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公开(公告)号：US07604424B2
公开(公告)日：2009-10-20
申请号：US11472780
申请日：2006-06-22
申请人： Kazuhito Shigemori , Koji Kaneyama , Akiko Harumoto , Tadashi Miyagi , Masashi Kanaoka , Shuichi Yasuda
发明人： Kazuhito Shigemori , Koji Kaneyama , Akiko Harumoto , Tadashi Miyagi , Masashi Kanaoka , Shuichi Yasuda
CPC分类号： H01L21/02087 , G03F7/00 , G03F7/162 , G03F7/168 , G03F7/2041 , H01L21/67034 , H01L21/67051 , H01L21/6708 , H01L21/67173 , H01L21/67178 , H01L21/67225 , H01L21/67742 , Y10S134/902
摘要： A substrate processing apparatus comprises an indexer block, an edge-cleaning processing block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block and an interface block. An exposure device is arranged adjacent to the interface block of the substrate processing apparatus. In the exposure device, exposure processing is applied to a substrate by a liquid immersion method. In the edge-cleaning processing group in the edge-cleaning processing block, an edge of the substrate before exposure processing is cleaned.
摘要翻译： 基板处理装置包括分度器块，边缘清洁处理块，防反射膜处理块，抗蚀剂膜处理块，显影处理块，抗蚀剂覆盖膜处理块，抗蚀剂覆盖膜去除块， 清洁/干燥处理块和接口块。 曝光装置被布置成与基板处理装置的界面块相邻。 在曝光装置中，通过液浸法对基板进行曝光处理。 在边缘清洁处理块中的边缘清洁处理组中，清洁曝光处理之前的基板的边缘。
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公开(公告)号：US20060291855A1
公开(公告)日：2006-12-28
申请号：US11472780
申请日：2006-06-22
申请人： Kazuhito Shigemori , Koji Kaneyama , Akiko Harumoto , Tadashi Miyagi , Masashi Kanaoka , Shuichi Yasuda
发明人： Kazuhito Shigemori , Koji Kaneyama , Akiko Harumoto , Tadashi Miyagi , Masashi Kanaoka , Shuichi Yasuda
IPC分类号： G03D5/00
CPC分类号： H01L21/02087 , G03F7/00 , G03F7/162 , G03F7/168 , G03F7/2041 , H01L21/67034 , H01L21/67051 , H01L21/6708 , H01L21/67173 , H01L21/67178 , H01L21/67225 , H01L21/67742 , Y10S134/902
摘要： A substrate processing apparatus comprises an indexer block, an edge-cleaning processing block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block and an interface block. An exposure device is arranged adjacent to the interface block of the substrate processing apparatus. In the exposure device, exposure processing is applied to a substrate by a liquid immersion method. In the edge-cleaning processing group in the edge-cleaning processing block, an edge of the substrate before exposure processing is cleaned.
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公开(公告)号：US08496761B2
公开(公告)日：2013-07-30
申请号：US12754872
申请日：2010-04-06
申请人： Koji Kaneyama , Akihiro Hisai , Toru Asano , Hiroshi Kobayashi , Tsuyoshi Okumura , Shuichi Yasuda , Masashi Kanaoka , Tadashi Miyagi , Kazuhito Shigemori
发明人： Koji Kaneyama , Akihiro Hisai , Toru Asano , Hiroshi Kobayashi , Tsuyoshi Okumura , Shuichi Yasuda , Masashi Kanaoka , Tadashi Miyagi , Kazuhito Shigemori
CPC分类号： G03F7/70991 , G03F7/70341
摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to an interface block. The interface block comprises a drying processing group including two drying processing units and an interface transport mechanism. After a substrate is subjected to exposure processing by the exposure device, the substrate is transported to the drying processing units in the drying processing group by the interface transport mechanism, where the substrate is subjected to cleaning and drying processings.
摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块和界面块。 曝光装置被布置成与界面块相邻。 接口块包括干燥处理组，其包括两个干燥处理单元和界面输送机构。 在通过曝光装置对基板进行曝光处理之后，通过界面传送机构将基板输送到干燥处理组中的干燥处理单元，其中对基板进行清洁和干燥处理。
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公开(公告)号：US20100239986A1
公开(公告)日：2010-09-23
申请号：US12813251
申请日：2010-06-10
CPC分类号： G03F7/70991 , H01L21/67051 , H01L21/67173 , H01L21/67178
摘要： The transporting process from cleaning and drying processing of a substrate in a cleaning/drying processing unit in a cleaning/drying processing group to post-exposure bake (PEB) of the substrate in a thermal processing group for post-exposure bake in a cleaning/drying processing block is described below. First, after the substrate after exposure processing is subjected to the cleaning and drying processing in the cleaning/drying processing group, a sixth central robot takes out the substrate from the cleaning/drying processing group and carries that substrate into the thermal processing group for post-exposure bake in the cleaning/drying processing block.
