公开(公告)号：US10354832B2

公开(公告)日：2019-07-16

申请号：US15616749

申请日：2017-06-07

Applicant: KLA-Tencor Corporation

Inventor： Robert Haynes ,  John Gerling ,  Aron Welk ,  Christopher Sears ,  Felipe Fuks ,  Mehran Nasser-Ghodsi ,  Tomas Plettner

IPC: H01J37/147 ,  H01J37/14 ,  H01J37/285 ,  H01J37/18

Abstract: A multi-column scanning electron microscopy (SEM) system is disclosed. The SEM system includes a source assembly. The source assembly includes two or more electron beam sources configured to generate a plurality of electron beams. The source assembly also includes two or more sets of positioners configured to actuate the two or more electron beam sources. The SEM system also includes a column assembly. The column assembly includes a plurality of substrate arrays. The column assembly also includes two or more electron-optical columns formed by a set of column electron-optical elements bonded to the plurality of substrate arrays. The SEM system also includes a stage configured to secure a sample that at least one of emits or scatters electrons in response to the plurality of electron beams directed by the two or more electron-optical columns to the sample.

公开(公告)号：US10211021B2

公开(公告)日：2019-02-19

申请号：US15429071

申请日：2017-02-09

Applicant: KLA-Tencor Corporation

Inventor： Tomas Plettner ,  John David Gerling ,  Mohammed Tahmassebpur

IPC: H01J29/68

Abstract: A permanent-magnet particle beam apparatus and method incorporating a non-magnetic portion for tunability are provided. The permanent-magnet particle beam apparatus includes a particle beam emitter that emits a charged particle beam, and includes a set of permanent magnets forming a magnetic field for controlling condensing of the charged particle beam. The permanent-magnet particle beam apparatus further includes a non-magnetic electrical conductor component situated with the set of permanent magnets to control a kinetic energy of the charged particle beam moving through the magnetic field.

公开(公告)号：US20180226219A1

公开(公告)日：2018-08-09

申请号：US15612862

申请日：2017-06-02

Applicant: KLA-Tencor Corporation

Inventor： Robert Haynes ,  Aron Welk ,  Tomas Plettner ,  John Gerling ,  Mehran Nasser Ghodsi

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/285

CPC classification number: H01J37/1471 ,  H01J37/28 ,  H01J37/285 ,  H01J2237/28

Abstract: A multi-column scanning electron microscopy (SEM) system includes a column assembly, where the column assembly includes a first substrate array assembly and at least a second substrate array assembly. The system also includes a source assembly, the source assembly including two or more illumination sources configured to generate two or more electron beams and two or more sets of a plurality of positioners configured to adjust a position of a particular illumination source of the two or more illumination sources in a plurality of directions. The system also includes a stage configured to secure a sample, where the column assembly directs at least a portion of the two or more electron beams onto a portion of the sample.

公开(公告)号：US20140218503A1

公开(公告)日：2014-08-07

申请号：US14095918

申请日：2013-12-03

Applicant: KLA-Tencor Corporation

Inventor： John Gerling ,  Edward Wagner ,  Mehran Nasser-Ghodsi ,  Garrett Pickard ,  Tomas Plettner ,  Robert Haynes ,  Christopher Sears

IPC: G01N21/95 ,  H04N7/18 ,  G01B21/02 ,  H04N5/225 ,  G01N27/82 ,  G01B7/02

CPC classification number: G01N21/9501 ,  G01B7/02 ,  G01B7/102 ,  G01B7/28 ,  G01B11/0608 ,  G01B11/24 ,  G01B21/02 ,  G01N21/956 ,  G01N27/82 ,  H04N5/2251 ,  H04N7/18

Abstract: A metrology system is configured to provide visual inspection of a workpiece, three-dimensional magnetic field map, and height measurement. A stage is configured to bring points of interest at the workpiece under the desired tool for measurement. The optical field, magnetic field, and height information can be used independently or together in order to correlate defects in the manufacturing process of the workpiece. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Abstract translation: 测量系统被配置为提供工件的目视检查，三维磁场图和高度测量。 一个阶段被配置成将所需的工具上的兴趣点放在所需的测量工具下。 可以独立地或一起使用光场，磁场和高度信息，以便将工件的制造过程中的缺陷相关联。 提供该摘要以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开内容的主题。 提交它的理解是，它不会用于解释或限制权利要求的范围或含义。

公开(公告)号：US20180358200A1

公开(公告)日：2018-12-13

申请号：US15616749

申请日：2017-06-07

Applicant: KLA-Tencor Corporation

Inventor： Robert Haynes ,  John Gerling ,  Aron Welk ,  Christopher Sears ,  Felipe Fuks ,  Mehran Nasser-Ghodsi ,  Tomas Plettner

IPC: H01J37/147 ,  H01J37/14 ,  H01J37/285 ,  H01J37/18

CPC classification number: H01J37/1474 ,  H01J37/14 ,  H01J37/1471 ,  H01J37/18 ,  H01J37/285

Abstract: A multi-column scanning electron microscopy (SEM) system is disclosed. The SEM system includes a source assembly. The source assembly includes two or more electron beam sources configured to generate a plurality of electron beams. The source assembly also includes two or more sets of positioners configured to actuate the two or more electron beam sources. The SEM system also includes a column assembly. The column assembly includes a plurality of substrate arrays. The column assembly also includes two or more electron-optical columns formed by a set of column electron-optical elements bonded to the plurality of substrate arrays. The SEM system also includes a stage configured to secure a sample that at least one of emits or scatters electrons in response to the plurality of electron beams directed by the two or more electron-optical columns to the sample.

