公开(公告)号：US09778205B2

公开(公告)日：2017-10-03

申请号：US14664565

申请日：2015-03-20

Applicant: KLA-Tencor Corporation

Inventor： Carl E. Hess ,  Yanwei Liu ,  Yalin Xiong

IPC: G06K9/00 ,  G01J1/46 ,  G01N21/88 ,  G01N21/956 ,  G03F1/84

CPC classification number: G01N21/8851 ,  G01N21/95607 ,  G01N2021/95676 ,  G03F1/84

Abstract: Disclosed are methods and apparatus for inspecting a photolithographic reticle. An inspection tool is used to obtain a plurality of patch area images of each patch area of each die of a set of identical dies on a reticle. An integrated intensity value for each patch area image is determined. A gain is applied to the integrated intensity value for each patch area image based on a pattern sparseness metric of such patch area image and its relative value to other patch area images' pattern sparseness metric. A difference between the integrated intensity value of each patch of pairs of the dies, which each pair includes a test die and a reference die, is determined to form a difference intensity map of the reticle. The difference intensity map correlates with a feature characteristic variation that depends on feature edges of the reticle.

公开(公告)号：US20150276617A1

公开(公告)日：2015-10-01

申请号：US14664565

申请日：2015-03-20

Applicant: KLA-Tencor Corporation

Inventor： Carl E. Hess ,  Yanwei Liu ,  Yalin Xiong

IPC: G01N21/88 ,  G01J1/44 ,  G03F7/20

CPC classification number: G01N21/8851 ,  G01N21/95607 ,  G01N2021/95676 ,  G03F1/84

Abstract: Disclosed are methods and apparatus for inspecting a photolithographic reticle. An inspection tool is used to obtain a plurality of patch area images of each patch area of each die of a set of identical dies on a reticle. An integrated intensity value for each patch area image is determined. A gain is applied to the integrated intensity value for each patch area image based on a pattern sparseness metric of such patch area image and its relative value to other patch area images' pattern sparseness metric. A difference between the integrated intensity value of each patch of pairs of the dies, which each pair includes a test die and a reference die, is determined to form a difference intensity map of the reticle. The difference intensity map correlates with a feature characteristic variation that depends on feature edges of the reticle.

Abstract translation: 公开了用于检查光刻掩模版的方法和装置。 使用检查工具来获得掩模版上的一组相同模具的每个管芯的每个贴片区域的多个贴片区域图像。 确定每个贴片区域图像的积分强度值。 基于这种贴片区域图像的图案稀疏度及其与其他贴片区域图像的图案稀疏度的相对值，对每个贴片区域图像的积分强度值进行增益。 确定每对包括测试模具和参考模具的每对模具对的积分强度值之间的差异，以形成掩模版的差分强度图。 差分强度图与取决于标线的特征边缘的特征特征变化相关。

公开(公告)号：US10451563B2

公开(公告)日：2019-10-22

申请号：US15438588

申请日：2017-02-21

Applicant: KLA-Tencor Corporation

Inventor： Weston L. Sousa ,  Yalin Xiong ,  Carl E. Hess

IPC: G03F1/84 ,  G01N21/956 ,  G01N21/88 ,  G06T7/00

Abstract: Disclosed are methods and systems for inspecting photolithographic reticles. A first and second reticle that were fabricated with a same design are obtained. A first and second reticle image of the first and second reticles are also obtained. The first reticle image is compared to the second reticle image to output a difference image having a plurality of difference events corresponding to candidate defects on either the first or second reticle. An inspection report of the candidate defects is then generated.

公开(公告)号：US20180238816A1

公开(公告)日：2018-08-23

申请号：US15438588

申请日：2017-02-21

Applicant: KLA-Tencor Corporation

Inventor： Weston L. Sousa ,  Yalin Xiong ,  CarlE. E. Hess

IPC: G01N21/956 ,  G01N21/88 ,  G06T7/00 ,  G03F1/84

Abstract: Disclosed are methods and systems for inspecting photolithographic reticles. A first and second reticle that were fabricated with a same design are obtained. A first and second reticle image of the first and second reticles are also obtained. The first reticle image is compared to the second reticle image to output a difference image having a plurality of difference events corresponding to candidate defects on either the first or second reticle. An inspection report of the candidate defects is then generated.

