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1.发明授权公开(公告)号：US06928143B2
公开(公告)日：2005-08-09
申请号：US10418921
申请日：2003-04-21
CPC分类号： G21K5/10
摘要： A portable apparatus for sanitizing and recovering mail and other materials is disclosed. The apparatus is employed after a known or suspected biological attack or contamination event, such as anthrax. Multiple X-ray sources penetrate mail and other materials, and destroy the biological agents. The apparatus is taken to the location of the biological problem, as opposed to shipping contaminated materials to a fixed facility for recovery. Many safety and practical advantages result from this approach to bio-terrorism or to biological contamination events. The design of this apparatus leads to a self-cleaning feature. Airflow control prevents escape of toxic biological materials into the environment.
摘要翻译： 公开了用于消毒和恢复邮件和其他材料的便携式设备。 该装置在已知或可疑的生物攻击或污染事件（例如炭疽）后使用。 多个X射线源穿透邮件和其他材料，并破坏生物制剂。 该设备被带到生物学问题的位置，而不是将污染的材料运送到固定设施以进行回收。 这种生物恐怖主义或生物污染事件的方法有许多安全和实际的优势。 该设备的设计导致自清洁功能。 气流控制可防止有毒生物材料逃逸到环境中。
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公开(公告)号：US20090120191A1
公开(公告)日：2009-05-14
申请号：US11937263
申请日：2007-11-08
申请人： Steven Morrison , Gershon Perelman
发明人： Steven Morrison , Gershon Perelman
IPC分类号： G01N29/14
CPC分类号： G01N29/265 , G01N2291/106 , G01N2291/2636
摘要： Methods and apparatus for inspecting tubes or pipes preferably includes at least one sealed inspection pig having a length to diameter relationship based on a known bend radius of a tube or pipe to be inspected. A plurality of such pigs may be used where such pigs are interconnected, sealed, and releasable by design and where an inspection transducer is located approximately centrally between the ends of at least one of the pigs.
摘要翻译： 用于检查管或管的方法和装置优选地包括至少一个密封的检查猪，其基于待检查的管或管的已知弯曲半径具有长度与直径的关系。 可以使用多个这样的猪，其中这些猪通过设计互连，密封和可释放，并且其中检查换能器大致位于至少一只猪的端部之间的中心位置。
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3.发明申请High throughput brightfield/darkfield wafer inspection system using advanced optical techiques 有权采用先进光学技术的高通量明场/暗场晶片检测系统公开(公告)号：US20050062962A1
公开(公告)日：2005-03-24
申请号：US10983078
申请日：2004-11-04
申请人： Christopher Fairley , Tao Fu , Gershon Perelman , Bin-Ming Tsai
发明人： Christopher Fairley , Tao Fu , Gershon Perelman , Bin-Ming Tsai
IPC分类号： G01N21/88 , G01N21/95 , G01N21/956
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/8825
摘要： The broadband brightfield/darkfield wafer inspection system provided receives broadband brightfield illumination information via a defect detector, which signals for initiation of darkfield illumination. The defect detector forms a two dimensional histogram of the defect data and a dual mode defect decision algorithm and post processor assess defects. Darkfield radiation is provided by two adjustable height laser beams which illuminate the surface of the wafer from approximately 6 to 39 degrees. Each laser is oriented at an azimuth angle 45 degrees from the orientation of the Manhattan geometry on the wafer, and 90 degrees in azimuth from one another. Vertical angular adjustability is provided by modifying cylindrical lens position to compensate for angular mirror change by translating an adjustable mirror, positioning the illumination spot into the sensor field of view, rotating and subsequently moving the cylindrical lens. A brightfield beamsplitter in the system is removable, and preferably replaced with a blank when performing darkfield illumination. Light level control for the system is provided by a dual polarizer first stage. Light exiting from the second polarizer passes through a filter which absorbs a portion of the light and comprises the second stage of light control. The beam then passes through a polarizing beamsplitter. The second channel is further reflected and polarized and both beams thereafter illuminate the substrate.
