公开(公告)号：US20060284052A1

公开(公告)日：2006-12-21

申请号：US11423776

申请日：2006-06-13

申请人： Kimiaki TOSHIKIYO ,  Takanori YOGO ,  Motonori ISHII ,  Toshinobu MATSUNO ,  Kazutoshi ONOZAWA

发明人： Kimiaki TOSHIKIYO ,  Takanori YOGO ,  Motonori ISHII ,  Toshinobu MATSUNO ,  Kazutoshi ONOZAWA

IPC分类号： H01L27/00

CPC分类号： H01L27/14627 ,  H01L27/14685

摘要： The present invention provides a solid-state imaging apparatus and the like which is able to support an optical system whose incident angle is wide. Each pixel is 2.25 μm square in size, and includes a distributed index lens 1, a color filter (for example, for green) 2, an Al interconnections 3, a signal transmitting unit 4, a planarized layer 5, a light-receiving device (Si photodiodes) 6, and an Si substrate 7. The two-stage concentric circle structure of the distributed index lens is formed by SiO2 (n=2) with the film thickness 1.2 μm (“grey color”), the film thickness 0.8 μm (“dots pattern”) and the film thickness of 0 μm (“without pattern: white color”), and the medium surrounding the distributed index lens 1 is air (n=1).

摘要翻译： 本发明提供能够支持入射角较宽的光学系统的固体摄像装置等。 每个像素的尺寸为2.25mum正方形，并且包括分布式折射率透镜1，滤色器（例如，绿色）2，Al互连3，信号发送单元4，平坦化层5，光接收装置 （Si光电二极管）6和Si衬底7.分布式折射率透镜的两级同心圆结构由SiO 2（n = 2）形成，膜厚为1.2μm（“灰” 颜色“），膜厚0.8μm（”点图案“）和膜厚度为0μm（”无图案：白色“），分布折射率透镜1周围的介质为空气（n = 1）。

公开(公告)号：US20090020840A1

公开(公告)日：2009-01-22

申请号：US12189971

申请日：2008-08-12

申请人： Kimiaki TOSHIKIYO ,  Takanori YOGO ,  Motonori ISHII ,  Toshinobu MATSUNO ,  Kazutoshi ONOZAWA

发明人： Kimiaki TOSHIKIYO ,  Takanori YOGO ,  Motonori ISHII ,  Toshinobu MATSUNO ,  Kazutoshi ONOZAWA

IPC分类号： H01L31/00

CPC分类号： H01L27/14627 ,  H01L27/14685

摘要： A solid-state imaging apparatus includes a plurality of unit pixels with associated microlenses arranged in a two-dimensional array. Each microlens includes a distributed index lens with a modulated effective refractive index distribution obtained by including a combination of a plurality of patterns having a concentric structure, the plurality of patterns being divided into line widths equal to or shorter than a wavelength of an incident light. At least one of the plurality of patterns includes a lower light-transmitting film having the concentric structure and a first line width and a first film thickness, and an upper light-transmitting film having the concentric structure configured on the lower light-transmitting film having a second line width and a second film thickness. The distributed index lens has a structure in which a refractive index material is dense at a center and becomes sparse gradually toward an outer side in the concentric structure.

摘要翻译： 固态成像装置包括具有以二维阵列排列的相关联的微透镜的多个单位像素。 每个微透镜包括具有调制的有效折射率分布的分布式折射率透镜，通过包括具有同心结构的多个图案的组合而获得，所述多个图案被划分成等于或短于入射光的波长的线宽。 多个图案中的至少一个图案包括具有同心结构且第一线宽度和第一膜厚度的下部透光膜，以及具有同心结构的上部透光膜，其在下部透光膜上具有 第二线宽度和第二膜厚度。 分布式折射率透镜具有其中折射率材料在中心处致密并且在同心结构中朝向外侧逐渐变稀的结构。

公开(公告)号：US20080076039A1

公开(公告)日：2008-03-27

申请号：US11860756

申请日：2007-09-25

申请人： Motonori ISHII ,  Kazutoshi ONOZAWA ,  Kimiaki TOSHIKIYO ,  Toshinobu MATSUNO ,  Takanori YOGO

