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1.发明申请公开(公告)号：US20130114898A1
公开(公告)日：2013-05-09
申请号：US13696260
申请日：2011-03-17
IPC分类号： G06K9/62
CPC分类号： G06K9/6201 , G01B11/00 , G01B15/00 , G06K9/6202 , G06T7/001 , G06T7/74 , G06T2207/30148 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： The present invention is a template matching processing device capable of evaluating a similarity degree which supports even a case of intensive morphological change between a design image and a photographic image. In the template matching processing device, matching processing between the design image and the photographic image is performed, a partial design image is obtained by clipping a portion having the highest correlation (step 101), and processing for deforming the photographic image in accordance with the clipped design image (steps 102 to 105) is performed, so that correlation between the deformed image obtained and the design image is taken to be set as the similarity degree.
摘要翻译： 本发明是一种模拟匹配处理装置，其能够评价即使在设计图像和摄影图像之间形成密集的情况的情况下也能够支持的相似度。 在模板匹配处理装置中，进行设计图像与摄影图像之间的匹配处理，通过剪切具有最高相关性的部分（步骤101）获得部分设计图像，以及根据 执行剪辑设计图像（步骤102至105），使得获得的变形图像与设计图像之间的相关性被设置为相似度。
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2.发明授权公开(公告)号：US08971627B2
公开(公告)日：2015-03-03
申请号：US13696260
申请日：2011-03-17
CPC分类号： G06K9/6201 , G01B11/00 , G01B15/00 , G06K9/6202 , G06T7/001 , G06T7/74 , G06T2207/30148 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： The present invention is a template matching processing device capable of evaluating a similarity degree which supports even a case of intensive morphological change between a design image and a photographic image. In the template matching processing device, matching processing between the design image and the photographic image is performed, a partial design image is obtained by clipping a portion having the highest correlation (step 101), and processing for deforming the photographic image in accordance with the clipped design image (steps 102 to 105) is performed, so that correlation between the deformed image obtained and the design image is taken to be set as the similarity degree.
摘要翻译： 本发明是一种模拟匹配处理装置，其能够评价即使在设计图像和摄影图像之间形成密集的情况的情况下也能够支持的相似度。 在模板匹配处理装置中，进行设计图像与摄影图像之间的匹配处理，通过剪切具有最高相关性的部分（步骤101）获得部分设计图像，以及根据 执行剪辑设计图像（步骤102至105），使得获得的变形图像与设计图像之间的相关性被设置为相似度。
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3.发明授权Device and method for detecting angle of rotation from normal position of image 有权从图像正常位置检测旋转角度的装置和方法公开(公告)号：US09514526B2
公开(公告)日：2016-12-06
申请号：US14005913
申请日：2011-11-09
申请人： Jun'ichi Taguchi , Mitsuji Ikeda , Yuichi Abe , Masahiro Kitazawa
发明人： Jun'ichi Taguchi , Mitsuji Ikeda , Yuichi Abe , Masahiro Kitazawa
CPC分类号： G06T7/0004 , G06K9/3275
摘要： An evaluation value indicative of the extent of lines in each direction is calculated for a pre-processed image in which 0s are filled in and extended in the lateral direction of the inputted image and which has been reduced ⅛th in the longitudinal direction. To obtain the angle of rotation of an image from the change in the evaluation value obtained while the angle relative to the lateral direction of the pre-processed image is modified in small steps, a parallel line is drawn for each direction, a projection is taken, and the sum of squares serves as the evaluation value of the direction. The direction having the highest evaluation value serves as the obtained direction of rotation from the normal position. The projection of each direction references the point of intersection between the parallel line drawn for each direction and the coordinate line of the horizontal axis.
