Abstract:
An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.
Abstract:
A spectrometer for tailored spectral sampling includes a dispersive element for spatially dispersing a spectrum of a light beam, a detector including a plurality of pixels distributed along a sampling direction, and a spectrum reshaping element including at least one of a reflective surface or a transmissive surface for reshaping the spatially-dispersed spectrum of the light beam from the dispersive element along the sampling direction to provide a selected distribution of the spectrum to the detector. The detector may spatially sample the spectrum of incident light with the plurality of pixels at selected spectral intervals based on the selected distribution of the spectrum.
Abstract:
The present invention may include an illumination source, a detector, a selectably adjustable optical system including a dynamically adjustable illumination pupil of the illumination arm, a dynamically adjustable collection pupil of the collection arm, a dynamically adjustable illumination field stop of the illumination arm, a dynamically adjustable collection field stop of the collection arm, a sensor configured to measure one or more optical characteristics of one or more components of the optical system, and a control system configured to selectably dynamically adjust at least one of the illumination pupil, the collection pupil, the illumination field stop, the collection field stop, and a spectral radiance of the illumination source.
Abstract:
An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.
Abstract:
A spectrometer for tailored spectral sampling includes a dispersive element for spatially dispersing a spectrum of a light beam, a detector including a plurality of pixels distributed along a sampling direction, and a spectrum reshaping element including at least one of a reflective surface or a transmissive surface for reshaping the spatially-dispersed spectrum of the light beam from the dispersive element along the sampling direction to provide a selected distribution of the spectrum to the detector. The detector may spatially sample the spectrum of incident light with the plurality of pixels at selected spectral intervals based on the selected distribution of the spectrum.
Abstract:
An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.
Abstract:
An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.
Abstract:
Various metrology systems and methods for high aspect ratio and large lateral dimension structures are provided. One method includes directing light to one or more structures formed on a wafer. The light includes ultraviolet light, visible light, and infrared light. The one or more structures include at least one high aspect ratio structure or at least one large lateral dimension structure. The method also includes generating output responsive to light from the one or more structures due to the light directed to the one or more structures. In addition, the method includes determining one or more characteristics of the one or more structures using the output.
Abstract:
An apparatus to calibrate a polarizer in a polarized optical system at any angle of incidence. The apparatus decouples the polarization effect of the system from the polarization effect of the sample. The apparatus includes a substrate with a polarizer disposed on the surface. An indicator on the substrate indicates the polarization orientation of the polarizer, which is in a predetermined orientation with respect to the substrate.
Abstract:
An apparatus to calibrate a polarizer in a polarized optical system at any angle of incidence. The apparatus decouples the polarization effect of the system from the polarization effect of the sample. The apparatus includes a substrate with a polarizer disposed on the surface. An indicator on the substrate indicates the polarization orientation of the polarizer, which is in a predetermined orientation with respect to the substrate.