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公开(公告)号:US06949678B2
公开(公告)日:2005-09-27
申请号:US09734625
申请日:2000-12-12
申请人: Kazuhiko Kunimoto , Hidetaka Oka , Masaki Ohwa , Junichi Tanabe , Hisatoshi Kura , Jean-Luc Birbaum
发明人: Kazuhiko Kunimoto , Hidetaka Oka , Masaki Ohwa , Junichi Tanabe , Hisatoshi Kura , Jean-Luc Birbaum
IPC分类号: G03F7/027 , A61K6/083 , B41M3/00 , C07C251/50 , C07C251/62 , C07C251/66 , C07C251/68 , C07C317/28 , C07C317/32 , C07C323/47 , C07C327/30 , C07D207/32 , C07D207/335 , C07D209/86 , C07D333/20 , C07D335/16 , C07D339/08 , C08F2/50 , G02B5/20 , G03F7/00 , G03F7/004 , G03F7/029 , G03F7/031 , C07C251/60
CPC分类号: C07D207/335 , A61K6/083 , B33Y70/00 , B41M3/003 , C07C251/66 , C07C251/68 , C07C317/32 , C07C323/47 , C07C327/30 , C07D209/86 , C07D333/20 , C07D335/16 , C07D339/08 , G03F7/0007 , G03F7/0045 , G03F7/031
摘要: Compounds of the formulae I, II, III, IV and V wherein R1 i.a. is C4-C9cycloalkanoyl, C1-C12alkanoyl, C4-C6alkenoyl, or benzoyl; R2 is for example phenyl, C1-C20alkyl, C3-C8cycloalkyl, C2-C20alkanoyl, or benzoyl; Ar1 is R4S-phenyl or NR5R6-phenyl, each of which optionally is substituted; or Ar1 i.a. is optionally substituted; or Ar1 is naphthyl or anthracyl each of which is unsubstituted or substituted; or Ar1 is benzoyl, naphthalenecarbonyl, phenanthrenecarbonyl, anthracenecarbonyl or pyrenecarbonyl, each of which is unsubstituted or substituted, or Ar1 is 3,4,5-trimethoxyphenyl, phenoxyphenyl or biphenyl; Ar2 i.a. is optionally substituted, or naphthyl or anthracyl, each of which is unsubstituted or substituted, x is 2 or 3; M1 when x is 2, for example is phenylene, naphthalene, anthracylene, each of which optionally is substituted; M1, when x is 3, is a trivalent radical; M2 for example is M3 is for example C1-C12alkylene, cyclohexylene, or phenylene; n is 1-20; R3 is for example hydrogen or C1-C12alkyl; R3′ i.a. is C1-C12alkyl; substituted or —O-interrupted C2-C6alkyl; R4 is for example hydrogen, or C1-C12alkyl; and R5 and R6 independently of each other i.a. are hydrogen, C1-C12alkyl, or phenyl; are suitable as photoinitiators in particular in resist applications.
