公开(公告)号：US20100331440A1

公开(公告)日：2010-12-30

申请号：US12875133

申请日：2010-09-03

申请人： Ken MARUYAMA ,  Daisuke SHIMIZU

发明人： Ken MARUYAMA ,  Daisuke SHIMIZU

IPC分类号： C08F232/08 ,  C07C69/753 ,  C08F2/50

CPC分类号： G03F7/0397 ,  C08F8/12 ,  C08F12/22 ,  C08F220/28 ,  C08F212/14 ,  C08F2220/1891 ,  C08F2220/283 ,  C08F220/18

摘要： A polymer includes a repeating unit shown by a general formula (1) in which R1 represents a hydrogen atom or a methyl group, R2 represents a substituted or unsubstituted linear or branched monovalent alkyl group having 1 to 20 carbon atoms, an alicyclic group having 3 to 25 carbon atoms, or an aryl group having 6 to 22 carbon atoms, and X represents a substituted or unsubstituted methylene group or a substituted or unsubstituted linear, branched or alicyclic hydrocarbon group having 2 to 25 carbon atoms. The polymer has a polystyrene-reduced weight average molecular weight determined by gel permeation chromatography (GPC) of 3000 to 100,000.

摘要翻译： 聚合物包括由通式（1）表示的重复单元，其中R 1表示氢原子或甲基，R 2表示取代或未取代的具有1至20个碳原子的直链或支链一价烷基，具有3个 至25个碳原子，或具有6至22个碳原子的芳基，X表示取代或未取代的亚甲基或具有2至25个碳原子的取代或未取代的直链，支链或脂环族烃基。 该聚合物通过凝胶渗透色谱法（GPC）测定的聚苯乙烯换算的重均分子量为3000至100,000。

公开(公告)号：US20120122036A1

公开(公告)日：2012-05-17

申请号：US13352384

申请日：2012-01-18

申请人： Hikaru SUGITA ,  Nobuji MATSUMURA ,  Daisuke SHIMIZU ,  Toshiyuki KAI ,  Tsutomu SHIMOKAWA

发明人： Hikaru SUGITA ,  Nobuji MATSUMURA ,  Daisuke SHIMIZU ,  Toshiyuki KAI ,  Tsutomu SHIMOKAWA

IPC分类号： G03F7/20

CPC分类号： G03F7/11 ,  G03F7/0045 ,  G03F7/0757 ,  G03F7/265

摘要： A pattern forming method includes providing and curing a under-layer film containing a radiation-sensitive acid generator which generates an acid upon exposure to radiation on a substrate. The under-layer film is irradiated with radiation through a mask to cause an acid to be selectively generated in an exposed area of the under-layer film. An upper-layer film which does not contain a radiation-sensitive acid generator and which contains a composition capable of polymerizing or crosslinking by an action of an acid is provided. A cured film is provided by polymerization or crosslinking selectively in an area of the upper-layer film corresponding to the exposed area of the under-layer film in which the acid has been generated. An area of the upper-layer film corresponding to an area of the under-layer film in which the acid has not been generated is removed.

摘要翻译： 图案形成方法包括提供和固化含有辐射敏感性酸产生剂的底层膜，其在暴露于基底上的辐射时产生酸。 底层膜通过掩模用辐射照射，以在底层膜的暴露区域中选择性地产生酸。 提供了不含有辐射敏感性酸产生剂并且含有能够通过酸的作用聚​​合或交联的组合物的上层膜。 通过在与产生酸的底层膜的暴露区域相对应的上层膜的区域中选择性地聚合或交联固化膜。 除去与未生成酸的下层膜的区域对应的上层膜的区域。

公开(公告)号：US20140213062A1

公开(公告)日：2014-07-31

申请号：US14157997

申请日：2014-01-17

申请人： Daisuke SHIMIZU ,  Jong Mun KIM

发明人： Daisuke SHIMIZU ,  Jong Mun KIM

IPC分类号： H01L21/3065

CPC分类号： H01L21/3065 ,  B81C1/00531 ,  H01J37/32082 ,  H01J37/32146 ,  H01J37/32165 ,  H01J37/3244 ,  H01L21/0332 ,  H01L21/3081 ,  H01L21/31116 ,  H01L21/31122 ,  H01L21/31138 ,  H01L21/32137 ,  H01L21/32139 ,  H01L21/67069 ,  H01L27/11556 ,  H01L27/11582

