    发明人： Ulrich Stroessner ,  Gerd Klose ,  Michael Totzeck

    IPC分类号： G01B11/02 ,  G01B11/14 ,  G01J4/00

    CPC分类号： G03F1/84 ,  G03F7/70141

    摘要： The invention relates to a method for measuring structures on masks (1) for photolithography, wherein firstly the mask (1) is mounted on a spatially movable platform (2). The position of the platform (2) is controlled in this case. The structure on the mask (1) is illuminated with illumination light from an illumination light source which emits coherent light. The light coming from the mask (1) is imaged onto a detection device (6) by an imaging optical unit (4) and detected. The detected signals are evaluated in an evaluation device (7) and the positions and dimensions of the structures are determined. The invention also relates to an apparatus by which these method steps, in particular, can be carried out. In this case, the accuracy of the position and dimension determination is increased by the properties of the illumination light being coordinated with the structure to be measured. For this purpose, the illumination device (3, 3′) has setting means for coordinating the properties of the illumination light with the structure to be measured.

    摘要翻译： 本发明涉及一种用于测量用于光刻的掩模（1）上的结构的方法，其中首先将掩模（1）安装在空间上可移动的平台（2）上。 在这种情况下，控制平台（2）的位置。 掩模（1）上的结构被来自发出相干光的照明光源的照明光照射。 来自掩模（1）的光通过成像光学单元（4）成像到检测装置（6）上并进行检测。 在评估装置（7）中评估检测到的信号，并确定结构的位置和尺寸。 本发明还涉及一种可以进行这些方法步骤的装置。 在这种情况下，通过与要测量的结构协调的照明光的特性来增加位置和尺寸确定的精度。 为此，照明装置（3,3'）具有用于使照明光的特性与被测量结构协调的设定装置。

    Method and apparatus for measuring structures on photolithography masks
    10.
    发明授权
    Method and apparatus for measuring structures on photolithography masks 有权
    用于测量光刻掩模上的结构的方法和装置

    公开(公告)号：US08736849B2

    公开(公告)日：2014-05-27

    申请号：US13062566

    申请日：2009-09-18

    申请人： Ulrich Stroessner ,  Gerd Klose ,  Michael Totzeck

    发明人： Ulrich Stroessner ,  Gerd Klose ,  Michael Totzeck

    IPC分类号： G01N21/00 ,  G01B11/14 ,  G03B27/42

    CPC分类号： G03F1/84 ,  G03F7/70141

    摘要： The invention relates to a method for measuring structures on masks (1) for photolithography, wherein firstly the mask (1) is mounted on a spatially movable platform (2). The position of the platform (2) is controlled in this case. The structure on the mask (1) is illuminated with illumination light from an illumination light source which emits coherent light. The light coming from the mask (1) is imaged onto a detection device (6) by an imaging optical unit (4) and detected. The detected signals are evaluated in an evaluation device (7) and the positions and dimensions of the structures are determined. The invention also relates to an apparatus by which these method steps, in particular, can be carried out. In this case, the accuracy of the position and dimension determination is increased by the properties of the illumination light being coordinated with the structure to be measured. For this purpose, the illumination device (3, 3′) has setting means for coordinating the properties of the illumination light with the structure to be measured.

    摘要翻译： 本发明涉及一种用于测量用于光刻的掩模（1）上的结构的方法，其中首先将掩模（1）安装在空间上可移动的平台（2）上。 在这种情况下，控制平台（2）的位置。 掩模（1）上的结构被来自发出相干光的照明光源的照明光照射。 来自掩模（1）的光通过成像光学单元（4）成像到检测装置（6）上并进行检测。 在评估装置（7）中评估检测到的信号，并确定结构的位置和尺寸。 本发明还涉及一种可以进行这些方法步骤的装置。 在这种情况下，通过与要测量的结构协调的照明光的特性来增加位置和尺寸确定的精度。 为此，照明装置（3,3'）具有用于使照明光的特性与被测量结构协调的设定装置。