公开(公告)号：US07961297B2

公开(公告)日：2011-06-14

申请号：US12065451

申请日：2006-09-02

申请人： Joern Greif-Wuestenbecker ,  Beate Boehme ,  Ulrich Stroessner ,  Michael Totzeck ,  Vladimir Kamenov ,  Olaf Dittmann ,  Daniel Kraehmer ,  Toralf Gruner ,  Bernd Geh

发明人： Joern Greif-Wuestenbecker ,  Beate Boehme ,  Ulrich Stroessner ,  Michael Totzeck ,  Vladimir Kamenov ,  Olaf Dittmann ,  Daniel Kraehmer ,  Toralf Gruner ,  Bernd Geh

IPC分类号： G03B27/72 ,  G03B27/32 ,  G03B27/68 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70666 ,  G03F7/70308

摘要： A method for determining intensity distribution in the focal plane of a projection exposure arrangement, in which a large aperture imaging system is emulated and a light from a sample is represented on a local resolution detector by an emulation imaging system. A device for carrying out the method and emulated devices are also described. The invention makes it possible to improve a reproduction quality since the system apodisation is taken into consideration. The inventive method includes determining the integrated amplitude distribution in an output pupil, combining the integrated amplitude distribution with a predetermined apodization correction and calculating a corrected apodization image according to the modified amplitude distribution.

摘要翻译： 一种用于确定投影曝光装置的焦平面中的强度分布的方法，其中大面积成像系统被仿真并且来自样品的光由仿真成像系统在局部分辨率检测器上表示。 还描述了用于执行该方法和仿真装置的装置。 由于考虑到系统变迹，本发明使得可以提高再现质量。 本发明的方法包括确定输出光瞳中的积分幅度分布，将积分幅度分布与预定的变迹校正相结合，并根据修改的振幅分布计算校正的变迹图像。

公开(公告)号：US20080212060A1

公开(公告)日：2008-09-04

申请号：US12065451

申请日：2006-09-02

申请人： Joern Greif-Wuestenbecker ,  Beate Boehme ,  Ulrich Stroessner ,  Michael Totzeck ,  Vladimir Kamenov ,  Olaf Dittmann ,  Daniel Kraehmer ,  Toralf Gruner ,  Bernd Geh

发明人： Joern Greif-Wuestenbecker ,  Beate Boehme ,  Ulrich Stroessner ,  Michael Totzeck ,  Vladimir Kamenov ,  Olaf Dittmann ,  Daniel Kraehmer ,  Toralf Gruner ,  Bernd Geh

IPC分类号： G03B27/54

CPC分类号： G03F7/70666 ,  G03F7/70308

摘要： A method for determining intensity distribution in the focal plane of a projection exposure arrangement, in which a large aperture imaging system is emulated and a light from a sample is represented on a local resolution detector by an emulation imaging system. A device for carrying out the method and emulated devices are also described. The invention makes it possible to improve a reproduction quality since the system apodisation is taken into consideration. The inventive method consists in includes determining the integrated amplitude distribution in an output pupil, combining the integrated amplitude distribution with a predetermined apodization correction and calculating a corrected apodization image according to the modified amplitude distribution.

摘要翻译： 一种用于确定投影曝光装置的焦平面中的强度分布的方法，其中大面积成像系统被仿真并且来自样品的光由仿真成像系统在局部分辨率检测器上表示。 还描述了用于执行该方法和仿真装置的装置。 由于考虑到系统变迹，本发明使得可以提高再现质量。 本发明的方法包括确定输出光瞳中的积分幅度分布，将积分幅度分布与预定的变迹校正相结合，并根据修改的幅度分布来计算校正的变迹图像。

公开(公告)号：US07808615B2

公开(公告)日：2010-10-05

申请号：US11427183

申请日：2006-06-28

申请人： Toralf Gruner ,  Olaf Conradi ,  Nils Dieckmann ,  Markus Schwab ,  Olaf Dittmann ,  Michael Totzeck ,  Daniel Kraehmer ,  Vladimir Kamenov

发明人： Toralf Gruner ,  Olaf Conradi ,  Nils Dieckmann ,  Markus Schwab ,  Olaf Dittmann ,  Michael Totzeck ,  Daniel Kraehmer ,  Vladimir Kamenov

