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公开(公告)号：US20160216197A1
公开(公告)日：2016-07-28
申请号：US15092329
申请日：2016-04-06
Applicant: KLA-Tencor Corporation
Inventor： Barak Bringoltz , Daniel Kandel , Yoel Feler , Noam Sapiens , Paykin Irina , Alexander Svizher , Meir Aloni , Guy Ben Dov , Hadar Shalmoni , Vladimir Levinski
CPC classification number: G01N21/01 , G01B11/272 , G01N21/4788 , G01N21/9501 , G01N21/956 , G01N2201/068 , G02B27/4255 , G02B27/4272 , G03F7/70633 , G03F7/70683
Abstract: Metrology methods, systems and targets are provided, which implement a side by side paradigm. Adjacent cells with periodic structures are used to extract the overlay error, e.g., by introducing controllable phase shifts or image shifts which enable algorithmic computation of the overlay. The periodic structures are designed to exhibit a rotational symmetry to support the computation and reduce errors.
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公开(公告)号：US09909982B2
公开(公告)日：2018-03-06
申请号：US14244179
申请日：2014-04-03
Applicant: KLA-Tencor Corporation
Inventor： Barak Bringoltz , Irina Vakshtein , Ofir Aharon , Guy Ben Dov , Zeev Bomzon
CPC classification number: G01N21/4785 , G03F7/70633
Abstract: Methods and calibrations modules are provided, for calibrating a pupil center in scatterometry overlay measurements. The calibration comprises calculating fluctuations from a first statistical figure of merit such as an average of an overlay signal per pixel at the pupil and significantly reducing, for example minimizing, the fluctuations with respect to a second statistical figure of merit thereof, such as a pupil weighted variance of the fluctuations.
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Patent Agency Ranking
公开(公告)号：US09581430B2
公开(公告)日：2017-02-28
申请号：US14057827
申请日：2013-10-18
Applicant: KLA-Tencor Corporation
Inventor： Amnon Manassen , Ohad Bachar , Daria Negri , Boris Golovanevsky , Barak Bringoltz , Daniel Kandel , Yoel Feler , Noam Sapiens , Paykin Irina , Alexander Svizher , Meir Aloni , Guy Ben Dov , Hadar Shalmoni , Vladimir Levinski
CPC classification number: G01B9/0209 , G01B9/02027 , G01B9/02043 , G01B9/02087 , G01N21/45
Abstract: Systems and methods are provided which derive target characteristics from interferometry images taken at multiple phase differences between target beams and reference beams yielding the interferometry images. The illumination of the target and the reference has a coherence length of less than 30 microns to enable scanning the phase through the coherence length of the illumination. The interferometry images are taken at the pupil plane and/or in the field plane to combine angular and spectroscopic scatterometry data that characterize and correct target topography and enhance the performance of metrology systems.
Abstract translation: 提供了系统和方法，其从在目标光束和参考光束之间的多个相位差处拍摄的产生干涉测量图像的干涉测量图像中导出目标特征。 目标和参考物的照明具有小于30微米的相干长度，以使得能够通过照明的相干长度扫描相位。 在瞳孔平面和/或场平面中拍摄干涉测量图像，以组合表征和校正目标地形的角度和光谱散射数据，并增强计量系统的性能。
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4.发明申请PUPIL PLANE CALIBRATION FOR SCATTEROMETRY OVERLAY MEASUREMENT 有权用于SCATTERMETRY OVERLAY测量的PUPIL PLANE校准公开(公告)号：US20140257734A1
公开(公告)日：2014-09-11
申请号：US14244179
申请日：2014-04-03
Applicant: KLA-Tencor Corporation
Inventor： Barak Bringoltz , Irina Vakshtein , Ofir Aharon , Guy Ben Dov , Zeev Bomzon
CPC classification number: G01N21/4785 , G03F7/70633
Abstract: Methods and calibrations modules are provided, for calibrating a pupil center in scatterometry overlay measurements. The calibration comprises calculating fluctuations from a first statistical figure of merit such as an average of an overlay signal per pixel at the pupil and significantly reducing, for example minimizing, the fluctuations with respect to a second statistical figure of merit thereof, such as a pupil weighted variance of the fluctuations.
