公开(公告)号：US20180226219A1

公开(公告)日：2018-08-09

申请号：US15612862

申请日：2017-06-02

Applicant: KLA-Tencor Corporation

Inventor： Robert Haynes ,  Aron Welk ,  Tomas Plettner ,  John Gerling ,  Mehran Nasser Ghodsi

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/285

CPC classification number: H01J37/1471 ,  H01J37/28 ,  H01J37/285 ,  H01J2237/28

Abstract: A multi-column scanning electron microscopy (SEM) system includes a column assembly, where the column assembly includes a first substrate array assembly and at least a second substrate array assembly. The system also includes a source assembly, the source assembly including two or more illumination sources configured to generate two or more electron beams and two or more sets of a plurality of positioners configured to adjust a position of a particular illumination source of the two or more illumination sources in a plurality of directions. The system also includes a stage configured to secure a sample, where the column assembly directs at least a portion of the two or more electron beams onto a portion of the sample.