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公开(公告)号:US20050191567A1
公开(公告)日:2005-09-01
申请号:US11103194
申请日:2005-04-11
申请人: Kazuhiko Kunimoto , Hidetaka Oka , Masaki Ohwa , Junichi Tanabe , Hisatoshi Kura , Jean-Luc Birbaum
发明人: Kazuhiko Kunimoto , Hidetaka Oka , Masaki Ohwa , Junichi Tanabe , Hisatoshi Kura , Jean-Luc Birbaum
IPC分类号: G03F7/027 , A61K6/083 , B41M3/00 , C07C251/50 , C07C251/62 , C07C251/66 , C07C251/68 , C07C317/28 , C07C317/32 , C07C323/47 , C07C327/30 , C07D207/32 , C07D207/335 , C07D209/86 , C07D333/20 , C07D335/16 , C07D339/08 , C08F2/50 , G02B5/20 , G03F7/00 , G03F7/004 , G03F7/029 , G03F7/031 , G03F9/00
CPC分类号: C07D207/335 , A61K6/083 , B33Y70/00 , B41M3/003 , C07C251/66 , C07C251/68 , C07C317/32 , C07C323/47 , C07C327/30 , C07D209/86 , C07D333/20 , C07D335/16 , C07D339/08 , G03F7/0007 , G03F7/0045 , G03F7/031
摘要: Compounds of the formulae I, II, III, IV and V wherein R1 i.a. is C4-C9cycloalkanoyl, C1-C12alkanoyl, C4-C6alkenoyl, or benzoyl; R2 is for example phenyl, C1-C20alkyl, C3-C8cycloalkyl, C2-C20alkanoyl, or benzoyl; Ar1 is R4S-phenyl or NR5R6-phenyl, each of which optionally is substituted; or Ar1 i.a. is optionally substituted; or Ar1 is naphthyl or anthracyl each of which is unsubstituted or substituted; or Ar1 is benzoyl, naphthalenecarbonyl, phenanthrenecarbonyl, anthracenecarbonyl or pyrenecarbonyl, each of which is unsubstituted or substituted, or Ar1 is 3,4,5-trimethoxyphenyl, phenoxyphenyl or biphenyl; Ar2 i.a. is optionally substituted, or naphthyl or anthracyl, each of which is unsubstituted or substituted, x is 2 or 3; M1 when x is 2, for example is phenylene, naphthalene, anthracylene, each of which optionally is substituted; M1, when x is 3, is a trivalent radical; M2 for example is M3 is for example C1-C12alkylene, cyclohexylene, or phenylene; n is 1-20; R3 is for example hydrogen or C1-C12alkyl; R3′ i.a. is C1-C12alkyl; substituted or —O-interrupted C2-C6alkyl; R4 is for example hydrogen, or C1-C12alkyl; and R5 and R6 independently of each other i.a. are hydrogen, C1-C12alkyl, or phenyl; are suitable as photoinitiators in particular in resist applications.
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公开(公告)号:US07381842B2
公开(公告)日:2008-06-03
申请号:US11103194
申请日:2005-04-11
申请人: Kazuhiko Kunimoto , Hidetaka Oka , Masaki Ohwa , Junichi Tanabe , Hisatoshi Kura , Jean-Luc Birbaum
发明人: Kazuhiko Kunimoto , Hidetaka Oka , Masaki Ohwa , Junichi Tanabe , Hisatoshi Kura , Jean-Luc Birbaum
IPC分类号: C07C251/60
CPC分类号: C07D207/335 , A61K6/083 , B33Y70/00 , B41M3/003 , C07C251/66 , C07C251/68 , C07C317/32 , C07C323/47 , C07C327/30 , C07D209/86 , C07D333/20 , C07D335/16 , C07D339/08 , G03F7/0007 , G03F7/0045 , G03F7/031
摘要: Compounds of the formulae I, II, III, IV and V wherein R1 i.a. is C4-C9cycloalkanoyl, C1-C12alkanoyl, C4-C6alkenoyl, or benzoyl; R2 is for example phenyl, C1-C20alkyl, C3-C8cycloalkyl, C2-C20alkanoyl, or benzoyl; Ar1 is R4S-phenyl or NR5R6-phenyl, each of which optionally is substituted; or Ar1 i.a. is optionally substituted; or Ar1 is naphthyl or anthracyl each of which is unsubstituted or substituted; or Ar1 is benzoyl, naphthalenecarbonyl, phenanthrenecarbonyl, anthracenecarbonyl or pyrenecarbonyl, each of which is unsubstituted or substituted, or Ar1 is 3,4,5-trimethoxyphenyl, phenoxyphenyl or biphenyl; Ar2 i.a. is optionally substituted, or naphthyl or anthracyl, each of which is unsubstituted or substituted, x is 2 or 3; M1 when x is 2, for example is phenylene, naphthalene, anthracylene, each of which optionally is substituted; M1, when x is 3, is a trivalent radical; M2 for example is M3 is for example C1-C12alkylene, cyclohexylene, or phenylene; n is 1-20; R3 is for example hydrogen or C1-C12alkyl; R3′ i.a. is C1-C12alkyl; substituted or —O-interrupted C2-C6alkyl; R4 is for example hydrogen, or C1-C12alkyl; and R5 and R6 independently of each other i.a. are hydrogen, C1-C12alkyl, or phenyl; are suitable as photoinitiators in particular in resist applications.
