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    Method for Producing Optical Article
    3.
    发明申请
    Method for Producing Optical Article 审中-公开
    光学制品的制造方法

    公开(公告)号：US20110033635A1

    公开(公告)日：2011-02-10

    申请号：US12844701

    申请日：2010-07-27

    Applicant: Keiji NISHIMOTO ,  Takashi NOGUCHI

    Inventor： Keiji NISHIMOTO ,  Takashi NOGUCHI

    IPC: B05D3/10

    CPC classification number: G02B1/116 ,  B29D11/00865 ,  G02B1/105 ,  G02B1/14 ,  G02B2207/121

    Abstract: A method for producing an optical article includes: forming a first layer that is light-transmissive on an optical substrate directly or with another layer in between; and reducing the resistance of at least a portion of a surface layer of the first layer by ion-assisted deposition of at least one composition selected from the group consisting of titanium, niobium, oxides of titanium, and oxides of niobium.

    Abstract translation: 一种光学制品的制造方法包括：在光学基板上直接形成透光性的第一层，或与其间的其他层形成第一层; 以及通过离子辅助沉积至少一种选自钛，铌，钛的氧化物和铌氧化物的组合来降低第一层的至少一部分表面层的电阻。

    Optical Article and Process for Producing the Same
    4.
    发明申请
    Optical Article and Process for Producing the Same 审中-公开
    光学制品及其制作方法

    公开(公告)号：US20100226005A1

    公开(公告)日：2010-09-09

    申请号：US12710974

    申请日：2010-02-23

    Applicant: Keiji NISHIMOTO ,  Takashi NOGUCHI ,  Hiroyuki SEKI

    Inventor： Keiji NISHIMOTO ,  Takashi NOGUCHI ,  Hiroyuki SEKI

    IPC: G02B5/20 ,  B05D5/06

    CPC classification number: G02B1/115

    Abstract: A process for producing an optical article having an antireflection layer formed directly or via another layer on a flexible optical base material, includes: forming a primary layer contained in the antireflection layer; and adding at least any one of carbon, silicon, and germanium to a surface of the primary layer to reduce a resistance.

    Abstract translation: 一种具有抗反射层的光学物品的制造方法，其特征在于，在柔性光学基材上直接或经由另一层形成抗反射层，其特征在于，包括：形成所述防反射层中含有的主层; 并且将至少任一种碳，硅和锗添加到初级层的表面以降低电阻。

    Optical Article and Method for Producing the Same
    6.
    发明申请
    Optical Article and Method for Producing the Same 审中-公开
    光学制品及其制造方法

    公开(公告)号：US20100226004A1

    公开(公告)日：2010-09-09

    申请号：US12695795

    申请日：2010-01-28

    Applicant: Keiji NISHIMOTO ,  Takashi NOGUCHI ,  Hiroyuki SEKI

    Inventor： Keiji NISHIMOTO ,  Takashi NOGUCHI ,  Hiroyuki SEKI

    IPC: G02B5/20 ,  B05D5/06

    CPC classification number: G02B5/208

    Abstract: A method for producing an optical article having a filter layer formed directly or with another layer in between on an optical substrate, the filter layer transmitting light in a predetermined wavelength band and blocking light with a wavelength longer and/or shorter than the predetermined wavelength band, includes: forming a first layer to be included in the filter layer, and adding at least one of carbon, silicon, and germanium to the surface of the first layer, thereby reducing the resistance of the surface of the first layer.

    Abstract translation: 一种用于制造光学制品的方法，所述光学制品具有在光学基板上直接或与其它层形成的滤光层，所述滤光片层透射预定波长带的光并阻挡具有比预定波长更长和/或更短的波长的光 包括：形成要包括在过滤层中的第一层，并将碳，硅和锗中的至少一种添加到第一层的表面，从而降低第一层的表面的电阻。

    Optical Article and Process for Producing the Same
    7.
    发明申请
    Optical Article and Process for Producing the Same 有权
    光学制品及其制作方法

    公开(公告)号：US20100225882A1

    公开(公告)日：2010-09-09

    申请号：US12710701

    申请日：2010-02-23

    Applicant: Keiji NISHIMOTO ,  Takashi NOGUCHI ,  Hiroyuki SEKI

    Inventor： Keiji NISHIMOTO ,  Takashi NOGUCHI ,  Hiroyuki SEKI

    IPC: G02C7/10 ,  G02B5/22 ,  B05D5/06 ,  B05D5/12

    CPC classification number: G02B1/115 ,  G02C7/108 ,  G02C2202/16

    Abstract: A process for producing an optical article having an antireflection layer formed directly or via another layer on an optical base material, includes: forming a primary layer contained in the antireflection layer; and forming a light transmissive conductive layer containing a metal containing germanium as a main component and/or a compound of germanium and a transition metal on a surface of the primary layer.