摘要翻译： 对于其中0被填充并在输入图像的横向方向上延伸并且在纵向方向上被减小的预处理图像，计算表示每个方向的行程度的评估值。 为了在以小步骤修改相对于预处理图像的横向方向的角度获得的评估值的变化中获得图像的旋转角度，对于每个方向绘制平行线，进行投影 ，并且平方和作为方向的评价值。 具有最高评估值的方向用作从正常位置获得的旋转方向。 每个方向的投影参考在每个方向绘制的平行线与水平轴的坐标线之间的交点。
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4.发明申请DEVICE AND METHOD FOR DETECTING ANGLE OF ROTATION FROM NORMAL POSITION OF IMAGE 有权用于检测图像正常位置的旋转角的装置和方法公开(公告)号：US20140016824A1
公开(公告)日：2014-01-16
申请号：US14005913
申请日：2011-11-09
申请人： Jun'ichi Taguchi , Mitsuji Ikeda , Yuichi Abe , Masahiro Kitazawa
发明人： Jun'ichi Taguchi , Mitsuji Ikeda , Yuichi Abe , Masahiro Kitazawa
IPC分类号： G06T7/00
CPC分类号： G06T7/0004 , G06K9/3275
摘要： An evaluation value indicative of the extent of lines in each direction is calculated for a pre-processed image in which 0s are filled in and extended in the lateral direction of the inputted image and which has been reduced ⅛th in the longitudinal direction. To obtain the angle of rotation of an image from the change in the evaluation value obtained while the angle relative to the lateral direction of the pre-processed image is modified in small steps, a parallel line is drawn for each direction, a projection is taken, and the sum of squares serves as the evaluation value of the direction. The direction having the highest evaluation value serves as the obtained direction of rotation from the normal position. The projection of each direction references the point of intersection between the parallel line drawn for each direction and the coordinate line of the horizontal axis.
摘要翻译： 对于其中0被填充并在输入图像的横向方向上延伸并且在纵向方向上减少1/8的预处理图像来计算指示每个方向的行程度的评估值。 为了在以小步骤修改相对于预处理图像的横向方向的角度获得的评估值的变化中获得图像的旋转角度，对于每个方向绘制平行线，进行投影 ，并且平方和作为方向的评价值。 具有最高评估值的方向用作从正常位置获得的旋转方向。 每个方向的投影参考在每个方向绘制的平行线与水平轴的坐标线之间的交点。
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公开(公告)号：US10535129B2
公开(公告)日：2020-01-14
申请号：US13981963
申请日：2011-12-07
IPC分类号： G06T7/00
摘要： It is an object of the present invention to provide a semiconductor inspection apparatus capable of well carrying out position alignment and correctly determining whether the position alignment has been carried out successfully or has ended in a failure without operator interventions even if an inspected image is an image having few characteristics as is the case with a repetitive pattern or the inspected image is an image having a complicated shape.The semiconductor inspection apparatus includes means for imaging a shape on a wafer or on an exposure mask; means for storing an image inspected by the imaging means; means for storing design data of the semiconductor circuit corresponding to a position on the wafer or on the exposure mask which are to be imaged by the imaging means; means for storing a design-data image obtained as a result of converting the design data into an image; means for generating a design-data ROI image by converting an interest drawing region found from a relative crude-density relation of a shape included in the design-data image into an image; and a position alignment section configured to carry out position alignment on the inspected image and the design-data image. The semiconductor inspection apparatus makes use of the design-data ROI image in order to identify a position at which the inspected image and the design-data image match each other or compute the degree of coincidence.
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公开(公告)号：US20140023265A1
公开(公告)日：2014-01-23
申请号：US13981963
申请日：2011-12-07
IPC分类号： G06T7/00
CPC分类号： G06T7/0004 , G06T7/001 , G06T2207/10061 , G06T2207/30148 , H01L22/12
摘要： It is an object of the present invention to provide a semiconductor inspection apparatus capable of well carrying out position alignment and correctly determining whether the position alignment has been carried out successfully or has ended in a failure without operator interventions even if an inspected image is an image having few characteristics as is the case with a repetitive pattern or the inspected image is an image having a complicated shape.The semiconductor inspection apparatus includes means for imaging a shape on a wafer or on an exposure mask; means for storing an image inspected by the imaging means; means for storing design data of the semiconductor circuit corresponding to a position on the wafer or on the exposure mask which are to be imaged by the imaging means; means for storing a design-data image obtained as a result of converting the design data into an image; means for generating a design-data ROI image by converting an interest drawing region found from a relative crude-density relation of a shape included in the design-data image into an image; and a position alignment section configured to carry out position alignment on the inspected image and the design-data image. The semiconductor inspection apparatus makes use of the design-data ROI image in order to identify a position at which the inspected image and the design-data image match each other or compute the degree of coincidence.