公开(公告)号：US20170053395A1

公开(公告)日：2017-02-23

申请号：US15344788

申请日：2016-11-07

Applicant: KLA-Tencor Corporation

Inventor： Chun Guan ,  Yalin Xiong ,  Joseph M. Blecher ,  Robert A. Comstock ,  Mark J. Wihl

IPC: G06T7/00 ,  G01N21/956

CPC classification number: G06T7/0006 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/95676 ,  G06T2207/30148

Abstract: A reticle that is within specifications is inspected to generate baseline candidate defects and their location and size. After using the reticle in photolithography, the reticle is inspected to generate current candidate defects and their location and size. An inspection report of filtered candidate defects and their images is generated so that these candidate defects include a first subset of the current candidate defects and their images and exclude a second subset of the current candidate defects and their images. Each of the first subset of candidate defects has a location and size that fails to match any baseline candidate defect's location and size, and each of the excluded second subset of candidate defects has a location and size that matches a baseline candidate defect's location and size.

Abstract translation: 检查规格内的掩模版，以生成基线候选缺陷及其位置和大小。 在光刻中使用掩模版之后，检查掩模版以产生当前候选缺陷及其位置和尺寸。 生成滤波候选缺陷及其图像的检查报告，使得这些候选缺陷包括当前候选缺陷及其图像的第一子集，并排除当前候选缺陷及其图像的第二子集。 候选缺陷的第一子集中的每一个具有不匹配任何基线候选缺陷的位置和大小的位置和大小，并且排除的候选缺陷的第二子集中的每一个具有与基线候选缺陷的位置和大小相匹配的位置和大小。

公开(公告)号：US20150029498A1

公开(公告)日：2015-01-29

申请号：US14278277

申请日：2014-05-15

Applicant: KLA-Tencor Corporation

Inventor： Chun Guan ,  Yalin Xiong ,  Joseph M. Blecher ,  Robert A. Comstock ,  Mark J. Wihl

IPC: G01N21/956

CPC classification number: G06T7/0006 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/95676 ,  G06T2207/30148

Abstract: A reticle that is within specifications is inspected so as to generate a baseline event indicating a location and a size value for each unusual reticle feature. After using the reticle in photolithography, the reticle is inspected so as to generate a current event indicating a location and a size value for each unusual reticle feature. An inspection report of candidate defects and their images is generated so that these candidate defects include a first subset of the current events and their corresponding candidate defect images and exclude a second subset of the current events and their corresponding excluded images. Each of the first included events has a location and size value that fails to match any baseline event's location and size value, and each of the excluded second events has a location and size value that matches a baseline event's location and size value.

Abstract translation: 检查在规格内的掩模版，以便生成指示每个异常掩模版特征的位置和尺寸值的基线事件。 在光刻中使用掩模版之后，检查掩模版以产生指示每个异常掩模版特征的位置和尺寸值的电流事件。 生成候选缺陷及其图像的检查报告，使得这些候选缺陷包括当前事件的第一子集及其对应的候选缺陷图像，并排除当前事件的第二子集及其对应的排除图像。 每个第一个包含的事件都有一个位置和大小值，无法匹配任何基线事件的位置和大小值，并且每个排除的第二个事件具有与基准事件的位置和大小值相匹配的位置和大小值。

公开(公告)号：US10539512B2

公开(公告)日：2020-01-21

申请号：US15707791

申请日：2017-09-18

Applicant: KLA-Tencor Corporation

Inventor： Abdurrahman Sezginer ,  Patrick LoPresti ,  Joe Blecher ,  Rui-fang Shi ,  Yalin Xiong ,  John Fielden

IPC: G06K9/62 ,  G01N21/88 ,  G01N21/958 ,  G06T7/00

Abstract: Block-to-block reticle inspection includes acquiring a swath image of a portion of a reticle with a reticle inspection sub-system, identifying a first occurrence of a block in the swatch image and at least a second occurrence of the block in the swath image substantially similar to the first occurrence of the block and determining at least one of a location, one or more geometrical characteristics of the block and a spatial offset between the first occurrence of the block and the at least a second occurrence of the block.