    Abstract translation: 一种光学制品的制造方法，其特征在于，在光学基材上直接或经由另一层形成具有抗反射层的光学物品的制造方法，其特征在于，包括：形成所述防反射层中含有的主层; 以及在所述主层的表面上形成含有锗作为主要成分的金属和/或锗和过渡金属的化合物的透光导电层。

    Optical Article
    9.
    发明申请
    Optical Article 审中-公开
    光学文章

    公开(公告)号：US20110117345A1

    公开(公告)日：2011-05-19

    申请号：US12914464

    申请日：2010-10-28

    Applicant: Keiji NISHIMOTO ,  Mitsuhiro TODA ,  Naoki UCHIDA

    Inventor： Keiji NISHIMOTO ,  Mitsuhiro TODA ,  Naoki UCHIDA

    IPC: B32B7/02 ,  B05D5/06

    CPC classification number: G02B1/115 ,  B32B7/02 ,  B32B2250/05 ,  B32B2551/00 ,  Y10T428/24975

    Abstract: An optical article includes: an optical base material; a primer layer formed on the optical base material; a binder layer; and a hardcoat layer formed on the primer layer via the binder layer, the primer layer having a thickness of at least 700 nm, the binder layer having a lower refractive index than the refractive index of the primer layer and the refractive index of the hardcoat layer, and the binder layer having a thickness of at least 35 nm.

    Abstract translation: 光学制品包括：光学基材; 形成在所述光学基材上的底漆层; 粘合剂层; 以及通过粘合剂层在底漆层上形成的硬涂层，底漆层的厚度至少为700nm，粘合剂层的折射率低于底漆层的折射率和硬涂层的折射率 ，粘合剂层的厚度为35nm以上。

    Optical Article and Method for Producing Optical Article
    10.
    发明申请
    Optical Article and Method for Producing Optical Article 审中-公开
    光学制品及其制造方法

    公开(公告)号：US20120154916A1

    公开(公告)日：2012-06-21

    申请号：US13323532

    申请日：2011-12-12

    Applicant: Keiji NISHIMOTO ,  Hiroyuki SEKI

    Inventor： Keiji NISHIMOTO ,  Hiroyuki SEKI

    IPC: G02B1/11 ,  B05D5/06

    CPC classification number: G02B1/115

    Abstract: An optical article includes an antireflection coating that is configured from alternately laminated n+1 low-refractive-index layers and n high-refractive-index layers (where n is an integer of 2 or more) . At least one of the n high-refractive-index layers is a first-type layer formed by vapor deposition using only a first deposition source that includes zirconium oxide as the main component. The remaining layers) in the n high-refractive-index layers is a second-type layer (s) formed by vapor deposition using only a second deposition source that includes titanium oxide as the main component. The n+1 low-refractive-index layers are third-type layers formed by vapor deposition using only a third deposition source that includes silicon oxide as the main component. The proportion of the total thickness of the second-type layer (s) in the total thickness of the n high-refractive-index layers is from 15% to 90%.

    Abstract translation: 光学制品包括由交替层叠的n + 1个低折射率层和n个高折射率层（其中n为2以上的整数）构成的防反射膜。 n个高折射率层中的至少一个是通过仅使用包含氧化锆作为主要成分的第一沉积源的气相沉积形成的第一类型层。 n个高折射率层中的剩余层是通过仅使用包括氧化钛作为主要成分的第二沉积源的气相沉积形成的第二类型层。 n + 1低折射率层是仅使用包括氧化硅作为主要成分的第三沉积源的气相沉积形成的第三类型层。 第二类层的总厚度在n个高折射率层的总厚度中的比例为15％至90％。

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