Closed-loop process control for electron beam freeform fabrication and deposition processes
    1.
    发明授权
    Closed-loop process control for electron beam freeform fabrication and deposition processes 有权
    电子束自由形成和沉积过程的闭环过程控制

    公开(公告)号:US08452073B2

    公开(公告)日:2013-05-28

    申请号:US12750991

    申请日:2010-03-31

    IPC分类号: G06K9/00

    摘要: A closed-loop control method for an electron beam freeform fabrication (EBF3) process includes detecting a feature of interest during the process using a sensor(s), continuously evaluating the feature of interest to determine, in real time, a change occurring therein, and automatically modifying control parameters to control the EBF3 process. An apparatus provides closed-loop control method of the process, and includes an electron gun for generating an electron beam, a wire feeder for feeding a wire toward a substrate, wherein the wire is melted and progressively deposited in layers onto the substrate, a sensor(s), and a host machine. The sensor(s) measure the feature of interest during the process, and the host machine continuously evaluates the feature of interest to determine, in real time, a change occurring therein. The host machine automatically modifies control parameters to the EBF3 apparatus to control the EBF3 process in a closed-loop manner.

    摘要翻译: 用于电子束自由形成(EBF3)处理的闭环控制方法包括在使用传感器的过程中检测感兴趣的特征,连续评估感兴趣的特征,实时地确定其中发生的变化, 并自动修改控制参数来控制EBF3进程。 一种装置提供了该方法的闭环控制方法,并且包括用于产生电子束的电子枪,用于将线材馈送到衬底的送丝器,其中线材熔化并逐渐沉积到衬底上,传感器 (s)和主机。 传感器在过程中测量感兴趣的特征,并且主机连续评估感兴趣的特征,以实时确定其中发生的变化。 主机自动将控制参数修改为EBF3设备,以闭环方式控制EBF3进程。

    Closed-Loop Process Control for Electron Beam Freeform Fabrication and Deposition Processes
    2.
    发明申请
    Closed-Loop Process Control for Electron Beam Freeform Fabrication and Deposition Processes 有权
    电子束自由形成和沉积过程的闭环过程控制

    公开(公告)号:US20100260410A1

    公开(公告)日:2010-10-14

    申请号:US12750991

    申请日:2010-03-31

    IPC分类号: G06K9/00 G06F17/00

    摘要: A closed-loop control method for an electron beam freeform fabrication (EBF3) process includes detecting a feature of interest during the process using a sensor(s), continuously evaluating the feature of interest to determine, in real time, a change occurring therein, and automatically modifying control parameters to control the EBF3 process. An apparatus provides closed-loop control method of the process, and includes an electron gun for generating an electron beam, a wire feeder for feeding a wire toward a substrate, wherein the wire is melted and progressively deposited in layers onto the substrate, a sensor(s), and a host machine. The sensor(s) measure the feature of interest during the process, and the host machine continuously evaluates the feature of interest to determine, in real time, a change occurring therein. The host machine automatically modifies control parameters to the EBF3 apparatus to control the EBF3 process in a closed-loop manner.

    摘要翻译: 用于电子束自由形成(EBF3)处理的闭环控制方法包括在使用传感器的过程中检测感兴趣的特征,连续评估感兴趣的特征,实时地确定其中发生的变化, 并自动修改控制参数来控制EBF3进程。 一种装置提供了该方法的闭环控制方法,并且包括用于产生电子束的电子枪,用于将线材馈送到衬底的送丝器,其中线材熔化并逐渐沉积到衬底上,传感器 (s)和主机。 传感器在过程中测量感兴趣的特征,并且主机连续评估感兴趣的特征,以实时确定其中发生的变化。 主机自动将控制参数修改为EBF3设备,以闭环方式控制EBF3进程。

    Use of Beam Deflection to Control an Electron Beam Wire Deposition Process
    3.
    发明申请
    Use of Beam Deflection to Control an Electron Beam Wire Deposition Process 有权
    使用光束偏转来控制电子束线沉积过程