摘要翻译： 提供的宽带明场/暗场晶片检查系统经由缺陷检测器接收宽带明场照明信息，该缺陷检测器信号用于开始暗场照明。 缺陷检测器形成缺陷数据的二维直方图，并且双模缺陷判定算法和后处理器评估缺陷。 暗场辐射由两个可调节的高度激光束提供，其将晶片的表面从约6度39度照射。 每个激光器的方位角与晶片上的曼哈顿几何形状的取向成45度，并且彼此相差90度。 通过改变柱面透镜位置来补偿角度反射镜的变化，通过平移可调节的反射镜，将照明光斑定位在传感器视场内，旋转和随后移动柱面透镜来提供垂直角度调整性。 系统中的明场分束器是可拆卸的，并且当执行暗场照明时，优选地用空白物替换。 系统的光级控制由双偏振器第一级提供。 从第二偏振片射出的光通过吸收一部分光的滤光器，并包括第二级光控制。 然后光束通过偏振分光镜。 第二通道被进一步反射和偏振，并且两个光束此后照亮基板。
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公开(公告)号：US20230009117A1
公开(公告)日：2023-01-12
申请号：US17857108
申请日：2022-07-04
申请人： Glen R. Stevick , Gershon Perelman , Kyle McGrath
发明人： Glen R. Stevick , Gershon Perelman , Kyle McGrath
IPC分类号： B25B27/14
摘要： Methods and devices for extracting an internal pipe/tube element from a connected outer pipe/tube element. Certain embodiments are directed to methods and devices that inwardly distort a pipe/tube at a connection to allow the pipe to be more easily disconnected without damaging the overlapping (outside) half of the connection. Collapsing the pipe adjacent to, and into, the fitting and reducing its circumference allows the pipe to be unscrewed or slide out of the overlapping side of the connection. Embodiments are described including partially cutting thru the male portion of the connection and locally compressing and collapsing the pipe to radially disengage it from interior of the opposing fitting or pipe section. In one method, an interior pipe/tube is disengaged from a fitting or overlapping connection where a connection (weld, adhesive or soldered attachment) is utilized and the connection is selected small/weak enough to be broken in the compression process.
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公开(公告)号：US20060043283A1
公开(公告)日：2006-03-02
申请号：US10931809
申请日：2004-08-31
申请人： Stephen Davis , Lee Earley , Mark Hardman , Adrian Land , Gershon Perelman
发明人： Stephen Davis , Lee Earley , Mark Hardman , Adrian Land , Gershon Perelman
IPC分类号： H01J49/00
CPC分类号： H01J49/40
摘要： An apparatus that comprises material which have different thermal expansion coefficients, combined in such a way that the length of the drift region is variant, and self adjusting with temperature. The adjustment is such as to compensate for the length changes resulting from thermal expansion or contraction in other ion optical elements, such that ions of substantially equivalent mass to charge ratios maintain a constant flight time though the system. This allows for use of standard construction methods for the ion optical elements.
摘要翻译： 一种包括具有不同热膨胀系数的材料的装置，其组合使得漂移区域的长度是不同的，并且随着温度自调节。 该调整是为了补偿由其它离子光学元件的热膨胀或收缩导致的长度变化，使得基本相当的质荷比的离子通过系统保持恒定的飞行时间。 这允许使用用于离子光学元件的标准施工方法。
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6.发明授权High throughput brightfield/darkfield wafer inspection system using advanced optical techniques 失效采用先进光学技术的高通量明场/暗视场检测系统公开(公告)号：US06288780B1
公开(公告)日：2001-09-11
申请号：US08991927
申请日：1997-12-16
IPC分类号： G01N2100
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/8825
摘要： The broadband brightfield/darkfield wafer inspection system provided receives broadband brightfield illumination information via a defect detector, which signals for initiation of darkfield illumination. The defect detector forms a two dimensional histogram of the defect data and a dual mode defect decision algorithm and post processor assess defects. Darkfield radiation is provided by two adjustable height laser beams which illuminate the surface of the wafer from approximately 6 to 39 degrees. Each laser is oriented at an azimuth angle 45 degrees from the orientation of the Manhattan geometry on the wafer, and 90 degrees in azimuth from one another. Vertical angular adjustability is provided by modifying cylindrical lens position to compensate for angular mirror change by translating an adjustable mirror, positioning the illumination spot into the sensor field of view, rotating and subsequently moving the cylindrical lens. A brightfield beamsplitter in the system is removable, and preferably replaced with a blank when performing darkfield illumination. Light level control for the system is provided by a dual polarizer first stage. Light exiting from the second polarizer passes through a filter which absorbs a portion of the light and comprises the second stage of light control. The beam then passes through a polarizing beamsplitter. The second channel is further reflected and polarized and both beams thereafter illuminate the substrate.
