公开(公告)号：US6066392A

公开(公告)日：2000-05-23

申请号：US192196

申请日：1998-11-16

申请人： Jun Hisamoto ,  Toshiyuki Tanaka ,  Masahiro Yanagawa

发明人： Jun Hisamoto ,  Toshiyuki Tanaka ,  Masahiro Yanagawa

IPC分类号： C23C14/24 ,  C23C16/44 ,  C25D11/04 ,  B32B3/26

CPC分类号： C25D11/045 ,  Y10T428/249953 ,  Y10T428/249956

摘要： An Al material having an anodic oxidation film is provided that is excellent in gas and plasma corrosion resistance. By the present invention, a crack is not generated in the anodic oxidation film even in high temperature thermal cycles and corrosive gas or plasma environment. In the Al material having an Al alloy having on its surface an anodic oxidation film according to the invention, the anodic oxidation film has a porous layer and a barrier layer, and portions of cell triplet points, at which boundary faces of 3 cells in the porous layer melt, have secondary-pores.

摘要翻译： 提供具有优异的气体和等离子体耐腐蚀性的具有阳极氧化膜的Al材料。 通过本发明，即使在高温热循环和腐蚀性气体或等离子体环境中也不会在阳极氧化膜中产生裂纹。 在具有本发明的阳极氧化膜的表面具有铝合金的Al材料中，阳极氧化膜具有多孔层和阻挡层，以及单元三重点中的3个单元的边界面 多孔层熔融，具有二次孔。

公开(公告)号：US6027629A

公开(公告)日：2000-02-22

申请号：US836469

申请日：1997-05-16

申请人： Jun Hisamoto ,  Koji Wada ,  Koki Ikeda ,  Masahiro Yanagawa

发明人： Jun Hisamoto ,  Koji Wada ,  Koki Ikeda ,  Masahiro Yanagawa

IPC分类号： B01J3/00 ,  B01J19/02 ,  C23C16/44 ,  C25D11/04 ,  C25D11/12

CPC分类号： C23C16/4404 ,  B01J19/02 ,  B01J3/006 ,  C25D11/045 ,  C25D11/12 ,  B01J2219/024 ,  Y10T428/249953 ,  Y10T428/249954 ,  Y10T428/249956

摘要： The present invention relates to a vacuum chamber and chamber parts made of aluminum or its alloys which exhibit excellent corrosion resistance to a corrosive gas or plasma introduced into the vacuum chamber, the surface treatment, and material for the vacuum chamber. The vacuum chamber has a porous layer with a structure in which a pore diameter at the top thereof is small, while a pore diameter at the bottom thereof is large. In order to give such a structure to the porous layer, a final anodizing voltage is set to be higher than an initial anodizing voltage when the surface of the base material is anodized. After the porous-type anodizing is completed, non-porous type anodizing may be conducted so as to grow a barrier layer. Furthermore, the base material made of aluminum alloy preferably has particles such as precipitates and/or deposits with a diameter of 10 .mu.m or less in average, and the precipitates and/or deposits are arranged in parallel with a largest surface of the base material.

摘要翻译： PCT No.PCT / JP95 / 02263 Sec。 371日期：1997年5月16日 102（e）日期1997年5月16日PCT提交1995年11月6日PCT公布。 公开号WO96 / 15295 日期1996年5月23日本发明涉及一种由铝或其合金制成的真空室和室部件，其对被引入真空室的腐蚀性气体或等离子体，表面处理和真空室的材料表现出优异的耐腐蚀性。 真空室具有其顶部的孔径小的多孔层，底部的孔径大。 为了将这种结构赋予多孔层，当阳极氧化基底材料的表面时，最终的阳极氧化电压被设定为高于初始阳极氧化电压。 在多孔型阳极氧化完成之后，可以进行无孔型阳极氧化以便生长阻挡层。 此外，由铝合金制成的基材优选具有平均直径为10μm以下的析出物和/或沉积物的粒子，并且析出物和/或沉积物与基材的最大表面平行地排列 。

公开(公告)号：US06521046B2

公开(公告)日：2003-02-18

申请号：US09773638

申请日：2001-02-02

申请人： Toshiyuki Tanaka ,  Koji Wada ,  Jun Hisamoto ,  Hiroki Sawada ,  Hiroshi Matsuura

发明人： Toshiyuki Tanaka ,  Koji Wada ,  Jun Hisamoto ,  Hiroki Sawada ,  Hiroshi Matsuura