IPC分类号： G03B27/54 ,  G03B27/32

CPC分类号： G03F7/70958 ,  G02B13/143 ,  G02B17/0856 ,  G02B17/0892 ,  G02B27/0012 ,  G03F7/70091

摘要： The invention concerns a method for operating a projection exposure apparatus to project the image of a structure of an object (5) arranged in an object plane (6) onto a substrate (10) arranged in an image plane (8). The object (5) is illuminated with light of an operating wavelength of the projection exposure apparatus according to one of several adjustable exposure modes. The light produces changes in at least one optical element (9) of the projection exposure apparatus, by which the optical properties of the projection exposure apparatus are influenced. The operation of the projection exposure apparatus makes allowance for the influencing of the optical properties of the projection exposure apparatus or a quantity dependent on the former, being calculated approximately on the basis of the exposure mode used and the structure of the object (5).

摘要翻译： 本发明涉及一种用于操作投影曝光装置以将布置在物平面（6）中的物体（5）的结构的图像投影到布置在图像平面（8）中的基板（10）上的方法。 根据多种可调曝光模式之一，物体（5）被投影曝光装置的工作波长的光照射。 该光在投影曝光装置的至少一个光学元件（9）中产生变化，由此影响投影曝光装置的光学特性。 投影曝光装置的操作允许基于所使用的曝光模式和对象（5）的结构大致计算投影曝光装置的光学特性或取决于前者的光学特性的影响。

公开(公告)号：US07239450B2

公开(公告)日：2007-07-03

申请号：US11181694

申请日：2005-07-14

申请人： Vladimir Kamenov ,  Daniel Kraehmer ,  Michael Totzeck ,  Toralf Gruner ,  Aurelian Dodoc

发明人： Vladimir Kamenov ,  Daniel Kraehmer ,  Michael Totzeck ,  Toralf Gruner ,  Aurelian Dodoc

IPC分类号： G02B3/00

CPC分类号： G03F7/70891 ,  G02B1/02 ,  G02B1/08 ,  G02B17/0812 ,  G02B17/0892 ,  G03F7/70966

摘要： A method of determining materials of lenses contained in an optical system of a projection exposure apparatus is described. First, for each lens of a plurality of the lenses, a susceptibility factor KLT/LH is determined. This factor is a measure of the susceptibility of the respective lens to deteriorations caused by at least one of lifetime effects and lens heating effects. Then a birefringent fluoride crystal is selected as a material for each lens for which the susceptibility factor KLT/LH is above a predetermined threshold. Theses lenses are assigned to a first set of lenses. For these lenses, measures are determined for reducing adverse effects caused by birefringence inherent to the fluoride crystals.

摘要翻译： 描述了确定投影曝光装置的光学系统中所包含的透镜的材料的方法。 首先，对于多个透镜的每个透镜，确定敏感度因子K LT / LH 。 该因子是由寿命效应和透镜加热效果中的至少一种引起的各透镜对恶化的敏感性的量度。 然后选择双折射氟化物晶体作为敏感度因子K LT / LH <>高于预定阈值的每个透镜的材料。 这些镜头被分配到第一组透镜。 对于这些透镜，确定了减少由氟化物晶体固有的双折射引起的不利影响的措施。

公开(公告)号：US20080002167A1

公开(公告)日：2008-01-03

申请号：US11427183

申请日：2006-06-28

申请人： Toralf Gruner ,  Olaf Conradi ,  Nils Dieckmann ,  Markus Schwab ,  Olaf Hmann ,  Michael Totzeck ,  Daniel Kraehmer ,  Vladimir Kamenov

发明人： Toralf Gruner ,  Olaf Conradi ,  Nils Dieckmann ,  Markus Schwab ,  Olaf Hmann ,  Michael Totzeck ,  Daniel Kraehmer ,  Vladimir Kamenov

IPC分类号： G03B27/42 ,  G02B9/00

CPC分类号： G03F7/70958 ,  G02B13/143 ,  G02B17/0856 ,  G02B17/0892 ,  G02B27/0012 ,  G03F7/70091

摘要： The invention concerns a method for operating a projection exposure apparatus to project the image of a structure of an object (5) arranged in an object plane (6) onto a substrate (10) arranged in an image plane (8). The object (5) is illuminated with light of an operating wavelength of the projection exposure apparatus according to one of several adjustable exposure modes. The light produces changes in at least one optical element (9) of the projection exposure apparatus, by which the optical properties of the projection exposure apparatus are influenced. The operation of the projection exposure apparatus makes allowance for the influencing of the optical properties of the projection exposure apparatus or a quantity dependent on the former, being calculated approximately on the basis of the exposure mode used and the structure of the object (5).