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公开(公告)号:US07759043B2
公开(公告)日:2010-07-20
申请号:US11660346
申请日:2005-08-08
申请人: Junichi Tanabe , Kazuhiko Kunimoto , Hisatoshi Kura , Hidetaka Oka , Masaki Ohwa
发明人: Junichi Tanabe , Kazuhiko Kunimoto , Hisatoshi Kura , Hidetaka Oka , Masaki Ohwa
IPC分类号: G03C1/00 , C07D213/00 , C07D207/00 , C07D209/56 , C09B5/00 , G03F7/26 , C08F2/50
CPC分类号: G03F7/031 , B33Y70/00 , C07D209/86 , C07D413/10
摘要: Compounds of the formula (I), wherein R1, R2 and R10 independently of one another are C1-C20alkyl, phenyl, C1-C12alkylphenyl or phenyl-C1-C6alkyl; R3 and R4 independently of one another are hydrogen, C1-C20alkyl, NR6R7 or SR8, provided that at least one of R3 or R4 is NR6R7 or SR8; R5 is hydrogen or C1-C20alkyl; R6 and R7 independently of one another are C1-C20alkyl, or R6 and R7 together with the N-atom to which they are attached form a 5 or 6 membered ring, which optionally is interrupted by O, S or NR9 and which optionally additionally is substituted by one or more C1-C4alkyl; R8 is phenyl, biphenylyl, naphthyl, anthryl or phenanthryl, all of which optionally are substituted by one or more C1-C4alkyl; and R9 is hydrogen, C1-C20alkyl, C2-C4hydroxyalkyl or phenyl; exhibit an unexpectedly good performance in photopolymerization reactions.
摘要翻译: 式(I)化合物,其中R 1,R 2和R 10彼此独立地是C 1 -C 20烷基,苯基,C 1 -C 12烷基苯基或苯基-C 1 -C 6烷基; R 3和R 4彼此独立地是氢,C 1 -C 20烷基,NR 6 R 7或SR 8,条件是R 3或R 4中的至少一个是NR 6 R 7或SR 8; R5是氢或C1-C20烷基; R 6和R 7彼此独立地是C 1 -C 20烷基,或者R 6和R 7与它们所连接的N原子一起形成5或6元环,其任选地被O,S或NR 9中断,并且任选地另外是 被一个或多个C 1 -C 4烷基取代; R8是苯基,联苯基,萘基,蒽基或菲基,它们全部被一个或多个C 1 -C 4烷基取代; 且R 9为氢,C 1 -C 20烷基,C 2 -C 4羟烷基或苯基; 在光聚合反应中表现出出人意料的良好性能。
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公开(公告)号:US07829257B2
公开(公告)日:2010-11-09
申请号:US09734635
申请日:2000-12-12
申请人: Hidetaka Oka , Kazuhiko Kunimoto , Hisatoshi Kura , Masaki Ohwa , Junichi Tanabe
发明人: Hidetaka Oka , Kazuhiko Kunimoto , Hisatoshi Kura , Masaki Ohwa , Junichi Tanabe
IPC分类号: G03C1/00
摘要: Photosensitive compositions comprising (A) an alkali soluble compound; (B) at least one compound, of formula I or II wherein R1 inter alia is C4-C9cycloalkanoyl, C3-C12alkenoyl, or benzoyl which is unsubstituted or substituted; Ar1 is either C6-C20aryl or C6-C20aryloyl each of which is unsubstituted or substituted; x is 2 or 3; M1 when x is 2, inter alia is a group phenylene or naphthylene, each of which optionally is substituted i.a. by OR3, SR4 or NR5R6; or M1, when x is 3, is a trivalent group, optionally substituted; R3 is for example hydrogen or C1-C12alkyl; C2-C6alkyl which is for example substituted by —OH, —SH, —CN, C3-C6alkenoxy, or —OCH2CH2CN; R4 is for example hydrogen, C1-C12alkyl, C3-C12alkenyl, cyclohexyl, or phenyl which is unsubstituted or substituted; R5 and R6 independently of each other inter alia are hydrogen, C1-C12alkyl, C2-C4hydroxyalkyl, C2-C10alkoxyalkyl, C3-C5alkenyl, C3-C8cycloalkyl, phenyl-C1-C3alkyl, C1-C4alkanoyl, C3-C6alkenoyl, benzoyl or phenyl which is unsubstituted or substituted; and (C) a photopolymerizable compound; exhibit an unexpectedly good performance, in particular in photoresist technology.
