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    Microelectromechanical device and method of manufacturing
    1.
    发明授权
    Microelectromechanical device and method of manufacturing 有权
    微机电装置及制造方法

    公开(公告)号：US09063333B2

    公开(公告)日：2015-06-23

    申请号：US13486722

    申请日：2012-06-01

    申请人： Joyce H. Wu ,  Jianru Shi ,  Mark B. Andersson ,  Jasper Lodewyk Steyn ,  Timothy J. Brosnihan

    发明人： Joyce H. Wu ,  Jianru Shi ,  Mark B. Andersson ,  Jasper Lodewyk Steyn ,  Timothy J. Brosnihan

    IPC分类号： G02F3/02 ,  G02B26/02 ,  G09G3/34 ,  G02F3/00

    CPC分类号： G02B26/023 ,  G09G3/346

    摘要： A display apparatus includes a backlight and an aperture layer that is positioned in front of the backlight and defines a plurality of apertures. The display apparatus also includes a microelectromechanical system (MEMS) light modulator configured to modulate light emitted by the backlight passing through the apertures to form an image on the display apparatus. The MEMS light modulator includes a shutter that has a light blocking portion having an aperture layer-facing surface and a front-facing surface and at least one depression formed in the light blocking portion. The width of the at least one depression accounts for at least 50% but less than 100% of a distance separating two edges of the shutter.

    摘要翻译： 显示装置包括位于背光源前面并限定多个孔的背光源和孔径层。 显示装置还包括微机电系统（MEMS）光调制器，其被配置为调制由穿过孔的背光发出的光以在显示装置上形成图像。 MEMS光调制器包括具有遮光部分的遮光部分，遮光部分具有面向孔的表面和面向前的表面以及形成在遮光部分中的至少一个凹陷部。 至少一个凹陷的宽度占离开快门的两个边缘的距离的至少50％但小于100％。

    MICROELECTROMECHANICAL DEVICE AND METHOD OF MANUFACTURING
    2.
    发明申请
    MICROELECTROMECHANICAL DEVICE AND METHOD OF MANUFACTURING 有权
    微电子设备及其制造方法

    公开(公告)号：US20130322058A1

    公开(公告)日：2013-12-05

    申请号：US13486722

    申请日：2012-06-01

    申请人： Joyce H. WU ,  Jianru Shi ,  Mark B. Andersson ,  Jasper Lodewyk Steyn ,  Timothy J. Brosnihan

    发明人： Joyce H. WU ,  Jianru Shi ,  Mark B. Andersson ,  Jasper Lodewyk Steyn ,  Timothy J. Brosnihan

    IPC分类号： G09F13/04

    CPC分类号： G02B26/023 ,  G09G3/346

    摘要： A display apparatus includes a backlight and an aperture layer that is positioned in front of the backlight and defines a plurality of apertures. The display apparatus also includes a microelectromechanical system (MEMS) light modulator configured to modulate light emitted by the backlight passing through the apertures to form an image on the display apparatus. The MEMS light modulator includes a shutter that has a light blocking portion having an aperture layer-facing surface and a front-facing surface and at least one depression formed in the light blocking portion. The width of the at least one depression accounts for at least 50% but less than 100% of a distance separating two edges of the shutter.

    摘要翻译： 显示装置包括位于背光源前面并限定多个孔的背光源和孔径层。 显示装置还包括微机电系统（MEMS）光调制器，其被配置为调制由穿过孔的背光发出的光以在显示装置上形成图像。 MEMS光调制器包括具有遮光部分的遮光部分，遮光部分具有面向孔的表面和面向前的表面以及形成在遮光部分中的至少一个凹陷部。 至少一个凹陷的宽度占离开快门的两个边缘的距离的至少50％但小于100％。

    MECHANICAL LIGHT MODULATORS WITH STRESSED BEAMS
    3.
    发明申请
    MECHANICAL LIGHT MODULATORS WITH STRESSED BEAMS 有权
    机械光调制器与受压梁

    公开(公告)号：US20090195855A1

    公开(公告)日：2009-08-06

    申请号：US12370471

    申请日：2009-02-12

    申请人： Jasper Lodewyk Steyn ,  Timothy J. Brosnihan ,  Joyce H. Wu ,  Mark B. Andersson ,  Richard S. Payne ,  John J. Fijol ,  Roger W. Barton ,  Nesbitt W. Hagood

    发明人： Jasper Lodewyk Steyn ,  Timothy J. Brosnihan ,  Joyce H. Wu ,  Mark B. Andersson ,  Richard S. Payne ,  John J. Fijol ,  Roger W. Barton ,  Nesbitt W. Hagood

    IPC分类号： G02B26/00

    CPC分类号： G02B26/00 ,  G02B26/02 ,  G02B26/0841 ,  G09G3/2022 ,  G09G3/3406 ,  G09G3/3433 ,  G09G2300/08 ,  G09G2310/0235 ,  G09G2320/0633

    摘要： The invention relates to a spatial light modulator including a substrate having a surface and a modulation assembly coupled to the substrate including a modulation element and a compliant beam. The modulation assembly is configured to limit the bending of the compliant beam towards an opposing surface that would otherwise be caused by inherent stresses within the compliant beam. The invention also relates to a method of manufacturing a spatial light modulator including the steps of forming and releasing a modulation assembly that has a modulation element and a compliant beam formed in a pre-release position to have an intended inherent stress state. As a result of the stress state in the compliant beam, upon release of the compliant beam, the compliant beam bends into a rest position which is different than the pre-release position, where the rest position is based in part on the intended inherent stress state.

