公开(公告)号：US20090020840A1

公开(公告)日：2009-01-22

申请号：US12189971

申请日：2008-08-12

申请人： Kimiaki TOSHIKIYO ,  Takanori YOGO ,  Motonori ISHII ,  Toshinobu MATSUNO ,  Kazutoshi ONOZAWA

发明人： Kimiaki TOSHIKIYO ,  Takanori YOGO ,  Motonori ISHII ,  Toshinobu MATSUNO ,  Kazutoshi ONOZAWA

IPC分类号： H01L31/00

CPC分类号： H01L27/14627 ,  H01L27/14685

摘要： A solid-state imaging apparatus includes a plurality of unit pixels with associated microlenses arranged in a two-dimensional array. Each microlens includes a distributed index lens with a modulated effective refractive index distribution obtained by including a combination of a plurality of patterns having a concentric structure, the plurality of patterns being divided into line widths equal to or shorter than a wavelength of an incident light. At least one of the plurality of patterns includes a lower light-transmitting film having the concentric structure and a first line width and a first film thickness, and an upper light-transmitting film having the concentric structure configured on the lower light-transmitting film having a second line width and a second film thickness. The distributed index lens has a structure in which a refractive index material is dense at a center and becomes sparse gradually toward an outer side in the concentric structure.

摘要翻译： 固态成像装置包括具有以二维阵列排列的相关联的微透镜的多个单位像素。 每个微透镜包括具有调制的有效折射率分布的分布式折射率透镜，通过包括具有同心结构的多个图案的组合而获得，所述多个图案被划分成等于或短于入射光的波长的线宽。 多个图案中的至少一个图案包括具有同心结构且第一线宽度和第一膜厚度的下部透光膜，以及具有同心结构的上部透光膜，其在下部透光膜上具有 第二线宽度和第二膜厚度。 分布式折射率透镜具有其中折射率材料在中心处致密并且在同心结构中朝向外侧逐渐变稀的结构。

公开(公告)号：US20080076039A1

公开(公告)日：2008-03-27

申请号：US11860756

申请日：2007-09-25

申请人： Motonori ISHII ,  Kazutoshi ONOZAWA ,  Kimiaki TOSHIKIYO ,  Toshinobu MATSUNO ,  Takanori YOGO

发明人： Motonori ISHII ,  Kazutoshi ONOZAWA ,  Kimiaki TOSHIKIYO ,  Toshinobu MATSUNO ,  Takanori YOGO

IPC分类号： G03F1/00

CPC分类号： G03F7/0005 ,  G03F1/30

摘要： The phase shift mask according to the present invention is a phase shift mask for manufacturing a semiconductor device. The phase shift mask includes a light-blocking portion, a light-transmitting portion, a phase shift portion, and an auxiliary pattern portion, the light-blocking portion, the light-transmitting portion, the phase shift portion, and the auxiliary pattern portion being concentrically arranged, wherein a width of the auxiliary pattern portion in a radius direction is less than a width of the light-transmitting portion and a width of the phase shift portion in a radius direction. Furthermore, it is possible that a phase of exposure light which passes through an auxiliary pattern portion is opposite to a phase of exposure light which passes through a light-transmitting portion or a phase shift portion, the light-transmitting portion or the phase shift portion being the closest to the auxiliary pattern portion.

摘要翻译： 根据本发明的相移掩模是用于制造半导体器件的相移掩模。 相移掩模包括遮光部分，透光部分，相移部分和辅助图案部分，遮光部分，透光部分，相移部分和辅助图案部分 其中所述辅助图形部分在半径方向上的宽度小于所述透光部分的宽度和所述相移部分在半径方向上的宽度。 此外，通过辅助图案部分的曝光光的相位可能与通过透光部分或相移部分的曝光光的相位相反，透光部分或相移部分 最靠近辅助图案部分。

公开(公告)号：US20060285228A1

公开(公告)日：2006-12-21

申请号：US11423989

申请日：2006-06-14

申请人： Motonori ISHII ,  Kazutoshi ONOZAWA ,  Toshinobu MATSUNO ,  Takanori YOGO ,  Kimiaki TOSHIKIYO

发明人： Motonori ISHII ,  Kazutoshi ONOZAWA ,  Toshinobu MATSUNO ,  Takanori YOGO ,  Kimiaki TOSHIKIYO

IPC分类号： G02B3/08

CPC分类号： G02B5/1847 ,  G02B5/1876 ,  G02B5/1885 ,  G02B27/4205

摘要： The present invention provides a method of manufacturing a lens, in which the method includes exposing a photoresist to light using a phase shift mask. Here, the phase shift mask includes layout portions respectively corresponding to pixels and lens, in which each of the layout portions has: a light-blocking portion which has a shape of a substantially circle or a substantially concentric zone; a light-transmitting portion which has a shape of a substantially circle or a substantially concentric zone; a phase shift portion which has a shape of a substantially circle or a substantially concentric zone; and a light-blocking frame. Furthermore, the light-transmitting portion, the light-blocking portion and the phase shift portion are arranged alternately so as to form concentric circles, and the light-blocking frame corresponds to a whole or a part of a perimeter of the lens.

