PARKING ASSIST APPARATUS
    1.
    发明申请
    PARKING ASSIST APPARATUS 有权
    停车辅助装置

    公开(公告)号:US20110298639A1

    公开(公告)日:2011-12-08

    申请号:US13202259

    申请日:2010-02-15

    IPC分类号: B60Q1/48

    摘要: A parking assist apparatus includes a parking target position setting section for setting a parking target position when a vehicle is to be parked by reversing, a parking pathway determining section for determining possibility/impossibility of direct parking for parking the vehicle to the parking target position without turnaround, and a report outputting section for effecting reporting to allow a driver engaged in parking to recognize the possibility/impossibility of the direct parking based on the result of determination by the parking pathway determining section.

    摘要翻译: 停车辅助装置包括:停车目标位置设定部,其用于通过反转来设定待停车的停车目标位置;停车路径确定部,用于确定用于将车辆停放到停车目标位置的直接停车的可能性/不可能性,而没有 以及报告输出部分,用于进行报告以允许从事停车的驾驶员基于停车路径确定部分的确定结果来识别直接停车的可能性/不可能性。

    Parking assistance apparatus
    4.
    发明授权
    Parking assistance apparatus 有权
    停车辅助设备

    公开(公告)号:US09043083B2

    公开(公告)日:2015-05-26

    申请号:US13696899

    申请日:2011-06-08

    摘要: A parking assistance apparatus has a region detector capable of detecting a plurality of possible parking regions where a vehicle can park in at least one side to the left or right of the vehicle, a photographic image of the scenery surrounding the vehicle including the possible parking regions is displayed on a monitor device, the possible parking regions detected by the region detector are superimposed on the photographic image as graphic images showing parking target candidates in all of the corresponding positions, and one of the parking target candidates can be selected as a parking target on the basis of a command input from a driving device of the vehicle.

    摘要翻译: 一种停车辅助装置具有能够检测车辆能够停放在车辆的左侧或右侧的至少一侧的多个可能的停车区域的区域检测器,包括可能的停车区域的车辆周围的风景的摄影图像 显示在监视器装置上,由区域检测器检测到的可能的停车区域叠加在摄影图像上,作为显示所有对应位置的停车目标候选的图形图像,并且可以选择一个停车目标候选作为停车目标 基于来自车辆的驾驶装置的命令输入。

    PARKING ASSISTANCE APPARATUS
    5.
    发明申请
    PARKING ASSISTANCE APPARATUS 有权
    停车辅助装置

    公开(公告)号:US20130060421A1

    公开(公告)日:2013-03-07

    申请号:US13696899

    申请日:2011-06-08

    IPC分类号: G06F17/00

    摘要: A parking assistance apparatus has a region detector capable of detecting a plurality of possible parking regions where a vehicle can park in at least one side to the left or right of the vehicle, a photographic image of the scenery surrounding the vehicle including the possible parking regions is displayed on a monitor device, the possible parking regions detected by the region detector are superimposed on the photographic image as graphic images showing parking target candidates in all of the corresponding positions, and one of the parking target candidates can be selected as a parking target on the basis of a command input from a driving device of the vehicle.

    摘要翻译: 一种停车辅助装置具有能够检测车辆能够停放在车辆的左侧或右侧的至少一侧的多个可能的停车区域的区域检测器,包括可能的停车区域的车辆周围的风景的摄影图像 显示在监视器装置上,由区域检测器检测到的可能的停车区域叠加在摄影图像上,作为显示所有对应位置的停车目标候选的图形图像,并且可以选择一个停车目标候选作为停车目标 基于来自车辆的驾驶装置的命令输入。

    Semiconductor device
    6.
    发明授权
    Semiconductor device 失效
    半导体器件

    公开(公告)号:US5177592A

    公开(公告)日:1993-01-05

    申请号:US671554

    申请日:1991-03-19

    摘要: A semiconductor includes a conductor layer formed on one side thereof toward a first surface of a substrate, and a first interlayer insulation layer on the conductor layer. The first interlayer insulation layer has a first opening extending therethrough to the conductor layer. A first wiring layer is provided on the first interlayer insulation layer, and connected to the conductor layer via the first opening. A second interlayer insulation layer is formed on the first wiring layer and has a second opening extending through the first opening to the first wiring layer. A second wiring layer is formed on the second interlayer insulation layer and extends through the second interlayer to the first wiring layer and/or the conductor layer via the first opening and the second opening.