摘要翻译： 本发明的目的是提供一种半导体检查装置，即使被检查的图像是图像，也能够良好地执行位置对准并且正确地确定位置对准是否已经成功地执行或者在没有操作者干预的情况下已经结束 具有与重复图案的情况相同的特性，或被检查图像是具有复杂形状的图像。 半导体检查装置包括用于对晶片或曝光掩模上的形状进行成像的装置; 用于存储由成像装置检查的图像的装置; 用于存储对应于要由成像装置成像的晶片或曝光掩模上的位置的半导体电路的设计数据的装置; 用于存储作为将设计数据转换为图像而获得的设计数据图像的装置; 用于通过将从所述设计数据图像中包含的形状的相对粗密度关系中找到的兴趣绘制区域转换为图像来生成设计数据ROI图像的装置; 以及位置对准部，被配置为在被检查图像和设计数据图像上执行位置对准。 半导体检查装置利用设计数据ROI图像来识别被检查图像和设计数据图像彼此匹配的位置或计算符合度。
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公开(公告)号：US20120207397A1
公开(公告)日：2012-08-16
申请号：US13502823
申请日：2010-10-06
申请人： Wataru Nagatomo , Yuichi Abe , Mitsuji Ikeda
发明人： Wataru Nagatomo , Yuichi Abe , Mitsuji Ikeda
IPC分类号： G06K9/68
CPC分类号： G06K9/6203 , G06K9/6253 , G06K9/6255 , G06K9/6857 , G06T7/74 , G06T2207/10061 , G06T2207/20016 , G06T2207/30148 , H01J2237/221 , H01J2237/226
摘要： Provided is a template matching method and a template matching apparatus, where the degree of matching between a template and the actual image upon template matching is maintained at a high level, without depending on a partial appearance of a lower layer. Proposed as one embodiment, is a method and an apparatus for template matching, where either an area is set in which comparison of the template and the image is not conducted, or a second area is set inside the template where comparison different from comparison conducted in a first comparison area is to be conducted, and the template matching is conducted on the basis either of comparison excluding the non-comparison area, or of comparison using the first and second areas.
摘要翻译： 提供了一种模板匹配方法和模板匹配装置，其中模板匹配之间的模板和实际图像之间的匹配程度保持在高水平，而不依赖于较低层的部分外观。 作为一个实施例，提出了一种用于模板匹配的方法和装置，其中设置了不进行模板和图像的比较的区域，或者在模板内部设置第二区域，其中比较不同于进行比较 将进行第一比较区域，并且基于除非比较区域之外的比较或使用第一和第二区域的比较进行模板匹配。
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公开(公告)号：US08885950B2
公开(公告)日：2014-11-11
申请号：US13502823
申请日：2010-10-06
申请人： Wataru Nagatomo , Yuichi Abe , Mitsuji Ikeda
发明人： Wataru Nagatomo , Yuichi Abe , Mitsuji Ikeda
CPC分类号： G06K9/6203 , G06K9/6253 , G06K9/6255 , G06K9/6857 , G06T7/74 , G06T2207/10061 , G06T2207/20016 , G06T2207/30148 , H01J2237/221 , H01J2237/226
摘要： Provided is a template matching method and a template matching apparatus, where the degree of matching between a template and the actual image upon template matching is maintained at a high level, without depending on a partial appearance of a lower layer. Proposed as one embodiment, is a method and an apparatus for template matching, where either an area is set in which comparison of the template and the image is not conducted, or a second area is set inside the template where comparison different from comparison conducted in a first comparison area is to be conducted, and the template matching is conducted on the basis either of comparison excluding the non-comparison area, or of comparison using the first and second areas.