IPC分类号： C23C1600

CPC分类号： H01J37/32467

摘要： A chamber material made of Al alloy excellent in thermal cracking resistance and chemical and/or physical corrosion resistance and capable of reducing contamination excellently and further having excellent and wide applicable brazing property in a high temperature corrosive circumstance, in which the substrate aluminum material for the chamber material made of Al alloy having an anodized film comprises 0.1 to 2.0% Si, 0.1 to 3.5% Mg, 0.02 to 4.0% Cu on the mass% basis and the balance of Al and impurity element with Cr in the impurity elements being less than 0.04%. Preferably, Fe is 0.1% or less and Mn is 0.04% or less in the impurity element and, further, the total sum of impurity elements other than Cr and Mn being restricted to 0.1% or less. This invention can be utilized suitably to various materials used in high temperature corrosive circumstance, particularly, in high temperature corrosive gas or plasma atmosphere.

摘要翻译： 由耐热龟裂性，耐化学腐蚀性和/或物理耐腐蚀性优异并且能够在高温腐蚀环境中具有优异且广泛适用的钎焊性能的，能够优异地降低污染的Al合金制的腔室材料，其中用于 具有阳极氧化膜的Al合金制成的室内材料以质量％计含有0.1〜2.0％的Si，0.1〜3.5％的Mg，0.02〜4.0％的Cu，余量的Al和杂质元素的杂质元素的Cr少于 0.04％。 优选的是，在杂质元素中，Fe为0.1％以下，Mn为0.04％以下，Cr，Mn以外的杂质元素的总和为0.1％以下。 本发明可以适用于高温腐蚀性环境中使用的各种材料，特别是在高温腐蚀性气体或等离子体气氛中。

公开(公告)号：US20100018617A1

公开(公告)日：2010-01-28

申请号：US12374798

申请日：2007-07-10

申请人： Koji Wada ,  Jun Hisamoto ,  Toshiyuki Tanaka ,  Kozo Hoshino ,  Kazunori Kobayashi

发明人： Koji Wada ,  Jun Hisamoto ,  Toshiyuki Tanaka ,  Kozo Hoshino ,  Kazunori Kobayashi

IPC分类号： C22F1/04 ,  C22C21/02 ,  C22C21/08 ,  C22F1/043 ,  C22F1/047 ,  C23C16/40

CPC分类号： C25D11/04 ,  C22C21/00 ,  C22C21/02 ,  C22C21/08 ,  C22F1/043 ,  C22F1/047

摘要： The aluminum alloy for anodic oxidation treatment directed to the present invention comprises as alloy elements 0.1 to 2.0% Mg, 0.1 to 2.0% Si, and 0.1 to 2.0% Mn, wherein each content of Fe, Cr, and Cu is limited to 0.03 mass % or less, and wherein the remainder is composed of Al and inevitable impurities. An aluminum alloy more excellent in the durability can be obtained by subjecting the aluminum alloy ingot having the above element composition to a homogenization treatment at a temperature of more than 550° C. to 600° C. or less. An aluminum alloy member can be obtained by forming an anodic oxidation coating on the surface of the aluminum alloy.

摘要翻译： 用于本发明的用于阳极氧化处理的铝合金包括作为合金元素的合金元素为0.1-2.0％的Mg，0.1-2.0％的Si和0.1到2.0％的Mn，其中Fe，Cr和Cu的每个含量被限制在0.03质量 ％以下，其余为Al和不可避免的杂质。 通过将具有上述元素组成的铝合金锭在550℃〜600℃以下的温度下进行均质化处理，可以获得耐久性更优异的铝合金。 通过在铝合金表面上形成阳极氧化涂层可以获得铝合金构件。

公开(公告)号：US20110220289A1

公开(公告)日：2011-09-15

申请号：US13129302

申请日：2008-12-02

申请人： Toshiyuki Tanaka ,  Jun Hisamoto ,  Hiroto Sugano

发明人： Toshiyuki Tanaka ,  Jun Hisamoto ,  Hiroto Sugano

IPC分类号： C23C16/50 ,  H01L21/3065 ,  C25D11/02

CPC分类号： H01J37/32477 ,  C23C16/4404 ,  C25D11/045 ,  H01J37/32467 ,  H01J37/3255

摘要： A member for a plasma treatment apparatus is provided, which has excellent anti-sticking properties, is suitable, for example, as a lower electrode in CVD apparatuses, has a stable shape as the lower electrode, and can suppress abnormal discharge during plasma treatment. The member for a plasma treatment apparatus comprises a base material formed of an aluminum alloy having a smoothly machined surface and a treated anodic oxide coating provided on the surface of the base material and formed by hydrating an anodic oxide coating formed on the surface of the base material to form microcracks therein. The anodic oxide coating has a leak current density of more than 0.9×10−5 A/cm2 at an applied voltage of 100 V, a thickness of not less than 3 μm, an arithmetic average surface roughness of less than 1 μm, and a dissolution rate of less than 100 mg/dm2/15 min in a phosphoric and chromic acid immersion test. The flatness of the surface on which the anodic oxide coating has been formed is not more than 50 μm.