摘要翻译： 本发明提供一种制造透镜的方法，其中所述方法包括使用相移掩模将光致抗蚀剂曝光。 这里，相移掩模包括分别对应于像素和透镜的布局部分，其中每个布局部分具有：具有基本圆形或基本同心的形状的遮光部分; 具有基本上圆形或大体上同心的形状的透光部分; 相移部，其具有大致圆形或大致同心的区域的形状; 和遮光框架。 此外，光透射部分，遮光部分和相移部分交替地布置以形成同心圆，并且遮光框对应于透镜的周边的全部或一部分。

公开(公告)号：US20060284052A1

公开(公告)日：2006-12-21

申请号：US11423776

申请日：2006-06-13

申请人： Kimiaki TOSHIKIYO ,  Takanori YOGO ,  Motonori ISHII ,  Toshinobu MATSUNO ,  Kazutoshi ONOZAWA

发明人： Kimiaki TOSHIKIYO ,  Takanori YOGO ,  Motonori ISHII ,  Toshinobu MATSUNO ,  Kazutoshi ONOZAWA

IPC分类号： H01L27/00

CPC分类号： H01L27/14627 ,  H01L27/14685

摘要： The present invention provides a solid-state imaging apparatus and the like which is able to support an optical system whose incident angle is wide. Each pixel is 2.25 μm square in size, and includes a distributed index lens 1, a color filter (for example, for green) 2, an Al interconnections 3, a signal transmitting unit 4, a planarized layer 5, a light-receiving device (Si photodiodes) 6, and an Si substrate 7. The two-stage concentric circle structure of the distributed index lens is formed by SiO2 (n=2) with the film thickness 1.2 μm (“grey color”), the film thickness 0.8 μm (“dots pattern”) and the film thickness of 0 μm (“without pattern: white color”), and the medium surrounding the distributed index lens 1 is air (n=1).

摘要翻译： 本发明提供能够支持入射角较宽的光学系统的固体摄像装置等。 每个像素的尺寸为2.25mum正方形，并且包括分布式折射率透镜1，滤色器（例如，绿色）2，Al互连3，信号发送单元4，平坦化层5，光接收装置 （Si光电二极管）6和Si衬底7.分布式折射率透镜的两级同心圆结构由SiO 2（n = 2）形成，膜厚为1.2μm（“灰” 颜色“），膜厚0.8μm（”点图案“）和膜厚度为0μm（”无图案：白色“），分布折射率透镜1周围的介质为空气（n = 1）。

公开(公告)号：US20080251873A1

公开(公告)日：2008-10-16

申请号：US11954948

申请日：2007-12-12

申请人： Masahiro KASANO ,  Takanori YOGO ,  Kazutoshi ONOZAWA

发明人： Masahiro KASANO ,  Takanori YOGO ,  Kazutoshi ONOZAWA

IPC分类号： H01L31/0232 ,  H01L31/18

CPC分类号： H01L27/14625 ,  H01L27/14621 ,  H01L27/14627 ,  H01L27/14632 ,  H01L27/14687 ,  H01L31/02165

摘要： A solid-state imaging device which includes a color filter having excellent color reproduction, a manufacturing method thereof and a camera are provided.A color filter in a solid-state imaging device 1 having an optical film thickness of approximately ¼ of a set wavelength λ, being sandwiched by a third layer and a fourth layer which are spacer layers in which only 3 layers are laminated and which consist of two types of layers (first layers and a second layer) with different refractive indexes, and further, having a structure that is sandwiched by a film, a first layer, which has a film thickness approximately equal to the above λ/4. Between the two types of layers having different refractive indexes, the first layers are composed of high refractive index material, and the second layer is composed of low refractive index material. The third layer and the fourth layer have an optical film thickness according to the light which passes through, and the material film thickness of the entire color filter also differs for each color of light.

摘要翻译： 提供一种固态成像装置，其包括具有优异色彩再现的滤色器，其制造方法和照相机。 固态成像装置1中的滤色器，其光学膜厚度约为设定波长λ的1/4，被第三层和第四层夹在中间，其中仅层压有3层，并且由 具有不同折射率的两种类型的层（第一层和第二层），并且还具有被膜夹持的结构，第一层具有大约等于上述λ/ 4的膜厚度。 在具有不同折射率的两种类型的层之间，第一层由高折射率材料构成，第二层由低折射率材料构成。 第三层和第四层根据通过的光具有光学膜厚度，并且对于每种颜色的光，整个滤色器的材料膜厚度也不同。