公开(公告)号：US20170294286A1

公开(公告)日：2017-10-12

申请号：US15429071

申请日：2017-02-09

Applicant: KLA-Tencor Corporation

Inventor： Tomas Plettner ,  John David Gerling ,  Mohammed Tahmassebpur

IPC: H01J29/68

CPC classification number: H01J29/68 ,  H01J2229/703

Abstract: A permanent-magnet particle beam apparatus and method incorporating a non-magnetic portion for tunability are provided. The permanent-magnet particle beam apparatus includes a particle beam emitter that emits a charged particle beam, and includes a set of permanent magnets forming a magnetic field for controlling condensing of the charged particle beam. The permanent-magnet particle beam apparatus further includes a non-magnetic electrical conductor component situated with the set of permanent magnets to control a kinetic energy of the charged particle beam moving through the magnetic field.

公开(公告)号：US09513230B2

公开(公告)日：2016-12-06

申请号：US14095918

申请日：2013-12-03

Applicant: KLA-Tencor Corporation

Inventor： John Gerling ,  Edward Wagner ,  Mehran Nasser-Ghodsi ,  Garrett Pickard ,  Tomas Plettner ,  Robert Haynes ,  Christopher Sears

IPC: G01N27/82 ,  G01N21/95 ,  G01B7/28 ,  G01B11/24 ,  G01N21/956 ,  G01B7/06 ,  G01B11/06 ,  G01B7/02 ,  G01B21/02 ,  H04N5/225 ,  H04N7/18

CPC classification number: G01N21/9501 ,  G01B7/02 ,  G01B7/102 ,  G01B7/28 ,  G01B11/0608 ,  G01B11/24 ,  G01B21/02 ,  G01N21/956 ,  G01N27/82 ,  H04N5/2251 ,  H04N7/18

Abstract: A metrology system is configured to provide visual inspection of a workpiece, three-dimensional magnetic field map, and height measurement. A stage is configured to bring points of interest at the workpiece under the desired tool for measurement. The optical field, magnetic field, and height information can be used independently or together in order to correlate defects in the manufacturing process of the workpiece. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Abstract translation: 测量系统被配置为提供工件的目视检查，三维磁场图和高度测量。 一个阶段被配置成将所需的工具上的兴趣点放在所需的测量工具下。 可以独立地或一起使用光场，磁场和高度信息，以便将工件的制造过程中的缺陷相关联。 提供该摘要以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开内容的主题。 提交它的理解是，它不会用于解释或限制权利要求的范围或含义。

公开(公告)号：US20150069234A1

公开(公告)日：2015-03-12

申请号：US14476537

申请日：2014-09-03

Applicant: KLA-Tencor Corporation

Inventor： John Gerling ,  Tomas Plettner ,  Mehran Nasser-Ghodsi

IPC: H01J37/28 ,  H01J37/20 ,  H01J37/14 ,  H01J37/22

CPC classification number: H01J37/28 ,  H01J37/244 ,  H01J2237/2446 ,  H01J2237/28

Abstract: A charged particle detection device has an active portion for configured to produce a signal in response secondary charged particles emitted from a sample landing on the active portion. The active portion is shaped to accommodate an expected asymmetric pattern of the secondary charged particles at a detector. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Abstract translation: 带电粒子检测装置具有有源部分，用于配置为产生响应从活性部分上的样品着陆点发射的二次带电粒子的信号。 活性部分被成形为在检测器处适应预期的二次带电粒子的非对称图案。 提供该摘要以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开内容的主题。 提交它的理解是，它不会用于解释或限制权利要求的范围或含义。

公开(公告)号：US09418819B2

公开(公告)日：2016-08-16

申请号：US14476537

申请日：2014-09-03

Applicant: KLA-Tencor Corporation

Inventor： John Gerling ,  Tomas Plettner ,  Mehran Nasser-Ghodsi

IPC: G21K5/04 ,  H01J37/28 ,  H01J37/244

CPC classification number: H01J37/28 ,  H01J37/244 ,  H01J2237/2446 ,  H01J2237/28

Abstract: A charged particle detection device has an active portion for configured to produce a signal in response secondary charged particles emitted from a sample landing on the active portion. The active portion is shaped to accommodate an expected asymmetric pattern of the secondary charged particles at a detector. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Abstract translation: 带电粒子检测装置具有有源部分，用于配置为产生响应从活性部分上的样品着陆点发射的二次带电粒子的信号。 活性部分被成形为在检测器处适应预期的二次带电粒子的非对称图案。 提供该摘要以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开内容的主题。 提交它的理解是，它不会用于解释或限制权利要求的范围或含义。

公开(公告)号：US20150076697A1

公开(公告)日：2015-03-19

申请号：US14485574

申请日：2014-09-12

Applicant: KLA-Tencor Corporation

Inventor： Tomas Plettner ,  Mehran Nasser-Ghodsi ,  John Gerling

IPC: H01L21/768 ,  H01L23/532 ,  H01L23/522

CPC classification number: H01L21/76865 ,  H01J9/025 ,  H01L23/522 ,  H01L2221/1094 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A semiconductor device comprises a plurality of device features formed on a substrate and a plurality of dummy features formed on the substrate and across an open region between the device features. Adjacent device features are spaced apart by a distance of 100 microns or more. Each device feature includes a barrier island and a metal layer on top of the barrier island. Each dummy feature has a structure that corresponds to the structure of the barrier island. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Abstract translation: 半导体器件包括形成在衬底上的多个器件特征以及形成在衬底上并穿过器件特征之间的开放区域的多个虚拟特征。 相邻的设备特征间隔开100微米或更大的距离。 每个设备特征包括屏障岛和在屏障岛顶部的金属层。 每个虚拟特征具有对应于屏障岛的结构的结构。 提供该摘要以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开内容的主题。 提交它的理解是，它不会用于解释或限制权利要求的范围或含义。