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    Polycrystalline diamond, polycrystalline diamond compacts, methods of making same, and applications
    1.
    发明授权
    Polycrystalline diamond, polycrystalline diamond compacts, methods of making same, and applications 有权
    多晶金刚石，多晶金刚石压块，制造方法及应用

    公开(公告)号：US09315881B2

    公开(公告)日：2016-04-19

    申请号：US13486578

    申请日：2012-06-01

    申请人： Kenneth E. Bertagnolli ,  Jiang Qian ,  Jason K. Wiggins ,  Michael A. Vail ,  Debkumar Mukhopadhyay ,  Brandon P. Linford

    发明人： Kenneth E. Bertagnolli ,  Jiang Qian ,  Jason K. Wiggins ,  Michael A. Vail ,  Debkumar Mukhopadhyay ,  Brandon P. Linford

    IPC分类号： B21D3/10 ,  E21B10/46 ,  B01J3/06 ,  C22C26/00 ,  F16C33/04 ,  B22F5/00

    CPC分类号： B24D3/10 ,  B22F2005/001 ,  C22C26/00 ,  E21B10/567 ,  F16C33/043 ,  F16C2352/00

    摘要： Embodiments of the invention relate to polycrystalline diamond compacts (“PDC”) exhibiting enhanced diamond-to-diamond bonding. In an embodiment, a PDC includes a polycrystalline diamond (“PCD”) table bonded to a substrate. At least a portion of the PCD table includes a plurality of diamond grains defining a plurality of interstitial regions. The plurality of interstitial regions includes a metal-solvent catalyst. The plurality of diamond grains exhibit an average grain size of about 30 μm or less. The plurality of diamond grains and the metal-solvent catalyst collectively exhibit an average electrical conductivity of less than about 1200 S/m. Other embodiments are directed to PCD, employing such PCD, methods of forming PCD and PDCs, and various applications for such PCD and PDCs in rotary drill bits, bearing apparatuses, and wire-drawing dies.

    摘要翻译： 本发明的实施方案涉及显示增强的金刚石到金刚石结合的多晶金刚石压块（“PDC”）。 在一个实施例中，PDC包括结合到衬底的多晶金刚石（“PCD”）表。 PCD表的至少一部分包括限定多个间隙区域的多个金刚石晶粒。 多个间隙区域包括金属 - 溶剂催化剂。 多个金刚石晶粒的平均粒径为30μm以下。 多个金刚石晶粒和金属 - 溶剂催化剂共同表现出小于约1200S / m的平均导电率。 其他实施例涉及PCD，采用这种PCD，形成PCD和PDC的方法，以及用于旋转钻头，轴承装置和拉丝模具中的这种PCD和PDC的各种应用。

    POLYCRYSTALLINE DIAMOND, POLYCRYSTALLINE DIAMOND COMPACTS, METHODS OF MAKING SAME, AND APPLICATIONS
    2.
    发明申请
    POLYCRYSTALLINE DIAMOND, POLYCRYSTALLINE DIAMOND COMPACTS, METHODS OF MAKING SAME, AND APPLICATIONS 有权
    多晶金刚石，多晶金刚石复合材料，制备方法及应用

    公开(公告)号：US20120241226A1

    公开(公告)日：2012-09-27

    申请号：US13486578

    申请日：2012-06-01

    申请人： Kenneth E. Bertagnolli ,  Jiang Qian ,  Jason K. Wiggins ,  Michael A. Vail ,  Debkumar Mukhopadhyay ,  Brandon P. Linford

    发明人： Kenneth E. Bertagnolli ,  Jiang Qian ,  Jason K. Wiggins ,  Michael A. Vail ,  Debkumar Mukhopadhyay ,  Brandon P. Linford

    IPC分类号： B24D3/10 ,  E21B10/46 ,  B01J3/06

    CPC分类号： B24D3/10 ,  B22F2005/001 ,  C22C26/00 ,  E21B10/567 ,  F16C33/043 ,  F16C2352/00

    摘要： Embodiments of the invention relate to polycrystalline diamond compacts (“PDC”) exhibiting enhanced diamond-to-diamond bonding. In an embodiment, a PDC includes a polycrystalline diamond (“PCD”) table bonded to a substrate. At least a portion of the PCD table includes a plurality of diamond grains defining a plurality of interstitial regions. The plurality of interstitial regions includes a metal-solvent catalyst. The plurality of diamond grains exhibit an average grain size of about 30 μm or less. The plurality of diamond grains and the metal-solvent catalyst collectively exhibit an average electrical conductivity of less than about 1200 S/m. Other embodiments are directed to PCD, employing such PCD, methods of forming PCD and PDCs, and various applications for such PCD and PDCs in rotary drill bits, bearing apparatuses, and wire-drawing dies.

