-
公开(公告)号：US10354832B2
公开(公告)日：2019-07-16
申请号：US15616749
申请日：2017-06-07
Applicant: KLA-Tencor Corporation
Inventor： Robert Haynes , John Gerling , Aron Welk , Christopher Sears , Felipe Fuks , Mehran Nasser-Ghodsi , Tomas Plettner
IPC: H01J37/147 , H01J37/14 , H01J37/285 , H01J37/18
Abstract: A multi-column scanning electron microscopy (SEM) system is disclosed. The SEM system includes a source assembly. The source assembly includes two or more electron beam sources configured to generate a plurality of electron beams. The source assembly also includes two or more sets of positioners configured to actuate the two or more electron beam sources. The SEM system also includes a column assembly. The column assembly includes a plurality of substrate arrays. The column assembly also includes two or more electron-optical columns formed by a set of column electron-optical elements bonded to the plurality of substrate arrays. The SEM system also includes a stage configured to secure a sample that at least one of emits or scatters electrons in response to the plurality of electron beams directed by the two or more electron-optical columns to the sample.
-
2.发明授权公开(公告)号：US10777377B2
公开(公告)日：2020-09-15
申请号：US15879120
申请日：2018-01-24
Applicant: KLA-Tencor Corporation
Inventor： Robert Haynes , Frank Chilese , Moshe E. Preil
Abstract: A multi-column assembly for a scanning electron microscopy (SEM) system is disclosed. The multi-column assembly includes a plurality of electron-optical columns arranged in an array defined by one or more spacings. Each electron-optical column includes one or more electron-optical elements. The plurality of electron-optical columns is configured to characterize one or more field areas on a surface of a sample secured on a stage. The number of electron-optical columns in the plurality of electron-optical columns equals an integer number of inspection areas in a field area of the one or more field areas. The one or more spacings of the plurality of electron-optical columns correspond to one or more dimensions of the inspection areas.
-
公开(公告)号：US10438769B1
公开(公告)日：2019-10-08
申请号：US15969555
申请日：2018-05-02
Applicant: KLA-Tencor Corporation
Inventor： Alex Lipkind , Alon Rosenthal , Frank Chilese , John Gerling , Lawrence Muray , Robert Haynes
IPC: H01J37/28 , G21K5/04 , H01J37/147 , H01J37/153 , H01J37/244
Abstract: A scanning electron microscopy (SEM) system includes a plurality of electron beam sources configured to generate a primary electron beam. The SEM system includes an electron-optical column array with a plurality of electron-optical columns. An electron-optical column includes a plurality of electron-optical elements. The plurality of electron-optical elements includes a deflector layer configured to be driven via a common controller shared by at least some of the plurality of electron-optical columns and includes a trim deflector layer configured to be driven by an individual controller. The plurality of electron-optical elements is arranged to form an electron beam channel configured to direct the primary electron beam to a sample secured on a stage, which emits an electron beam in response to the primary electron beam. The electron-optical column includes an electron detector. The electron beam channel is configured to direct the electron beam to the electron detector.
-
公开(公告)号：US20180226219A1
公开(公告)日：2018-08-09
申请号：US15612862
申请日：2017-06-02
Applicant: KLA-Tencor Corporation
Inventor： Robert Haynes , Aron Welk , Tomas Plettner , John Gerling , Mehran Nasser Ghodsi
IPC: H01J37/147 , H01J37/28 , H01J37/285
CPC classification number: H01J37/1471 , H01J37/28 , H01J37/285 , H01J2237/28
Abstract: A multi-column scanning electron microscopy (SEM) system includes a column assembly, where the column assembly includes a first substrate array assembly and at least a second substrate array assembly. The system also includes a source assembly, the source assembly including two or more illumination sources configured to generate two or more electron beams and two or more sets of a plurality of positioners configured to adjust a position of a particular illumination source of the two or more illumination sources in a plurality of directions. The system also includes a stage configured to secure a sample, where the column assembly directs at least a portion of the two or more electron beams onto a portion of the sample.
-
5.发明申请APPARATUS AND METHOD FOR OPTICAL INSPECTION, MAGNETIC FIELD AND HEIGHT MAPPING 有权光学检测，磁场和高度映射的装置和方法公开(公告)号：US20140218503A1
公开(公告)日：2014-08-07
申请号：US14095918
申请日：2013-12-03
Applicant: KLA-Tencor Corporation
Inventor： John Gerling , Edward Wagner , Mehran Nasser-Ghodsi , Garrett Pickard , Tomas Plettner , Robert Haynes , Christopher Sears
CPC classification number: G01N21/9501 , G01B7/02 , G01B7/102 , G01B7/28 , G01B11/0608 , G01B11/24 , G01B21/02 , G01N21/956 , G01N27/82 , H04N5/2251 , H04N7/18
Abstract: A metrology system is configured to provide visual inspection of a workpiece, three-dimensional magnetic field map, and height measurement. A stage is configured to bring points of interest at the workpiece under the desired tool for measurement. The optical field, magnetic field, and height information can be used independently or together in order to correlate defects in the manufacturing process of the workpiece. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
Abstract translation: 测量系统被配置为提供工件的目视检查，三维磁场图和高度测量。 一个阶段被配置成将所需的工具上的兴趣点放在所需的测量工具下。 可以独立地或一起使用光场，磁场和高度信息，以便将工件的制造过程中的缺陷相关联。 提供该摘要以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开内容的主题。 提交它的理解是，它不会用于解释或限制权利要求的范围或含义。
-
Patent Agency Ranking
6.发明申请公开(公告)号：US20180233318A1
公开(公告)日：2018-08-16
申请号：US15879120
申请日：2018-01-24
Applicant: KLA-Tencor Corporation
Inventor： Robert Haynes , Frank Chilese , Moshe E. Preil
Abstract: A multi-column assembly for a scanning electron microscopy (SEM) system is disclosed. The multi-column assembly includes a plurality of electron-optical columns arranged in an array defined by one or more spacings. Each electron-optical column includes one or more electron-optical elements. The plurality of electron-optical columns is configured to characterize one or more field areas on a surface of a sample secured on a stage. The number of electron-optical columns in the plurality of electron-optical columns equals an integer number of inspection areas in a field area of the one or more field areas. The one or more spacings of the plurality of electron-optical columns correspond to one or more dimensions of the inspection areas.