    摘要翻译： 本发明涉及一种空间光调制器，其包括具有表面的基板和耦合到该基板的调制组件，该调制组件包括调制元件和柔性梁。 调制组件被配置为将柔性梁的弯曲限制在相反的表面，否则将由柔性梁内的固有应力引起。 本发明还涉及一种制造空间光调制器的方法，包括以下步骤：形成和释放调制组件，该调制组件具有形成在预释放位置中的调制元件和柔性梁，以具有预期的固有应力状态。 由于柔性梁中的应力状态，在释放柔性梁时，柔性梁弯曲成与预释放位置不同的静止位置，其中静止位置部分地基于预期的固有应力 州。

    Mechanical light modulators with stressed beams
    4.
    发明授权
    Mechanical light modulators with stressed beams 有权
    具有应力梁的机械光调制器

    公开(公告)号：US08526096B2

    公开(公告)日：2013-09-03

    申请号：US12370471

    申请日：2009-02-12

    申请人： Jasper Lodewyk Steyn ,  Timothy J. Brosnihan ,  Joyce H. Wu ,  Mark B. Andersson ,  Richard S. Payne ,  John J. Fijol ,  Roger W. Barton ,  Nesbitt W. Hagood

    发明人： Jasper Lodewyk Steyn ,  Timothy J. Brosnihan ,  Joyce H. Wu ,  Mark B. Andersson ,  Richard S. Payne ,  John J. Fijol ,  Roger W. Barton ,  Nesbitt W. Hagood

    IPC分类号： G02B26/00 ,  G02B26/02

    CPC分类号： G02B26/00 ,  G02B26/02 ,  G02B26/0841 ,  G09G3/2022 ,  G09G3/3406 ,  G09G3/3433 ,  G09G2300/08 ,  G09G2310/0235 ,  G09G2320/0633

    摘要： The invention relates to a spatial light modulator including a substrate having a surface and a modulation assembly coupled to the substrate including a modulation element and a compliant beam. The modulation assembly is configured to limit the bending of the compliant beam towards an opposing surface that would otherwise be caused by inherent stresses within the compliant beam. The invention also relates to a method of manufacturing a spatial light modulator including the steps of forming and releasing a modulation assembly that has a modulation element and a compliant beam formed in a pre-release position to have an intended inherent stress state. As a result of the stress state in the compliant beam, upon release of the compliant beam, the compliant beam bends into a rest position which is different than the pre-release position, where the rest position is based in part on the intended inherent stress state.

    摘要翻译： 本发明涉及一种空间光调制器，其包括具有表面的基板和耦合到该基板的调制组件，该调制组件包括调制元件和柔性梁。 调制组件被配置为将柔性梁的弯曲限制在相反的表面，否则将由柔性梁内的固有应力引起。 本发明还涉及一种制造空间光调制器的方法，包括以下步骤：形成和释放调制组件，该调制组件具有形成在预释放位置中的调制元件和柔性梁，以具有预期的固有应力状态。 由于柔性梁中的应力状态，在释放柔性梁时，柔性梁弯曲成与预释放位置不同的静止位置，其中静止位置部分地基于预期的固有应力 州。

    ELECTROMECHANICAL SYSTEM STRUCTURES WITH RIBS HAVING GAPS
    10.
    发明申请
    ELECTROMECHANICAL SYSTEM STRUCTURES WITH RIBS HAVING GAPS 有权
    具有GAPS的RIBS的电化学系统结构

    公开(公告)号：US20130050290A1

    公开(公告)日：2013-02-28

    申请号：US13591842

    申请日：2012-08-22

    申请人： Mark B. Andersson ,  Joyce H. Wu ,  Jasper Lodewyk Steyn

    发明人： Mark B. Andersson ,  Joyce H. Wu ,  Jasper Lodewyk Steyn

    IPC分类号： G02B26/00 ,  G09G5/10

    CPC分类号： B81B3/007 ,  B81B2201/047 ,  B81B2203/0109 ,  B81B2203/0163 ,  B81B2203/0307 ,  B81B2203/051 ,  G02B26/023 ,  G09G3/346 ,  G09G3/3473 ,  G09G2300/08

    摘要： This disclosure provides systems, methods and apparatus for an electromechanical systems (EMS) assembly. The EMS assembly includes a substrate, an anchor disposed on the substrate, and a suspended planar body supported over the substrate by the anchor. The suspended planar body includes at least one depression extending out of a plane of the suspended planar body and protruding towards the substrate. The suspended planar body also includes a substantially horizontal portion corresponding to a gap in the at least one depression. An extent of the gap is up to 20% of a length of the suspended planar body.

    摘要翻译： 本公开提供了用于机电系统（EMS）组件的系统，方法和装置。 EMS组件包括衬底，设置在衬底上的锚固体和通过锚固件支撑在衬底上的悬挂平面体。 悬挂的平面体包括至少一个从悬挂的平面体的平面延伸并朝向基底突出的凹陷。 悬挂的平面体还包括对应于至少一个凹部中的间隙的基本水平的部分。 间隙的程度高达悬挂平面体长度的20％。