摘要:
A design system for designing complex integrated circuits (ICs), a method of IC design and program product therefor. A layout unit receives a circuit description representing portions in a grid and glyph format. A checking unit checks grid and glyph portions of the design. An elaboration unit generates a target layout from the checked design. A data prep unit prepares the target layout for mask making. A pattern caching unit selectively replaces portions of the design with previously cached results for improved design efficiency.
摘要:
A design system for designing complex integrated circuits (ICs), a method of IC design and program product therefor. A layout unit receives a circuit description representing portions in a grid and glyph format. A checking unit checks grid and glyph portions of the design. An elaboration unit generates a target layout from the checked design. A data prep unit prepares the target layout for mask making. A pattern caching unit selectively replaces portions of the design with previously cached results for improved design efficiency.
摘要:
A design system for designing complex integrated circuits (ICs), a method of IC design and program product therefor. A layout unit receives a circuit description representing portions in a grid and glyph format. A checking unit checks grid and glyph portions of the design. An elaboration unit generates a target layout from the checked design. A data prep unit prepares the target layout for mask making. A pattern caching unit selectively replaces portions of the design with previously cached results for improved design efficiency.
摘要:
A design system for designing complex integrated circuits (ICs), a method of IC design and program product therefor. A layout unit receives a circuit description representing portions in a grid and glyph format. A checking unit checks grid and glyph portions of the design. An elaboration unit generates a target layout from the checked design. A data prep unit prepares the target layout for mask making. A pattern caching unit selectively replaces portions of the design with previously cached results for improved design efficiency.
摘要:
A design system for designing complex integrated circuits (ICs), a method of IC design and program product therefor. A layout unit receives a circuit description representing portions in a grid and glyph format. A checking unit checks grid and glyph portions of the design. An elaboration unit generates a target layout from the checked design. A data prep unit prepares the target layout for mask making. A pattern caching unit selectively replaces portions of the design with previously cached results for improved design efficiency.
摘要:
A method of physical design for integrated circuit (IC) chip fabrication, physical design system and program product therefor. A design shape is fragmented into segments for Optical Proximity Correction (OPC) and a harmonic mean of the segments is determined. Electrical intent is determined for the shape and a harmonic mean is determined for the segments. Segments may be moved based on a effect on the harmonic mean from moving the segments, measured using a harmonic mean cost function. Finally segmented shapes are passed to OPC.
摘要:
A method of physical design for integrated circuit (IC) chip fabrication, physical design system and program product therefor. A design shape is fragmented into segments for Optical Proximity Correction (OPC) and a harmonic mean of the segments is determined. Electrical intent is determined for the shape and a harmonic mean is determined for the segments. Segments may be moved based on a effect on the harmonic mean from moving the segments, measured using a harmonic mean cost function. Finally segmented shapes are passed to OPC.