发明人： Motonori ISHII ,  Kazutoshi ONOZAWA ,  Kimiaki TOSHIKIYO ,  Toshinobu MATSUNO ,  Takanori YOGO

IPC分类号： G03F1/00

CPC分类号： G03F7/0005 ,  G03F1/30

摘要： The phase shift mask according to the present invention is a phase shift mask for manufacturing a semiconductor device. The phase shift mask includes a light-blocking portion, a light-transmitting portion, a phase shift portion, and an auxiliary pattern portion, the light-blocking portion, the light-transmitting portion, the phase shift portion, and the auxiliary pattern portion being concentrically arranged, wherein a width of the auxiliary pattern portion in a radius direction is less than a width of the light-transmitting portion and a width of the phase shift portion in a radius direction. Furthermore, it is possible that a phase of exposure light which passes through an auxiliary pattern portion is opposite to a phase of exposure light which passes through a light-transmitting portion or a phase shift portion, the light-transmitting portion or the phase shift portion being the closest to the auxiliary pattern portion.

摘要翻译： 根据本发明的相移掩模是用于制造半导体器件的相移掩模。 相移掩模包括遮光部分，透光部分，相移部分和辅助图案部分，遮光部分，透光部分，相移部分和辅助图案部分 其中所述辅助图形部分在半径方向上的宽度小于所述透光部分的宽度和所述相移部分在半径方向上的宽度。 此外，通过辅助图案部分的曝光光的相位可能与通过透光部分或相移部分的曝光光的相位相反，透光部分或相移部分 最靠近辅助图案部分。

公开(公告)号：US20060285228A1

公开(公告)日：2006-12-21

申请号：US11423989

申请日：2006-06-14

申请人： Motonori ISHII ,  Kazutoshi ONOZAWA ,  Toshinobu MATSUNO ,  Takanori YOGO ,  Kimiaki TOSHIKIYO

发明人： Motonori ISHII ,  Kazutoshi ONOZAWA ,  Toshinobu MATSUNO ,  Takanori YOGO ,  Kimiaki TOSHIKIYO

IPC分类号： G02B3/08

CPC分类号： G02B5/1847 ,  G02B5/1876 ,  G02B5/1885 ,  G02B27/4205

摘要： The present invention provides a method of manufacturing a lens, in which the method includes exposing a photoresist to light using a phase shift mask. Here, the phase shift mask includes layout portions respectively corresponding to pixels and lens, in which each of the layout portions has: a light-blocking portion which has a shape of a substantially circle or a substantially concentric zone; a light-transmitting portion which has a shape of a substantially circle or a substantially concentric zone; a phase shift portion which has a shape of a substantially circle or a substantially concentric zone; and a light-blocking frame. Furthermore, the light-transmitting portion, the light-blocking portion and the phase shift portion are arranged alternately so as to form concentric circles, and the light-blocking frame corresponds to a whole or a part of a perimeter of the lens.

摘要翻译： 本发明提供一种制造透镜的方法，其中所述方法包括使用相移掩模将光致抗蚀剂曝光。 这里，相移掩模包括分别对应于像素和透镜的布局部分，其中每个布局部分具有：具有基本圆形或基本同心的形状的遮光部分; 具有基本上圆形或大体上同心的形状的透光部分; 相移部，其具有大致圆形或大致同心的区域的形状; 和遮光框架。 此外，光透射部分，遮光部分和相移部分交替地布置以形成同心圆，并且遮光框对应于透镜的周边的全部或一部分。

公开(公告)号：US20070035721A1

公开(公告)日：2007-02-15

申请号：US11423803

申请日：2006-06-13

申请人： Kimiaki TOSHIKIYO ,  Motohiro KOJIMA ,  Kazutoshi ONOZAWA

发明人： Kimiaki TOSHIKIYO ,  Motohiro KOJIMA ,  Kazutoshi ONOZAWA

IPC分类号： G01N21/00

CPC分类号： H04N1/0311 ,  G02B3/0087 ,  G02B5/1876 ,  G02B5/1885 ,  H04N1/0282 ,  H04N1/0312

摘要： The present invention provides a contact-type solid-state imaging apparatus which realizes high resolution and high sensitivity, and also implements downsizing and lowering the cost of the contact-type solid-state imaging apparatus. Each pixel includes a protection glass plate, a light-collecting device, a light-receiving device, a semiconductor integrated circuit, a light emitting diode (LED) and a mounting package. The light-collecting apparatus has two kinds of distributed index lens (o lens and convex lens), and Sin (N=2) film, which is a two-stage concentric structure, is embedded in SiO2 (N=1.45) film.

