公开(公告)号：US09156068B2

公开(公告)日：2015-10-13

申请号：US14482510

申请日：2014-09-10

Applicant: KLA-Tencor Corporation ,  Sandia Corporation

Inventor： Leonard E. Klebanoff ,  Gildardo R. Delgado ,  Jeromy T. Hollenshead ,  Karl R. Umstadter ,  Elena Starodub ,  Guorong V. Zhuang

IPC: H01J49/14 ,  H01J49/24 ,  B08B7/00 ,  G03F7/20

CPC classification number: B08B7/0057 ,  G03F1/84 ,  G03F7/70925

Abstract: An optical instrument, including a chamber, an object exposed to an interior of the chamber, a source of low-pressure gas, the gas comprising at least one of low-pressure molecular hydrogen gas, low-pressure molecular oxygen and a low-pressure noble gas, the source of low pressure gas being fluidly coupled to the chamber, a low voltage source electrically coupled between the object and a remaining portion of the instrument that is exposed to the interior of the chamber so as to maintain the object at a low voltage relative to the remaining portion, and an EUV/VUV light source adapted to direct EUV/VUV light through the low pressure gas in the chamber onto the object. In such a system, when the EUV/VUV light source is activated ions of the low-pressure gas are formed and directed to the object. The ions may be ions of Hydrogen, Oxygen or a noble gas.

Abstract translation: 一种光学仪器，包括室，暴露于室内的物体，低压气体源，气体包括低压分子氢气，低压分子氧和低压中的至少一种 惰性气体，低压气体源流体耦合到腔室，低压源电耦合在物体与仪器的剩余部分之间，暴露于腔室的内部，以将物体保持在低位 相对于其余部分的电压以及EUV / VUV光源，其适于将EUV / VUV光通过室内的低压气体引导到物体上。 在这种系统中，当EUV / VUV光源被激活时，低压气体的离子被形成并被引导到物体。 离子可以是氢，氧或惰性气体的离子。

公开(公告)号：US09155180B1

公开(公告)日：2015-10-06

申请号：US13647826

申请日：2012-10-09

Applicant: KLA-Tencor Corporation

Inventor： Karl R. Umstadter

IPC: H05H1/00 ,  H01J27/08 ,  G03F7/20 ,  H01J17/30

CPC classification number: H05H1/00 ,  G03F7/70916 ,  H01J17/30 ,  H01J27/08 ,  H05G2/003

Abstract: The disclosure is directed to a system and method of fueling and mitigating debris for an illumination source. An illumination system may include a plasma-based illumination source. The illumination system may provide illumination along an illumination path emanating from an illumination origin of the illumination source. A gas jet nozzle may be disposed at a selected distance from the illumination origin or proximate to the illumination origin. The gas jet nozzle may be configured to provide fuel gas to fuel the plasma-based illumination source. The gas jet nozzle may be further configured to provide fuel gas in a selected direction substantially opposite to a direction of illumination emanating from the illumination origin to remove at least a portion of debris from the illumination path.

Abstract translation: 本公开涉及一种用于加注和减轻照明源的碎屑的系统和方法。 照明系统可以包括基于等离子体的照明源。 照明系统可以沿着从照明源的照明原点发出的照明路径提供照明。 气体喷嘴可以设置在距照明原点或接近照明原点的选定距离处。 气体喷嘴可以被配置为提供燃料气体来燃料基于等离子体的照明源。 气体喷嘴可以进一步构造成在与从照明原点发出的照明方向基本相反的选定方向上提供燃料气体，以从照明路径去除至少一部分碎片。

公开(公告)号：US20140374619A1

公开(公告)日：2014-12-25

申请号：US14482510

申请日：2014-09-10

Applicant: KLA-Tencor Corporation ,  Sandia Corporation

Inventor： Leonard E. Klebanoff ,  Gildardo R. Delgado ,  Jeromy T. Hollenshead ,  Karl R. Umstadter ,  Elena Starodub ,  Guorong V. Zhuang

IPC: B08B7/00

CPC classification number: B08B7/0057 ,  G03F1/84 ,  G03F7/70925

Abstract: An optical instrument, including a chamber, an object exposed to an interior of the chamber, a source of low-pressure gas, the gas comprising at least one of low-pressure molecular hydrogen gas, low-pressure molecular oxygen and a low-pressure noble gas, the source of low pressure gas being fluidly coupled to the chamber, a low voltage source electrically coupled between the object and a remaining portion of the instrument that is exposed to the interior of the chamber so as to maintain the object at a low voltage relative to the remaining portion, and an EUV/VUV light source adapted to direct EUV/VUV light through the low pressure gas in the chamber onto the object. In such a system, when the EUV/VUV light source is activated ions of the low-pressure gas are formed and directed to the object. The ions may be ions of Hydrogen, Oxygen or a noble gas.