摘要翻译： 在清洁/干燥处理组中的清洁/干燥处理单元中的基板的清洁和干燥处理到在热处理组中的曝光后烘烤（PEB）的后处理组中的曝光后烘烤处理的传送过程， 干燥处理块如下所述。 首先，在清洗/干燥处理组中对曝光处理后的基板进行清洗干燥处理后，第六中央机器人从清洗/干燥处理组中取出基板，将该基板搬送到热处理组中 - 在清洁/干燥处理块中进行曝光烘烤。
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公开(公告)号：US08540824B2
公开(公告)日：2013-09-24
申请号：US12813251
申请日：2010-06-10
CPC分类号： G03F7/70991 , H01L21/67051 , H01L21/67173 , H01L21/67178
摘要： The transporting process from cleaning and drying processing of a substrate in a cleaning/drying processing unit in a cleaning/drying processing group to post-exposure bake (PEB) of the substrate in a thermal processing group for post-exposure bake in a cleaning/drying processing block is described below. First, after the substrate after exposure processing is subjected to the cleaning and drying processing in the cleaning/drying processing group, a sixth central robot takes out the substrate from the cleaning/drying processing group and carries that substrate into the thermal processing group for post-exposure bake in the cleaning/drying processing block.
摘要翻译： 在清洁/干燥处理组中的清洁/干燥处理单元中的基板的清洁和干燥处理到在热处理组中的曝光后烘烤（PEB）的后处理组中的曝光后烘烤处理的传送过程， 干燥处理块如下所述。 首先，在清洗/干燥处理组中对曝光处理后的基板进行清洗干燥处理后，第六中央机器人从清洗/干燥处理组中取出基板，将该基板搬送到热处理组中 - 在清洁/干燥处理块中进行曝光烘烤。
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公开(公告)号：US20100190116A1
公开(公告)日：2010-07-29
申请号：US12754872
申请日：2010-04-06
申请人： Koji Kaneyama , Akihiro Hisai , Toru Asano , Hiroshi Kobayashi , Tsuyoshi Okumura , Shuichi Yasuda , Masashi Kanaoka , Tadashi Miyagi , Kazuhito Shigemori
发明人： Koji Kaneyama , Akihiro Hisai , Toru Asano , Hiroshi Kobayashi , Tsuyoshi Okumura , Shuichi Yasuda , Masashi Kanaoka , Tadashi Miyagi , Kazuhito Shigemori
CPC分类号： G03F7/70991 , G03F7/70341
摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to an interface block. The interface block comprises a drying processing group including two drying processing units and an interface transport mechanism. After a substrate is subjected to exposure processing by the exposure device, the substrate is transported to the drying processing units in the drying processing group by the interface transport mechanism, where the substrate is subjected to cleaning and drying processings.
摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块和界面块。 曝光装置被布置成与界面块相邻。 接口块包括干燥处理组，其包括两个干燥处理单元和界面输送机构。 在通过曝光装置对基板进行曝光处理之后，通过界面传送机构将基板输送到干燥处理组中的干燥处理单元，其中对基板进行清洁和干燥处理。
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7.发明申请METHOD OF PROCESSING SUBSTRATE, SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING APPARATUS 审中-公开基板加工方法，基板加工系统及基板加工设备公开(公告)号：US20070147832A1
公开(公告)日：2007-06-28
申请号：US11615513
申请日：2006-12-22
IPC分类号： G03D5/00
CPC分类号： H01L21/67178 , H01L21/67173 , H01L21/67225 , H01L21/67276 , H01L21/67742 , H01L21/67748
摘要： Immediately before or immediately after an alignment process for adjusting an exposure position of a pattern image in an exposure unit compatible with immersion exposure, a dummy substrate for use in the alignment process is transported from the exposure unit to a substrate processing apparatus. In the substrate processing apparatus, a cleaning processing unit cleans and dries the received dummy substrate. The cleaned dummy substrate is transported from the substrate processing apparatus back to the exposure unit. The use of the clean dummy substrate for the execution of the alignment process in the exposure unit reduces contamination of mechanisms within the exposure unit, such as a substrate stage. When the dummy substrate is water-repellent, the cleaning in the substrate processing apparatus restores the water repellency of the dummy substrate.
