公开(公告)号：US20180358200A1

公开(公告)日：2018-12-13

申请号：US15616749

申请日：2017-06-07

Applicant: KLA-Tencor Corporation

Inventor： Robert Haynes ,  John Gerling ,  Aron Welk ,  Christopher Sears ,  Felipe Fuks ,  Mehran Nasser-Ghodsi ,  Tomas Plettner

IPC: H01J37/147 ,  H01J37/14 ,  H01J37/285 ,  H01J37/18

CPC classification number: H01J37/1474 ,  H01J37/14 ,  H01J37/1471 ,  H01J37/18 ,  H01J37/285

Abstract: A multi-column scanning electron microscopy (SEM) system is disclosed. The SEM system includes a source assembly. The source assembly includes two or more electron beam sources configured to generate a plurality of electron beams. The source assembly also includes two or more sets of positioners configured to actuate the two or more electron beam sources. The SEM system also includes a column assembly. The column assembly includes a plurality of substrate arrays. The column assembly also includes two or more electron-optical columns formed by a set of column electron-optical elements bonded to the plurality of substrate arrays. The SEM system also includes a stage configured to secure a sample that at least one of emits or scatters electrons in response to the plurality of electron beams directed by the two or more electron-optical columns to the sample.

公开(公告)号：US10354832B2

公开(公告)日：2019-07-16

申请号：US15616749

申请日：2017-06-07

Applicant: KLA-Tencor Corporation

Inventor： Robert Haynes ,  John Gerling ,  Aron Welk ,  Christopher Sears ,  Felipe Fuks ,  Mehran Nasser-Ghodsi ,  Tomas Plettner

IPC: H01J37/147 ,  H01J37/14 ,  H01J37/285 ,  H01J37/18

Abstract: A multi-column scanning electron microscopy (SEM) system is disclosed. The SEM system includes a source assembly. The source assembly includes two or more electron beam sources configured to generate a plurality of electron beams. The source assembly also includes two or more sets of positioners configured to actuate the two or more electron beam sources. The SEM system also includes a column assembly. The column assembly includes a plurality of substrate arrays. The column assembly also includes two or more electron-optical columns formed by a set of column electron-optical elements bonded to the plurality of substrate arrays. The SEM system also includes a stage configured to secure a sample that at least one of emits or scatters electrons in response to the plurality of electron beams directed by the two or more electron-optical columns to the sample.

公开(公告)号：US20180226219A1

公开(公告)日：2018-08-09

申请号：US15612862

申请日：2017-06-02

Applicant: KLA-Tencor Corporation

Inventor： Robert Haynes ,  Aron Welk ,  Tomas Plettner ,  John Gerling ,  Mehran Nasser Ghodsi

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/285

CPC classification number: H01J37/1471 ,  H01J37/28 ,  H01J37/285 ,  H01J2237/28

Abstract: A multi-column scanning electron microscopy (SEM) system includes a column assembly, where the column assembly includes a first substrate array assembly and at least a second substrate array assembly. The system also includes a source assembly, the source assembly including two or more illumination sources configured to generate two or more electron beams and two or more sets of a plurality of positioners configured to adjust a position of a particular illumination source of the two or more illumination sources in a plurality of directions. The system also includes a stage configured to secure a sample, where the column assembly directs at least a portion of the two or more electron beams onto a portion of the sample.