Abstract translation: 一种光学仪器，包括室，暴露于室内的物体，低压气体源，气体包括低压分子氢气，低压分子氧和低压中的至少一种 惰性气体，低压气体源流体耦合到腔室，低压源电耦合在物体与仪器的剩余部分之间，暴露于腔室的内部，以将物体保持在低位 相对于其余部分的电压以及EUV / VUV光源，其适于将EUV / VUV光通过室内的低压气体引导到物体上。 在这种系统中，当EUV / VUV光源被激活时，低压气体的离子被形成并被引导到物体。 离子可以是氢，氧或惰性气体的离子。

公开(公告)号：US20140166051A1

公开(公告)日：2014-06-19

申请号：US14105986

申请日：2013-12-13

Applicant: KLA-Tencor Corporation

Inventor： Karl R. Umstadter ,  Michael P. Kanouff ,  Rudy Garcia ,  Mike Romero

IPC: B05B1/00

CPC classification number: G03F7/70916 ,  G03F7/70033 ,  H01J37/32449 ,  H05G2/001

Abstract: An assembly, including: a nozzle including a first chamber with a first orifice arranged to receive a stream of gas; a second chamber with a second orifice to emit the stream; a throat connecting the nozzle chambers; and a collector including: top and bottom walls with first and second openings; a third chamber bounded by the top and bottom walls and including a third opening connected to the second orifice to receive the stream; and a fourth opening. The first chamber tapers from the first orifice to the throat. The second chamber expands in size from the throat to the second orifice. The third chamber expands in size from the third opening to the fourth opening. The collector is arranged to: entrain, in the stream, debris entering the third chamber through first or second opening; and emit the stream, with the entrained debris, from the fourth opening.

Abstract translation: 一种组件，包括：喷嘴，其包括具有布置成接收气流的第一孔的第一室; 具有第二孔的第二室，用于排出所述流; 连接喷嘴室的喉部; 和收集器，包括：具有第一和第二开口的顶壁和底壁; 第三室，其由顶壁和底壁限定，并且包括连接到第二孔以接收流的第三开口; 和第四个开口。 第一个室从第一个孔到喉咙逐渐变细。 第二腔室的尺寸从喉部扩大到第二孔口。 第三室从第三个开口扩大到第四个开口。 收集器布置成：在流中夹带通过第一或第二开口进入第三室的碎屑; 并从第四个开口排出带有夹带的碎屑的流。

公开(公告)号：US20140158914A1

公开(公告)日：2014-06-12

申请号：US14101065

申请日：2013-12-09

Applicant: Sandia Corporation ,  KLA-Tencor Corporation

Inventor： Leonard E. Klebanoff ,  Jeromy T. Hollenshead ,  Gildardo Delgado ,  Elena Starodub ,  Karl R. Umstadter ,  Guorong V. Zhuang ,  Garry Rose

IPC: G02B27/00 ,  G01N23/00

CPC classification number: G02B1/18 ,  G02B27/0006

Abstract: An optical component arranged for use in a low pressure environment including: a surface arranged to receive extreme ultra-violet (EUV) light and a coating, on the surface, arranged to block at least one contaminant in the low pressure environment from binding to the surface. A method of mitigating contamination of a surface of an optical component, including: inserting the optical component into a chamber for a semi-conductor inspection system, controlling a temperature and a pressure within the chamber, introducing a blocking material, in a gaseous state, into the chamber, coating a surface of the optical component with the blocking material, and preventing, using the coating, a contaminant in the chamber from binding to the optical component.

Abstract translation: 布置成用于低压环境的光学部件，包括：布置成接收极紫外（EUV）光的表面和表面上的涂层，其布置成阻挡低压环境中的至少一种污染物结合到 表面。 一种减轻光学部件的表面污染的方法，包括：将光学部件插入用于半导体检查系统的室中，控制室内的温度和压力，以气态引入阻塞材料， 进入室中，用阻挡材料涂覆光学部件的表面，并且防止使用涂层将室内的污染物结合到光学部件。