公开(公告)号：US06642489B2

公开(公告)日：2003-11-04

申请号：US09758000

申请日：2001-01-09

申请人： Kartik Ramaswamy ,  Dennis S. Grimard ,  Philip M. Salzman ,  Liang-Guo Wang ,  Kwok Manus Wong

发明人： Kartik Ramaswamy ,  Dennis S. Grimard ,  Philip M. Salzman ,  Liang-Guo Wang ,  Kwok Manus Wong

IPC分类号： H05B610

CPC分类号： H01L21/67098

摘要： A conduit has a heating system disposed therein. The heating system generates heat in response to magnetic flux generated by an inductive coil. The heating system has a heat transfer element and a plurality of ferromagnetic elements. The heat transfer element may be displaced within the conduit to control the amount of heat generated.

摘要翻译： 导管具有设置在其中的加热系统。 加热系统响应于由感应线圈产生的磁通而产生热量。 加热系统具有传热元件和多个铁磁元件。 传热元件可以在导管内移位以控制产生的热量。

公开(公告)号：US5777289A

公开(公告)日：1998-07-07

申请号：US597445

申请日：1996-02-02

申请人： Hiroji Hanawa ,  Gerald Zheyao Yin ,  Diana Xiaobing Ma ,  Philip M. Salzman ,  Peter K. Loewenhardt ,  Allen Zhao

发明人： Hiroji Hanawa ,  Gerald Zheyao Yin ,  Diana Xiaobing Ma ,  Philip M. Salzman ,  Peter K. Loewenhardt ,  Allen Zhao

IPC分类号： H05H1/46 ,  C23F4/00 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  B23K10/00

CPC分类号： H01J37/321

摘要： An inductively coupled RF plasma reactor for processing semiconductor wafer includes a reactor chamber having a side wall and a ceiling, a wafer pedestal for supporting the wafer in the chamber, an RF power source, apparatus for introducing a processing gas into the reactor chamber, and a coil inductor adjacent the reactor chamber connected to the RF power source, the coil inductor including (a) a side section facing a portion of the side wall and including a bottom winding and a top winding, the top winding being at a height corresponding at least approximately to a top height of the ceiling, and (b) a top section extending radially inwardly from the top winding of the side section so as to overlie at least a substantial portion of the ceiling. The present invention adheres to an optimized coil-dome geometry including a particular dome apex height range relative to the dome base and a particular wafer position range relative to the dome apex.

摘要翻译： 用于处理半导体晶片的感应耦合RF等离子体反应器包括具有侧壁和天花板的反应室，用于将晶片支撑在室中的晶片基座，RF电源，将处理气体引入反应室的装置，以及 与所述反应室相邻的线圈电感器，所述线圈电感器连接到所述RF电源，所述线圈电感器包括（a）面向所述侧壁的一部分并包括底部绕组和顶部绕组的侧面部分，所述顶部绕组的高度对应于 至少约至顶部的顶部高度，以及（b）从侧部的顶部绕组径向向内延伸的顶部部分，以覆盖至少大部分天花板。 本发明遵循优化的线圈 - 圆顶几何形状，其包括相对于圆顶基座的特定圆顶顶部高度范围和相对于圆顶顶点的特定晶片位置范围。

公开(公告)号：US5538390A

公开(公告)日：1996-07-23

申请号：US146482

申请日：1993-10-29

申请人： Philip M. Salzman

发明人： Philip M. Salzman

IPC分类号： H01L21/673 ,  H01L21/677 ,  B65B1/04

CPC分类号： H01L21/67757 ,  H01L21/67772 ,  Y10S414/137 ,  Y10S414/138 ,  Y10S414/139 ,  Y10S414/14

摘要： A load lock interface for a semiconductor wafer process chamber includes a platform adapted to receive and engage with a carrier containing a cassette of semiconductor wafers; and a removable bell-shaped enclosure adapted to surround and seal said carrier from the ambient environment while the carrier is engaged with the load lock interface platform. Once engaged with the carrier, the platform is operable to withdraw the cassette of wafers from the carrier and position the cassette within a load lock. Thereafter, the cassette may be indexed and individual wafers may be removed from the cassette for processing within the process chamber.