摘要翻译： 提供了一种等离子体处理装置的构件，其具有优异的防粘性，适合于CVD装置中的下电极，作为下电极具有稳定的形状，并且可以抑制等离子体处理期间的异常放电。 用于等离子体处理装置的构件包括由具有平滑加工表面的铝合金形成的基材和经设置在基材表​​面上的经处理的阳极氧化物涂层，并且通过水合形成在基材表面上的阳极氧化物涂层 材料在其中形成微裂纹。 阳极氧化膜的施加电压为100V，厚度不小于3μm，算术平均表面粗糙度小于1μm，漏电流密度大于0.9×10 -5 A / cm 2， 在磷酸和铬酸浸渍试验中溶解速率小于100mg / dm2 / 15min。 已经形成阳极氧化物涂层的表面的平坦度不大于50μm。

公开(公告)号：US08404059B2

公开(公告)日：2013-03-26

申请号：US12374798

申请日：2007-07-10

申请人： Koji Wada ,  Jun Hisamoto ,  Toshiyuki Tanaka ,  Kozo Hoshino ,  Kazunori Kobayashi

发明人： Koji Wada ,  Jun Hisamoto ,  Toshiyuki Tanaka ,  Kozo Hoshino ,  Kazunori Kobayashi

IPC分类号： C22C21/08

CPC分类号： C25D11/04 ,  C22C21/00 ,  C22C21/02 ,  C22C21/08 ,  C22F1/043 ,  C22F1/047

摘要： The aluminum alloy for anodic oxidation treatment directed to the present invention comprises as alloy elements 0.1 to 2.0% Mg, 0.1 to 2.0% Si, and 0.1 to 2.0% Mn, wherein each content of Fe, Cr, and Cu is limited to 0.03 mass % or less, and wherein the remainder is composed of Al and inevitable impurities. An aluminum alloy more excellent in the durability can be obtained by subjecting the aluminum alloy ingot having the above element composition to a homogenization treatment at a temperature of more than 550° C. to 600° C. or less. An aluminum alloy member can be obtained by forming an anodic oxidation coating on the surface of the aluminum alloy.

摘要翻译： 用于本发明的用于阳极氧化处理的铝合金包括作为合金元素的合金元素为0.1-2.0％的Mg，0.1-2.0％的Si和0.1到2.0％的Mn，其中Fe，Cr和Cu的每个含量被限制在0.03质量 ％以下，其余为Al和不可避免的杂质。 通过将具有上述元素组成的铝合金锭在550℃〜600℃以下的温度下进行均质化处理，可以获得耐久性更优异的铝合金。 通过在铝合金表面上形成阳极氧化涂层可以获得铝合金构件。

公开(公告)号：US09005765B2

公开(公告)日：2015-04-14

申请号：US13120600

申请日：2009-09-16

申请人： Koji Wada ,  Jun Hisamoto

发明人： Koji Wada ,  Jun Hisamoto

IPC分类号： B32B15/04 ,  C25D11/08 ,  C25D11/06 ,  C25D11/02

CPC分类号： C25D11/06 ,  C25D11/024

摘要： Provided is an anodic oxide processing method in which the generation of cracks is suppressed in an anodic oxide film formed on an aluminum alloy substrate surface, such as an inner wall of a vacuum chamber of a plasma processing device, and an anodic oxide film having low heat reflectivity and a high withstand voltage is formed with high efficiency. The method for forming an anodic oxide film involves forming the anodic oxide film on the surface of a JIS 6061 aluminum alloy substrate in a sulfuric acid solution or a mixed acid solution of sulfuric acid and oxalic acid.

摘要翻译： 提供了一种阳极氧化处理方法，其中在诸如等离子体处理装置的真空室的内壁的铝合金基板表面上形成的阳极氧化膜和具有低等离子体处理装置的阳极氧化膜中抑制了裂纹的产生 以高效率形成热反射率和高耐受电压。 形成阳极氧化膜的方法包括在硫酸溶液或硫酸和草酸的混合酸溶液中在JIS 6061铝合金基材的表面上形成阳极氧化膜。