摘要翻译： 本发明涉及一种用于操作投影曝光装置以将布置在物平面（6）中的物体（5）的结构的图像投影到布置在图像平面（8）中的基板（10）上的方法。 根据多种可调曝光模式之一，物体（5）被投影曝光装置的工作波长的光照射。 该光在投影曝光装置的至少一个光学元件（9）中产生变化，由此影响投影曝光装置的光学特性。 投影曝光装置的操作允许基于所使用的曝光模式和对象（5）的结构大致计算投影曝光装置的光学特性或取决于前者的光学特性的影响。

公开(公告)号：US20090284831A1

公开(公告)日：2009-11-19

申请号：US12330980

申请日：2008-12-09

申请人： Karl-Heinz Schuster ,  Heiko Feldmann ,  Toralf Gruner ,  Michael Totzeck ,  Wilfried Clauss ,  Susanne Beder ,  Daniel Kraehmer ,  Olaf Dittmann

发明人： Karl-Heinz Schuster ,  Heiko Feldmann ,  Toralf Gruner ,  Michael Totzeck ,  Wilfried Clauss ,  Susanne Beder ,  Daniel Kraehmer ,  Olaf Dittmann

IPC分类号： G02B13/14 ,  G02B27/28 ,  G02B3/00

CPC分类号： G03F7/70341 ,  G02B5/3091 ,  G02B27/0025 ,  G03F7/70308

摘要： A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element (L3) with an index of refraction greater than 1.6. This element (L3) has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume (L3′) which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.

摘要翻译： 微光刻投影曝光装置的投影物镜具有折射率大于1.6的高折射率折射光学元件（L3）。 该元件（L3）具有在体积上变化的体积和材料相关的光学性质。 该光学特性的变化导致物镜的像差。 在一个实施例中，提供至少4个光学表面，其布置在与折射光学元件的体积光学共轭的至少一个体积（L3'）中。 每个光学表面包括至少一个校正装置，例如具有局部变化特性的表面变形或双折射层，其至少部分地校正由光学性质的变化引起的像差。

公开(公告)号：US20070195423A1

公开(公告)日：2007-08-23

申请号：US11657925

申请日：2007-01-25

申请人： Vladimir Kamenov ,  Daniel Kraehmer ,  Michael Totzeck ,  Toralf Gruner ,  Aurelian Dodoc ,  David Shafer ,  Wilhelm Ulrich ,  Rudolf Buenau ,  Hans-Juergen Mann ,  Alexander Epple

发明人： Vladimir Kamenov ,  Daniel Kraehmer ,  Michael Totzeck ,  Toralf Gruner ,  Aurelian Dodoc ,  David Shafer ,  Wilhelm Ulrich ,  Rudolf Buenau ,  Hans-Juergen Mann ,  Alexander Epple

IPC分类号： G02B3/00

CPC分类号： G02B27/0012 ,  G02B1/02 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70966 ,  G03F7/70975

摘要： A method of determining materials of lenses contained in an optical system of a projection exposure apparatus is described. First, for each lens of a plurality of the lenses, a susceptibility factor KLT/LH is determined. This factor is a measure of the susceptibility of the respective lens to deteriorations caused by at least one of lifetime effects and lens heating effects. Then a birefringent fluoride crystal is selected as a material for each lens for which the susceptibility factor KLT/LH is above a predetermined threshold. Theses lenses are assigned to a first set of lenses. For these lenses, measures are determined for reducing adverse effects caused by birefringence inherent to the fluoride crystals.

