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    MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND METHODS
    3.
    发明申请
    MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND METHODS 有权
    多个角度的半导体计量系统和方法

    公开(公告)号：US20140375981A1

    公开(公告)日：2014-12-25

    申请号：US14043783

    申请日：2013-10-01

    Applicant: KLA-Tencor Corporation

    Inventor： David Y. Wang ,  Klaus Flock ,  Lawrence Rotter ,  Shankar Krishnan ,  Johannes D. de Veer ,  Catalin Filip ,  Gregory Brady ,  Muzammil Arain ,  Andrei Shchegrov

    IPC: G01N21/88

    CPC classification number: G01N21/211 ,  G01B2210/56 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/214 ,  G01N2021/8848 ,  G01N2201/06113 ,  G01N2201/0636

    Abstract: An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.

    Abstract translation: 一种装置包括（i）用于提供在从深紫外波长到红外波长的范围内可选择的多个波长的照明光束的明亮光源，（ii）照明光学器件，用于将照明光束以可选择的角度集合 （AOI）或方位角（AZ）和极化状态以提供光谱椭偏仪，其中照明光学器件包括用于控制每个可选AOI / AZ组上样品上的照明光束的光斑尺寸的变迹器，（iii ）收集光学器件，用于响应于在每个可选择的AOI / AZ集合处的照明光束和朝向基于输出光束产生输出信号或图像的检测器的偏振状态来引导来自样品的输出光束，以及（v） 控制器，用于基于输出信号或图像来表征样本的特征。

    Multiple angles of incidence semiconductor metrology systems and methods
    4.
    发明授权
    Multiple angles of incidence semiconductor metrology systems and methods 有权
    多重入射角度半导体测量系统和方法

    公开(公告)号：US09116103B2

    公开(公告)日：2015-08-25

    申请号：US14043783

    申请日：2013-10-01

    Applicant: KLA-Tencor Corporation

    Inventor： David Y. Wang ,  Klaus Flock ,  Lawrence Rotter ,  Shankar Krishnan ,  Johannes D. de Veer ,  Catalin Filip ,  Gregory Brady ,  Muzammil Arain ,  Andrei Shchegrov

    IPC: G01J4/00 ,  G01N21/21 ,  G01N21/95 ,  G01N21/956

    CPC classification number: G01N21/211 ,  G01B2210/56 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/214 ,  G01N2021/8848 ,  G01N2201/06113 ,  G01N2201/0636

    Abstract: An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.

    Abstract translation: 一种装置包括（i）用于提供在从深紫外波长到红外波长的范围内可选择的多个波长的照明光束的明亮光源，（ii）照明光学器件，用于将照明光束以可选择的角度集合 （AOI）或方位角（AZ）和极化状态以提供光谱椭偏仪，其中照明光学器件包括用于控制每个可选AOI / AZ组上样品上的照明光束的光斑尺寸的变迹器，（iii ）收集光学器件，用于响应于在每个可选择的AOI / AZ集合处的照明光束和朝向基于输出光束产生输出信号或图像的检测器的偏振状态来引导来自样品的输出光束，以及（v） 控制器，用于基于输出信号或图像来表征样本的特征。

    Metrology systems and methods for high aspect ratio and large lateral dimension structures
    5.
    发明授权
    Metrology systems and methods for high aspect ratio and large lateral dimension structures 有权
    高纵横比和大横向尺寸结构的计量系统和方法

    公开(公告)号：US08860937B1

    公开(公告)日：2014-10-14

    申请号：US13743304

    申请日：2013-01-16

    Applicant: KLA-Tencor Corporation

    Inventor： Thaddeus Gerard Dziura ,  Xuefeng Liu ,  David Y. Wang ,  Jonathan Madsen ,  Alexander Kuznetsov ,  Johannes D. de Veer ,  Shankar Krishnan ,  Derrick Shaughnessy ,  Andrei Shchegrov

    IPC: G01N21/00 ,  G01N21/47

    CPC classification number: G01N21/47 ,  G01B2210/56 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: Various metrology systems and methods for high aspect ratio and large lateral dimension structures are provided. One method includes directing light to one or more structures formed on a wafer. The light includes ultraviolet light, visible light, and infrared light. The one or more structures include at least one high aspect ratio structure or at least one large lateral dimension structure. The method also includes generating output responsive to light from the one or more structures due to the light directed to the one or more structures. In addition, the method includes determining one or more characteristics of the one or more structures using the output.