摘要翻译: 光敏组合物,其包含(A)碱溶性化合物; (B)至少一种式I或II的化合物,其中R 1特别是C 4 -C 9环烷酰基,C 3 -C 12烯酰基或未取代或取代的苯甲酰基; Ar 1是C 6 -C 20芳基或C 6 -C 20芳酰基,其各自为未取代或取代的; x为2或3; M1当x为2时,特别是亚苯基或亚萘基,其各自任选被取代。 由OR3,SR4或NR5R6; 或M1,当x为3时,为任选取代的三价基团; R3是例如氢或C1-C12烷基; 例如被-OH,-SH,-CN,C 3 -C 6烯氧基或-OCH 2 CH 2 CN取代的C 2 -C 6烷基; R4是例如氢,C1-C12烷基,C3-C12链烯基,环己基或未取代或取代的苯基; R 5和R 6彼此独立地尤其是氢,C 1 -C 12烷基,C 2 -C 4羟烷基,C 2 -C 10烷氧基烷基,C 3 -C 5烯基,C 3 -C 8环烷基,苯基-C 1 -C 3烷基,C 1 -C 4烷酰基,C 3 -C 6烯酰基,苯甲酰基或苯基 未取代或取代; 和(C)可光聚合化合物; 表现出意想不到的良好性能,特别是在光刻胶技术中。
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公开(公告)号:US20080096115A1
公开(公告)日:2008-04-24
申请号:US11660346
申请日:2005-08-08
申请人: Junichi Tanabe , Kazuhiko Kunimoto , Hisatoshi Kura , Hidetaka Oka , Masaki Ohwa
发明人: Junichi Tanabe , Kazuhiko Kunimoto , Hisatoshi Kura , Hidetaka Oka , Masaki Ohwa
IPC分类号: C08F2/46 , C07D209/88 , G03F3/00 , G03F7/40
CPC分类号: G03F7/031 , B33Y70/00 , C07D209/86 , C07D413/10
摘要: Compounds of the formula (I), wherein R1, R2 and R10 independently of one another are C1-C20alkyl, phenyl, C1-C12alkylphenyl or phenyl-C1-C6alkyl; R3 and R4 independently of one another are hydrogen, C1-C20alkyl, NR6R7 or SR8, provided that at least one of R3 or R4 is NR6R7 or SR8; R5 is hydrogen or C1-C20alkyl; R6 and R7 independently of one another are C1-C20alkyl, or R6 and R7 together with the N-atom to which they are attached form a 5 or 6 membered ring, which optionally is interrupted by O, S or NR9 and which optionally additionally is substituted by one or more C1-C4alkyl; R8 is phenyl, biphenylyl, naphthyl, anthryl or phenanthryl, all of which optionally are substituted by one or more C1-C4alkyl; and R9 is hydrogen, C1-C20alkyl, C2-C4hydroxyalkyl or phenyl; exhibit an unexpectedly good performance in photopolymerization reactions.
