公开(公告)号：US20130209800A1

公开(公告)日：2013-08-15

申请号：US13820837

申请日：2011-08-18

申请人： Kazue Uemura ,  Yumiko Amino ,  Yuta Suzuki ,  Yoshitomo Ono ,  Emi Nakajima

发明人： Kazue Uemura ,  Yumiko Amino ,  Yuta Suzuki ,  Yoshitomo Ono ,  Emi Nakajima

IPC分类号： C09J7/02 ,  C09J121/00 ,  C09J133/04 ,  C09D183/16

CPC分类号： C09D183/16 ,  C09J7/29 ,  C09J121/00 ,  C09J133/04 ,  C09J183/16 ,  C09J2203/326 ,  C09J2421/00 ,  C09J2433/00 ,  C09J2483/006 ,  H01L51/5253 ,  H01L51/5256 ,  Y10T428/2848

摘要： The invention pertains to an adhesive sheet including a base material having thereon at least a gas barrier layer and an adhesive layer, wherein the gas barrier layer is constituted of a material containing at least an oxygen atom and a silicon atom; in a surface layer part of the gas barrier layer, an existing proportion of an oxygen atom is from 60 to 75%, an existing proportion of a nitrogen atom is from 0 to 10%, and an existing proportion of a silicon atom is from 25 to 35% relative to a total existing amount of the oxygen atom, the nitrogen atom, and the silicon atom; and a film density in the surface layer part of the gas barrier layer is from 2.4 to 4.0 g/cm3, and also to an electronic device provided with the subject adhesive sheet as an electronic device member. The invention is able to provide an adhesive sheet with excellent gas barrier properties, resistance to folding and transparency and also an electronic device provided with the subject adhesive sheet as an electronic device member.

摘要翻译： 本发明涉及一种粘合片，其包括至少具有阻气层和粘合剂层的基材，其中阻气层由至少含有氧原子和硅原子的材料构成; 在阻气层的表层部分中，氧原子的存在比例为60〜75％，氮原子的比例为0〜10％，硅原子的比例为25 至35％，相对于氧原子，氮原子和硅原子的总存在量; 并且阻气层的表层部分中的膜密度为2.4〜4.0g / cm 3，并且还包括设置有作为电子器件构件的被摄体粘合片的电子设备。 本发明能够提供具有优异的阻气性，抗折叠性和透明性的粘合片，以及设置有作为电子器件的目标粘合片的电子装置。

公开(公告)号：US09611541B2

公开(公告)日：2017-04-04

申请号：US13138499

申请日：2010-03-24

申请人： Shinichi Hoshi ,  Takeshi Kondo ,  Kazue Uemura ,  Yuta Suzuki

发明人： Shinichi Hoshi ,  Takeshi Kondo ,  Kazue Uemura ,  Yuta Suzuki

IPC分类号： C23C14/14 ,  C23C14/48 ,  C23C14/56 ,  B05D1/00 ,  B05D3/14

CPC分类号： C23C14/48 ,  B05D1/62 ,  B05D3/148 ,  B05D2252/02 ,  C23C14/562

摘要： Disclosed is a formed article comprising a layer obtained by implanting ions of a hydrocarbon compound into a polyorganosiloxane compound-containing layer. Also disclosed are: a method of producing the formed article, the method comprising implanting ions of a hydrocarbon compound into a surface of a polyorganosiloxane compound-containing layer of a formed body that includes the polyorganosiloxane compound-containing layer in its surface; an electronic device member that includes the formed article; and an electronic device that includes the electronic device member. The present invention provides; a formed article which exhibits an excellent gas barrier capability, transparency, bendability, antistatic performance, and surface flatness; a method of producing the formed article, an electronic device member, and an electronic device.

