Conveyance system and conveyance method of conveyance system

    公开(公告)号:US10160625B2

    公开(公告)日:2018-12-25

    申请号:US14426546

    申请日:2013-09-06

    摘要: A conveyance system includes a robot and a suspending device. The robot moves and conveys a workpiece in a horizontal direction. The suspending device includes a suspending mechanism, a lifting unit, and a support mechanism. The suspending mechanism suspends the workpiece, and the lifting unit lifts up and down the workpiece. The support mechanism supports the suspending mechanism such that the suspending mechanism is movable in the horizontal direction.

    Wafer transfer apparatus and substrate transfer apparatus

    公开(公告)号:USRE48792E1

    公开(公告)日:2021-10-26

    申请号:US16869962

    申请日:2020-05-08

    IPC分类号: H01L21/677

    摘要: A wafer transfer apparatus is provided. In a minimum transformed state where a robot arm is transformed such that a distance defined from a pivot axis to an arm portion, which is farthest in a radial direction relative to the pivot axis, is minimum, a minimum rotation radius R, is set to exceed ½ of a length B in the forward and backward directions of an interface space, the length B corresponding to a length between the front wall and the rear wall of the interface space forming portion, and is further set to be equal to or less than a subtracted value obtained by subtracting a distance L0 in the forward and backward directions from the rear wall of the interface space forming portion to the pivot axis, from the length B in the forward and backward directions of the interface space (i.e., B/2

    End effector and substrate conveying robot

    公开(公告)号:US10483143B2

    公开(公告)日:2019-11-19

    申请号:US15108387

    申请日:2014-06-27

    摘要: An end effector has a hand base portion at least a part of which advances below a lowermost substrate or above an uppermost substrate of a plurality of substrates stored in a substrate storing portion, a substrate holding unit provided to the hand base portion so as to hold the two or more substrates including the lowermost substrate or the uppermost substrate, and a protrusion amount change unit for changing a protrusion amount of the substrate holding unit from a reference surface including the surface of the hand base portion opposed to the lowermost substrate or the uppermost substrate. The protrusion amount change unit has a single drive source applying a drive force to the whole substrate holding unit.

    Wafer transfer apparatus and substrate transfer apparatus

    公开(公告)号:USRE46465E1

    公开(公告)日:2017-07-04

    申请号:US14852993

    申请日:2015-09-14

    IPC分类号: H01L21/677

    摘要: A wafer transfer apparatus is provided. In a minimum transformed state where a robot arm is transformed such that a distance defined from a pivot axis to an arm portion, which is farthest in a radial direction relative to the pivot axis, is minimum, a minimum rotation radius R, is set to exceed ½ of a length B in the forward and backward directions of an interface space, the length B corresponding to a length between the front wall and the rear wall of the interface space forming portion, and is further set to be equal to or less than a subtracted value obtained by subtracting a distance L0 in the forward and backward directions from the rear wall of the interface space forming portion to the pivot axis, from the length B in the forward and backward directions of the interface space (i.e., B/2

    Substrate conveying system and method

    公开(公告)号:US10553471B2

    公开(公告)日:2020-02-04

    申请号:US15114623

    申请日:2014-06-27

    摘要: The end effector has a first hand and a second hand which can be driven independently from each other. The first hand has a hand body which can be inserted between vertically adjacent substrates stored in a substrate storing portion, holding a substrate immediately above or immediately below the hand body. The second hand has a hand base portion which at least partially advances below a lowermost substrate or above an uppermost substrate of a plurality of substrates stored in a substrate storing portion and a substrate holding means provided to the hand base portion so as to hold two or more substrates including the lowermost substrate or the uppermost substrate. By the end effector, substrates can be conveyed without any problem even when use of a batch conveying type hand is restricted due to the condition on the substrate storing portion side.