摘要翻译： 用于半导体晶片处理室的负载锁定接口包括适于接收并与包含半导体晶片盒的载体接合的平台; 以及可移动的钟形壳体，其适于在载体与负载锁定接口平台接合的同时围绕环境环境并密封所述载体。 一旦与承运人接合，该平台可操作地从载体中取出晶片盒并将盒定位在加载锁定中。 此后，盒可以被索引，并且单独的晶片可以从盒中移除以在处理室内进行处理。

公开(公告)号：US5597439A

公开(公告)日：1997-01-28

申请号：US329584

申请日：1994-10-26

申请人： Philip M. Salzman

发明人： Philip M. Salzman

IPC分类号： H05H1/46 ,  C23C16/44 ,  C23C16/455 ,  C23F4/00 ,  H01J37/32 ,  H01L21/02 ,  H01L21/302 ,  H01L21/3065 ,  B44C1/22

CPC分类号： C23C16/4558 ,  H01J37/3244 ,  H01J37/32449

摘要： An easy to modify, remove, clean, and replace gas distribution ring for a highly corrosive plasma etch substrate processing chamber is disclosed. Gas is provided to a gap between adjacent pieces in sealing a ceramic dome of the processing chamber to a lower wall section of processing chamber. The gap acts as a manifold type channel around the periphery of the processing chamber. The channel opening is obstructed by the gas distribution ring. The gas distribution ring includes a series of slots in its surface which control the gas flow pattern into the processing chamber. The gas flow pattern can be easily adjusted merely by changing one gas distribution ring to another gas distribution ring with the desired slot configuration. The gas flow passages can easily be cleaned by removing the process chamber dome which exposes the gas flow passages in the gas distribution ring.

摘要翻译： 公开了一种用于高腐蚀性等离子体蚀刻衬底处理室的易于修改，去除，清洁和替换气体分配环。 在将处理室的陶瓷圆顶密封到处理室的下壁部分之间，将气体提供给相邻片之间的间隙。 间隙作为处理室周围的歧管型通道。 通道开口被气体分配环阻挡。 气体分布环包括在其表面中的一系列槽，其控制进入处理室的气体流动模式。 仅通过将一个气体分配环改变成具有期望的槽结构的另一个气体分配环，可以容易地调节气体流动模式。 通过去除暴露气体分配环中的气体流动通道的处理室圆顶，可以容易地清洁气体流动通道。

公开(公告)号：US4134504A

公开(公告)日：1979-01-16

申请号：US725166

申请日：1976-09-21

申请人： Louis Salas ,  Philip M. Salzman

发明人： Louis Salas ,  Philip M. Salzman

IPC分类号： A61G3/06 ,  B60P1/44

CPC分类号： A61G3/06 ,  A61G3/062 ,  A61G3/067 ,  Y10S414/134

摘要： The lift is installed on the underside of the body of a van below the side doors. In retracted position it is entirely concealed below the van and does not obstruct normal usage of the van. Stationary portions of the device are fixed to the van frame. Slideable therein are an outer platform and a support frame for the outer platform is extended by a first hydraulic cylinder and linkage. Slideable relative to the outer platform is an inner platform. The inner platform extends and retracts with the outer platform by means of a cable drive. A pair of second hydraulic cylinders interconnect the outer platform and the support frame using four links which raise and lower both platforms in a parallelogram linkage. Thus the platforms remain substantially horizontal as they move from a first position directly horizontally outward from their storage position to a lower position and then upward to an upper position, then back to first position, whereupon, the platforms and the support frame may be returned to retracted position. Thus in lower position the inner platform is at street or curb level so that a wheelchair may be rolled onto the platforms. As the platforms rise to upper position, the wheelchair is lifted to the level of the floor of the van and the platforms move inward to contact the van floor so that the wheelchair may be rolled into the van.

摘要翻译： 电梯安装在侧门下面的厢式车身下面。 在缩回位置，它完全隐藏在厢式货车下方，不会妨碍货车的正常使用。 装置的固定部分固定在货车架上。 其中可滑动的是外平台，并且用于外平台的支撑框架由第一液压缸和连杆延伸。 相对于外平台可滑动的是内平台。 内部平台通过电缆驱动器与外部平台延伸和缩回。 一对第二液压缸使用四个连杆来连接外平台和支撑框架，这四个连杆以平行四边形联动装置升高和降低两个平台。 因此，当平台从第一位置从其存储位置直接水平向外移动到下部位置然后向上移动到上部位置时，平台保持基本水平，然后返回到第一位置，于是平台和支撑框架可以返回到 缩回位置。 因此，在较低的位置，内平台处于街道或路边处，使得轮椅可以滚动到平台上。 当平台升到高位时，轮椅被提升到货车的地板的高度，并且平台向内移动以接触货车地板，使得轮椅可以卷入货车。