摘要： Multilayered stacks having layers of silicon interleaved with layers of a dielectric, such as silicon dioxide, are plasma etched with non-corrosive process gas chemistries. Etching plasmas of fluorine source gases, such as SF6 and/or NF3 typically only suitable for dielectric layers, are energized by pulsed RF to achieve high aspect ratio etching of silicon/silicon dioxide bi-layers stacks without the addition of corrosive gases, such as HBr or Cl2. In embodiments, a mask open etch and the multi-layered stack etch are performed in a same plasma processing chamber enabling a single chamber, single recipe solution for patterning such multi-layered stacks. In embodiments, 3D NAND memory cells are fabricated with memory plug and/or word line separation etches employing a fluorine-based, pulsed-RF plasma etch.

摘要翻译： 具有与电介质层（诸如二氧化硅）交错的硅层的多层叠层用非腐蚀性工艺气体化学等离子体蚀刻。 氟源气体的蚀刻等离子体，例如通常仅适用于介电层的SF6和/或NF3，通过脉冲RF激励，以实现硅/二氧化硅双层堆叠的高纵横比蚀刻，而不加入腐蚀性气体，例如 HBr或Cl2。 在实施例中，掩模开口蚀刻和多层叠层蚀刻在相同的等离子体处理室中进行，从而能够实现用于图案化这种多层叠层的单室单配方解决方案。 在实施例中，使用采用氟基脉冲RF等离子体蚀刻的存储器插头和/或字线分离蚀刻来制造3D NAND存储器单元。

公开(公告)号：US20090268107A1

公开(公告)日：2009-10-29

申请号：US12428789

申请日：2009-04-23

申请人： Daisuke SHIMIZU

发明人： Daisuke SHIMIZU

IPC分类号： H04N5/64 ,  F16D7/00

CPC分类号： F16D43/211 ,  F16D7/021 ,  F16M11/10 ,  F16M11/18 ,  F16M11/2014 ,  F16M2200/044 ,  F16M2200/08

摘要： This torque limiter includes a first rotating member integrally provided with a plurality of fragment portions in a concentric manner and having a spring storage portion enclosed with the plurality of fragment portions, a second rotating member having a lid portion arranged to cover the spring storage portion of the first rotating member and a fit portion fitted with the outer peripheral surfaces of the plurality of fragment portions of the first rotating member and a spring member press-fitted into the spring storage portion enclosed with the inner peripheral surfaces of the plurality of fragment portions of the first rotating member thereby bringing the plurality of fragment portions into pressure contact with the fit portion of the second rotating member, for transmitting driving torque in response to pressure contact force applied by the spring member.

摘要翻译： 该扭矩限制器包括以同心方式一体设置有多个碎片部分的第一旋转构件，并且具有由多个碎片部分包围的弹簧储存部分;第二旋转构件，具有盖部，该盖部分布置成覆盖弹簧储存部分的弹簧储存部分 第一旋转构件和装配有第一旋转构件的多个碎片部分的外周面的配合部分和压配合到弹簧储存部分中的弹簧构件，该弹簧储存部分包围多个碎片部分的内周表面 所述第一旋转部件使所述多个碎片部与所述第二旋转部件的嵌合部压力接触，以响应于所述弹簧部件所施加的压力接触力传递驱动转矩。

公开(公告)号：US20090268106A1

公开(公告)日：2009-10-29

申请号：US12428781

申请日：2009-04-23

申请人： Daisuke SHIMIZU

发明人： Daisuke SHIMIZU

IPC分类号： H04N5/64 ,  F16M11/22

CPC分类号： F16M11/10 ,  F16M2200/08 ,  Y10S248/917 ,  Y10S248/919

摘要： In a display screen support mechanism, a first hole portion receiving a platelike support shaft is provided in the form of a symmetrical sector formed by connecting two sectoral forward ends which are symmetric with respect to a hole center, and a display screen support member is rotatable about the platelike support shaft serving as a rotating shaft within an angular range of the symmetrical sectoral hole portion in a state where an end of the platelike support shaft in a longitudinal direction comes into contact with an arcuate inner peripheral surface of the symmetrical sectoral hole portion.

