公开(公告)号：US06437347B1

公开(公告)日：2002-08-20

申请号：US09290785

申请日：1999-04-13

申请人： John George Hartley ,  Rodney Arthur Kendall

发明人： John George Hartley ,  Rodney Arthur Kendall

IPC分类号： H01J37304

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3045 ,  H01J2237/31754 ,  H01J2237/31766 ,  Y10S977/887

摘要： An e-beam lithographic system capable of in situ registration. The system has an optics section such as a VAIL lens. A controllable stage moves a substrate with respect to the beam axis to place substrate writing fields beneath the beam. A field locking target between the optics section and the stage has an aperture sized to permit the beam to write a target field on the substrate. The field locking target includes alignment or registration marks around the aperture. A differential interferometric system measures the relative positions of the field locking target and the stage and controls stage position. The beam patterns the substrate on a field by field basis. As the stage is moving into position for each field, the beam is swept until it hits the alignment marks, thereby checking system alignment. The beam control data, i.e., coil currents necessary to hit the marks are stored, and drift correction values calculated from the beam control data. Meanwhile, pattern beam control is compensated by the drift correction values.

摘要翻译： 一种能够进行原位配准的电子束光刻系统。 该系统具有诸如VAIL透镜的光学部分。 可控阶段相对于光束轴移动衬底，以将衬底写入字段放置在光束下方。 在光学部分和舞台之间的场锁定目标具有一个孔径，其尺寸允许光束在基底上写入目标场。 场锁定目标包括孔周围的对准或对准标记。 差分干涉测量系统测量场锁定目标和平台的相对位置并控制舞台位置。 光束以场为单位对基板进行图案化。 当舞台正在移动到每个场的位置时，梁被扫掠直到它撞到对准标记，从而检查系统对准。 存储光束控制数据，即击中标记所需的线圈电流，以及从光束控制数据计算的漂移校正值。 同时，模式波束控制由漂移校正值补偿。

公开(公告)号：US5798528A

公开(公告)日：1998-08-25

申请号：US814211

申请日：1997-03-11

申请人： Rainer Butsch ,  John George Hartley ,  Werner Stickel

发明人： Rainer Butsch ,  John George Hartley ,  Werner Stickel

IPC分类号： H01J37/304 ,  H01J37/317

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/30433 ,  H01J2237/30444

摘要： A method is disclosed for improving the electron beam apparatus lithography process wherein the calibration procedure for the apparatus is improved by using the product pattern and stepping sequence used to make the mask on a calibration plate and/or calibration grid and to determine improved apparatus correction errors which errors are used to control the apparatus for making an improved mask. The well-known EMULATION procedure is improved by calculating additional field correction errors based on a two step registration procedure to determine X/Y apparatus stepping errors. The LEARN procedure based on a static calibration grid procedure is improved by employing the duty cycle of the product pattern to calibrate the apparatus to determine deflection beam errors.

摘要翻译： 公开了一种用于改进电子束装置光刻处理的方法，其中通过使用产品图案和用于在校准板和/或校准网格上制作掩模的步进顺序来改进装置的校准程序，并且确定改进的装置校正误差 哪些错误用于控制用于制造改进掩模的装置。 通过基于两步注册过程来计算附加的场校正误差来确定X / Y设备的步进误差来改进众所周知的仿真程序。 基于静态校准网格程序的LEARN程序通过采用产品图案的占空比校准装置来确定偏转光束误差得到改进。

公开(公告)号：US06177680B1

公开(公告)日：2001-01-23

申请号：US09197167

申请日：1998-11-20

申请人： Gregory J. Dick ,  Abigail S. Ganong ,  John George Hartley ,  John W. Pavick ,  Denise M. Puisto

发明人： Gregory J. Dick ,  Abigail S. Ganong ,  John George Hartley ,  John W. Pavick ,  Denise M. Puisto

IPC分类号： H01J37302

CPC分类号： H01J37/304 ,  G05B2219/37097 ,  G05B2219/37129 ,  G05B2219/37576 ,  G05B2219/45027 ,  H01J2237/30444 ,  H01J2237/3175

摘要： An e-beam system for making masks corrects the beam for pattern-dependent errors by executing the bulk of the post-processing program only once, with two sets of output data being generated by the encode routine. A first output file of the encode routine generates the beam control data without pattern-dependent corrections. A second output file merges the beam control data with the data for metrology marks. A test wafer is patterned using the second output file and measured to generate a set of pattern correction data. Production wafers are written using the beam control data corrected on the fly by the pattern correction data.