    摘要翻译： 本发明的实施方案涉及显示增强的金刚石到金刚石结合的多晶金刚石压块（“PDC”）。 在一个实施例中，PDC包括结合到衬底的多晶金刚石（“PCD”）表。 PCD表的至少一部分包括限定多个间隙区域的多个金刚石晶粒。 多个间隙区域包括金属 - 溶剂催化剂。 多个金刚石晶粒的平均粒径为30μm以下。 多个金刚石晶粒和金属 - 溶剂催化剂共同表现出小于约1200S / m的平均导电率。 其他实施例涉及PCD，采用这种PCD，形成PCD和PDC的方法，以及用于旋转钻头，轴承装置和拉丝模具中的这种PCD和PDC的各种应用。

    Polycrystalline diamond compacts, method of fabricating same, and various applications
    4.
    发明授权
    Polycrystalline diamond compacts, method of fabricating same, and various applications 有权
    多晶金刚石压块，其制造方法以及各种应用

    公开(公告)号：US08297382B2

    公开(公告)日：2012-10-30

    申请号：US12690998

    申请日：2010-01-21

    申请人： Kenneth E. Bertagnolli ,  David P. Miess ,  Jiang Qian ,  Jason K. Wiggins ,  Michael A. Vail ,  Debkumar Mukhopadhyay

    发明人： Kenneth E. Bertagnolli ,  David P. Miess ,  Jiang Qian ,  Jason K. Wiggins ,  Michael A. Vail ,  Debkumar Mukhopadhyay

    IPC分类号： E21B10/36 ,  E21B10/46

    CPC分类号： E21B10/36 ,  B22F7/08 ,  B22F2998/00 ,  B24D18/00 ,  C22C26/00 ,  E21B10/5735 ,  F16C33/043 ,  F16C2352/00 ,  Y10T428/24612 ,  Y10T428/24996 ,  Y10T428/249967 ,  C22C29/08

    摘要： Embodiments of the invention relate to polycrystalline diamond (“PCD”) exhibiting enhanced diamond-to-diamond bonding. In an embodiment, polycrystalline diamond compact (“PDC”) includes a PCD table having a maximum thickness. At least a portion of the PCD table includes a plurality of diamond grains defining a plurality of interstitial regions. A metal-solvent catalyst occupies at least a portion of the plurality of interstitial regions. The plurality of diamond grains and the metal-solvent catalyst collectively exhibit a coercivity of about 115 Oersteds (“Oe”) or more and a specific magnetic saturation of about 15 Gauss·cm3/grams (“G·cm3/g”) or less. The PDC includes a substrate having an interfacial surface that is bonded to the PCD table. The interfacial surface exhibits a substantially planar topography. Other embodiments are directed to methods of forming PCD and PDCs, and various applications for such PCD and PDCs in rotary drill bits, bearing apparatuses, and wire-drawing dies.

    摘要翻译： 本发明的实施方案涉及显示出增强的金刚石与金刚石结合的多晶金刚石（PCD）。 在一个实施例中，多晶金刚石复合体（PDC）包括具有最大厚度的PCD台。 PCD表的至少一部分包括限定多个间隙区域的多个金刚石晶粒。 金属溶剂催化剂占据多个间隙区域的至少一部分。 多个金刚石晶粒和金属 - 溶剂催化剂共同表现出约115奥斯特（Oe）以上的矫顽磁力和约15高斯·cm 3 /克（G·cm 3 / g）以下的比磁饱和。 PDC包括具有接合到PCD台的界面的基底。 界面表面呈现基本平坦的形貌。 其他实施例涉及形成PCD和PDC的方法，以及用于旋转钻头，轴承装置和拉丝模具中的这种PCD和PDC的各种应用。