公开(公告)号：US06686053B2

公开(公告)日：2004-02-03

申请号：US10196198

申请日：2002-07-17

申请人： Koji Wada ,  Jun Hisamoto

发明人： Koji Wada ,  Jun Hisamoto

IPC分类号： B32B1504

CPC分类号： C25D11/06 ,  C22C21/02 ,  C22C21/08 ,  C25D11/18 ,  Y10T428/12479

摘要： An Al alloy member having excellent corrosion resistance comprises an Al or Al alloy substrate having an anodic oxide film including a porous layer and a pore-free barrier layer. At least a part of a structure of the barrier layer is altered into boehmite and/or pseudo-boehmite, a dissolution rate of the film is at 100 mg/dm2/15 minutes or below when determined by an immersion test in phosphoric acid/chromic acid (JIS H 8683-2), and a corroded area percent is at 10% or below after allowing the film to stand in an atmosphere of 5% Cl2—Ar gas at 400° C. for 4 hours.

摘要翻译： 具有优异耐腐蚀性的Al合金构件包括具有包括多孔层和无孔阻隔层的阳极氧化膜的Al或Al合金基底。 阻挡层的结构的至少一部分被改变为勃姆石和/或假勃姆石，当通过磷酸浸渍试验测定时，膜的溶解速率为100mg / dm 2/15分钟或更低 酸/铬酸（JIS H 8683-2），腐蚀面积百分数在使膜在5％Cl 2 -Ar气氛中在400℃下放置4小时后为10％以下。

公开(公告)号：US5389453A

公开(公告)日：1995-02-14

申请号：US62141

申请日：1993-05-17

申请人： Kikurou Toyose ,  Hideo Fujimoto ,  Akihiro Tsuruno ,  Masao Takemoto ,  Eiki Usui ,  Masahiro Kawaguchi ,  Kouki Ikeda ,  Jun Hisamoto ,  Nagisa Takee

发明人： Kikurou Toyose ,  Hideo Fujimoto ,  Akihiro Tsuruno ,  Masao Takemoto ,  Eiki Usui ,  Masahiro Kawaguchi ,  Kouki Ikeda ,  Jun Hisamoto ,  Nagisa Takee

IPC分类号： C23C22/78 ,  C23C28/00 ,  B32B15/20

CPC分类号： C23C28/00 ,  C23C22/78 ,  Y10T428/12486 ,  Y10T428/1266 ,  Y10T428/12736 ,  Y10T428/12792

摘要： An aluminum alloy material having a surface suitable for zinc phosphate processing prepared by a process comprising the steps of (1) cleaning the aluminum alloy surface, and (2) forming a composite film layer comprising Zn metal, Ni or Mn metal, and silicon oxide on the surface of the aluminum alloy.

摘要翻译： 1.一种铝合金材料，其具有适于磷酸锌处理的表面，该方法包括以下步骤：（1）清洗铝合金表面，和（2）形成包含Zn金属，Ni或Mn金属的复合膜层和氧化硅 在铝合金表面。

公开(公告)号：US09187840B2

公开(公告)日：2015-11-17

申请号：US13581086

申请日：2011-02-23

申请人： Koji Wada ,  Mamoru Hosokawa ,  Takayuki Tsubota ,  Jun Hisamoto

发明人： Koji Wada ,  Mamoru Hosokawa ,  Takayuki Tsubota ,  Jun Hisamoto

IPC分类号： C25D11/04 ,  C25D11/18 ,  C25D11/02 ,  C25D11/08 ,  C25D11/16 ,  C25D11/24 ,  C25D21/12

CPC分类号： C25D11/04 ,  C25D11/024 ,  C25D11/08 ,  C25D11/16 ,  C25D11/18 ,  C25D11/246 ,  C25D21/12

摘要： The present invention provides a method for forming an anode oxide film, in which on the assumption that a direct-current power source is used, a thick anode oxide film can be formed with good productivity within a short time without using special equipment. The method includes allowing a current A0 to pass through an aluminum base material, and includes a step of repeating a first electricity cut-off treatment multiple times, in which when a voltage reaches a voltage V1 during the formation of the film, the passage of electricity is once cut off, this electricity cut-off is continued for a period equal to or longer than an electricity cut-off time T1, and the passage of electricity is then resumed, wherein the voltage V1 and electricity cut-off time T1 satisfy the prescribed expressions.

摘要翻译： 本发明提供了一种形成阳极氧化膜的方法，其中假设使用直流电源时，可以在短时间内以高生产率形成厚阳极氧化膜而不使用特殊设备。 该方法包括使电流A0通过铝基材料，并且包括多次重复第一次断电处理的步骤，其中当膜形成期间电压达到电压V1时，通过 电一旦被切断，该断电持续时间等于或长于断电时间T1，然后恢复通电，其中电压V1和断电时间T1满足 规定的表达。