摘要翻译： 用于制造掩模的电子束系统通过仅执行一次后处理程序的大部分，由编码例程生成两组输出数据来校正波束的图形相关错误。 编码例程的第一输出文件产生不具有模式相关校正的波束控制数据。 第二个输出文件将光束控制数据与计量标记的数据进行合并。 使用第二输出文件对测试晶片进行图案化并被测量以产生一组图案校正数据。 使用通过模式校正数据在飞行中校正的波束控制数据来写入生产晶片。

公开(公告)号：US5917932A

公开(公告)日：1999-06-29

申请号：US881220

申请日：1997-06-24

申请人： John George Hartley

发明人： John George Hartley

IPC分类号： G03F1/00 ,  G03F1/84 ,  G03F7/20 ,  G06K9/00 ,  G03F9/00

CPC分类号： G03F1/84 ,  G03F7/70433 ,  G03F7/706 ,  H01J2237/2816 ,  H01J2237/2817

摘要： Process steps are provided to analyze image placement on a pre-distorted lithographic mask produced by a lithographic system. Obtain metrology data, form a reference array equal to the design coordinates of the metrology sites. Align the metrology data grid coordinate system to remove rigid body components from the metrology data offsets. Parse the metrology data into one or more correction areas. If the mask is to have its disposition provided according to the statistics of the residual errors in the correction areas, then compute the statistics and compare them to the specifications. Otherwise concatenate the local reference arrays summed with their corresponding correction area center coordinates to form reference mark design location arrays. Concatenate temporary arrays with the mask offsets free of pre-distortion into an array of mask offsets corresponding to desired disposition areas and compute statistical distribution of residual errors in array(s) of mask offsets for disposition. Compare statistical distribution of residual errors determined during computation with the specified statistical distribution of the mask disposition areas to accept or reject the mask.

摘要翻译： 提供了处理步骤来分析由光刻系统产生的预变形光刻掩模上的图像放置。 获取计量数据，形成等于计量站点设计坐标的参考数组。 对齐计量数据网格坐标系以从计量数据偏移中移除刚体组件。 将测量数据解析成一个或多个校正区域。 如果掩模要根据校正区域中的残差的统计信息提供其处理，则计算统计数据并将其与规格进行比较。 否则将本地参考数组与其对应的校正区域中心坐标相加，以形成参考标记设计位置数组。 将具有无预失真的掩码偏移的临时阵列连接到对应于期望的配置区域的掩码偏移阵列中，并计算用于配置的掩模偏移阵列中的残余误差的统计分布。 比较计算过程中确定的残差的统计分布与掩模配置区域的指定统计分布，以接受或拒绝掩码。

公开(公告)号：US5825039A

公开(公告)日：1998-10-20

申请号：US756360

申请日：1996-11-27

申请人： John George Hartley

发明人： John George Hartley

IPC分类号： H01J37/147 ,  H04N3/30 ,  H01J37/304

CPC分类号： H04N3/30 ,  H01J37/1474 ,  H01J2237/30488

摘要： A digitally stepped deflection raster system and a method of operation thereof are disclosed. The digitally stepped deflection raster system operates to provide horizontal and vertical scans of an area of interest. The total length of each of the horizontal and vertical scans is proportioned into segments to provide non-continuous scanning signals that are arranged into predetermined raster patterns each of which reduces the deflection placement error of the digitally stepped deflection raster system.

摘要翻译： 公开了一种数字阶梯偏转光栅系统及其操作方法。 数字阶梯偏转光栅系统用于提供感兴趣区域的水平和垂直扫描。 每个水平扫描和垂直扫描的总长度被分成段，以提供非连续的扫描信号，其被布置成预定的光栅图案，每个扫描信号减少数字阶梯偏转光栅系统的偏转放置误差。

公开(公告)号：US5773836A

公开(公告)日：1998-06-30

申请号：US739137

申请日：1996-10-28

申请人： John George Hartley

发明人： John George Hartley

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01J37/302 ,  H01J37/304

CPC分类号： G03F7/706 ,  G03F7/70425 ,  G03F7/70475 ,  G03F7/70633 ,  G03F9/70 ,  H01J37/3023 ,  H01J2237/30433 ,  H01J2237/31767

摘要： A method for correcting placement errors in a lithography system, and a system therefor, are disclosed. The method comprises the steps of obtaining metrology data of sufficient density to smoothly map an error to be corrected, deriving a metrology data grid coordinate system from the data, aligning the metrology data grid coordinate system to remove rigid body components, and for each of a plurality of lithographic fields: identifying a number of metrology sites nearest to the center of the field; establishing a reference grid coordinate system coinciding with the lithographic field; determining at least one correction factor which minimizes the residual errors; and applying at least one correction factor for at least one field to the first lithography system to correct a placement error. Such a method and system are particularly useful for error correction in e beam lithography tools.

摘要翻译： 公开了一种用于校正光刻系统中的放置误差的方法及其系统。 该方法包括以下步骤：获得具有足够密度的测量数据，以平滑地映射待校正的误差，从数据中导出测量数据网格坐标系，对准测量数据网格坐标系以去除刚体部件，以及针对 多个光刻领域：识别最靠近场中心的测量点; 建立与光刻场一致的参考网格坐标系; 确定使残余误差最小化的至少一个校正因子; 以及将至少一个场的至少一个校正因子应用于所述第一光刻系统以校正放置误差。 这种方法和系统对于电子束光刻工具中的纠错特别有用。