    POLYCRYSTALLINE DIAMOND COMPACT INCLUDING A CARBONATE-CATALYZED POLYCRYSTALLINE DIAMOND TABLE AND APPLICATIONS THEREFOR
    5.
    发明申请
    POLYCRYSTALLINE DIAMOND COMPACT INCLUDING A CARBONATE-CATALYZED POLYCRYSTALLINE DIAMOND TABLE AND APPLICATIONS THEREFOR 有权
    多晶金刚石，包括碳酸钙催化的多晶金刚石表及其应用

    公开(公告)号：US20130043078A1

    公开(公告)日：2013-02-21

    申请号：US13552052

    申请日：2012-07-18

    申请人： Jiang Qian ,  C. Eugene McMurray ,  Debkumar Mukhopadhyay ,  Jason K. Wiggins ,  Michael A. Vail ,  Kenneth E. Bertagnolli

    发明人： Jiang Qian ,  C. Eugene McMurray ,  Debkumar Mukhopadhyay ,  Jason K. Wiggins ,  Michael A. Vail ,  Kenneth E. Bertagnolli

    IPC分类号： B24D3/06 ,  B23B51/00 ,  E21B10/46 ,  B24D18/00

    CPC分类号： B24D3/10 ,  B22F7/062 ,  B22F2005/001 ,  B24D18/0009 ,  C22C26/00 ,  E21B10/54 ,  E21B10/56 ,  E21B10/567 ,  F16C33/043 ,  F16C33/108 ,  F16C2352/00 ,  Y10T408/89

    摘要： In an embodiment, a polycrystalline diamond compact includes a substrate and a preformed polycrystalline diamond table bonded to the substrate. The table includes bonded diamond grains defining interstitial regions. The table includes an upper surface, a back surface bonded to the substrate, and at least one lateral surface extending therebetween. The table includes a first region extending inwardly from the upper surface and the lateral surface. The first region exhibits a first interstitial region concentration and includes at least one interstitial constituent disposed therein, which may be present in at least a residual amount and includes at least one metal carbonate and/or at least one metal oxide. The table includes a second bonding region adjacent to the substrate that extends inwardly from the back surface. The second bonding region exhibits a second interstitial region concentration that is greater than the first interstitial region concentration and includes a metallic infiltrant therein.

    摘要翻译： 在一个实施例中，多晶金刚石致密体包括基底和结合到基底的预成型多晶金刚石台。 该表包括定义间隙区域的结合金刚石颗粒。 桌子包括上表面，粘合到基底的后表面和在它们之间延伸的至少一个侧表面。 桌子包括从上表面和侧表面向内延伸的第一区域。 第一区域表现出第一间隙区域浓度并且包括至少一个置于其中的间隙成分，其可以以至少残留量存在并且包括至少一种金属碳酸盐和/或至少一种金属氧化物。 桌子包括与衬底相邻的第二接合区域，其从后表面向内延伸。 第二结合区域表现出比第一间隙区域浓度大的第二间隙区域浓度，并且其中包括金属渗透剂。

    POLYCRYSTALLINE DIAMOND COMPACTS, METHOD OF FABRICATING SAME, AND VARIOUS APPLICATIONS
    6.
    发明申请
    POLYCRYSTALLINE DIAMOND COMPACTS, METHOD OF FABRICATING SAME, AND VARIOUS APPLICATIONS 有权
    多晶金刚石复合材料，其制造方法及各种应用

    公开(公告)号：US20110017519A1

    公开(公告)日：2011-01-27

    申请号：US12690998

    申请日：2010-01-21

    申请人： Kenneth E. Bertagnolli ,  David P. Miess ,  Jiang Qian ,  Jason K. Wiggins ,  Michael A. Vail ,  Debkumar Mukhopadhyay

    发明人： Kenneth E. Bertagnolli ,  David P. Miess ,  Jiang Qian ,  Jason K. Wiggins ,  Michael A. Vail ,  Debkumar Mukhopadhyay

    IPC分类号： E21B10/46 ,  B32B5/30 ,  B24D3/10 ,  B32B7/04

    CPC分类号： E21B10/36 ,  B22F7/08 ,  B22F2998/00 ,  B24D18/00 ,  C22C26/00 ,  E21B10/5735 ,  F16C33/043 ,  F16C2352/00 ,  Y10T428/24612 ,  Y10T428/24996 ,  Y10T428/249967 ,  C22C29/08