摘要翻译： 提供了一种模板匹配方法和模板匹配装置，其中模板匹配之间的模板和实际图像之间的匹配程度保持在高水平，而不依赖于较低层的部分外观。 作为一个实施例，提出了一种用于模板匹配的方法和装置，其中设置了不进行模板和图像的比较的区域，或者在模板内部设置第二区域，其中比较不同于进行比较 将进行第一比较区域，并且基于除非比较区域之外的比较或使用第一和第二区域的比较进行模板匹配。
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9.发明申请DEFECT REVIEW DEVICE, DEFECT REVIEW METHOD, AND DEFECT REVIEW EXECUTION PROGRAM 审中-公开缺陷审查设备，缺陷审查方法和缺陷审查执行程序公开(公告)号：US20110129140A1
公开(公告)日：2011-06-02
申请号：US13055870
申请日：2009-06-29
申请人： Masahiro Kitazawa , Mitsuji Ikeda
发明人： Masahiro Kitazawa , Mitsuji Ikeda
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06T2207/30148
摘要： Provided is a defect review device enabling identification of a defect and a defect coordinate 33. The defect review device comprises a distance inspection image generation unit 5 for generating, on the basis of an inspection image 28, a distance inspection image 29 in which distance values between pixels constituting the contour of an actual pattern 28a and pixels lying in a direction normal to the contour are set in respect of the individual pixels, a distance design image generation unit 6 for generating a distance design image 27 in which values between pixels constituting the contour of a design pattern 26a corresponding to the actual pattern 28a and pixels lying in a direction normal to the contour are set in respect of the individual pixels, a distance difference image generation unit 9 for generating a distance difference image 30 in which differences in distance value between the distance design image 27 and the distance inspection image 29 are set in respect of the individual pixels, and a defect coordinate identifying unit 10 for identifying, on the basis of the distance difference image 30, a defect coordinate 33 at which a defect 28b takes place.
摘要翻译： 提供了能够识别缺陷和缺陷坐标33的缺陷检查装置。缺陷检查装置包括距离检查图像生成单元5，用于基于检查图像28生成距离检查图像29，其中距离值 构成实际图案28a的轮廓的像素和与轮廓垂直的方向的像素相对于各个像素设置距离设计图像生成单元6，用于生成距离设计图像27，其中构成 相对于各个像素设置与实际图案28a对应的设计图案26a的轮廓和垂直于轮廓的方向的像素，距离差图像生成单元9，用于生成距离差图像30，其中距离差 距离设计图像27和距离检查图像29之间的值相对于个体被设定 像素，以及缺陷坐标识别单元10，用于基于距离差图像30识别发生缺陷28b的缺陷坐标33。
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10.发明申请DATA MANAGEMENT EQUIPMENT USED TO DEFECT REVIEW EQUIPMENT AND TESTING SYSTEM CONFIGURATIONS 审中-公开用于缺陷审查设备和测试系统配置的数据管理设备公开(公告)号：US20090074286A1
公开(公告)日：2009-03-19
申请号：US12205419
申请日：2008-09-05
申请人： Masahiro KITAZAWA , Mitsuji Ikeda
发明人： Masahiro KITAZAWA , Mitsuji Ikeda
IPC分类号： G06K9/00
CPC分类号： G06T7/0006 , G01N21/9501 , G01N21/956 , G01N2021/8861 , G06T2207/10056 , G06T2207/30148
摘要： A data management equipment connected with a general inspection system for detecting a defect candidate on a wafer and acquiring a location thereof, a design data server for storing a design data for a semiconductor circuit and a defect review system for acquiring a defect data image on the basis of the location and comparing the defect candidate image with a defect-free reference image to identify a defect. The data management equipment includes a first detecting unit for finding that the general inspection system is acquiring a location, a storage controlling unit responsive to the finding to start to store the location from the general inspection system in a storage unit and a defect-circumferential design data acquiring unit for acquiring from a portion of the design data a defect-circumferential design data such that a reference image including the location can be produced from the defect-circumferential design data.
摘要翻译： 与用于检测晶片上的缺陷候选物并获取其位置的一般检查系统连接的数据管理设备，用于存储半导体电路的设计数据的设计数据服务器和用于获取半导体电路的缺陷数据图像的缺陷审查系统 并且将缺陷候选图像与无缺陷参考图像进行比较以识别缺陷。 数据管理设备包括用于发现一般检查系统正在获取位置的第一检测单元，响应于发现的存储控制单元开始将来自一般检查系统的位置存储在存储单元中的缺陷周边设计 数据获取单元，用于从设计数据的一部分获取缺陷圆周设计数据，使得可以从缺陷圆周设计数据产生包括位置的参考图像。
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