LOSS MONITORING IN PHOTONIC CIRCUIT FABRICATION

    公开(公告)号:US20220065798A1

    公开(公告)日:2022-03-03

    申请号:US17006366

    申请日:2020-08-28

    Abstract: Optical fabrication monitor structures can be included in a design fabricated on a wafer from a mask or fabrication reticle. A first set of components can be formed in an initial fabrication cycle, where the first set includes functional components and monitor structures. A second set of components can be formed by subsequent fabrication processes that can potentially cause errors or damage to the first set of components. The monitor structures can be implemented during fabrication (e.g., in a cleanroom) to detect fabrication errors without pulling or scrapping the wafer.

    OPTICAL CLADDING LAYER DESIGN
    3.
    发明申请

    公开(公告)号:US20210028323A1

    公开(公告)日:2021-01-28

    申请号:US17065180

    申请日:2020-10-07

    Abstract: Embodiments of the invention describe apparatuses, optical systems, and methods related to utilizing optical cladding layers. According to one embodiment, a hybrid optical device includes a silicon semiconductor layer and a III-V semiconductor layer having an overlapping region, wherein a majority of a field of an optical mode in the overlapping region is to be contained in the III-V semiconductor layer. A cladding region between the silicon semiconductor layer and the III-V semiconductor layer has a spatial property to substantially confine the optical mode to the III-V semiconductor layer and enable heat dissipation through the silicon semiconductor layer.

    PHOTODETECTOR WITH SEQUENTIAL ASYMMETRIC-WIDTH WAVEGUIDES

    公开(公告)号:US20200209472A1

    公开(公告)日:2020-07-02

    申请号:US16233498

    申请日:2018-12-27

    Abstract: Described are various configurations of optical structures having asymmetric-width waveguides. A photodetector can include parallel waveguides that have different widths, which can be connected via passive waveguide. One or more light absorbing regions can be proximate to the waveguides to absorb light propagating through one or more of the parallel waveguides. Multiple photodetectors having asymmetric width waveguides can operate to transduce light in different modes in a polarization diversity optical receiver.

    Integrated optoelectronic device with heater

    公开(公告)号:US10739622B2

    公开(公告)日:2020-08-11

    申请号:US16235197

    申请日:2018-12-28

    Abstract: Disclosed are structures as well as methods of manufacture and operation of integrated optoelectronic devices that facilitate directly heating the diode or waveguide structures to regulate a temperature of the device while allowing electrical contacts to be placed close to the device to reduce the electrical resistance. Embodiments include, in particular, heterogeneous electro-absorption modulators that include a compound-semiconductor diode structure placed above a waveguide formed in the device layer of an SOI substrate.

    Optical cladding layer design
    7.
    发明授权

    公开(公告)号:US10431703B2

    公开(公告)日:2019-10-01

    申请号:US15927277

    申请日:2018-03-21

    Abstract: Embodiments of the invention describe apparatuses, optical systems, and methods related to utilizing optical cladding layers. According to one embodiment, a hybrid optical device includes a silicon semiconductor layer and a III-V semiconductor layer having an overlapping region, wherein a majority of a field of an optical mode in the overlapping region is to be contained in the III-V semiconductor layer. A cladding region between the silicon semiconductor layer and the III-V semiconductor layer has a spatial property to substantially confine the optical mode to the III-V semiconductor layer and enable heat dissipation through the silicon semiconductor layer.

    Radio-frequency loss reduction for integrated devices

    公开(公告)号:US11164893B1

    公开(公告)日:2021-11-02

    申请号:US16863223

    申请日:2020-04-30

    Abstract: In radio-frequency (RF) devices integrated on semiconductor-on-insulator (e.g., silicon-based) substrates, RF losses may be reduced by increasing the resistivity of the semiconductor device layer in the vicinity of (e.g., underneath and/or in whole or in part surrounding) the metallization structures of the RF device, such as, e.g., transmission lines, contacts, or bonding pads. Increased resistivity can be achieved, e.g., by ion-implantation, or by patterning the device layer to create disconnected semiconductor islands.

    Optical cladding layer design
    10.
    发明授权

    公开(公告)号:US10833213B2

    公开(公告)日:2020-11-10

    申请号:US16548260

    申请日:2019-08-22

    Abstract: Embodiments of the invention describe apparatuses, optical systems, and methods related to utilizing optical cladding layers. According to one embodiment, a hybrid optical device includes a silicon semiconductor layer and a III-V semiconductor layer having an overlapping region, wherein a majority of a field of an optical mode in the overlapping region is to be contained in the III-V semiconductor layer. A cladding region between the silicon semiconductor layer and the III-V semiconductor layer has a spatial property to substantially confine the optical mode to the III-V semiconductor layer and enable heat dissipation through the silicon semiconductor layer.

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