    摘要： Embodiments of the invention relate to polycrystalline diamond (“PCD”) exhibiting enhanced diamond-to-diamond bonding. In an embodiment, polycrystalline diamond compact (“PDC”) includes a PCD table having a maximum thickness. At least a portion of the PCD table includes a plurality of diamond grains defining a plurality of interstitial regions. A metal-solvent catalyst occupies at least a portion of the plurality of interstitial regions. The plurality of diamond grains and the metal-solvent catalyst collectively exhibit a coercivity of about 115 Oersteds (“Oe”) or more and a specific magnetic saturation of about 15 Gauss·cm3/grams (“G·cm3/g”) or less. The PDC includes a substrate having an interfacial surface that is bonded to the PCD table. The interfacial surface exhibits a substantially planar topography. Other embodiments are directed to methods of forming PCD and PDCs, and various applications for such PCD and PDCs in rotary drill bits, bearing apparatuses, and wire-drawing dies.

    摘要翻译： 本发明的实施方案涉及显示增强的金刚石 - 金刚石键合的多晶金刚石（“PCD”）。 在一个实施例中，多晶金刚石复合体（“PDC”）包括具有最大厚度的PCD台。 PCD表的至少一部分包括限定多个间隙区域的多个金刚石晶粒。 金属溶剂催化剂占据多个间隙区域的至少一部分。 多个金刚石晶粒和金属 - 溶剂催化剂共同表现出约115奥斯特（“Oe”）或更高的矫顽磁力和约15高斯·cm 3 /克（“G·cm 3 / g”）或更小的特定磁饱和度 。 PDC包括具有接合到PCD台的界面的基底。 界面表面呈现基本平坦的形貌。 其他实施例涉及形成PCD和PDC的方法，以及用于旋转钻头，轴承装置和拉丝模具中的这种PCD和PDC的各种应用。

    Cutting element assembly including one or more superabrasive cutting elements, drill bit utilizing the same, and methods of manufacture
    7.
    发明授权
    Cutting element assembly including one or more superabrasive cutting elements, drill bit utilizing the same, and methods of manufacture 有权
    包括一个或多个超级磨料切割元件的切割元件组件，利用其的钻头以及制造方法

    公开(公告)号：US08479845B1

    公开(公告)日：2013-07-09

    申请号：US12853752

    申请日：2010-08-10

    申请人： Jiang Qian ,  Debkumar Mukhopadhyay ,  Jason Wiggins ,  Kenneth E. Bertagnolli ,  Shawn C. Scott ,  Kevin Duy Nguyen ,  Michael A. Vail

    发明人： Jiang Qian ,  Debkumar Mukhopadhyay ,  Jason Wiggins ,  Kenneth E. Bertagnolli ,  Shawn C. Scott ,  Kevin Duy Nguyen ,  Michael A. Vail

    IPC分类号： E21B10/42

    CPC分类号： E21B10/56 ,  E21B10/43 ,  E21B10/52 ,  E21B10/567 ,  E21B10/633

    摘要： Some embodiments relate to cutting element assemblies including a superabrasive cutting element that may be axially compressed to enhance the damage tolerance thereof, enclosed in an enclosure that exposes the superabrasive cutting element therethrough, enclosed in an enclosure that restricts rotation of the superabrasive cutting element, or combinations of the foregoing. Additionally, some embodiments relate to cutting element assemblies in which a superabrasive cutting element is mechanically fastened to a base, such as a substrate or directly to a bit body of a rotary drill bit. Some embodiments also relate to cutting element assemblies including one or more superabrasive cutting elements that are rotatable about a longitudinal axis of the cutting element assembly, that may be axially compressed to enhance the damage tolerance thereof, that may be enclosed in an enclosure that exposes the superabrasive cutting element therethrough, or combinations thereof.

    摘要翻译： 一些实施例涉及切割元件组件，其包括可以被轴向压缩以增强其破坏公差的超研磨切割元件，其包围在限制超研磨切割元件的旋转的外壳中的外罩中，该外壳将露出超硬磨料切割元件， 上述的组合。 另外，一些实施例涉及切割元件组件，其中超研磨切割元件机械地紧固到基座，例如基底或直接连接到旋转钻头的钻头体。 一些实施例还涉及切割元件组件，其包括可围绕切割元件组件的纵向轴线旋转的一个或多个超级研磨切割元件，其可以被轴向压缩以增强其损伤容限，其可以封闭在暴露于 超研磨切割元件或其组合。