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21 条记录 (耗时 0.046 秒)

    Lithographic process window optimization under complex constraints on edge placement
    6.
    发明授权
    Lithographic process window optimization under complex constraints on edge placement 有权
    边缘放置复杂约束下的平版印刷工艺窗口优化

    公开(公告)号：US07269817B2

    公开(公告)日：2007-09-11

    申请号：US10776901

    申请日：2004-02-10

    申请人： Fook-Luen Heng ,  Mark A. Lavin ,  Jin-Fuw Lee ,  Daniel L. Ostapko ,  Alan E. Rosenbluth ,  Nakgeuon Seong

    发明人： Fook-Luen Heng ,  Mark A. Lavin ,  Jin-Fuw Lee ,  Daniel L. Ostapko ,  Alan E. Rosenbluth ,  Nakgeuon Seong

    IPC分类号： G06F17/50

    CPC分类号： G03F1/36

    摘要： A method and system for layout optimization relative to lithographic process windows which facilitates lithographic constraints to be non-localized in order to impart a capability of printing a given circuit with a process window beyond the process windows which are attainable with conventional simplified design rules. Pursuant to the method and system, lithographic capability and process windows are maximized to satisfy local circuit requirements and in order to achieve a maximally efficient layout. In this connection, there is employed a method utilizing a generalized lithographic process window as a measure when layout optimization is extended to a degree beyond that achieved by the simple fixed design rules which are applied to the design rules obtained is the advantage that a lithographic process window is determined purely through the calculation of image intensities and slopes, and as a result, the method can be quite rapid in application because it is possible to take advantage of known methods for rapid calculation of image intensity, and because there is obviated the need for geometrical shape processing during optimization.

    摘要翻译： 一种用于相对于光刻工艺窗口的布局优化的方法和系统，其有助于光刻约束被非局部化，以便赋予给定电路打印超过可以​​用常规简化设计规则达到的过程窗口的处理窗口的能力。 根据方法和系统，光刻能力和工艺窗口最大化，以满足局部电路要求，并实现最大限度的高效布局。 在这方面，采用一种利用广义平版印刷工艺窗口作为测量的方法，当布局优化扩展到超过通过简单的固定设计规则实现的程度时，应用于所获得的设计规则是光刻工艺的优点 通过计算图像强度和斜率来确定窗口，结果，该方法在应用中可以相当快速，因为可以利用已知的方法来快速计算图像强度，并且因为不需要 用于优化期间的几何形状处理。

    Active spectral control of optical source
    10.
    发明授权
    Active spectral control of optical source 有权
    光源的有源光谱控制

    公开(公告)号：US08520186B2

    公开(公告)日：2013-08-27

    申请号：US12860288

    申请日：2010-08-20

    申请人： Nakgeuon Seong ,  Ivan B. Lalovic ,  Nigel R. Farrar ,  Robert J. Rafac ,  Joseph J. Bendik

    发明人： Nakgeuon Seong ,  Ivan B. Lalovic ,  Nigel R. Farrar ,  Robert J. Rafac ,  Joseph J. Bendik

    IPC分类号： G03B27/68 ,  G03B27/42

    CPC分类号： G03F7/70575 ,  G03F7/70525

    摘要： A method of controlling a spectral property of a light beam includes directing a light beam to a lithography exposure apparatus configured to create a pattern on a wafer; receiving information representative of a spectral property of the light beam; receiving information representative of an optical imaging condition of the lithography exposure apparatus; estimating a characteristic value of the light beam based on the received spectral property information and the received optical imaging condition information; determining whether the estimated light beam characteristic value matches a target light beam characteristic value; and if it is determined that the estimated light beam characteristic value does not match the target light beam characteristic value, adjusting the spectral property of the light beam.

    摘要翻译： 控制光束的光谱特性的方法包括将光束引导到被配置为在晶片上产生图案的光刻曝光装置; 接收表示光束的光谱特性的信息; 接收表示所述光刻曝光装置的光学成像条件的信息; 基于所接收的光谱特性信息和所接收的光学成像条件信息来估计光束的特征值; 确定所估计的光束特性值是否与目标光束特性值匹配; 并且如果确定估计光束特性值与目标光束特性值不匹配，则调整光束的光谱特性。