Micro-fluid ejection assemblies
    2.
    发明申请
    Micro-fluid ejection assemblies 有权
    微流体喷射组件

    公开(公告)号:US20050231557A1

    公开(公告)日:2005-10-20

    申请号:US10823939

    申请日:2004-04-14

    IPC分类号: B41J2/16 C23F1/00

    摘要: A micro-fluid ejection assembly including a silicon substrate having accurately formed fluid paths therein. The fluid paths are formed by a deep reactive ion etching process conducted on a substrate having a surface characteristic before etching selected from the group consisting of a dielectric layer thickness of no more than about 5000 Angstroms, and a substantially dielectric material free pitted surface wherein a root mean square depth of surface pitting is less than about 500 Angstroms and a maximum surface pitting depth is no more than about 2500 Angstroms. Fluid paths in such substrates having improved flow characteristics for more reliable fluid ejection operations.

    摘要翻译: 一种微流体喷射组件,包括其中具有精确形成的流体路径的硅衬底。 流体路径是通过在具有不超过约5000埃的电介质层厚度的蚀刻之前在具有蚀刻前的表面特性的基底上进行的深反应离子蚀刻工艺形成的,以及基本上不含介质材料的凹坑表面,其中a 表面点蚀的均方根深度小于约500埃,最大表面点蚀深度不超过约2500埃。 这种衬底中的流体路径具有改进的流动特性以便更可靠的流体喷射操作。

    Methods of deep reactive ion etching

    公开(公告)号:US20060054590A1

    公开(公告)日:2006-03-16

    申请号:US10938009

    申请日:2004-09-10

    IPC分类号: B41J2/04 G11B5/127

    摘要: A method of substantially simultaneously forming at least two fluid supply slots through a thickness of semiconductor substrate from a first surface to a second surface thereof. The method includes the steps of applying a photoresist layer to the first surface of the semiconductor substrate. The photoresist layer is patterned and developed using a gray scale mask for a first fluid supply slot. The semiconductor substrate is then reactive ion etched, to form the at least two fluid supply slots through the thickness of the substrate. The first fluid supply slot is substantially wider than the second fluid supply slot, and the first and second fluid supply slots are etched through the substrate at substantially the same rate.

    Method for fabricating fluid ejection device
    6.
    发明授权
    Method for fabricating fluid ejection device 有权
    制造流体喷射装置的方法

    公开(公告)号:US09132639B2

    公开(公告)日:2015-09-15

    申请号:US13097566

    申请日:2011-04-29

    IPC分类号: B41J2/16 B41J2/14 H01L21/265

    摘要: A method for fabricating an ejection chip of a fluid ejection device includes forming a drive circuitry layer on a substrate, fabricating at least one fluid ejection element on the substrate, forming at least one slot within a top portion of the substrate, filling each slot of the at least one slot with a protective material, grinding the substrate from a bottom portion of the substrate up to a predetermined height, removing the protective material from the each slot of the at least one slot, and laminating a flow feature layer and a nozzle plate over the substrate having the at least one slot.

    摘要翻译: 用于制造流体喷射装置的喷射芯片的方法包括在基板上形成驱动电路层,在基板上制造至少一个流体喷射元件,在基板的顶部部分内形成至少一个槽, 所述至少一个狭槽具有保护材料,将所述基底从所述基底的底部研磨到预定高度,从所述至少一个狭槽的每个槽移除所述保护材料,以及层压流动特征层和喷嘴 在具有至少一个槽的衬底上方。

    Method for fabricating fluid ejection device
    7.
    发明授权
    Method for fabricating fluid ejection device 有权
    制造流体喷射装置的方法

    公开(公告)号:US09403365B2

    公开(公告)日:2016-08-02

    申请号:US13097549

    申请日:2011-04-29

    IPC分类号: B41J2/16 H01L21/265

    摘要: A method for fabricating a fluid ejection device includes forming a drive circuitry layer on a substrate, fabricating at least one fluid ejection element on a top portion of the substrate, grinding the substrate from a bottom portion of the substrate up to a predetermined height, etching the top portion of the substrate to configure at least one slot within the top portion of the substrate, depositing a layer of an etch-stop material over the top portion of the substrate while filling the at least one slot with the etch-stop material, etching the bottom portion of the substrate to configure at least one fluid feed trench within the bottom portion of the substrate, removing the layer of the etch-stop material from the top portion of the substrate, and laminating a flow feature layer and a nozzle plate as a single unit over the top portion of the substrate.

    摘要翻译: 一种用于制造流体喷射装置的方法包括在基板上形成驱动电路层,在基板的顶部上制造至少一个流体喷射元件,将基板从基板底部研磨至预定高度,蚀刻 衬底的顶部以在衬底的顶部部分内配置至少一个槽,在衬底的顶部部分沉积一层蚀刻停止材料,同时用该蚀刻停止材料填充该至少一个槽, 蚀刻衬底的底部以在衬底的底部部分内配置至少一个流体馈送沟槽,从衬底的顶部去除蚀刻停止材料层,并层压流动特征层和喷嘴板 作为衬底顶部上的单个单元。

    Inkjet print cartridge having an adhesive with improved dimensional control
    10.
    发明申请
    Inkjet print cartridge having an adhesive with improved dimensional control 有权
    具有改进的尺寸控制的粘合剂的喷墨打印盒

    公开(公告)号:US20060001713A1

    公开(公告)日:2006-01-05

    申请号:US11169905

    申请日:2005-06-29

    IPC分类号: B41J2/175

    CPC分类号: B41J2/17559

    摘要: A method for manufacturing an inkjet print cartridge and an inkjet cartridge produced thereby are disclosed. An inkjet print cartridge in accordance with one aspect includes a component of the inkjet print cartridge and an applied adhesive on at least a portion of the component, wherein the applied adhesive is formed from an adhesive having a rheology viscosity ratio ηi/ηmin of from 1.0 to less than 2.1. The method in accordance with one aspect includes applying an adhesive onto at least a portion of a component of an inkjet print cartridge at an application temperature, Tα, and heating the adhesive from an initial temperature, Ti, to a cure temperature for the adhesive, Tc. The adhesive has a rheology cure profile characterized by at least one of the following parameters: a) a rheology viscosity ratio ηi/ηmin of from 1.0 to less than 2.1, b) a temperature of the adhesive is approximately equal to a minimum viscosity temperature for the adhesive, Tηmin, within less than about 10 minutes from the start of the cure cycle, and c) viscosity of the adhesive increases within less than about 5 minutes from the start of the cure cycle.

    摘要翻译: 公开了一种用于制造由此制造的喷墨打印墨盒和喷墨墨盒的方法。 根据一个方面的喷墨打印墨盒包括喷墨打印墨盒的组件和在组件的至少一部分上的涂布的粘合剂,其中涂布的粘合剂由具有流变粘度比η的粘合剂形成, / SUB> / etamin为1.0至小于2.1。 根据一个方面的方法包括在施加温度Tαα下将粘合剂施加到喷墨打印盒的部件的至少一部分上,并从初始温度T 1加热粘合剂, 将粘合剂的固化温度提高到粘合剂的固化温度。 粘合剂具有以下参数中的至少一个特征的流变学固化分布:a)1.0至小于2.1的流变粘度比ηa / etamin,b)粘合剂的温度为 大约等于从固化循环开始不到约10分钟内粘合剂T etamin N的最小粘度温度,以及c)粘合剂的粘度在小于约5分钟内增加 治愈周期的开始。