摘要翻译: 式(I)的化合物,其中R 1,R 2和R 10彼此独立地为C 1〜 C 1 -C 20烷基,苯基,C 1 -C 12烷基苯基或苯基-C 1 -C 1 -C 12烷基, C 6烷基; R 3和R 4彼此独立地是氢,C 1 -C 20烷基,NR N > 6> R 7或SR 8,条件是R 3或R 4中的至少一个 SUB >是NR 6 R 7或SR 8; R 5是氢或C 1 -C 20烷基; R 6和R 7彼此独立地是C 1 -C 20烷基,或R 1和R 2彼此独立地是C 1 -C 6烷基, 6和R 7与它们所连接的N-原子一起形成5或6元环,其任选被O,S或NR 9中断, 并且其任选另外被一个或多个C 1 -C 4烷基取代; R 8是苯基,联苯基,萘基,蒽基或菲基,它们全部被任意被一个或多个C 1 -C 4烷基取代 ; R 9是氢,C 1 -C 20烷基,C 2 -C 4烷基,C 1 -C 20烷基, 羟基烷基或苯基; 在光聚合反应中表现出出人意料的良好性能。
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公开(公告)号:US07189489B2
公开(公告)日:2007-03-13
申请号:US10480146
申请日:2002-06-04
申请人: Kazuhiko Kunimoto , Junichi Tanabe , Hisatoshi Kura , Hidetaka Oka , Masaki Ohwa
发明人: Kazuhiko Kunimoto , Junichi Tanabe , Hisatoshi Kura , Hidetaka Oka , Masaki Ohwa
IPC分类号: G03F7/004
CPC分类号: C08F2/50 , B33Y70/00 , C07C251/66 , G03F7/031
摘要: Compounds of the formulae I, II and III wherein R1 is for example hydrogen, C3–C8cycloalkyl, C1–C12alkyl, phenyl unsubstituted or substituted; R2 and R2′ for example are hydrogen, C1–C20alkyl, C3–C8cycloalkyl or phenyl, unsubstituted or substituted, or are Ar1 is for example phenyl, optionally substituted by e.g. Ar2 is for example phenylene, optionally substituted e.g. by —(CO)R7, (D), (E) or (F); Ar3 is for example phenyl; M1, M2 and M3 are, for example, C1–C20alkylene; M4 is for example direct bond, —O—, —S—, —Y—(C1–C10alkylene)-Y′—, optionally substituted; Y and Y′ are for example a direct bond or —O—; R7 is for example hydrogen, C1–C20alkyl or phenyl, optionally substituted; R8, R9, R8′ and R9′ are for example hydrogen or C1–C12alkyl, exhibit an unexpectedly good performance in photopolymerization reactions.
摘要翻译: 式I,II和III的化合物,其中R 1是例如氢,C 3 -C 8环烷基,C 1 C 12 -C 12烷基,未取代或取代的苯基; R 2和R 2是例如氢,C 1 -C 20烷基,C 1 -C 12烷基,C 1 -C 12烷基, C 3 -C 8环烷基或未取代或取代的苯基,或者Ar 1是例如苯基,任选地被例如 Ar 2是例如亚苯基,任选被取代的例如亚苯基。 (CO)R 7,(D),(E)或(F); Ar 3是例如苯基; M 1,M 2和M 3是例如C 1 -C 20, 亚烷基; M 4是例如直接键合,-O - , - S-, - Y-(C 1 -C 10亚烷基)-Y ' - ,任选取代; Y和Y'例如是直接键或-O-键; R 7是例如氢,C 1 -C 20烷基或任选被取代的苯基; R 8,R 9,R 8和R 9是例如氢或C 1 -C 8烷基, 1 -C 12烷基,在光聚合反应中表现出出乎意料的良好性能。
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公开(公告)号:US06596445B1
公开(公告)日:2003-07-22
申请号:US09338152
申请日:1999-06-23
申请人: Akira Matsumoto , Hidetaka Oka , Masaki Ohwa , Hisatoshi Kura , Jean-Luc Birbaum , Kurt Dietliker
发明人: Akira Matsumoto , Hidetaka Oka , Masaki Ohwa , Hisatoshi Kura , Jean-Luc Birbaum , Kurt Dietliker
IPC分类号: C07C25164
CPC分类号: C07C251/66 , B33Y70/00 , C07C251/68 , C07C323/47 , C07D295/135 , C07D335/18 , C08F2/50 , G03F7/0007 , G03F7/002 , G03F7/0045 , G03F7/031 , G03F7/0388
