摘要:
An organic light emitting display device includes pixels at intersection regions of scan and data lines, a scan driver configured to supply a scan signal to the scan lines, a data driver configured to supply a data signal to the data lines, and a timing controller configured to receive from outside frame data including left and right image data, and to insert first blank periods into initial and latter periods of a same frame, the left and right image data being between the initial and latter periods of the same frame.
摘要:
An organic light emitting display device capable of driving transistor threshold voltage compensation, including: pixels positioned in the intersections of scan lines and data lines, wherein each pixel comprises: a first transistor and a fourth transistor, connected at a common node, disposed between an anode of an OLED and a first power supply; a cathode of the OLED connected to a second power supply; a second transistor connected between a gate of the first transistor and a data line, and turned on when a scan signal is supplied to a scan line; a third transistor connected between the common node and the data line, and turned on when a scan signal is supplied to the scan line; a first capacitor connected between the gate of the first transistor and the anode of the OLED; and a second capacitor connected between the anode of the OLED and a predetermined voltage source.
摘要:
An organic light emitting display device capable of driving transistor threshold voltage compensation, including: pixels positioned in the intersections of scan lines and data lines, wherein each pixel comprises: a first transistor and a fourth transistor, connected at a common node, disposed between an anode of an OLED and a first power supply; a cathode of the OLED connected to a second power supply; a second transistor connected between a gate of the first transistor and a data line, and turned on when a scan signal is supplied to a scan line; a third transistor connected between the common node and the data line, and turned on when a scan signal is supplied to the scan line; a first capacitor connected between the gate of the first transistor and the anode of the OLED; and a second capacitor connected between the anode of the OLED and a predetermined voltage source.
摘要:
A method for fabricating a capacitor of a semiconductor device includes sequentially forming an etch-stop layer and a mold layer over a substrate, sequentially forming a support layer and a hard mask pattern over the mold layer, forming a storage node hole by etching the support layer and the mold layer using the hard mask pattern as an etch barrier, forming a barrier layer on the sidewall of the mold layer inside the storage node hole, etching the etch-stop layer under the storage node hole, forming a storage node inside the storage node hole, and removing the hard mask pattern, the mold layer, and the barrier layer.
摘要:
A semiconductor device includes: a semiconductor substrate configured to include a plurality of trenches therein; a plurality of buried bit lines each configured to fill a portion of each trench; a plurality of active pillars each formed in an upper portion of each buried bit line; a plurality of vertical gates each configured to surround each active pillar; and a plurality of word lines configured to couple neighboring vertical gates with each other.
摘要:
A photo sensor in a flat panel display includes a first transistor having first, second, and gate electrodes respectively coupled to first, second, and third nodes; a second transistor having first, second, and gate electrodes, respectively coupled to a fourth node, the first node, and a first control signal line; a third transistor having first, second, and gate electrodes, respectively coupled to the second node, the third node, and the first control signal line; a fourth transistor having first, second, and gate electrodes, respectively coupled to a reset power line, the third node, and a reset signal line; a fifth transistor having first, second, and gate electrodes, respectively coupled to a first power source, the first node, and a second control signal line; a sixth transistor having first, second, and gate electrodes, respectively coupled to the second node, output line, and the second control signal line; and a seventh transistor.
摘要:
A method for fabricating a semiconductor device includes forming a first dielectric structure over a second region of a substrate to expose a first region of the substrate, forming a barrier layer over an entire surface including the first dielectric structure, forming a second dielectric structure over the barrier layer in the first region, forming first open parts and second open parts in the first region and the second region, respectively, by etching the second dielectric structure, the barrier layer and the first dielectric structure, forming first conductive patterns filled in the first open parts and second conductive patterns filled in the second open parts, forming a protective layer to cover the second region, and removing the second dielectric structure.
摘要:
A photo sensor in a flat panel display includes a first transistor having first, second, and gate electrodes respectively coupled to first, second, and third nodes; a second transistor having first, second, and gate electrodes, respectively coupled to a fourth node, the first node, and a first control signal line; a third transistor having first, second, and gate electrodes, respectively coupled to the second node, the third node, and the first control signal line; a fourth transistor having first, second, and gate electrodes, respectively coupled to a reset power line, the third node, and a reset signal line; a fifth transistor having first, second, and gate electrodes, respectively coupled to a first power source, the first node, and a second control signal line; a sixth transistor having first, second, and gate electrodes, respectively coupled to the second node, output line, and the second control signal line; and a seventh transistor.
摘要:
A method for fabricating a semiconductor device includes forming a mold layer over a substrate, wherein the mold layer includes a first sacrificial layer and a second sacrificial layer that are stacked, forming an insulation layer pattern that has an etch selectivity to the first sacrificial layer and the second sacrificial layer on the mold layer, etching the mold layer using the insulation layer pattern as an etch barrier to form storage node holes, forming a storage node conductive layer over a substrate structure including the insulation layer pattern and the mold layer that has been etched, performing a storage node isolation process that simultaneously forms storage nodes and forming the insulation layer pattern to a first thickness, and removing the first sacrificial layer and the second sacrificial layer.
摘要:
A method for fabricating a capacitor of a semiconductor device includes sequentially forming an etch-stop layer and a mold layer over a substrate, sequentially forming a support layer and a hard mask pattern over the mold layer, forming a storage node hole by etching the support layer and the mold layer using the hard mask pattern as an etch barrier, forming a barrier layer on the sidewall of the mold layer inside the storage node hole, etching the etch-stop layer under the storage node hole, forming a storage node inside the storage node hole, and removing the hard mask pattern, the mold layer, and the barrier layer.