公开(公告)号：US08216745B2

公开(公告)日：2012-07-10

申请号：US12740645

申请日：2008-10-29

申请人： Kagehiro Kageyama ,  Fumihiko Yamada

发明人： Kagehiro Kageyama ,  Fumihiko Yamada

IPC分类号： G06F1/24

CPC分类号： G03F7/70791 ,  G03F1/38 ,  G03F1/50 ,  G03F1/54 ,  G03F1/80

摘要： A halftone mask increasing the versatility of an etching stopper layer. The half tone mask (10) is provided with a transparent portion (TA) using a glass substrate (S), a first semi-transparent portion (HA) including a first semi-transparent layer (11) formed on the glass substrate, and a light shield portion (PA) including a first semi-transparent portion, a light shield layer (13) superimposed above the first semi-transparent layer, and an etching stopper layer (12) formed between the first semi-transparent layer and the light shield layer. The first semi-transparent layer and the light shield layer are each formed from Cr or at least one selected from the group consisting of an oxide, nitride, carbide, oxynitride, oxycarbide, carbonitride, and oxycarbonitride of Cr. The etching stopper layer includes a first element of at least one selected from the group consisting of Fe, Ni, and Co and a second element of at least one selected from the group consisting of Al, Si, Ti, Nb, Ta, Hf, and Zr.

摘要翻译： 半色调掩模增加蚀刻阻挡层的通用性。 半色调掩模（10）使用玻璃基板（S）设置透明部分（TA），第一半透明部分（HA）包括形成在玻璃基板上的第一半透明层（11），以及 包括第一半透明部分的遮光部分（PA），叠加在第一半透明层之上的遮光层（13）和形成在第一半透明层和光之间的蚀刻停止层（12） 屏蔽层。 第一半透明层和遮光层各自由Cr或选自Cr的氧化物，氮化物，碳化物，氮氧化物，碳氧化物，碳氮化物和碳氮氧化物中的至少一种形成。 蚀刻停止层包括选自Fe，Ni和Co中的至少一种的第一元素和选自Al，Si，Ti，Nb，Ta，Hf中的至少一种的第二元素， 和Zr。

公开(公告)号：US20100294651A1

公开(公告)日：2010-11-25

申请号：US12682549

申请日：2008-10-09

申请人： Fumihiko Yamada ,  Toshiharu Ozaki ,  Takaei Sasaki ,  Masahiko Ishizuka ,  Kagehiro Kageyama ,  Hiroyuki Iso ,  Ryouichi Kobayashi ,  Atsushi Hayashi

发明人： Fumihiko Yamada ,  Toshiharu Ozaki ,  Takaei Sasaki ,  Masahiko Ishizuka ,  Kagehiro Kageyama ,  Hiroyuki Iso ,  Ryouichi Kobayashi ,  Atsushi Hayashi

IPC分类号： C23C14/34

CPC分类号： G03F1/50

摘要： A method for manufacturing a gray-tone mask that decreases the wavelength dependency with respect to an exposure wavelength under stable and simple film formation conditions. A reactive sputtering method that sputters a pure Cr target in an atmosphere of Ar and NO is used to form a Cr nitride film having a single-layer structure. Based on a plurality of different spectral transmittance curves obtained under a plurality of film formation conditions having different NO concentrations, a target concentration (intermediate value) for NO is obtained that sets the transmittance uniformity of the semi-transparent film to 1.0% or less in the range of 365 nm to 436 nm or 4.0% or less in the range of 300 nm to 500 nm. Then, a semi-transparent film is formed by using the NO target concentration.

摘要翻译： 一种用于制造在稳定且简单的成膜条件下降低相对于曝光波长的波长依赖性的灰色调掩模的方法。 使用在Ar和NO的气氛中喷射纯Cr靶的反应性溅射法形成具有单层结构的Cr氮化物膜。 基于在具有不同NO浓度的多个成膜条件下获得的多个不同的光谱透射率曲线，获得了将半透明膜的透射率均匀性设定为1.0％以下的目标浓度（中间值）为1.0％以下 365nm至436nm的范围或在300nm至500nm的范围内为4.0％以下的范围。 然后，使用NO靶浓度形成半透明膜。

公开(公告)号：US20100261096A1

公开(公告)日：2010-10-14

申请号：US12740645

申请日：2008-10-29

申请人： Kagehiro Kageyama ,  Fumihiko Yamada

发明人： Kagehiro Kageyama ,  Fumihiko Yamada

IPC分类号： G03F1/00

CPC分类号： G03F7/70791 ,  G03F1/38 ,  G03F1/50 ,  G03F1/54 ,  G03F1/80

摘要： A halftone mask increasing the versatility of an etching stopper layer. The half tone mask (10) is provided with a transparent portion (TA) using a glass substrate (S), a first semi-transparent portion (HA) including a first semi-transparent layer (11) formed on the glass substrate, and a light shield portion (PA) including a first semi-transparent portion, a light shield layer (13) superimposed above the first semi-transparent layer, and an etching stopper layer (12) formed between the first semi-transparent layer and the light shield layer. The first semi-transparent layer and the light shield layer are each formed from Cr or at least one selected from the group consisting of an oxide, nitride, carbide, oxynitride, oxycarbide, carbonitride, and oxycarbonitride of Cr. The etching stopper layer includes a first element of at least one selected from the group consisting of Fe, Ni, and Co and a second element of at least one selected from the group consisting of Al, Si, Ti, Nb, Ta, Hf, and Zr.