公开(公告)号：US20120101221A1

公开(公告)日：2012-04-26

申请号：US13321687

申请日：2010-05-21

申请人： Shinichi Hoshi ,  Masaharu Ito ,  Kazue Uemura ,  Yuta Suzuki

发明人： Shinichi Hoshi ,  Masaharu Ito ,  Kazue Uemura ,  Yuta Suzuki

IPC分类号： C08L83/00

CPC分类号： C23C14/48 ,  B32B27/06 ,  B32B2307/7244 ,  C08J7/047 ,  C08J7/123 ,  C08J2383/05 ,  G02F1/133305 ,  G02F2201/501 ,  G02F2201/503 ,  H01L31/049 ,  Y02E10/50

摘要： A formed article comprising a gas barrier layer that is formed of a material including at least an oxygen atom, a carbon atom, and a silicon atom, the gas barrier layer including an area (A) where an oxygen atom content rate gradually decreases, and a carbon atom content rate gradually increases in a depth direction from a surface, the area (A) including a partial area (A1) and a partial area (A2), the (A1) having a specific oxygen, carbon and silicon content, and the (A2) having a specific oxygen, carbon and silicon content; a method of producing the same; an electronic device member; an electronic device. The formed article exhibits an excellent gas barrier capability, excellent bendability, excellent adhesion, and excellent surface flatness.

摘要翻译： 包含由至少包含氧原子，碳原子和硅原子的材料形成的气体阻隔层的成形体，所述阻气层包括氧原子含有率逐渐降低的区域（A），以及 碳原子含量率从表面的深度方向逐渐增加，包括部分区域（A1）和部分区域（A2）的区域（A），（A1）具有特定的氧，碳和硅含量，以及 （A2）具有特定的氧，碳和硅含量; 其制造方法; 电子设备构件; 电子设备。 该成型体具有优异的阻气性，优异的弯曲性，优异的粘附性和优异的表面平坦度。

公开(公告)号：US20120088880A1

公开(公告)日：2012-04-12

申请号：US13138499

申请日：2010-03-24

申请人： Shinichi Hoshi ,  Takeshi Kondo ,  Kazue Uemura ,  Yuta Suzuki

发明人： Shinichi Hoshi ,  Takeshi Kondo ,  Kazue Uemura ,  Yuta Suzuki

IPC分类号： H05H1/24 ,  C08K5/01 ,  C08L83/04

CPC分类号： C23C14/48 ,  B05D1/62 ,  B05D3/148 ,  B05D2252/02 ,  C23C14/562

摘要： Disclosed is a formed article comprising a layer obtained by implanting ions of a hydrocarbon compound into a polyorganosiloxane compound-containing layer. Also disclosed are: a method of producing the formed article, the method comprising implanting ions of a hydrocarbon compound into a surface of a polyorganosiloxane compound-containing layer of a formed body that includes the polyorganosiloxane compound-containing layer in its surface; an electronic device member that includes the formed article; and an electronic device that includes the electronic device member. The present invention provides; a formed article which exhibits an excellent gas barrier capability, transparency, bendability, antistatic performance, and surface flatness; a method of producing the formed article, an electronic device member, and an electronic device.

摘要翻译： 公开了一种成形制品，其包括通过将烃化合物的离子注入到含有机硅氧烷化合物的层中而获得的层。 还公开了一种生产成型制品的方法，该方法包括将烃化合物的离子注入到其表面上包含含聚有机硅氧烷化合物的层的成形体的含聚有机硅氧烷化合物的层的表面中; 包括所述成形制品的电子装置构件; 以及包括电子设备构件的电子设备。 本发明提供： 表现出优异的阻气性，透明性，弯曲性，抗静电性能和表面平坦度的成形制品; 制成成形品的方法，电子器件部件和电子器件。

