公开(公告)号：US20240014000A1

公开(公告)日：2024-01-11

申请号：US17862052

申请日：2022-07-11

Applicant: KLA Corporation

Inventor： Alan D. Brodie ,  Lawrence P. Muray ,  John Gerling

IPC: H01J37/141 ,  H01J37/153

CPC classification number: H01J37/141 ,  H01J37/153 ,  H01J37/147

Abstract: A miniature electron optical column apparatus is disclosed. The apparatus may include a set of electron-optical elements configured to direct a primary electron beam to a sample. The set of electron-optical elements may include an objective lens. The apparatus may also include a deflection sub-system. The deflection sub-system may include one or more pre-lens deflectors positioned between an electron beam source and the objective lens. The deflection sub-system may also include a post-lens deflector positioned between the objective lens and the sample. The deflection sub-system may also include a post-lens miniature optical element positioned between the objective lens and the sample.

公开(公告)号：US11495428B2

公开(公告)日：2022-11-08

申请号：US16789650

申请日：2020-02-13

Applicant: KLA CORPORATION

Inventor： Katerina Ioakeimidi ,  Gildardo R. Delgado ,  Frances Hill ,  Gary V. Lopez Lopez ,  Miguel A. Gonzalez ,  Alan D. Brodie

IPC: H01J1/34 ,  H01J37/317 ,  G02B5/00

Abstract: A photocathode emitter can include a transparent substrate, a photocathode layer, and a plasmonic structure array disposed between the transparent substrate and the photocathode layer. The plasmonic structure can serve as a spot-confining structure and an electrical underlayer for biasing the photocathode. The plasmonic structure can confine the incident light at subwavelength sizes.

公开(公告)号：US11239048B2

公开(公告)日：2022-02-01

申请号：US16812720

申请日：2020-03-09

Applicant: KLA Corporation

Inventor： Alan D. Brodie ,  Lawrence P. Muray ,  John Fielden

IPC: H01J37/244 ,  H01J37/22

Abstract: An electron beam inspection system is disclosed, in accordance with one or more embodiments of the present disclosure. The inspection system may include an electron beam source configured to generate one or more primary electron beams. The inspection system may also include an electron-optical column including a set of electron-optical elements configured to direct the one or more primary electron beams to a sample. The inspection system may further include a detection assembly comprising: a scintillator substrate configured to collect electrons emanating from the sample, the scintillator substrate configured to generate optical radiation in response to the collected electrons; one or more light guides; one or more reflective surfaces configured to receive the optical radiation and direct the optical radiation along the one or more light guides; and one or more detectors configured to receive the optical radiation from the light guide.

公开(公告)号：US20210280386A1

公开(公告)日：2021-09-09

申请号：US16812720

申请日：2020-03-09

Applicant: KLA Corporation

Inventor： Alan D. Brodie ,  Lawrence P. Muray ,  John Fielden

IPC: H01J37/244 ,  H01J37/22

Abstract: An electron beam inspection system is disclosed, in accordance with one or more embodiments of the present disclosure. The inspection system may include an electron beam source configured to generate one or more primary electron beams. The inspection system may also include an electron-optical column including a set of electron-optical elements configured to direct the one or more primary electron beams to a sample. The inspection system may further include a detection assembly comprising: a scintillator substrate configured to collect electrons emanating from the sample, the scintillator substrate configured to generate optical radiation in response to the collected electrons; one or more light guides; one or more reflective surfaces configured to receive the optical radiation and direct the optical radiation along the one or more light guides; and one or more detectors configured to receive the optical radiation from the light guide.

公开(公告)号：US20200266019A1

公开(公告)日：2020-08-20

申请号：US16789650

申请日：2020-02-13

Applicant: KLA CORPORATION

Inventor： Katerina Ioakeimidi ,  Gildardo R. Delgado ,  Frances Hill ,  Gary V. Lopez Lopez ,  Miguel A. Gonzalez ,  Alan D. Brodie

IPC: H01J1/34 ,  H01J37/317 ,  G02B5/00

Abstract: A photocathode emitter can include a transparent substrate, a photocathode layer, and a plasmonic structure array disposed between the transparent substrate and the photocathode layer. The plasmonic structure can serve as a spot-confining structure and an electrical underlayer for biasing the photocathode. The plasmonic structure can confine the incident light at subwavelength sizes.