-
公开(公告)号：US20140318855A1
公开(公告)日：2014-10-30
申请号：US14256828
申请日：2014-04-18
Applicant: KLA-Tencor Corporation
Inventor： Robert Haynes , Mehran Nasser-Ghodsi
CPC classification number: H05K3/4046 , H05K1/147 , H05K3/365 , H05K3/4061 , H05K3/4629 , H05K2201/10265 , H05K2201/10378 , H05K2201/10545 , Y10T29/49155 , Y10T29/49165
Abstract: Embodiments of this invention use multi-layer ceramic substrate with one or more hermetically sealed and filled metal vias with smaller pitch and size in combination with flexible printed circuit cables and interposers to provide a custom electric feed through for vacuum to atmosphere chambers. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
Abstract translation: 本发明的实施例使用具有一个或多个具有较小节距和尺寸的密封和填充的金属通孔的多层陶瓷基板，与柔性印刷电路电缆和插入件组合，以提供用于真空到大气室的定制电加料。 提供该摘要以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开内容的主题。 提交它的理解是，它不会用于解释或限制权利要求的范围或含义。
-
公开(公告)号：US20180358200A1
公开(公告)日：2018-12-13
申请号：US15616749
申请日：2017-06-07
Applicant: KLA-Tencor Corporation
Inventor： Robert Haynes , John Gerling , Aron Welk , Christopher Sears , Felipe Fuks , Mehran Nasser-Ghodsi , Tomas Plettner
IPC: H01J37/147 , H01J37/14 , H01J37/285 , H01J37/18
CPC classification number: H01J37/1474 , H01J37/14 , H01J37/1471 , H01J37/18 , H01J37/285
Abstract: A multi-column scanning electron microscopy (SEM) system is disclosed. The SEM system includes a source assembly. The source assembly includes two or more electron beam sources configured to generate a plurality of electron beams. The source assembly also includes two or more sets of positioners configured to actuate the two or more electron beam sources. The SEM system also includes a column assembly. The column assembly includes a plurality of substrate arrays. The column assembly also includes two or more electron-optical columns formed by a set of column electron-optical elements bonded to the plurality of substrate arrays. The SEM system also includes a stage configured to secure a sample that at least one of emits or scatters electrons in response to the plurality of electron beams directed by the two or more electron-optical columns to the sample.
-
公开(公告)号：US09591770B2
公开(公告)日：2017-03-07
申请号：US14256828
申请日：2014-04-18
Applicant: KLA-Tencor Corporation
Inventor： Robert Haynes , Mehran Nasser-Ghodsi
CPC classification number: H05K3/4046 , H05K1/147 , H05K3/365 , H05K3/4061 , H05K3/4629 , H05K2201/10265 , H05K2201/10378 , H05K2201/10545 , Y10T29/49155 , Y10T29/49165
Abstract: Embodiments of this invention use multi-layer ceramic substrate with one or more hermetically sealed and filled metal vias with smaller pitch and size in combination with flexible printed circuit cables and interposers to provide a custom electric feed through for vacuum to atmosphere chambers. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
Abstract translation: 本发明的实施例使用具有一个或多个具有较小节距和尺寸的密封和填充的金属通孔的多层陶瓷基板，与柔性印刷电路电缆和插入件组合，以提供用于真空到大气室的定制电加料。 提供该摘要以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开内容的主题。 提交它的理解是，它不会用于解释或限制权利要求的范围或含义。
-
10.发明授权Apparatus and method for optical inspection, magnetic field and height mapping 有权用于光学检测，磁场和高度测绘的装置和方法公开(公告)号：US09513230B2
公开(公告)日：2016-12-06
申请号：US14095918
申请日：2013-12-03
Applicant: KLA-Tencor Corporation
Inventor： John Gerling , Edward Wagner , Mehran Nasser-Ghodsi , Garrett Pickard , Tomas Plettner , Robert Haynes , Christopher Sears
IPC: G01N27/82 , G01N21/95 , G01B7/28 , G01B11/24 , G01N21/956 , G01B7/06 , G01B11/06 , G01B7/02 , G01B21/02 , H04N5/225 , H04N7/18
CPC classification number: G01N21/9501 , G01B7/02 , G01B7/102 , G01B7/28 , G01B11/0608 , G01B11/24 , G01B21/02 , G01N21/956 , G01N27/82 , H04N5/2251 , H04N7/18
Abstract: A metrology system is configured to provide visual inspection of a workpiece, three-dimensional magnetic field map, and height measurement. A stage is configured to bring points of interest at the workpiece under the desired tool for measurement. The optical field, magnetic field, and height information can be used independently or together in order to correlate defects in the manufacturing process of the workpiece. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
Abstract translation: 测量系统被配置为提供工件的目视检查，三维磁场图和高度测量。 一个阶段被配置成将所需的工具上的兴趣点放在所需的测量工具下。 可以独立地或一起使用光场，磁场和高度信息，以便将工件的制造过程中的缺陷相关联。 提供该摘要以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开内容的主题。 提交它的理解是，它不会用于解释或限制权利要求的范围或含义。
-
-
-
-
-
-
-
-
-
Search Results
10
records
(took 0.015 seconds)