公开(公告)号：US20120041116A1

公开(公告)日：2012-02-16

申请号：US13256143

申请日：2010-03-24

申请人： Shinichi Hoshi ,  Takeshi Kondo ,  Kazue Uemura ,  Yuta Suzuki

发明人： Shinichi Hoshi ,  Takeshi Kondo ,  Kazue Uemura ,  Yuta Suzuki

IPC分类号： C08L83/04 ,  C08L67/02 ,  C08K5/5415 ,  C08K5/54 ,  B01J19/08 ,  C08K5/5419

CPC分类号： C23C14/48 ,  C08G77/04 ,  C08J7/06 ,  C08J2383/04 ,  C23C14/20 ,  C23C14/562

摘要： Disclosed is a formed article comprising an ion-implanted layer obtained by implanting ions of a silicon compound into a polymer layer. Also disclosed are: a method of producing the formed article, the method comprising implanting ions of a silicon compound into a surface of a polymer layer of a formed body that includes the polymer layer in its surface; an electronic device member comprising the formed article; an electronic device comprising the electronic device member. Consequently, the present invention provides: a formed article which has excellent gas barrier capability, bendability and surface flatness; a method of producing the formed article, an electronic device member comprising the formed article; an electronic device comprising the electronic device member.

摘要翻译： 公开了一种成形制品，其包括通过将硅化合物的离子注入聚合物层而获得的离子注入层。 还公开了一种制造成型制品的方法，该方法包括将硅化合物的离子注入到其表面上包含聚合物层的成形体的聚合物层的表面中; 包括所述成形制品的电子装置构件; 包括电子设备构件的电子设备。 因此，本发明提供：阻气性，弯曲性，表面平坦性优异的成形体， 一种生产成型物品的方法，一种包括成形物品的电子器件部件; 包括电子设备构件的电子设备。

公开(公告)号：US08865810B2

公开(公告)日：2014-10-21

申请号：US13256143

申请日：2010-03-24

申请人： Shinichi Hoshi ,  Takeshi Kondo ,  Kazue Uemura ,  Yuta Suzuki

发明人： Shinichi Hoshi ,  Takeshi Kondo ,  Kazue Uemura ,  Yuta Suzuki

IPC分类号： C08K5/54 ,  C23C14/48 ,  C23C14/56 ,  C23C14/20

CPC分类号： C23C14/48 ,  C08G77/04 ,  C08J7/06 ,  C08J2383/04 ,  C23C14/20 ,  C23C14/562

摘要： Disclosed is a formed article comprising an ion-implanted layer obtained by implanting ions of a silicon compound into a polymer layer. Also disclosed are: a method of producing the formed article, the method comprising implanting ions of a silicon compound into a surface of a polymer layer of a formed body that includes the polymer layer in its surface; an electronic device member comprising the formed article; an electronic device comprising the electronic device member. Consequently, the present invention provides: a formed article which has excellent gas barrier capability, bendability and surface flatness; a method of producing the formed article, an electronic device member comprising the formed article; an electronic device comprising the electronic device member.

摘要翻译： 公开了一种成形制品，其包括通过将硅化合物的离子注入到聚合物层中而获得的离子注入层。 还公开了一种制造成型制品的方法，该方法包括将硅化合物的离子注入到其表面上包含聚合物层的成形体的聚合物层的表面中; 包括所述成形制品的电子装置构件; 包括电子设备构件的电子设备。 因此，本发明提供：阻气性，弯曲性，表面平坦性优异的成形体， 一种生产成型物品的方法，一种包括成形物品的电子器件部件; 包括电子设备构件的电子设备。

公开(公告)号：US09365922B2

公开(公告)日：2016-06-14

申请号：US13321687

申请日：2010-05-21

申请人： Shinichi Hoshi ,  Masaharu Ito ,  Kazue Uemura ,  Yuta Suzuki

发明人： Shinichi Hoshi ,  Masaharu Ito ,  Kazue Uemura ,  Yuta Suzuki

IPC分类号： C23C14/48 ,  H01L31/049 ,  B32B27/06 ,  G02F1/1333

CPC分类号： C23C14/48 ,  B32B27/06 ,  B32B2307/7244 ,  C08J7/047 ,  C08J7/123 ,  C08J2383/05 ,  G02F1/133305 ,  G02F2201/501 ,  G02F2201/503 ,  H01L31/049 ,  Y02E10/50

摘要： A formed article comprising a gas barrier layer that is formed of a material including at least an oxygen atom, a carbon atom, and a silicon atom, the gas barrier layer including an area (A) where an oxygen atom content rate gradually decreases, and a carbon atom content rate gradually increases in a depth direction from a surface, the area (A) including a partial area (A1) and a partial area (A2), the (A1) having a specific oxygen, carbon and silicon content, and the (A2) having a specific oxygen, carbon and silicon content; a method of producing the same; an electronic device member; an electronic device. The formed article exhibits an excellent gas barrier capability, excellent bendability, excellent adhesion, and excellent surface flatness.