摘要翻译： 半色调掩模增加蚀刻阻挡层的通用性。 半色调掩模（10）使用玻璃基板（S）设置透明部分（TA），第一半透明部分（HA）包括形成在玻璃基板上的第一半透明层（11），以及 包括第一半透明部分的遮光部分（PA），叠加在第一半透明层之上的遮光层（13）和形成在第一半透明层和光之间的蚀刻停止层（12） 屏蔽层。 第一半透明层和遮光层各自由Cr或选自Cr的氧化物，氮化物，碳化物，氧氮化物，碳氧化物，碳氮化物和碳氮氧化物中的至少一种形成。 蚀刻停止层包括选自Fe，Ni和Co中的至少一种的第一元素和选自Al，Si，Ti，Nb，Ta，Hf中的至少一种的第二元素， 和Zr。

公开(公告)号：US06627118B2

公开(公告)日：2003-09-30

申请号：US09839397

申请日：2001-04-23

申请人： Kagehiro Kageyama ,  Koji Sato

发明人： Kagehiro Kageyama ,  Koji Sato

IPC分类号： H01B516

CPC分类号： H05K3/323 ,  B22F9/24 ,  B22F2998/00 ,  B22F2998/10 ,  B32B15/018 ,  C22C45/04 ,  H01B1/02 ,  Y10S428/936 ,  Y10T428/12569 ,  Y10T428/12944 ,  Y10T428/2991 ,  B22F9/002 ,  B22F1/0048 ,  B22F1/0085 ,  B22F1/025

摘要： A crystalline Ni alloy particle for an anisotropic conductive film comprising Ni and a metalloid element such as P, B, etc. and having a structure in which a Ni intermetallic compound phase is precipitated can be produced by preparing substantially amorphous Ni alloy particle by an electroless reduction method, and heat-treating the substantially amorphous Ni alloy particle. The Ni alloy particle is preferably heat-treated after disintegration, and preferably coated with Au.

公开(公告)号：US6051083A

公开(公告)日：2000-04-18

申请号：US799017

申请日：1997-02-07

申请人： Hideki Tamaki ,  Akira Yoshinari ,  Akira Okayama ,  Mitsuru Kobayashi ,  Kagehiro Kageyama ,  Takehiro Ohno

发明人： Hideki Tamaki ,  Akira Yoshinari ,  Akira Okayama ,  Mitsuru Kobayashi ,  Kagehiro Kageyama ,  Takehiro Ohno

IPC分类号： B22D27/04 ,  C22C19/05 ,  C22C19/00

CPC分类号： B22D27/045 ,  C22C19/056 ,  C22C19/057

摘要： In order to provide a high strength Ni-base superalloy for directionally solidified castings, which is prevented from solidification cracking at the casting, having a sufficient grain boundary strength for ensuring reliability during its operation and a superior high temperature concurrently, a high strength Ni-base superalloy for directionally solidified castings having a superior grain boundary strength, which contains C: 0.05% to less than 0.1%, B: 0.015% to 0.04%, Hf: 0.01.about.less than 0.5%, Zr: less than 0.01%, Cr: 1.5%.about.16%, Mo: utmost 6%, W: 2.about.12%, Re: 0.1.about.9%, Ta: 2.about.12%, Nb: utmost 4%, Al: 4.5.about.6.5%, Ti: less than 0.5%, Co: less than 9%, and Ni: at least 60% in weight, is disclosed.

摘要翻译： 为了提供用于定向凝固铸件的高强度Ni基超合金，其在铸造时防止固化裂纹，具有足够的晶界强度以确保其操作期间的可靠性和高的高温同时，高强度的Ni- 具有优异的晶界强度的定向凝固铸件用基体超合金，其含有C：0.05〜小于0.1％，B：0.015％〜0.04％，Hf：0.01分散度小于0.5％，Zr：小于0.01％，Cr ：1.5％差异16％，Mo：最大6％，W：2差异12％，Re：0.1差异9％，Ta：2差异12％，Nb：最大4％，Al：4.5差异6.5％，Ti：较小 不超过0.5％，Co：小于9％，Ni：至少为60重量％。