公开(公告)号：US20180342051A1

公开(公告)日：2018-11-29

申请号：US15971536

申请日：2018-05-04

Applicant: KLA-TENCOR CORPORATION

Inventor： Abdurrahman Sezginer ,  Xiaochun Li ,  Pavan Kumar ,  Junqing Huang ,  Lisheng Gao ,  Grace H. Chen ,  Yalin Xiong ,  Hawren Fang

IPC: G06T7/00

Abstract: Systems and methods increase the signal to noise ratio of optical inspection of wafers to obtain higher inspection sensitivity. The computed reference image can minimize a norm of the difference of the test image and the computed reference image. A difference image between the test image and a computed reference image is determined. The computed reference image includes a linear combination of a second set of images.

公开(公告)号：US20160093040A1

公开(公告)日：2016-03-31

申请号：US14890880

申请日：2014-05-14

Applicant: KLA-TENCOR CORPORATION

Inventor： Weston L. Sousa ,  Yalin Xiong ,  Rui-Fang Shi

IPC: G06T7/00 ,  G01N21/88 ,  G03F1/84

CPC classification number: G01N21/8851 ,  G01N21/94 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/558 ,  G01N2021/8867 ,  G01N2021/95676 ,  G01N2201/12 ,  G03F1/84 ,  G06T7/0004 ,  G06T7/001 ,  G06T7/10 ,  G06T7/136 ,  G06T2207/30148

Abstract: Methods and systems for integrated multi-pass reticle inspection are provided. One method for inspecting a reticle includes acquiring at least first, second, and third images for the reticle. The first image is a substantially high resolution image of light transmitted by the reticle. The second image is a substantially high resolution image of light reflected from the reticle. The third image is an image of light transmitted by the reticle that is acquired with a substantially low numerical aperture. The method also includes detecting defects on the reticle using at least the first, second, and third images for the reticle in combination.

Abstract translation: 提供了综合多通道掩模检测的方法和系统。 用于检查掩模版的一种方法包括获取用于掩模版的至少第一，第二和第三图像。 第一个图像是由光罩传输的光的基本上高分辨率的图像。 第二个图像是从掩模版反射的光的基本上高分辨率的图像。 第三图像是由具有基本上低的数值孔径获得的掩模版传输的光的图像。 该方法还包括组合使用至少第一，第二和第三图像来检测掩模版上的缺陷。

公开(公告)号：US20150078650A1

公开(公告)日：2015-03-19

申请号：US14466688

申请日：2014-08-22

Applicant: KLA-Tencor Corporation

Inventor： Abdurrahman Sezginer ,  Patrick LoPresti ,  Joe Blecher ,  Rui-fang Shi ,  Yalin Xiong ,  John Fielden

IPC: G01N21/88 ,  G06T7/00 ,  G01N21/958

CPC classification number: G01N21/8851 ,  G01N21/8806 ,  G01N21/958 ,  G01N2021/8887 ,  G01N2201/125 ,  G06T7/001 ,  G06T2207/20224 ,  G06T2207/30148

Abstract: Block-to-block reticle inspection includes acquiring a swath image of a portion of a reticle with a reticle inspection sub-system, identifying a first occurrence of a block in the swatch image and at least a second occurrence of the block in the swath image substantially similar to the first occurrence of the block and determining at least one of a location, one or more geometrical characteristics of the block and a spatial offset between the first occurrence of the block and the at least a second occurrence of the block.

Abstract translation: 块对块掩模版检查包括用掩模版检查子系统获取掩模版的一部分的条带图像，识别样本图像中的块的第一次出现以及条纹图像中的块的至少第二次出现 基本上类似于块的第一次出现并且确定块的位置，一个或多个几何特征和块的第一次出现与块的至少第二次出现之间的空间偏移中的至少一个。