    Abstract translation: 提供了用于高纵横比和大横向尺寸结构的各种计量系统和方法。 一种方法包括将光引导到在晶片上形成的一个或多个结构。 该光包括紫外光，可见光和红外光。 一个或多个结构包括至少一个高纵横比结构或至少一个大的横向尺寸结构。 该方法还包括响应于来自一个或多个结构的光而产生输出，这是由于指向一个或多个结构的光。 另外，该方法包括使用该输出确定一个或多个结构的一个或多个特性。

    Optical metrology of periodic targets in presence of multiple diffraction orders
    8.
    发明授权
    Optical metrology of periodic targets in presence of multiple diffraction orders 有权
    存在多个衍射级的周期性目标的光学计量学

    公开(公告)号：US09243886B1

    公开(公告)日：2016-01-26

    申请号：US13924204

    申请日：2013-06-21

    Applicant: KLA-Tencor Corporation

    Inventor： Alexander Kuznetsov ,  Kevin Peterlinz ,  Andrei Shchegrov

    IPC: G01B9/02 ,  G01N21/47 ,  G01N21/956

    CPC classification number: G01N21/956 ,  G01B2210/56 ,  G01N21/4785 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/95623 ,  G03F7/70625 ,  H01L22/12

    Abstract: One or more non-zero diffraction orders are selected, and these selected one or more zero or non-zero diffraction orders are selected for eliminating or obtaining corresponding zero or non-zero diffraction order terms or interference term from measurements from a periodic target using an optical metrology tool. The periodic target has a pitch, and the measurements contain a zero diffraction order and one or more non-zero diffraction order terms. Using the optical metrology tool, an incident beam is directed to positions on the target, and the measurements are obtained from the target in response to the incident beam. The measurements are processed to eliminate or obtain each zero or non-zero diffraction order term or interference term associated with each selected zero or non-zero diffraction order, resulting in a processed metrology signal. The positions are shifted from each other so as to cause the zero or non-zero diffraction order term or interference term corresponding to each selected zero or non-zero diffraction order to be eliminated or obtained.

    Abstract translation: 选择一个或多个非零衍射级，并且选择这些选择的一个或多个零或非零衍射级，以从消除或获得来自周期性靶的测量的相应的零或非零衍射级项或干扰项使用 光学计量工具。 周期性目标具有间距，并且测量包含零衍射级和一个或多个非零衍射级项。 使用光学测量工具，入射光束被引导到目标上的位置，并且响应于入射光束从目标获得测量值。 处理测量以消除或获得与每个选定的零或非零衍射级相关联的每个零或非零衍射级项或干涉项，导致处理的度量信号。 这些位置彼此偏移，以便消除或获得与零或非零衍射级相对应的零或非零衍射级项或干涉项。

    MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND METHODS
    10.
    发明申请
    MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND METHODS 有权
    多个角度的半导体计量系统和方法

    公开(公告)号：US20150285735A1

    公开(公告)日：2015-10-08

    申请号：US14745047

    申请日：2015-06-19

    Applicant: KLA-Tencor Corporation

    Inventor： David Y. Wang ,  Klaus Flock ,  Lawrence Rotter ,  Shankar Krishnan ,  Johannes D. de Veer ,  Catalin Filip ,  Gregory Brady ,  Muzammil Arain ,  Andrei Shchegrov

    IPC: G01N21/21 ,  G01N21/95

    CPC classification number: G01N21/211 ,  G01B2210/56 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/214 ,  G01N2021/8848 ,  G01N2201/06113 ,  G01N2201/0636

    Abstract: An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.

    Abstract translation: 一种装置包括（i）用于提供在从深紫外波长到红外波长的范围内可选择的多个波长的照明光束的明亮光源，（ii）照明光学器件，用于将照明光束以可选择的角度集合 （AOI）或方位角（AZ）和极化状态以提供光谱椭偏仪，其中照明光学器件包括用于控制每个可选AOI / AZ组上样品上的照明光束的光斑尺寸的变迹器，（iii ）收集光学器件，用于响应于在每个可选择的AOI / AZ集合处的照明光束和朝向基于输出光束产生输出信号或图像的检测器的偏振状态来引导来自样品的输出光束，以及（v） 控制器，用于基于输出信号或图像来表征样本的特征。

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