SEM TYPE DEFECT OBSERVATION DEVICE AND DEFECT IMAGE ACQUIRING METHOD
    1.
    发明申请
    SEM TYPE DEFECT OBSERVATION DEVICE AND DEFECT IMAGE ACQUIRING METHOD 审中-公开
    SEM型缺陷观察装置和缺陷图像获取方法

    公开(公告)号:US20120327212A1

    公开(公告)日:2012-12-27

    申请号:US13580259

    申请日:2010-12-01

    IPC分类号: H04N7/18

    摘要: The present invention enables provision of a defect observation device that reduces wait time from an end of pickup of a reference image and accompanying processing to a start of pickup of a defect image compared to conventional ones by making a pixel count resolution of the reference image be low compared to a pixel count of the defect image in an image pickup unit using an electronic microscope for automatic fine defect classification, whereby a throughput enhanced compared to those of conventional ones can be achieved.

    摘要翻译: 本发明能够提供一种缺陷观察装置,其通过使参考图像的像素数分辨率为比较,从而将参考图像的拾取结束的等待时间和伴随处理缩短到与传统缺陷图像相比的缺陷图像的开始拾取 与使用电子显微镜进行自动精细缺陷分类的图像拾取单元中的缺陷图像的像素数相比较低,从而可以实现与常规相比增加的吞吐量。

    Method of observing a specimen using a scanning electron microscope
    2.
    发明授权
    Method of observing a specimen using a scanning electron microscope 有权
    使用扫描电子显微镜观察样品的方法

    公开(公告)号:US07075077B2

    公开(公告)日:2006-07-11

    申请号:US11020265

    申请日:2004-12-27

    IPC分类号: H01J37/21

    摘要: A method of observing a specimen using a scanning electron microscope, makes it possible to shorten the time required to perform automatic focusing at the time of semiconductor defect automatic review and improves the throughput in the processing in which the specimen is observed. In the above method, the specimen is imaged at a low resolution by the scanning electron microscope to obtain an image, an area for imaging the specimen at a high resolution is specified from the image acquired at the low resolution, the specimen is imaged at a high resolution by the scanning electron microscope to determine a focus position, a focal point of the scanning electron microscope is set to the determined focus position, and a high resolution image in the specified area is acquired in a state in which the focus position has been set to the determined focus position.

    摘要翻译: 使用扫描电子显微镜观察样本的方法可以缩短在半导体缺陷自动检查时进行自动聚焦所需的时间,并且提高了观察样本的处理中的通过量。 在上述方法中,通过扫描电子显微镜以低分辨率对样本进行成像以获得图像,从以低分辨率获取的图像指定用于以高分辨率成像试样的区域,将样品在 通过扫描电子显微镜的高分辨率来确定聚焦位置,将扫描电子显微镜的焦点设置为确定的聚焦位置,并且在聚焦位置已经被处理的状态下获取指定区域中的高分辨率图像 设置为确定的焦点位置。

    Scanning electron microscope
    3.
    发明授权
    Scanning electron microscope 有权
    扫描电子显微镜

    公开(公告)号:US07307254B2

    公开(公告)日:2007-12-11

    申请号:US11103654

    申请日:2005-04-12

    IPC分类号: G01N23/00 G01N21/00

    摘要: This SEM has a capability of preventing shift of a view field of the foreign matters at a stage where no sufficient correction is carried out when obtaining the SEM coordinate values used for transforming the coordinate values of the foreign matters on the sample sent from another device into the SEM coordinate values. The SEM selects the foreign matters closer to the center of the sample at first and then the foreign matters spirally from the center of the sample to the outer periphery.

    摘要翻译: 该SEM具有在获得用于将从另一装置发送的样本上的异物的坐标值变换为的变形的SEM坐标值进入到不进行充分校正的阶段时,能够防止异物的视场的偏移 SEM坐标值。 SEM首先从样品的中心选择更接近样品中心的异物,然后从样品的中心向外周螺旋地排列异物。

    Scanning electron microscope
    4.
    发明申请
    Scanning electron microscope 有权
    扫描电子显微镜

    公开(公告)号:US20060043294A1

    公开(公告)日:2006-03-02

    申请号:US11211650

    申请日:2005-08-26

    IPC分类号: G21K7/00

    摘要: In a scanning electron microscope having the function of observing an attentional object on a specimen, an error in an in-focus position can be corrected at high speeds. When moving the field of view to an object to be observed on a specimen on which an electron beam is scanned, an error between an in-focus position indicated by a mechanism for measuring a height of surface of the specimen and an actual in-focus position is corrected on the basis of information concerning points which are among a plurality of measured points and are adjacent to the target observing point.

