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公开(公告)号：US08753805B2
公开(公告)日：2014-06-17
申请号：US13530896
申请日：2012-06-22
IPC分类号： G03F7/26
CPC分类号： G03F7/038 , G03F1/32 , G03F7/0046 , G03F7/0395 , G03F7/0397 , G03F7/11 , G03F7/203 , G03F7/2041 , G03F7/325 , G03F7/70466
摘要： A negative pattern is formed by applying a resist composition onto a substrate, prebaking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to dissolve the unexposed region of resist film. The resist composition comprising a polymer comprising recurring units of cycloolefin having a hydroxyl group substituted with an acid labile group, an acid generator, and an organic solvent displays a high dissolution contrast and high etch resistance.
摘要翻译： 通过将抗蚀剂组合物施加到基材上，预烘烤，暴露于高能辐射，烘烤（PEB）和在有机溶剂显影剂中显影曝光的抗蚀剂膜以溶解抗蚀剂膜的未曝光区域来形成负图案。 包含含有被酸不稳定基团，酸发生剂和有机溶剂取代的羟基的环烯烃的重复单元的聚合物的抗蚀剂组合物显示出高的溶解对比度和高耐蚀刻性。
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公开(公告)号：US08440386B2
公开(公告)日：2013-05-14
申请号：US13053714
申请日：2011-03-22
申请人： Jun Hatakeyama , Takeshi Nagata , Koji Hasegawa
发明人： Jun Hatakeyama , Takeshi Nagata , Koji Hasegawa
CPC分类号： G03F7/0397 , C07C69/54 , C07C2603/74 , C08F2220/282 , C08F2220/283 , C09D133/14 , C09D133/16 , G03F7/325 , C08F2220/302 , C08F222/06 , C08F2220/382
摘要： A pattern is formed by applying a resist composition comprising a polymer comprising recurring units having an acid labile group-substituted hydroxyl group, an acid generator, and an organic solvent onto a substrate, prebaking the composition to form a resist film, exposing the resist film to high-energy radiation to define exposed and unexposed regions, baking, and developing the exposed film with an organic solvent developer to form a negative pattern wherein the unexposed region of film is dissolved and the exposed region of film is not dissolved.
摘要翻译： 通过将包含含有酸不稳定基取代的羟基的重复单元的聚合物，酸产生剂和有机溶剂的抗蚀剂组合物涂布在基材上，预烘烤组合物以形成抗蚀剂膜，使抗蚀剂膜曝光 以高能量辐射来限定暴露和未曝光的区域，用有机溶剂显影剂烘烤和显影曝光的膜，以形成其中未暴露的膜的区域溶解并且曝光的区域不溶解的负图案。
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公开(公告)号：US08431323B2
公开(公告)日：2013-04-30
申请号：US12608556
申请日：2009-10-29
申请人： Takeru Watanabe , Satoshi Shinachi , Takeshi Kinsho , Koji Hasegawa , Yuji Harada , Jun Hatakeyama , Kazunori Maeda , Tomohiro Kobayashi
发明人： Takeru Watanabe , Satoshi Shinachi , Takeshi Kinsho , Koji Hasegawa , Yuji Harada , Jun Hatakeyama , Kazunori Maeda , Tomohiro Kobayashi
CPC分类号： G03F7/11 , C07D307/04 , C07D307/77 , C07D315/00 , C07D319/06 , C08F14/18 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , C08F2/00
摘要： A fluorinated monomer of cyclic acetal structure has formula (1) wherein R is a C1-C20 alkyl group which may be substituted with halogen or separated by oxygen or carbonyl, and Z is a divalent organic group which forms a ring with alkylenoxy and contains a polymerizable unsaturated group. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water sliding property, lipophilicity, acid lability and hydrolyzability and is useful in formulating a protective coating composition and a resist composition.
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公开(公告)号：US20130071788A1
公开(公告)日：2013-03-21
申请号：US13614494
申请日：2012-09-13
申请人： Jun Hatakeyama , Kazuhiro Katayama , Koji Hasegawa
发明人： Jun Hatakeyama , Kazuhiro Katayama , Koji Hasegawa
CPC分类号： G03F7/325 , G03F1/00 , G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/0397 , G03F7/11 , G03F7/203 , G03F7/2041 , G03F7/70466
摘要： A negative pattern is formed by coating a resist composition comprising a polymer comprising recurring units of acid labile group-substituted vinyl alcohol and maleic anhydride and/or maleimide, an acid generator, and an organic solvent onto a substrate, prebaking, exposing to high-energy radiation, and developing in an organic solvent developer such that the unexposed region of resist film is dissolved away and the exposed region of resist film is not dissolved. In image formation via positive/negative reversal by organic solvent development, the resist film is characterized by a high dissolution contrast between the unexposed and exposed regions.