公开(公告)号：US5643366A

公开(公告)日：1997-07-01

申请号：US189951

申请日：1994-01-31

申请人： Sasson R. Somekh ,  Philip M. Salzman ,  Oskar U. Vierny

发明人： Sasson R. Somekh ,  Philip M. Salzman ,  Oskar U. Vierny

IPC分类号： H01L21/677 ,  H01L21/683 ,  H01L21/687 ,  C23C16/00

CPC分类号： H01L21/67748 ,  H01L21/6838 ,  H01L21/68728 ,  H01L21/68735 ,  H01L21/68742 ,  Y10S414/135

摘要： A structure and method for handling and processing wafers in a face down configuration is disclosed. A robot insertion blade supports a wafer to be processed in a recess having conically sloping wafer holding surfaces which touch the wafer only at its outer periphery. Once positioned in the chamber, a set of three transfer finger with sloped contact surfaces supported from a "C" shaped support assembly raise the wafer adjacent to a susceptor bottom surface. A recess in the face of the susceptor covering a large portion of the wafer is evacuated, compared to process chamber pressure, and when the differential pressure between the processing chamber and the evacuated recess behind the wafer can support the wafer, the transfer finger supports are lower and rotated out from under the wafer and susceptor assembly. The susceptor with the wafer attached by vacuum is then lowered to a processing location in contact with shadow rings supported by the "C" shaped support assembly and opposite a gas distribution plate.

摘要翻译： 公开了一种面朝下配置处理和处理晶片的结构和方法。 机器人插入刀片在具有锥形倾斜的晶片保持表面的凹部中支撑要处理的晶片，其仅在其外周缘处接触晶片。 一旦定位在腔室中，一组具有从“C”形支撑组件支撑的倾斜接触表面的三个转移手指将晶片靠近基座底表面提升。 与处理室压力相比，在覆盖晶片的大部分的基座的表面上的凹部被抽真空，并且当处理室和晶片后面的抽真空凹槽之间的压差可以支撑晶片时，转印手指支撑件 从晶片和基座组件下方旋转出来。 然后将具有通过真空附接的晶片的感受器降低到与由“C”形支撑组件支撑并与气体分配板相对的阴影环接触的处理位置。

公开(公告)号：US5630690A

公开(公告)日：1997-05-20

申请号：US575767

申请日：1995-12-20

申请人： Philip M. Salzman

发明人： Philip M. Salzman

IPC分类号： H01L21/673 ,  H01L21/677 ,  B65G1/04

CPC分类号： H01L21/67757 ,  H01L21/67772 ,  Y10S414/137 ,  Y10S414/138 ,  Y10S414/139 ,  Y10S414/14

摘要： A load lock interface for a semiconductor wafer process chamber includes a platform adapted to receive and engage with a carrier containing a cassette of semiconductor wafers; and a removable bell-shaped enclosure adapted to surround and seal said carrier from the ambient environment while the carrier is engaged with the load lock interface platform. Once engaged with the carrier, the platform is operable to withdraw the cassette of wafers from the carrier and position the cassette within a load lock. Thereafter, the cassette may be indexed and individual wafers may be removed from the cassette for processing within the process chamber.

摘要翻译： 用于半导体晶片处理室的负载锁定接口包括适于接收并与包含半导体晶片盒的载体接合的平台; 以及可移动的钟形壳体，其适于在载体与负载锁定接口平台接合的同时围绕环境环境并密封所述载体。 一旦与承运人接合，该平台可操作地从载体中取出晶片盒并将盒定位在加载锁定中。 此后，盒可以被索引，并且单独的晶片可以从盒中移除以在处理室内进行处理。

公开(公告)号：US5378107A

公开(公告)日：1995-01-03

申请号：US42917

申请日：1993-04-01

申请人： Oskar U. Vierny ,  Philip M. Salzman

发明人： Oskar U. Vierny ,  Philip M. Salzman

IPC分类号： B65G49/07 ,  H01L21/677 ,  B65G49/00 ,  B65G65/00

CPC分类号： H01L21/67772 ,  Y10S414/14

摘要： Disclosed is a method for enabling the contents of a first chamber to be moved into a second chamber without exposing either chamber to elements making particulate-producing sliding contact. In one aspect of the invention, the method includes providing a carrier for a vertically spaced array of articles such as semiconductor wafers and having a clamping device for clampingly holding each of the articles; locating the carrier within the second chamber; opening the carrier by moving a first portion of the carrier upwardly from a second portion or,he carrier without producing sliding contact within the second chamber; and releasing the a clamping device without producing sliding contact within the second chamber, whereby the articles are accessible within the second chamber.