摘要翻译： 在显示屏支撑机构中，容纳板状支撑轴的第一孔部分以对称扇形的形式设置，该对称扇区通过连接相对于孔中心对称的两个扇形前端而形成，并且显示屏支撑构件可旋转 在板状支撑轴的长度方向的端部与对称的扇形孔部的弓形内周面接触的状态下，围绕作为对称扇形孔部的角度范围内的旋转轴的板状支撑轴 。

公开(公告)号：US20080048391A1

公开(公告)日：2008-02-28

申请号：US11838633

申请日：2007-08-14

申请人： Daisuke SHIMIZU

发明人： Daisuke SHIMIZU

IPC分类号： B65H5/06

CPC分类号： B41J13/103 ,  B65H1/14 ,  B65H2402/31 ,  B65H2402/545 ,  B65H2403/51 ,  B65H2405/1117

摘要： In an image generating apparatus, a push-up member for pushing up a paper and bringing the same into contact with a paper feed roller includes a first push-up member, a second push-up member and a torsion coil spring, a second engaging portion of the second push-up member is rotatably engaged with a first engaging portion of the first push-up member, a second spring engaging portion of the second push-up member is engaged with a coil portion of the torsion coil spring, and a first spring engaging portion of the first push-up member is engaged with a first arm portion of the torsion coil spring.

摘要翻译： 在图像生成装置中，用于推动纸张并使其与送纸辊接触的上推构件包括第一上推构件，第二上推构件和扭力螺旋弹簧，第二接合 第二上推构件的部分与第一上推构件的第一接合部可旋转地接合，第二上推构件的第二弹簧接合部与扭转螺旋弹簧的线圈部接合， 第一上推构件的第一弹簧接合部与扭转螺旋弹簧的第一臂部接合。

公开(公告)号：US20090290077A1

公开(公告)日：2009-11-26

申请号：US12469209

申请日：2009-05-20

申请人： Daisuke SHIMIZU

发明人： Daisuke SHIMIZU

IPC分类号： H04N5/64

CPC分类号： F16M11/10 ,  F16M11/18 ,  F16M11/2021

摘要： A display includes a display screen portion, a display screen support member supporting the display screen portion to be rotatable in an anteroposterior direction with respect to a vertical plane and a driving source rotating the display screen support member in the anteroposterior direction by a prescribed angle with respect to the vertical plane, wherein a center of gravity of the display screen portion is located on either a frontward side or a rearward side with respect to the vertical plane in both of a state where the driving source rotates the display screen support member on the frontward side with respect to the vertical plane and a state where the driving source rotates the display screen support member on the rearward side with respect to the vertical plane.

摘要翻译： 显示器包括显示屏部分，支撑显示屏部分以相对于垂直平面前后方向可旋转的显示屏支撑部件和驱动源，所述驱动源使所述显示屏支撑部件在所述前后方向上以规定角度旋转预定角度， 相对于垂直面，其中显示屏部分的重心位于相对于垂直平面的前侧或后侧，其中驱动源在显示屏支撑构件上旋转的状态 相对于垂直面的前方，以及驱动源相对于垂直面在后方旋转显示屏支撑部件的状态。

公开(公告)号：US20080168918A1

公开(公告)日：2008-07-17

申请号：US11968706

申请日：2008-01-03

申请人： Daisuke SHIMIZU ,  Daisuke Takasaka

发明人： Daisuke SHIMIZU ,  Daisuke Takasaka

IPC分类号： B41F1/28 ,  F16C3/02 ,  F16C33/22

CPC分类号： F16C3/02 ,  F16C17/10 ,  F16C33/20

摘要： This image generating apparatus includes a side plate, mounted on a first side surface of a chassis provided with a print portion, integrally including a bearing, a bracket member mounted on the side plate and a support shaft arranged between the side plate and the bracket member for rotatably supporting a gear member, while a first end of the support shaft is fixedly mounted on the bracket member, and a second end of the support shaft includes a side end surface brought into line contact with the bearing of the side plate.

摘要翻译： 该图像产生装置包括：侧板，安装在设置有打印部分的底盘的第一侧表面上，一体地包括轴承，安装在侧板上的托架构件和布置在侧板和托架构件之间的支撑轴 用于可旋转地支撑齿轮构件，同时支撑轴的第一端固定地安装在支架构件上，并且支撑轴的第二端包括与侧板的轴承成直线接触的侧端面。