摘要翻译： 本发明提供了实现高分辨率和高灵敏度的接触型固态成像装置，并且还实现了小型化并降低了接触式固态成像装置的成本。 每个像素包括保护玻璃板，集光装置，光接收装置，半导体集成电路，发光二极管（LED）和安装封装。 光收集装置具有两种分布式折射率透镜（o透镜和凸透镜），并且作为两级同心结构的Sin（N = 2）膜被嵌入到SiO 2 （N = 1.45）膜。

公开(公告)号：US20080011937A1

公开(公告)日：2008-01-17

申请号：US11768970

申请日：2007-06-27

申请人： Kimiaki TOSHIKIYO

发明人： Kimiaki TOSHIKIYO

IPC分类号： H01L27/00

CPC分类号： H01L27/14625 ,  H01L27/14632

摘要： A solid-state imaging element or the like capable of limiting an abrupt refractive index distribution and collecting incident light at high efficiency is provided. The solid-state imaging element (size: 5.6 μm square) has a distributed index lens, a G color filter, Al wiring, a signal transmitting unit, a planarizing layer, a light receiving element (Si photodiode) and a Si substrate. A concentric structure of the distributed index lens is formed of SiO2 (n=1.43). This structure is a two-stage structure having film thicknesses of 1.2 and 0.8 μm. The distributed index lens is constructed by cutting concentric circular recesses into SiO2 and has a planar region about the center. A medium surrounding the lens is air (n=1).

摘要翻译： 提供能够限制突然的折射率分布并以高效率收集入射光的固态成像元件等。 固体摄像元件（尺寸：5.6μm正方形）具有分布式折射率透镜，G滤色器，Al布线，信号发送单元，平坦化层，受光元件（Si光电二极管）和Si基板。 分布式折射率透镜的同心结构由SiO 2（n = 1.43）形成。 该结构是膜厚为1.2μm和0.8μm的两级结构。 分布式折射率透镜通过将同心圆形凹槽切割成SiO 2构造并且具有围绕中心的平面区域。 透镜周围的介质是空气（n = 1）。

公开(公告)号：US20110176044A1

公开(公告)日：2011-07-21

申请号：US13078462

申请日：2011-04-01

申请人： Kimiaki TOSHIKIYO

发明人： Kimiaki TOSHIKIYO

IPC分类号： H04N5/335

CPC分类号： H01L27/14685 ,  H01L27/14627

摘要： A solid-state imaging device and the like are provided. The solid-state imaging device includes a light-collecting element capable of efficiently collecting incident light by improving reproducibility of refractive index distribution at the borders of pixels. Each of the pixels includes: a light-collecting element; a color filter; a light-blocking layer; a light-receiving element; a substrate; and a planarization film. The light-collecting element has a concentric structure and has a film thickness which forms a two-tiered structure. The concentric structure is curved out to define a concentric pattern and the surrounding medium is air. Further, an air gap is provided between adjacent light-collecting elements. The air gap extends to an upper surface of the light-blocking layer and has a gap width approximately equal to a wavelength of incident light.

摘要翻译： 提供固态成像装置等。 固态成像装置包括能够通过提高像素边界处的折射率分布的再现性而有效地收集入射光的聚光元件。 每个像素包括：集光元件; 彩色滤光片; 遮光层; 光接收元件; 底物; 和平坦化膜。 集光元件具有同心结构，并且具有形成双层结构的膜厚度。 同心结构被弯曲以限定同心图案，并且周围的介质是空气。 此外，在相邻的光收集元件之间设置气隙。 气隙延伸到遮光层的上表面，并且具有大致等于入射光波长的间隙宽度。