    公开(公告)号:US20100270274A1

    公开(公告)日:2010-10-28

    申请号:US12751075

    申请日:2010-03-31

    IPC分类号: B23K15/00

    CPC分类号: B23K15/02

    摘要: A method for controlling an electron beam process wherein a wire is melted and deposited on a substrate as a molten pool comprises generating the electron beam with a complex raster pattern, and directing the beam onto an outer surface of the wire to thereby control a location of the wire with respect to the molten pool. Directing the beam selectively heats the outer surface of the wire and maintains the position of the wire with respect to the molten pool. An apparatus for controlling an electron beam process includes a beam gun adapted for generating the electron beam, and a controller adapted for providing the electron beam with a complex raster pattern and for directing the electron beam onto an outer surface of the wire to control a location of the wire with respect to the molten pool.

    摘要翻译: 一种用于控制电子束工艺的方法,其中将熔丝熔化并沉积在作为熔池的衬底上的方法包括以复杂光栅图案生成电子束,并将光束引导到电线的外表面上,由此控制位置 电线相对于熔池。 引导梁选择性地加热线的外表面并且保持线相对于熔池的位置。 一种用于控制电子束处理的装置包括适于产生电子束的束枪,以及用于向电子束提供复杂光栅图案并用于将电子束引导到线的外表面以控制位置的控制器 的电线相对于熔池。

    Use of beam deflection to control an electron beam wire deposition process
    4.
    发明授权
    Use of beam deflection to control an electron beam wire deposition process 有权
    使用光束偏转来控制电子束丝沉积过程

    公开(公告)号:US08344281B2

    公开(公告)日:2013-01-01

    申请号:US12751075

    申请日:2010-03-31

    IPC分类号: B23K15/00

    CPC分类号: B23K15/02

    摘要: A method for controlling an electron beam process wherein a wire is melted and deposited on a substrate as a molten pool comprises generating the electron beam with a complex raster pattern, and directing the beam onto an outer surface of the wire to thereby control a location of the wire with respect to the molten pool. Directing the beam selectively heats the outer surface of the wire and maintains the position of the wire with respect to the molten pool. An apparatus for controlling an electron beam process includes a beam gun adapted for generating the electron beam, and a controller adapted for providing the electron beam with a complex raster pattern and for directing the electron beam onto an outer surface of the wire to control a location of the wire with respect to the molten pool.

    摘要翻译: 一种用于控制电子束工艺的方法,其中将熔丝熔化并沉积在作为熔池的衬底上的方法包括以复杂光栅图案生成电子束,并将光束引导到电线的外表面上,由此控制位置 电线相对于熔池。 引导梁选择性地加热线的外表面并且保持线相对于熔池的位置。 一种用于控制电子束处理的装置包括适于产生电子束的束枪,以及用于向电子束提供复杂光栅图案并用于将电子束引导到线的外表面以控制位置的控制器 的电线相对于熔池。

    Method and apparatus for making rapidly solidified particulate
    6.
    发明授权
    Method and apparatus for making rapidly solidified particulate 失效
    快速凝固颗粒的方法和装置

    公开(公告)号:US5032172A

    公开(公告)日:1991-07-16

    申请号:US413638

    申请日:1989-09-28

    IPC分类号: B22F9/00

    CPC分类号: B22F9/008

    摘要: A stream of molten material free falls through a drop tube and impinges on a chill surface adjacent the bottom of the drop tube to form rapidly solidified particulate. The chill surface is so inclined and moved relative to the stream of molten material as to have an upward component of motion counter to the downward direction of fall of the stream to significantly enhance shearing and rapid quenching of molten material striking the chill surface. The resulting solidified particulate is discharged from the chill surface for collection in a particulate collection chamber beneath the chill surface. Production quantities of rapidly solidified particulate can be continuously made.

    摘要翻译: 熔融物料流自由落下通过滴管并撞击在靠近滴管底部的冷却表面上以形成快速凝固的颗粒。 冷却表面相对于熔融材料流倾斜和移动,以具有与料流下降方向相反的向上运动分量,以显着增强熔融材料冲击冷却表面的剪切和快速淬火。 所得到的凝固颗粒从冷却表面排出,以收集在冷却表面下面的颗粒收集室中。 可以连续制造快速固化的颗粒的生产量。