Air conditioning system for semiconductor clean room including a
chemical filter downstream of a humidifier
    1.
    发明授权
    Air conditioning system for semiconductor clean room including a chemical filter downstream of a humidifier 失效
    半导体洁净室的空调系统,包括加湿器下游的化学过滤器

    公开(公告)号:US5890367A

    公开(公告)日:1999-04-06

    申请号:US899388

    申请日:1997-07-23

    CPC分类号: F24F3/161 F24F2003/1682

    摘要: An air conditioning system for a semiconductor clean room includes a chemical filter between an air conditioner including a humidifier and a ULPA filter of the clean room, for ionizing chemical impurities using moisture supplied from the humidifier and then adsorbing the ionized chemical impurities by using the chemical filter. The chemical filter is installed downstream of the humidifier, which applies phosphoric acid for the prevention of scale-formation. This downstream location allows the chemical filter to prevent the phosphoric acid from being included in the fresh air as a new chemical impurity, which makes regulation of temperature and humidity of the air possible without having to use a special and expensive pure steam system.

    摘要翻译: 用于半导体洁净室的空调系统包括在包括加湿器的空气调节器和洁净室的ULPA过滤器之间的化学过滤器,用于使用从加湿器供应的水分电离化学杂质,然后通过使用化学品吸附电离的化学杂质 过滤。 化学过滤器安装在加湿器的下游,该加湿器采用磷酸防止结垢形成。 该下游位置允许化学过滤器防止磷酸作为新的化学杂质被包含在新鲜空气中,这使得可以调节空气的温度和湿度,而不必使用特殊和昂贵的纯蒸汽系统。

    Methods of analyzing water soluble contaminants generated during microelectronic device manufacturing processes
    2.
    发明授权
    Methods of analyzing water soluble contaminants generated during microelectronic device manufacturing processes 有权
    分析微电子器件制造过程中产生的水溶性污染物的方法

    公开(公告)号:US06176120B1

    公开(公告)日:2001-01-23

    申请号:US09330972

    申请日:1999-06-11

    IPC分类号: G01N1100

    摘要: Methods of analyzing water-soluble contaminants comprise providing reference air streams having gaseous water present therein; condensing the reference air streams such that the gaseous water liquefies; pressurizing the liquefied water; and supplying the liquefied water to analyzers. Systems for analyzing water-soluble contaminants comprise air inlets that absorb reference air containing gaseous water therein; valves that control the flow of the reference air in fluid communication with the air inlets; condensers that condense the gaseous water in the reference air in fluid communication with the valves; pressurization pumps that pressurize the water condensed from the reference air in fluid communication with the condensers; and discharge pumps that discharge an excessive amount of water contained in the reference air.

    摘要翻译: 分析水溶性污染物的方法包括提供其中存在气态水的参考空气流; 冷凝参考气流,使气态水液化; 对液化水加压; 并将液化水供应给分析仪。 用于分析水溶性污染物的系统包括吸收其中含有气态水的参考空气的空气入口; 控制与空气入口流体连通的参考空气的流动的阀; 冷凝器,其将与参考空气中的气态水冷凝成与阀流体连通; 加压泵,其将与从冷凝器流体连通的参考空气冷凝的水加压; 以及排出包含在参考空气中的过量水的排出泵。

    Apparatus and method for depositing molecular impurities on a
semiconductor wafer
    3.
    发明授权
    Apparatus and method for depositing molecular impurities on a semiconductor wafer 失效
    用于在半导体晶片上沉积分子杂质的装置和方法

    公开(公告)号:US5871812A

    公开(公告)日:1999-02-16

    申请号:US773879

    申请日:1996-12-26

    摘要: An apparatus for quantitatively depositing molecular impurities on a semiconductor wafer, includes a reaction chamber, a gas generator for generating a source gas serving as the molecular impurities, a humidifier for generating moisture vapour of a constant temperature, a mixer for mixing the source gas and the moisture vapour to generate a mixed gas, a gas injector for injecting the mixed gas into the reaction chamber, an exhausting part for initiating a vacuum condition in the reaction chamber before deposition of the molecular impurities and for exhausting a remaining gases after deposition of the molecular impurities, and a cleaning air supply portion for supplying a cleaning air into the reaction chamber before deposition of the molecular impurities. After fabricating a semiconductor device using the wafer processed as above, a defective source of mechanism of contamination can be traced by analysing the semiconductor device.

    摘要翻译: 一种用于在半导体晶片上定量沉积分子杂质的装置包括反应室,用于产生用作分子杂质的源气体的气体发生器,用于产生恒温的湿气的加湿器,用于混合源气体的混合器和 产生混合气体的水分蒸汽,将混合气体注入反应室的气体注入器,用于在沉积分子杂质之前在反应室中引发真空状态并在沉积之后排出剩余气体的排气部分 分子杂质和用于在沉积分子杂质之前将清洁空气供应到反应室中的清洁空气供应部分。 在使用如上所述处理的晶片制造半导体器件之后,可以通过分析半导体器件来追踪污染机制的有缺陷的源。