公开(公告)号：US11812937B2

公开(公告)日：2023-11-14

申请号：US16309948

申请日：2017-06-01

Applicant: KONINKLIJKE PHILIPS N.V.

Inventor： Joost Hubert Maas ,  Emiel Peeters ,  Sima Asvadi

IPC: A61B10/00 ,  A61B5/00 ,  G06T7/00 ,  A61B5/103 ,  G06V40/16 ,  G06V40/10 ,  A61B5/01

CPC classification number: A61B10/0012 ,  A61B5/0013 ,  A61B5/01 ,  A61B5/103 ,  G06T7/0014 ,  G06V40/15 ,  G06V40/172 ,  A61B2010/0019 ,  G06V40/165

Abstract: An apparatus and method for predicting a fertility window include an image capture device and a processor. The fertility window includes a period of increased fecundability for a woman based on optical monitoring of facial features. The image capture device is configured to record images including facial features of a subject. The processor is configured to receive data corresponding to the recorded plural images; determine from the data changes in the facial features; and predict a fertility window based on the determination.

公开(公告)号：US20150027980A1

公开(公告)日：2015-01-29

申请号：US14385398

申请日：2013-03-14

Applicant: KONINKLIJKE PHILIPS N.V.

Inventor： Pieter Jan Van Der Zaag ,  Emiel Peeters ,  Roelof Koole ,  Falco Cornelius Marinus Jacobus Maria Van Delft

IPC: G01N33/487

CPC classification number: G01N33/48721 ,  B81C1/00087 ,  B81C2201/0149 ,  B82Y30/00 ,  G03F7/0002

Abstract: The invention relates to a method for manufacturing an apparatus for the processing of single molecules. According to this method, a self-assembling resist (155) is deposited on a processing layer (110, PL) and allowed to self-assemble into a pattern of two phases (155a, 155b). One of these phases (155a) is then selectively removed, and at least one aperture is generated in the processing layer (110, PL) through the mask of the remaining resist (155b). Thus apertures of small size can readily be produced that allow for the processing of single molecules (M), for example in DNA sequencing.

Abstract translation: 本发明涉及一种用于制造用于处理单分子的装置的方法。 根据该方法，将自组装抗蚀剂（155）沉积在处理层（110，PL）上并允许自组装成两相（155a，155b）的图案。 然后选择性地去除这些相（155a）中的一个，并且通过剩余的抗蚀剂（155b）的掩模在处理层（110，PL）中产生至少一个孔。 因此，容易产生允许单分子（M）加工的小尺寸孔，例如在DNA测序中。

公开(公告)号：US10690663B2

公开(公告)日：2020-06-23

申请号：US15560301

申请日：2016-03-25

Applicant: KONINKLIJKE PHILIPS N.V.

Inventor： Ron Martinus Laurentius Van Lieshout ,  Emiel Peeters

IPC: G01N33/553 ,  G01N33/543 ,  G01N33/53

Abstract: The invention relates to a processing device (110) and a method for manufacturing such a device. In a preferred embodiment, a mixture of magnetic particles (MP), a matrix material, and a volatile carrier is deposited onto binding sites (112) of a reaction surface (113). The deposited mixture is then dried while the magnetic particles (MP) are pulled away from the reaction surface (113) by a magnetic field (B). Thus unspecific binding of magnetic particles to the binding sites can be prevented.

公开(公告)号：US09568464B2

公开(公告)日：2017-02-14

申请号：US14385398

申请日：2013-03-14

Applicant: KONINKLIJKE PHILIPS N.V.

Inventor： Pieter Jan Van Der Zaag ,  Emiel Peeters ,  Roelof Koole ,  Falco Cornelius Marinus Jacobus Maria Van Delft

IPC: B44C1/22 ,  G01N33/487 ,  G03F7/00 ,  B82Y30/00 ,  B81C1/00

CPC classification number: G01N33/48721 ,  B81C1/00087 ,  B81C2201/0149 ,  B82Y30/00 ,  G03F7/0002

Abstract: The invention relates to a method for manufacturing an apparatus for the processing of single molecules. According to this method, a self-assembling resist (155) is deposited on a processing layer (110, PL) and allowed to self-assemble into a pattern of two phases (155a, 155b). One of these phases (155a) is then selectively removed, and at least one aperture is generated in the processing layer (110, PL) through the mask of the remaining resist (155b). Thus apertures of small size can readily be produced that allow for the processing of single molecules (M), for example in DNA sequencing.

Abstract translation: 本发明涉及一种用于制造用于处理单分子的装置的方法。 根据该方法，将自组装抗蚀剂（155）沉积在处理层（110，PL）上并允许自组装成两相（155a，155b）的图案。 然后选择性地去除这些相（155a）中的一个，并且通过剩余的抗蚀剂（155b）的掩模在处理层（110，PL）中产生至少一个孔。 因此，容易产生允许单分子（M）加工的小尺寸孔，例如在DNA测序中。