摘要翻译： 通过将包含酸不稳定基取代的乙烯醇和马来酸酐和/或马来酰亚胺的重复单元和/或马来酰亚胺，酸产生剂和有机溶剂的聚合物的抗蚀剂组合物涂布在基材上，预烘烤， 能量辐射，并在有机溶剂显影剂中显影，使得抗蚀剂膜的未曝光区域被溶解并且抗蚀剂膜的曝光区域不溶解。 在通过有机溶剂显影的正/负反转的图像形成中，抗蚀剂膜的特征在于未曝光和曝光区域之间的高溶解度对比度。
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公开(公告)号：US08313886B2
公开(公告)日：2012-11-20
申请号：US12761202
申请日：2010-04-15
申请人： Yuji Harada , Jun Hatakeyama , Koji Hasegawa , Tomohiro Kobatashi
发明人： Yuji Harada , Jun Hatakeyama , Koji Hasegawa , Tomohiro Kobatashi
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/2041
摘要： An additive polymer comprising recurring units of formula (1) is added to a resist composition comprising a base resin, a photoacid generator, and an organic solvent. R1 is hydrogen or methyl, R2 is alkylene or fluoroalkylene, and R3 is fluoroalkyl. The additive polymer is highly transparent to radiation with wavelength of up to 200 nm. Water repellency, water slip, acid lability, hydrolysis and other properties of the polymer may be adjusted by a choice of polymer structure.
摘要翻译： 将包含式（1）的重复单元的添加剂聚合物加入到包含基础树脂，光致酸发生剂和有机溶剂的抗蚀剂组合物中。 R1是氢或甲基，R2是亚烷基或氟代亚烷基，R3是氟烷基。 添加剂聚合物对波长高达200nm的辐射是高度透明的。 通过选择聚合物结构可以调节聚合物的拒水性，水滑动性，酸性，水解性和其它性能。
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公开(公告)号：US08211618B2
公开(公告)日：2012-07-03
申请号：US12719229
申请日：2010-03-08
CPC分类号： G03F7/0397 , C08F12/24 , C08F212/14 , C08F212/32 , C08F220/18 , C08F220/28 , C08F220/30 , C08F220/38 , C08F244/00 , C08F2220/301 , G03F7/0045 , G03F7/0046 , Y10S430/106 , Y10S430/111 , C08F234/02
摘要： A positive resist composition comprising as a base resin a polymer having carboxyl groups whose hydrogen is substituted by an acid labile group of acenaphthene structure exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal LER after exposure, a significant effect of suppressing acid diffusion rate, and improved etching resistance.
摘要翻译： 一种正性抗蚀剂组合物，其包含作为基础树脂的具有羧基的聚合物，其氢被酸不稳定的苊基团取代，表现出曝光前后的碱溶解速率的高对比度，高分辨率，良好的图案轮廓和最小的LER 暴露后，抑制酸扩散速度，提高耐蚀刻性的显着效果。
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公开(公告)号：US08158330B2
公开(公告)日：2012-04-17
申请号：US12463750
申请日：2009-05-11
申请人： Yuji Harada , Jun Hatakeyama , Koji Hasegawa , Satoshi Shinachi
发明人： Yuji Harada , Jun Hatakeyama , Koji Hasegawa , Satoshi Shinachi
CPC分类号： G03F7/11 , C08F220/24 , C08F232/08 , G03F7/0046 , G03F7/2041 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A protective coating composition comprising a copolymer of an alkali-soluble (α-trifluoromethyl) acrylate and a norbornene derivative as a base polymer, optionally in admixture with a second polymer containing sulfonic acid and/or sulfonic acid amine salt in repeat units is applied onto a resist film. The protective coating is effective in minimizing development defects and forming a resist pattern of improved profile.