摘要翻译： 提供的宽带明场/暗场晶片检查系统经由缺陷检测器接收宽带明场照明信息，该缺陷检测器信号用于开始暗场照明。 缺陷检测器形成缺陷数据的二维直方图，并且双模缺陷判定算法和后处理器评估缺陷。 暗场辐射由两个可调节的高度激光束提供，其将晶片的表面从约6度39度照射。 每个激光器的方位角与晶片上的曼哈顿几何形状的取向成45度，并且彼此相差90度。 通过改变柱面透镜位置来补偿角度反射镜的变化，通过平移可调节的反射镜，将照明光斑定位在传感器视场内，旋转和随后移动柱面透镜来提供垂直角度调整性。 系统中的明场分束器是可拆卸的，并且当执行暗场照明时，优选地用空白物替换。 系统的光级控制由双偏振器第一级提供。 从第二偏振片射出的光通过吸收一部分光的滤光器，并包括第二级光控制。 然后光束通过偏振分光镜。 第二通道被进一步反射和偏振，并且两个光束此后照亮基板。
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公开(公告)号：US07675031B2
公开(公告)日：2010-03-09
申请号：US12129608
申请日：2008-05-29
申请人： Michael Konicek , Adrian Land , Gershon Perelman , Lee Earley , Mark Hardman
发明人： Michael Konicek , Adrian Land , Gershon Perelman , Lee Earley , Mark Hardman
CPC分类号： H01J49/063 , H01J49/4225
摘要： Auxiliary electrodes for creating drag fields may be provided as arrays of finger electrodes on thin substrates such as printed circuit board material for insertion between main RF electrodes of a multipole. A progressive range of voltages can be applied along lengths of the auxiliary electrodes by implementing a voltage divider that utilizes static resisters interconnecting individual finger electrodes of the arrays. Dynamic voltage variations may be applied to individual finger electrodes or to groups of the finger electrodes.
摘要翻译： 用于产生拖曳场的辅助电极可以被提供为诸如印刷电路板材料的薄基板上的指状电极阵列，用于插入多极的主RF电极之间。 可以通过实施使用互连阵列的各个指状电极的静电阻的分压器来沿辅助电极的长度施加逐渐的电压范围。 动态电压变化可以施加到各个指状电极或指状电极的组。
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8.发明授权High throughput darkfield/brightfield wafer inspection system using advanced optical techniques 有权采用先进光学技术的高通量暗场/亮场晶片检测系统公开(公告)号：US07522275B2
公开(公告)日：2009-04-21
申请号：US11893169
申请日：2007-08-14
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/8825
摘要： The broadband brightfield/darkfield wafer inspection system provided receives broadband brightfield illumination information via a defect detector, which signals for initiation of darkfield illumination. The defect detector forms a two dimensional histogram of the defect data and a dual mode defect decision algorithm and post processor assess defects. Darkfield radiation is provided by two adjustable height laser beams. Vertical angular adjustability is provided by modifying cylindrical lens position to compensate for angular mirror change by translating an adjustable mirror, positioning the illumination spot into the sensor field of view, rotating and subsequently moving the cylindrical lens. A brightfield beamsplitter in the system is removable, and preferably replaced with a blank when performing darkfield illumination. Light level control for the system is provided by a dual polarizer first stage.