摘要翻译： 包含由至少包含氧原子，碳原子和硅原子的材料形成的阻气层的成形体，所述阻气层包括氧原子含有率逐渐降低的区域（A），以及 碳原子含量率从表面的深度方向逐渐增加，包括部分区域（A1）和部分区域（A2）的区域（A），（A1）具有特定的氧，碳和硅含量，以及 （A2）具有特定的氧，碳和硅含量; 其制造方法; 电子设备构件; 电子设备。 该成型体具有优异的阻气性，优异的弯曲性，优异的粘附性和优异的表面平坦度。

公开(公告)号：US20110274933A1

公开(公告)日：2011-11-10

申请号：US13128348

申请日：2009-12-11

申请人： Shinichi Hoshi ,  Takeshi Kondo ,  Seitaro Yamaguchi ,  Kazue Uemura ,  Yuta Suzuki

发明人： Shinichi Hoshi ,  Takeshi Kondo ,  Seitaro Yamaguchi ,  Kazue Uemura ,  Yuta Suzuki

IPC分类号： B32B13/04 ,  G21K5/00

CPC分类号： B32B27/08 ,  B32B27/281 ,  B32B27/285 ,  B32B27/286 ,  B32B27/288 ,  B32B27/308 ,  B32B27/32 ,  B32B27/325 ,  B32B27/34 ,  B32B27/36 ,  B32B27/365 ,  B32B2250/24 ,  B32B2255/10 ,  B32B2255/20 ,  B32B2255/28 ,  B32B2307/412 ,  B32B2307/558 ,  B32B2307/7242 ,  B32B2307/732 ,  B32B2457/00

摘要： A laminate comprises a gas barrier layer and an inorganic compound layer, the gas barrier layer being formed of a material that includes at least an oxygen atom, a carbon atom, and a silicon atom, the gas barrier layer having an oxygen atom content rate that gradually decreases from the surface of the gas barrier layer in the depth direction, and having a carbon atom content rate that gradually increases from the surface of the gas barrier layer in the depth direction. An electronic device member includes the laminate, and an electronic device includes the electronic device member. The laminate exhibits an excellent gas barrier capability and excellent transparency, and does not produce cracks (i.e., the gas barrier capability does not deteriorate) even when the laminate is folded. The laminate exhibits an excellent gas barrier capability and an excellent impact-absorbing capability even if an impact is applied from the outside.

摘要翻译： 层压体包括气体阻隔层和无机化合物层，阻气层由至少包含氧原子，碳原子和硅原子的材料形成，所述阻气层的氧原子含有率为 在气体阻挡层的深度方向的表面逐渐减少，并且具有从气体阻隔层的表面在深度方向逐渐增加的碳原子含有率。 电子设备构件包括层压体，电子设备包括电子设备构件。 层叠体具有优异的阻气性和优异的透明性，即使层叠体折叠也不产生裂纹（即阻气性不劣化）。 即使从外部施加冲击，该层压体显示出优异的阻气性和优异的冲击吸收能力。

公开(公告)号：US09512334B2

公开(公告)日：2016-12-06

申请号：US14126129

申请日：2012-07-12

申请人： Satoshi Naganawa ,  Yuta Suzuki

发明人： Satoshi Naganawa ,  Yuta Suzuki

IPC分类号： C08J7/18 ,  C09D183/16 ,  C08J7/12 ,  C08J7/04 ,  B05D5/00 ,  C09D1/00

CPC分类号： C09D183/16 ,  B05D5/00 ,  C08J7/042 ,  C08J7/047 ,  C08J7/123 ,  C08J2367/02 ,  C08J2483/16 ,  C09D1/00 ,  H01J2237/3365 ,  H01J2237/3382 ,  H01J2237/3385 ,  Y10T428/265