摘要: Oximeester compounds of the formulae I, II, III and IV wherein R1 is phenyl, C1-C20alkyl or C2-C20alkyl optionally interrupted by —O—, C2-C20alkanoyl or benzoyl, or R1 is C2-C12alkoxycarbonyl or phenoxycarbonyl; R1′ is C2-C12alkoxycarbonyl, or R1′ is phenoxycarbonyl, or R1′ is —CONR10R11 or CN; R2 is C2-C12alkanoyl, C4-C6alkenoyl, benzoyl, C2-C6alkoxycarbonyl or phenoxycarbonyl; R3, R4, R5, R6 and R7 are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl or a group OR8, SR9, SOR9, SO2R9 or NR10R11; R4′, R5′ and R6′ are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12-alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl, or are a group OR8, SR9, SOR9, SO2R9, NR10R11; provided that at least one of R3, R4, R5, R6, R7, R′4, R′5 and R′6 is OR8, SR9 or NR10R11; R8, R9, R10 and R11 are for example hydrogen, C1-C12alkyl, phenyl; are suitable as initiators for the photopolymerization of radically polymerizable compounds.
摘要翻译: 式I,II,III和IV其中R 1的肟酯化合物是苯基,任选被-O - ,C 2 -C 20烷酰基或苯甲酰基中断的C 1 -C 20烷基或C 2 -C 20烷基,或者R 1是C 2 -C 12烷氧基羰基或苯氧基羰基; R1'是C2-C12烷氧基羰基,或R1'是苯氧基羰基,或R1'是-CONR10R11或CN; R2是C2-C12烷酰基,C4-C6链烯酰基,苯甲酰基,C2-C6烷氧基羰基或苯氧基羰基; R3,R4,R5,R6和R7是氢,卤素,C1-C12烷基,环戊基,环己基,苯基,苄基,苯甲酰基,C2-C12烷酰基,C2-C12烷氧基羰基,苯氧基羰基或OR8,SR9,SOR9,SO2R9或NR10R11; R4',R5'和R6'为氢,卤素,C1-C12烷基,环戊基,环己基,苯基,苄基,苯甲酰基,C2-C12-烷酰基,C2-C12烷氧基羰基,苯氧基羰基,或为OR8,SR9,SOR9,SO2R9 ,NR10R11; 条件是R3,R4,R5,R6,R7,R'4,R'5和R'6中的至少一个是OR8,SR9或NR10R
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公开(公告)号:US07648738B2
公开(公告)日:2010-01-19
申请号:US10535962
申请日:2003-11-24
申请人: Junichi Tanabe , Hisatoshi Kura , Hidetaka Oka , Masaki Ohwa
发明人: Junichi Tanabe , Hisatoshi Kura , Hidetaka Oka , Masaki Ohwa
IPC分类号: C07C251/60 , G03F1/00 , G03C1/73
CPC分类号: C07D207/333 , B33Y70/00 , C07D207/335 , C07D209/12 , C07D209/14 , C07D209/42 , C07D333/22 , C07D333/38 , C07D333/58 , C07D401/06 , C07D403/06 , C07D405/06 , C07D409/06 , C07D409/14 , C08F2/50 , G03F7/031
摘要: Compounds of the formulae (I), (II), (III) and (IV), wherein Ch1 is e.g. the formula (V) or (VI); Ch2 is the formula (VII) or (VIII); Het1 is for example furyl, thienyl, pyrrolyl, pyridyl, benzothienyl, quinolyl or bithienyl; each of which is optionally substituted; Het2 and Het2′ e.g. are furylene, thienylene, pyrrolylene, benzothienylene, quinolylene, furylenecarbonyl, thienylenecarbonyl, benzothienylenecarbonyl or bithienylenecarbonyl; each of which is optionally substituted; A1, and Ar1′ i.a. are phenyl, naphthyl, benzoyl or naphthoyl, each of which is optionally substituted; Ar2 is for example phenylene, optionally substituted; M i.a. is C1-C20alkylene; R1 is for example C1-C12alkyl or phenyl; R2 and R2′ for example are hydrogen or C1-C20 alkyl; exhibit an unexpectedly good performance in photopolymerization reactions.