    摘要翻译: 半导体包括在其一侧朝向基板的第一表面形成的导体层和在导体层上的第一层间绝缘层。 第一层间绝缘层具有穿过其延伸到导体层的第一开口。 第一布线层设置在第一层间绝缘层上,并经由第一开口连接到导体层。 第二层间绝缘层形成在第一布线层上,并且具有延伸穿过第一开口的第二开口到第一布线层。 第二布线层形成在第二层间绝缘层上,并且经由第一开口和第二开口延伸穿过第二中间层到第一布线层和/或导体层。

    POLISHING APPARATUS AND POLISHING METHOD
    7.
    发明申请
    POLISHING APPARATUS AND POLISHING METHOD 审中-公开
    抛光装置和抛光方法

    公开(公告)号:US20100178851A1

    公开(公告)日:2010-07-15

    申请号:US12685793

    申请日:2010-01-12

    IPC分类号: B24B9/06 B24B1/00 B24B21/00

    CPC分类号: B24B9/065 B24B21/004

    摘要: A polishing apparatus for polishing a periphery of a substrate includes a substrate holder configured to rotate the substrate, a first polishing section configured to polish the periphery of the substrate by bringing a polishing layer of a first polishing tool into contact with the periphery of the substrate when rotated by the substrate holder, and a second polishing section configured to polish the periphery of the substrate by bringing a polishing layer of a second polishing tool into contact with the periphery of the substrate when rotated by the substrate holder. The polishing layer of the first polishing tool has hard first abrasive grains, and the polishing layer of the second polishing tool has second abrasive grains that are softer than the first abrasive grains.

    摘要翻译: 用于抛光基板周边的抛光装置包括:基板保持器,其被构造成旋转基板;第一抛光部,其被配置为通过使第一抛光工具的抛光层与基板的周边接触来抛光基板的周边; 当被基板保持器旋转时,以及第二抛光部分,被配置为当第二抛光工具的抛光层与基板保持器旋转时与基板的周边接触,从而抛光基板的周边。 第一研磨工具的抛光层具有硬的第一磨料颗粒,并且第二抛光工具的抛光层具有比第一磨料颗粒更软的第二磨料颗粒。

    METHOD OF POLISHING A SUBSTRATE USING A POLISHING TAPE HAVING FIXED ABRASIVE
    8.
    发明申请
    METHOD OF POLISHING A SUBSTRATE USING A POLISHING TAPE HAVING FIXED ABRASIVE 有权
    使用固定磨料抛光胶带抛光底材的方法

    公开(公告)号:US20120135668A1

    公开(公告)日:2012-05-31

    申请号:US13303485

    申请日:2011-11-23

    IPC分类号: B24B1/00

    摘要: A method of polishing a peripheral portion of a substrate is provided. This method includes: causing sliding contact between the peripheral portion of the substrate and a polishing tape; and supplying a polishing liquid onto the polishing tape contacting the peripheral portion of the substrate. The polishing tape includes a base tape and a fixed abrasive formed on the base tape, and the polishing liquid is an alkaline polishing liquid containing an alkaline chemical and an additive including molecules that cause steric hindrance.

    摘要翻译: 提供了研磨基板周边部分的方法。 该方法包括:引起基板的周边部分与研磨带之间的滑动接触; 以及将研磨液供给到与基板的周边部分接触的研磨带上。 抛光带包括形成在基带上的基带和固定磨料,抛光液是含有碱性化学物质和包含引起空间位阻的分子的添加剂的碱性抛光液。

    Method of polishing a substrate using a polishing tape having fixed abrasive
    9.
    发明授权
    Method of polishing a substrate using a polishing tape having fixed abrasive 有权
    使用具有固定磨料的研磨带研磨基材的方法

    公开(公告)号:US08926402B2

    公开(公告)日:2015-01-06

    申请号:US13303485

    申请日:2011-11-23

    摘要: A method of polishing a peripheral portion of a substrate is provided. This method includes: causing sliding contact between the peripheral portion of the substrate and a polishing tape; and supplying a polishing liquid onto the polishing tape contacting the peripheral portion of the substrate. The polishing tape includes a base tape and a fixed abrasive formed on the base tape, and the polishing liquid is an alkaline polishing liquid containing an alkaline chemical and an additive including molecules that cause steric hindrance.

    摘要翻译: 提供了研磨基板周边部分的方法。 该方法包括:引起基板的周边部分与研磨带之间的滑动接触; 以及将研磨液供给到与基板的周边部分接触的研磨带上。 抛光带包括形成在基带上的基带和固定磨料,抛光液是含有碱性化学物质和包含引起空间位阻的分子的添加剂的碱性抛光液。