摘要翻译： 在用于调整与浸没曝光相容的曝光单元中的图案图像的曝光位置的对准处理之前或之后，将用于对准处理的伪基板从曝光单元传送到基板处理装置。 在基板处理装置中，清洗处理部对所接收的虚设基板进行清洗干燥。 清洁的虚设基板从基板处理装置输送回曝光单元。 用于执行曝光单元中的对准处理的干净的虚设基板的使用减少了曝光单元内诸如基板台之间的机构的污染。 当虚设基板为憎水性时，基板处理装置的清洗恢复虚设基板的防水性。
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公开(公告)号：US20060098979A1
公开(公告)日：2006-05-11
申请号：US11273465
申请日：2005-11-10
申请人： Koji Kaneyama , Akihiro Hisai , Toru Asano , Hiroshi Kobayashi , Tsuyoshi Okumura , Shuichi Yasuda , Masashi Kanaoka , Tadashi Miyagi , Kazuhito Shigemori
发明人： Koji Kaneyama , Akihiro Hisai , Toru Asano , Hiroshi Kobayashi , Tsuyoshi Okumura , Shuichi Yasuda , Masashi Kanaoka , Tadashi Miyagi , Kazuhito Shigemori
IPC分类号： G03D5/00
CPC分类号： G03F7/70991 , G03F7/70341
摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to an interface block. The interface block comprises a drying processing group including two drying processing units and an interface transport mechanism. After a substrate is subjected to exposure processing by the exposure device, the substrate is transported to the drying processing units in the drying processing group by the interface transport mechanism, where the substrate is subjected to cleaning and drying processings.
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公开(公告)号：US08932672B2
公开(公告)日：2015-01-13
申请号：US12628120
申请日：2009-11-30
申请人： Koji Kaneyama , Masashi Kanaoka , Tadashi Miyagi , Kazuhito Shigemori , Shuichi Yasuda , Tetsuya Hamada
发明人： Koji Kaneyama , Masashi Kanaoka , Tadashi Miyagi , Kazuhito Shigemori , Shuichi Yasuda , Tetsuya Hamada
IPC分类号： B05D3/12 , B08B1/00 , B08B1/04 , B08B3/04 , G11B5/84 , G03F7/16 , G03F7/20 , H01L21/67 , G11B7/26
CPC分类号： G03F7/70925 , G03F7/168 , G03F7/7075 , G03F7/70916 , G03F7/70991 , G11B5/8404 , G11B7/261 , H01L21/67051 , H01L21/67225 , Y10S134/902
摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block, and an interface block. An exposure device is arranged adjacent to the interface block in the substrate processing apparatus. The exposure device subjects a substrate to exposure processing by means of an immersion method. In the edge cleaning unit in the cleaning/drying processing block, a brush abuts against an end of the rotating substrate, so that the edge of the substrate before the exposure processing is cleaned. At this time, the position where the substrate is cleaned is corrected.
摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块，抗蚀剂覆盖膜处理块，抗蚀剂覆盖膜去除块，清洁/干燥处理块，以及 一个接口块。 曝光装置被布置成与基板处理装置中的界面块相邻。 曝光装置通过浸渍方法使基板进行曝光处理。 在清洁/干燥处理块的边缘清洁单元中，刷子抵靠旋转基板的一端，从而清洁曝光处理之前的基板的边缘。 此时，校正基板被清洁的位置。
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公开(公告)号：US20100285225A1
公开(公告)日：2010-11-11
申请号：US12842485
申请日：2010-07-23
IPC分类号： B05D3/04
CPC分类号： H01L21/67051 , H01L21/67225
摘要： A substrate processing apparatus comprises an interface block. An exposure device is arranged adjacent to the interface block. The interface block includes first and second cleaning/drying processing units. A substrate W is subjected to cleaning and drying processing before exposure processing in the first cleaning/drying processing unit, while being subjected to cleaning and drying processing after the exposure processing in the second cleaning/drying processing unit.
摘要翻译： 基板处理装置包括接口块。 曝光装置设置在接口块附近。 界面块包括第一和第二清洁/干燥处理单元。 在第二清洗/干燥处理单元中进行曝光处理之后进行清洗和干燥处理之后，在第一清洗/干燥处理单元中对基板W进行曝光处理之前的清洗和干燥处理。
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