摘要翻译: 式(I),(II),(III)和(IV)的化合物,其中Ch1是例如。 式(Ⅴ)或(Ⅵ); Ch2是式(VII)或(VIII); Het1例如是呋喃基,噻吩基,吡咯基,吡啶基,苯并噻吩基,喹啉基或二噻吩基; 它们各自任选被取代; Het2和Het2' 呋喃基,噻吩乙烯基,吡咯基,苯并噻吩基,喹啉基,呋喃基羰基,噻吩羰基,苯并噻吩羰基或二噻吩羰基; 它们各自任选被取代; A1和Ar1'i.a. 是苯基,萘基,苯甲酰基或萘甲酰基,其各自任选被取代; Ar 2是例如亚苯基,任选被取代; 我是 是C 1 -C 20亚烷基; R1是例如C1-C12烷基或苯基; R2和R2'例如是氢或C1-C20烷基; 在光聚合反应中表现出出人意料的良好性能。
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公开(公告)号:US20060241259A1
公开(公告)日:2006-10-26
申请号:US10535962
申请日:2003-11-24
申请人: Junichi Tanabe , Hisatoshi Kura , Hidetaka Oka , Masaki Ohwa
发明人: Junichi Tanabe , Hisatoshi Kura , Hidetaka Oka , Masaki Ohwa
IPC分类号: C08F4/00
CPC分类号: C07D207/333 , B33Y70/00 , C07D207/335 , C07D209/12 , C07D209/14 , C07D209/42 , C07D333/22 , C07D333/38 , C07D333/58 , C07D401/06 , C07D403/06 , C07D405/06 , C07D409/06 , C07D409/14 , C08F2/50 , G03F7/031
摘要: Compounds of the formulae (I), (II), (III) and (IV), wherein Ch1 is e.g. the formula (V) or (VI); Ch2 is the formula (VII) or (VIII); Het1 is for example furyl, thienyl, pyrrolyl, pyridyl, benzothienyl, quinolyl or bithienyl; each of which is optionally substituted; Het2 and Het2′ e.g. are furylene, thienylene, pyrrolylene, benzothienylene, quinolylene, furylenecarbonyl, thienylenecarbonyl, benzothienylenecarbonyl or bithienylenecarbonyl; each of which is optionally substituted; A1, and Ar1′ i.a. are phenyl, naphthyl, benzoyl or naphthoyl, each of which is optionally substituted; Ar2 is for example phenylene, optionally substituted; M i.a. is C1-C20alkylene; R1 is for example C1-C12alkyl or phenyl; R2 and R2′ for example are hydrogen or C1-C20 alkyl; exhibit an unexpectedly good performance in photopolymerization reactions.
摘要翻译: 式(I),(II),(III)和(IV)的化合物,其中CH 1是例如。 式(Ⅴ)或(Ⅵ); 式(VII)或(VIII);式 Het 1是例如呋喃基,噻吩基,吡咯基,吡啶基,苯并噻吩基,喹啉基或二噻吩基; 它们各自任选被取代; 例如Het 2和Het 2。 呋喃基,噻吩乙烯基,吡咯基,苯并噻吩基,喹啉基,呋喃基羰基,噻吩羰基,苯并噻吩羰基或二噻吩羰基; 它们各自任选被取代; A 1< 1>和Ar 1< 1> 是苯基,萘基,苯甲酰基或萘甲酰基,其各自任选被取代; Ar 2是例如亚苯基,任选被取代; 我是 是C 1 -C 20亚烷基; R 1是例如C 1 -C 12烷基或苯基; R 2和R 2是例如氢或C 1 -C 20烷基; R 2是氢或C 1 -C 20烷基; 在光聚合反应中表现出出人意料的良好性能。
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