摘要翻译： 提供的宽带明场/暗场晶片检查系统经由缺陷检测器接收宽带明场照明信息，该缺陷检测器信号用于开始暗场照明。 缺陷检测器形成缺陷数据的二维直方图，并且双模缺陷判定算法和后处理器评估缺陷。 暗场辐射由两个可调高度的激光束提供。 通过改变柱面透镜位置来补偿角度反射镜的变化，通过平移可调节的反射镜，将照明光斑定位在传感器视场内，旋转和随后移动柱面透镜来提供垂直角度调整性。 系统中的明场分束器是可拆卸的，并且当执行暗场照明时，优选地用空白物替换。 系统的光级控制由双偏振器第一级提供。
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9.发明申请High throughput brightfield/darkfield water inspection system using advanced optical techniques 有权采用先进光学技术的高通量明场/暗场水检测系统公开(公告)号：US20080225298A1
公开(公告)日：2008-09-18
申请号：US12154593
申请日：2008-05-22
IPC分类号： G01N21/55
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N2021/8825
摘要： The broadband brightfield/darkfield wafer inspection system provided receives broadband brightfield illumination information via a defect detector, which signals for initiation of darkfield illumination. The defect detector forms a two dimensional histogram of the defect data and a dual mode defect decision algorithm and post processor assess defects. Darkfield radiation is provided by two adjustable height laser beams which illuminate the surface of the wafer from approximately 6 to 39 degrees. Each laser is oriented at an azimuth angle 45 degrees from the orientation of the manhattan geometry on the wafer, and 90 degrees in azimuth from one another. Vertical angular adjustability is provided by modifying cylindrical lens position to compensate for angular mirror change by translating an adjustable mirror, positioning the illumination spot into the sensor field of view, rotating and subsequently moving the cylindrical lens. A brightfield beamsplitter in the system is removable, and preferably replaced with a blank when performing darkfield illumination. Light level control for the system is provided by a dual polarizer first stage. Light exiting from the second polarizer passes through a filter which absorbs a portion of the light and comprises the second stage of light control. The beam then passes through a polarizing beamsplitter. The second channel is further reflected and polarized and both beams thereafter illuminate the substrate.
摘要翻译： 提供的宽带明场/暗场晶片检查系统经由缺陷检测器接收宽带明场照明信息，该缺陷检测器信号用于开始暗场照明。 缺陷检测器形成缺陷数据的二维直方图，并且双模缺陷判定算法和后处理器评估缺陷。 暗场辐射由两个可调节的高度激光束提供，其将晶片的表面从约6度39度照射。 每个激光器定向在与晶片上的曼哈顿几何形状的取向成45度的方位角，并且彼此成90度的方位角。 通过改变柱面透镜位置来补偿角度反射镜的变化，通过平移可调节的反射镜，将照明光斑定位在传感器视场内，旋转和随后移动柱面透镜来提供垂直角度调整性。 系统中的明场分束器是可拆卸的，并且当执行暗场照明时，优选地用空白物替换。 系统的光级控制由双偏振器第一级提供。 从第二偏振片射出的光通过吸收一部分光的滤光器，并包括第二级光控制。 然后光束通过偏振分光镜。 第二通道被进一步反射和偏振，并且两个光束此后照亮基板。
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10.发明授权公开(公告)号：US07259844B2
公开(公告)日：2007-08-21
申请号：US11652781
申请日：2007-01-12
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/8825
摘要： The broadband brightfield/darkfield wafer inspection system provided receives broadband brightfield illumination information via a defect detector, which signals for initiation of darkfield illumination. The defect detector forms a two dimensional histogram of the defect data and a dual mode defect decision algorithm and post processor assess defects. Darkfield radiation is provided by two adjustable height laser beams which illuminate the surface of the wafer from approximately 6 to 39 degrees. Each laser is oriented at an azimuth angle 45 degrees from the orientation of the manhattan geometry on the wafer, and 90 degrees in azimuth from one another. Vertical angular adjustability is provided by modifying cylindrical lens position to compensate for angular mirror change by translating an adjustable mirror, positioning the illumination spot into the sensor field of view, rotating and subsequently moving the cylindrical lens. A brightfield beamsplitter in the system is removable, and preferably replaced with a blank when performing darkfield illumination. Light level control for the system is provided by a dual polarizer first stage. Light exiting from the second polarizer passes through a filter which absorbs a portion of the light and comprises the second stage of light control. The beam then passes through a polarizing beamsplitter. The second channel is further reflected and polarized and both beams thereafter illuminate the substrate.
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