摘要翻译： 公开了一种使第一室的内容物能够移动到第二室中的方法，而不将任一室暴露于产生颗粒产生滑动接触的元素。 在本发明的一个方面，该方法包括提供用于垂直间隔的物品阵列的载体，例如半导体晶片，并具有用于夹紧地保持每个物品的夹紧装置; 将载体定位在第二室内; 通过将载体的第一部分从第二部分向上移动或者在第二室内不产生滑动接触而使载体打开; 以及释放所述夹紧装置，而不会在所述第二腔室内产生滑动接触，由此所述制品在所述第二腔室内是可接近的。

公开(公告)号：US06503367B1

公开(公告)日：2003-01-07

申请号：US09521799

申请日：2000-03-09

申请人： Peter K. Loewenhardt ,  Gerald Z. Yin ,  Philip M. Salzman

发明人： Peter K. Loewenhardt ,  Gerald Z. Yin ,  Philip M. Salzman

IPC分类号： H01L2100

CPC分类号： H01J37/3266 ,  H01J37/321 ,  H01J37/32834

摘要： The invention is embodied in an RF plasma reactor for processing a semiconductor wafer, including as reactor chamber bounded by a chamber wall defining an interior region of the chamber, a gas inlet, an RF power source and an RF power applicator proximal the chamber and connected to the RF power source, and an opening in this chamber communicating with the interior region of the chamber. The invention further includes a magnet apparatus disposed adjacent said opening to resist flow of plasma ions through the opening, and the magnet apparatus comprising a first pair of magnetic poles and a second pair of magnetic poles, the first pair of magnetic poles facing the second pair of magnetic poles across the opening.

摘要翻译： 本发明体现在用于处理半导体晶片的RF等离子体反应器中，该等离子体反应器包括作为反应室的反应室，该反应室由限定室的内部区域的室壁界定，气体入口，RF电源和RF室，并且连接 到RF电源，并且该室中的开口与腔室的内部区域连通。 本发明还包括一个与所述开口相邻设置的磁性装置，以阻止等离子体离子通过该开口的流动;磁体装置包括第一对磁极和第二对磁极，第一对磁极面对第二对磁极 的磁极穿过开口。

公开(公告)号：US06402885B2

公开(公告)日：2002-06-11

申请号：US09773409

申请日：2001-01-31

申请人： Peter K. Loewenhardt ,  Gerald Z. Yin ,  Philip M. Salzman

发明人： Peter K. Loewenhardt ,  Gerald Z. Yin ,  Philip M. Salzman

IPC分类号： H01L2100

CPC分类号： H01J37/3266 ,  H01J37/321 ,  H01J37/32834

摘要： The invention is embodied in a plasma reactor including a chamber enclosure having a process gas inlet and including a ceiling, a sidewall and a workpiece support pedestal capable of supporting a workpiece at a plasma processing location facing the ceiling, the workpiece processing location and ceiling defining a process region therebetween, the pedestal being spaced from said sidewall to define a pumping annulus therebetween having inner and outer walls, to permit process gas to be evacuated therethrough from the process region. The invention further includes a pair of opposing plasma confinement magnetic poles arranged adjacent the annulus within one of the inner and outer walls of the annulus, the opposing magnetic poles being axially displaced from one another the opposite poles being oriented to provide maximum magnetic flux in a direction across the annulus and a magnetic flux at the processing location less than the magnetic flux across the annulus.

摘要翻译： 本发明体现在一种等离子体反应器中，该等离子体反应器包括具有工艺气体入口并具有天花板，侧壁和工件支撑基座的室外壳，其能够在面向天花板的等离子体处理位置处支撑工件，工件加工位置和天花板限定 其间的处理区域，所述基座与所述侧壁间隔开，以在其间限定具有内壁和外壁的泵送环形空间，以允许处理气体从处理区域排出。 本发明还包括一对相对的等离子体限制磁极，其邻近环形空间的内壁和外壁之一设置在环形空间附近，相对的磁极彼此轴向移位，相对的磁极被定向以在 穿过环带的方向和在处理位置处的磁通量小于穿过环空的磁通量。