公开(公告)号：US20050094268A1

公开(公告)日：2005-05-05

申请号：US10922380

申请日：2004-08-19

申请人： Damian Fiolka ,  Olaf Dittmann ,  Michael Totzeck ,  Nils Dieckmann ,  Jess Koehler ,  Toralf Gruner ,  Daniel Kraehmer

发明人： Damian Fiolka ,  Olaf Dittmann ,  Michael Totzeck ,  Nils Dieckmann ,  Jess Koehler ,  Toralf Gruner ,  Daniel Kraehmer

IPC分类号： G02B17/08 ,  G02B27/09 ,  G02B27/28 ,  G03F7/20 ,  G02F1/1335

CPC分类号： G03F7/70241 ,  G02B27/0994 ,  G02B27/286 ,  G03F7/70191 ,  G03F7/70966

摘要： An optical system (1) includes a first optical subsystem (3) with at least a first birefringent optical element (7), and further includes a second optical subsystem (5) with at least a second birefringent optical element (9). Between the first optical subsystem and the second optical subsystem, an optical retarding system (13) with at least a first optical retarding element (15) is arranged, which introduces a retardation of one-half of a wavelength between two mutually orthogonal states of polarization.

摘要翻译： 光学系统（1）包括具有至少第一双折射光学元件（7）的第一光学子系统（3），并且还包括具有至少第二双折射光学元件（9）的第二光学子系统（5）。 在第一光学子系统和第二光学子系统之间布置有至少具有第一光学延迟元件（15）的光学延迟系统（13），其引入两个相互正交的极化状态之间的波长的一半的延迟 。

公开(公告)号：US20060109560A1

公开(公告)日：2006-05-25

申请号：US11181694

申请日：2005-07-14

申请人： Vladimir Kamenov ,  Daniel Kraehmer ,  Michael Totzeck ,  Toralf Gruner ,  Aurelian Dodoc

发明人： Vladimir Kamenov ,  Daniel Kraehmer ,  Michael Totzeck ,  Toralf Gruner ,  Aurelian Dodoc

IPC分类号： G02B3/00

CPC分类号： G03F7/70891 ,  G02B1/02 ,  G02B1/08 ,  G02B17/0812 ,  G02B17/0892 ,  G03F7/70966

摘要： A method of determining materials of lenses contained in an optical system of a projection exposure apparatus is described. First, for each lens of a plurality of the lenses, a susceptibility factor KLT/LH is determined. This factor is a measure of the susceptibility of the respective lens to deteriorations caused by at least one of lifetime effects and lens heating effects. Then a birefringent fluoride crystal is selected as a material for each lens for which the susceptibility factor KLT/LH is above a predetermined threshold. Theses lenses are assigned to a first set of lenses. For these lenses, measures are determined for reducing adverse effects caused by birefringence inherent to the fluoride crystals.

摘要翻译： 描述了确定投影曝光装置的光学系统中所包含的透镜的材料的方法。 首先，对于多个透镜的每个透镜，确定敏感度因子K LT / LH 。 该因子是由寿命效应和透镜加热效果中的至少一种引起的各透镜对恶化的敏感性的量度。 然后选择双折射氟化物晶体作为敏感度因子K LT / LH <>高于预定阈值的每个透镜的材料。 这些镜头被分配到第一组透镜。 对于这些透镜，确定了减少由氟化物晶体固有的双折射引起的不利影响的措施。

公开(公告)号：US08325426B2

公开(公告)日：2012-12-04

申请号：US13156819

申请日：2011-06-09

申请人： Karl-Heinz Schuster ,  Heiko Feldmann ,  Toralf Gruner ,  Michael Totzeck ,  Wilfried Clauss ,  Susanne Beder ,  Daniel Kraehmer ,  Olaf Dittmann

发明人： Karl-Heinz Schuster ,  Heiko Feldmann ,  Toralf Gruner ,  Michael Totzeck ,  Wilfried Clauss ,  Susanne Beder ,  Daniel Kraehmer ,  Olaf Dittmann

IPC分类号： G02B15/14

CPC分类号： G03F7/70341 ,  G02B5/3091 ,  G02B27/0025 ,  G03F7/70308

摘要： A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element with an index of refraction greater than 1.6. This element has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.

摘要翻译： 微光刻投影曝光装置的投影物镜具有折射率大于1.6的高折射率折射光学元件。 该元件具有在体积上变化的体积和材料相关的光学性质。 该光学特性的变化导致物镜的像差。 在一个实施例中，提供至少4个光学表面，其布置在与折射光学元件的体积光学共轭的至少一个体积中。 每个光学表面包括至少一个校正装置，例如具有局部变化特性的表面变形或双折射层，其至少部分地校正由光学性质的变化引起的像差。