摘要： Provided are a modified polysilazane film that is preferable as an intermediate material for forming a predetermined gas barrier film, and a method for producing a gas barrier film having excellent gas barrier properties using such modified polysilazane film as an intermediate material. A modified polysilazane film comprising a substrate and a modified polysilazane layer formed thereon, and a method for producing a gas barrier film obtained through such intermediate material, wherein the modified polysilazane layer has a thickness of a value in the range of 10 to 500 nm, and the modified polysilazane layer has a refractive index of a value in the range of 1.48 to 1.63.

摘要翻译： 提供作为用于形成预定阻气膜的中间材料的改性聚硅氮烷膜，以及使用这种改性聚硅氮烷膜作为中间材料的阻气性优异的阻气膜的制造方法。 包含基材和形成在其上的改性聚硅氮烷层的改性聚硅氮烷薄膜，以及通过这种中间材料制备阻气膜的方法，其中改性聚硅氮烷层的厚度为10〜500nm， 改性聚硅氮烷层的折射率为1.48〜1.63的范围。

公开(公告)号：US08846200B2

公开(公告)日：2014-09-30

申请号：US13823688

申请日：2011-09-16

申请人： Masaharu Ito ,  Takeshi Kondo ,  Yuta Suzuki

发明人： Masaharu Ito ,  Takeshi Kondo ,  Yuta Suzuki

IPC分类号： B32B9/04 ,  B32B27/00 ,  C08J7/04 ,  C08J7/18 ,  C23C14/14 ,  C23C14/20 ,  G02F1/1333 ,  H01L51/44 ,  C23C14/48 ,  C09D5/00 ,  C08J7/12 ,  H01L51/52

CPC分类号： C09D5/00 ,  C08J7/047 ,  C08J7/123 ,  C08J2369/00 ,  C08J2381/06 ,  C08J2483/16 ,  C23C14/48 ,  G02F1/133305 ,  H01L51/448 ,  H01L51/5253 ,  H01L2251/5338 ,  Y02E10/549 ,  Y02P70/521 ,  Y10T428/31667

摘要： The present invention provides a gas barrier film including a base layer, and a gas barrier layer that is provided on at least one side of the base layer, the base layer including a resin having a glass transition temperature (Tg) of more than 130° C., the gas barrier layer being formed of a material that includes at least an oxygen atom and a silicon atom, a surface layer part of the gas barrier layer having an oxygen atom content rate of 60 to 75%, a nitrogen atom content rate of 0 to 10%, and a silicon atom content rate of 25 to 35%, based on a total content rate of oxygen atoms, nitrogen atoms, and silicon atoms, and the surface layer part of the gas barrier layer having a film density of 2.4 to 4.0 g/cm3. Also provided are a process for producing the same, an electronic device member that includes the gas barrier film, and an electronic device that includes the electronic device member. The gas barrier film of the invention exhibits an excellent gas barrier capability, excellent transparency, excellent bending resistance, and excellent heat resistance.

摘要翻译： 本发明提供了一种阻气膜，其包括基底层和设置在基底层的至少一侧的阻气层，所述基底层包括玻璃化转变温度（Tg）大于130°的树脂 气体阻隔层由至少包含氧原子和硅原子的材料形成，阻气层的氧原子含有率为60〜75％的表层部分，氮原子含有率 为0〜10％，硅原子含有率为25〜35％，基于氧原子，氮原子和硅原子的总含有率，阻气层的表层部分的膜密度为 2.4〜4.0g / cm 3。 还提供了制造该方法的方法，包括阻气膜的电子器件部件和包括该电子器件部件的电子器件。 本发明的阻气膜表现出优异的阻气性，优异的透明性，优异的耐弯曲性和优异的耐热性。