    摘要翻译: 在具有观察样品上的注意物体的功能的扫描电子显微镜中,可以高速地校正对焦位置的误差。 当将视野移动到要扫描的电子束的样本上的观察对象时,由用于测量样本的表面的高度的机构和实际的聚焦位置所指示的对焦位置之间的误差 基于与多个测量点中的点相邻并且与目标观察点相邻的点的信息来校正位置。

    Method of observing a specimen using a scanning electron microscope
    5.
    发明申请
    Method of observing a specimen using a scanning electron microscope 有权
    使用扫描电子显微镜观察样品的方法

    公开(公告)号:US20050194533A1

    公开(公告)日:2005-09-08

    申请号:US11020265

    申请日:2004-12-27

    IPC分类号: G21K7/00

    摘要: A method of observing a specimen using a scanning electron microscope, makes it possible to shorten the time required to perform automatic focusing at the time of semiconductor defect automatic review and improves the throughput in the processing in which the specimen is observed. In the above method, the specimen is imaged at a low resolution by the scanning electron microscope to obtain an image, an area for imaging the specimen at a high resolution is specified from the image acquired at the low resolution, the specimen is imaged at a high resolution by the scanning electron microscope to determine a focus position, a focal point of the scanning electron microscope is set to the determined focus position, and a high resolution image in the specified area is acquired in a state in which the focus position has been set to the determined focus position.

    摘要翻译: 使用扫描电子显微镜观察样本的方法可以缩短在半导体缺陷自动检查时进行自动聚焦所需的时间,并且提高了观察样本的处理中的通过量。 在上述方法中,通过扫描电子显微镜以低分辨率对样本进行成像以获得图像,从以低分辨率获取的图像指定用于以高分辨率成像试样的区域,将样品在 通过扫描电子显微镜的高分辨率来确定聚焦位置,将扫描电子显微镜的焦点设置为确定的聚焦位置,并且在聚焦位置已经被处理的状态下获取指定区域中的高分辨率图像 设置为确定的焦点位置。

    Scanning electron microscope
    6.
    发明授权
    Scanning electron microscope 有权
    扫描电子显微镜

    公开(公告)号:US07307253B2

    公开(公告)日:2007-12-11

    申请号:US11211650

    申请日:2005-08-26

    IPC分类号: H01J37/256 G01N23/00

    摘要: In a scanning electron microscope having the function of observing an attentional object on a specimen, an error in an in-focus position can be corrected at high speeds. When moving the field of view to an object to be observed on a specimen on which an electron beam is scanned, an error between an in-focus position indicated by a mechanism for measuring a height of surface of the specimen and an actual in-focus position is corrected on the basis of information concerning points which are among a plurality of measured points and are adjacent to the target observing point.

    摘要翻译: 在具有观察样品上的注意物体的功能的扫描电子显微镜中,可以高速地校正对焦位置的误差。 当将视野移动到要扫描的电子束的样本上的观察对象时,由用于测量样本的表面的高度的机构和实际的聚焦位置所指示的对焦位置之间的误差 基于与多个测量点中的点相邻并且与目标观察点相邻的点的信息来校正位置。

    Scanning electron microscope
    7.
    发明申请
    Scanning electron microscope 有权
    扫描电子显微镜

    公开(公告)号:US20050236569A1

    公开(公告)日:2005-10-27

    申请号:US11103654

    申请日:2005-04-12

    IPC分类号: H01J37/28 G01N23/00 G21K7/00

    摘要: This SEM has a capability of preventing shift of a view field of the foreign matters at a stage where no sufficient correction is carried out when obtaining the SEM coordinate values used for transforming the coordinate values of the foreign matters on the sample sent from another device into the SEM coordinate values. The SEM selects the foreign matters closer to the center of the sample at first and then the foreign matters spirally from the center of the sample to the outer periphery.

    摘要翻译: 该SEM具有在获得用于将从另一装置发送的样本上的异物的坐标值变换为的变形的SEM坐标值进入到不进行充分校正的阶段时,能够防止异物的视场的偏移 SEM坐标值。 SEM首先从样品的中心选择更接近样品中心的异物,然后从样品的中心向外周螺旋地排列异物。

    Co-Cr-Mo-based alloy and production method therefor
    9.
    发明授权
    Co-Cr-Mo-based alloy and production method therefor 失效
    Co-Cr-Mo基合金及其制备方法

    公开(公告)号:US07569116B2

    公开(公告)日:2009-08-04

    申请号:US11350090

    申请日:2006-02-09

    IPC分类号: C22C19/07 C22C1/10

    CPC分类号: C22C19/07 C22F1/10

    摘要: A Co—Cr—Mo-based alloy includes: 63 mass %≦Co

    摘要翻译: Co-Cr-Mo基合金包括:63质量%<= Co <68质量% 15质量%<= Cr <26质量% 10质量%<= Mo <19质量% 和不可避免的杂质的平衡,其中Cr和Mo的总量为32质量%至37%。 合金的质磁化率在室温下为7×4pi×10-9 m3 / kg或更低,合金的维氏硬度(Hv)为400以上。