公开(公告)号：US5871812A

公开(公告)日：1999-02-16

申请号：US773879

申请日：1996-12-26

申请人： Jung-Sung Hwang ,  Dong-Joo Lee ,  Nam-Hee You ,  Sang-Young Moon

发明人： Jung-Sung Hwang ,  Dong-Joo Lee ,  Nam-Hee You ,  Sang-Young Moon

IPC分类号： G01N21/88 ,  C23C16/44 ,  C23C16/448 ,  C23C16/455 ,  C30B31/06 ,  C30B33/00 ,  G01N21/94 ,  G01N21/956 ,  H01L21/02 ,  H01L21/20 ,  C23C16/00

CPC分类号： C23C16/45565 ,  C23C16/4401 ,  C23C16/448 ,  C23C16/45512 ,  C30B31/06 ,  C30B33/00

摘要： An apparatus for quantitatively depositing molecular impurities on a semiconductor wafer, includes a reaction chamber, a gas generator for generating a source gas serving as the molecular impurities, a humidifier for generating moisture vapour of a constant temperature, a mixer for mixing the source gas and the moisture vapour to generate a mixed gas, a gas injector for injecting the mixed gas into the reaction chamber, an exhausting part for initiating a vacuum condition in the reaction chamber before deposition of the molecular impurities and for exhausting a remaining gases after deposition of the molecular impurities, and a cleaning air supply portion for supplying a cleaning air into the reaction chamber before deposition of the molecular impurities. After fabricating a semiconductor device using the wafer processed as above, a defective source of mechanism of contamination can be traced by analysing the semiconductor device.

摘要翻译： 一种用于在半导体晶片上定量沉积分子杂质的装置包括反应室，用于产生用作分子杂质的源气体的气体发生器，用于产生恒温的湿气的加湿器，用于混合源气体的混合器和 产生混合气体的水分蒸汽，将混合气体注入反应室的气体注入器，用于在沉积分子杂质之前在反应室中引发真空状态并在沉积之后排出剩余气体的排气部分 分子杂质和用于在沉积分子杂质之前将清洁空气供应到反应室中的清洁空气供应部分。 在使用如上所述处理的晶片制造半导体器件之后，可以通过分析半导体器件来追踪污染机制的有缺陷的源。

公开(公告)号：US5731592A

公开(公告)日：1998-03-24

申请号：US774276

申请日：1996-12-27

申请人： Sang-Guen Oh ,  Sang-Young Moon ,  Jueng-Gon Kim ,  Chan-Woo Park

发明人： Sang-Guen Oh ,  Sang-Young Moon ,  Jueng-Gon Kim ,  Chan-Woo Park

IPC分类号： H01J37/18 ,  H01J37/317 ,  H01L21/265

CPC分类号： H01J37/18 ,  H01J2237/1825 ,  H01J2237/31701

摘要： An exhaust system for an ion implanter includes an exhaust pump for removing remaining gases in an inner portion of the ion implanter, an exhaust duct for carrying the remaining gases from the exhaust pump to the outside of the exhaust system, and a gas introducing portion for introducing heated gases from a gas storage tank to the exhaust duct. Therefore, by-products on an inside of the exhaust duct are heated by the gases, such that a reaction between the remaining gases from the exhaust pump and the heated by-products is prevented. With the exhaust system, a corona discharge is not generated inside the exhaust duct, thereby preventing the exhaust duct from being burned out.

摘要翻译： 用于离子注入机的排气系统包括用于去除离子注入机的内部中剩余气体的排气泵，用于将剩余气体从排气泵输送到排气系统外部的排气管道，以及用于 将来自储气罐的加热气体引入排气管。 因此，排气管内部的副产物被气体加热，从而防止来自排气泵的剩余气体与加热副产物之间的反应。 利用排气系统，在排气管内不产生电晕放电，从而防止排气管被烧毁。