摘要翻译： 包含碱溶性（α-三氟甲基）丙烯酸酯和降冰片烯衍生物作为基础聚合物的共聚物的保护性涂料组合物，任选地与含有重复单元的磺酸和/或磺酸胺盐的第二聚合物的混合物施加到 抗蚀膜 保护涂层有效地使开发缺陷最小化并形成改进型材的抗蚀剂图案。
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公开(公告)号：US20110177462A1
公开(公告)日：2011-07-21
申请号：US13010318
申请日：2011-01-20
申请人： Jun Hatakeyama , Takeshi Nagata , Koji Hasegawa
发明人： Jun Hatakeyama , Takeshi Nagata , Koji Hasegawa
IPC分类号： G03F7/20
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/11 , G03F7/2041 , G03F7/325
摘要： A pattern is formed by coating a resist composition comprising a polymer comprising recurring units having an optionally acid labile group-substituted naphthol group, an acid generator, and an organic solvent onto a substrate, baking to form a resist film, exposing the resist film to high-energy radiation, baking, and developing the exposed film with an organic solvent developer to form a negative pattern wherein the unexposed region of film is dissolved and the exposed region of film is not dissolved. In the process of image formation via positive/negative reversal by organic solvent development, the resist film has a high dissolution contrast and controlled acid diffusion. By subjecting the resist film to exposure through a mask having a lattice-like pattern and organic solvent development, a fine hole pattern can be formed at a high precision of dimensional control.
摘要翻译： 通过将包含含有任选的酸不稳定基取代的萘酚基的重复单元，酸产生剂和有机溶剂的聚合物的抗蚀剂组合物涂布在基材上，烘烤以形成抗蚀剂膜，将抗蚀剂膜暴露于 高能辐射，烘烤，并用有机溶剂显影剂显影曝光的薄膜以形成其中未暴露的薄膜区域溶解并且曝光区域不溶解的负图案。 在通过有机溶剂显影的正/负反转的图像形成过程中，抗蚀剂膜具有高的溶解对比度和受控的酸扩散。 通过使抗蚀剂膜通过具有格子状图案和有机溶剂显影的掩模进行曝光，可以以高精度的尺寸控制形成细孔图案。
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公开(公告)号：US20100227274A1
公开(公告)日：2010-09-09
申请号：US12720098
申请日：2010-03-09
CPC分类号： G03F7/0397 , C08F12/24 , C08F212/14 , C08F212/32 , C08F220/18 , C08F220/30 , C08F220/38 , C08F234/02 , C08F244/00 , G03F7/0045 , G03F7/0046 , C08F232/08
摘要： A positive resist composition comprising as a base resin a polymer having carboxyl groups whose hydrogen is substituted by an acid labile group of fluorene structure exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal LER after exposure, a significant effect of suppressing acid diffusion rate, and improved etching resistance.
摘要翻译： 包含作为基础树脂的具有羧基的聚合物的正性抗蚀剂组合物，其氢被酸不稳定的芴结构基团取代，表现出曝光前后的碱溶解速率的高对比度，高分辨率，良好的图案轮廓和最小的LER 暴露后，抑制酸扩散速度，提高耐蚀刻性的显着效果。
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公开(公告)号：US20100227273A1
公开(公告)日：2010-09-09
申请号：US12719229
申请日：2010-03-08
IPC分类号： G03F7/004 , G03F7/027 , G03F7/20 , C08F32/08 , C08F224/00
CPC分类号： G03F7/0397 , C08F12/24 , C08F212/14 , C08F212/32 , C08F220/18 , C08F220/28 , C08F220/30 , C08F220/38 , C08F244/00 , C08F2220/301 , G03F7/0045 , G03F7/0046 , Y10S430/106 , Y10S430/111 , C08F234/02
摘要： A positive resist composition comprising as a base resin a polymer having carboxyl groups whose hydrogen is substituted by an acid labile group of acenaphthene structure exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal LER after exposure, a significant effect of suppressing acid diffusion rate, and improved etching resistance.
摘要翻译： 一种正性抗蚀剂组合物，其包含作为基础树脂的具有羧基的聚合物，其氢被酸不稳定的苊基团取代，表现出曝光前后的碱溶解速率的高对比度，高分辨率，良好的图案轮廓和最小的LER 暴露后，抑制酸扩散速度，提高耐蚀刻性的显着效果。
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