Abstract translation: 提供了方法和校准模块，用于在散射测量叠加测量中校准瞳孔中心。 校准包括从第一统计品质因数计算波动，例如在瞳孔处的每个像素的覆盖信号的平均值，并且显着地减少例如相对于其第二统计品质因数例如瞳孔的波动最小化 波动的加权方差。
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公开(公告)号：US10591406B2
公开(公告)日：2020-03-17
申请号：US15092329
申请日：2016-04-06
Applicant: KLA-Tencor Corporation
Inventor： Barak Bringoltz , Daniel Kandel , Yoel Feler , Noam Sapiens , Paykin Irina , Alexander Svizher , Meir Aloni , Guy Ben Dov , Hadar Shalmoni , Vladimir Levinski
Abstract: Metrology methods, systems and targets are provided, which implement a side by side paradigm. Adjacent cells with periodic structures are used to extract the overlay error, e.g., by introducing controllable phase shifts or image shifts which enable algorithmic computation of the overlay. The periodic structures are designed to exhibit a rotational symmetry to support the computation and reduce errors.
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公开(公告)号：US09739702B2
公开(公告)日：2017-08-22
申请号：US14161398
申请日：2014-01-22
Applicant: KLA-Tencor Corporation
Inventor： Barak Bringoltz , Daniel Kandel , Yoel Feler , Noam Sapiens , Irina Paykin , Alexander Svizher , Meir Aloni , Guy Ben Dov , Hadar Shalmoni , Vladimir Levinski
CPC classification number: G01N21/01 , G01B11/272 , G01N21/4788 , G01N21/9501 , G01N21/956 , G01N2201/068 , G02B27/4255 , G02B27/4272 , G03F7/70633 , G03F7/70683
Abstract: Metrology methods, systems and targets are provided, which implement a side by side paradigm. Adjacent cells with periodic structures are used to extract the overlay error, e.g., by introducing controllable phase shifts or image shifts which enable algorithmic computation of the overlay. The periodic structures are designed to exhibit a rotational symmetry to support the computation and reduce errors.
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公开(公告)号：US20140111791A1
公开(公告)日：2014-04-24
申请号：US14057827
申请日：2013-10-18
Applicant: KLA-Tencor Corporation
Inventor： Amnon Manassen , Ohad Bachar , Daria Negri , Boris Golovanevsky , Barak Bringoltz , Daniel Kandel , Yoel Feler , Noam Sapiens , Paykin Irina , Alexander Svizher , Meir Aloni , Guy Ben Dov , Hadar Shalmoni , Vladimir Levinski
IPC: G01B9/02
CPC classification number: G01B9/0209 , G01B9/02027 , G01B9/02043 , G01B9/02087 , G01N21/45
Abstract: Systems and methods are provided which derive target characteristics from interferometry images taken at multiple phase differences between target beams and reference beams yielding the interferometry images. The illumination of the target and the reference has a coherence length of less than 30 microns to enable scanning the phase through the coherence length of the illumination. The interferometry images are taken at the pupil plane and/or in the field plane to combine angular and spectroscopic scatterometry data that characterize and correct target topography and enhance the performance of metrology systems.
Abstract translation: 提供了系统和方法，其从在目标光束和参考光束之间的多个相位差处拍摄的产生干涉测量图像的干涉测量图像中导出目标特征。 目标和参考物的照明具有小于30微米的相干长度，以使得能够通过照明的相干长度扫描相位。 在瞳孔平面和/或场平面中拍摄干涉测量图像，以组合表征和校正目标地形的角度和光谱散射数据，并增强计量系统的性能。
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