In situ substrate holder leveling method and apparatus
    1.
    发明申请
    In situ substrate holder leveling method and apparatus 失效
    原位衬底保持器调平方法和装置

    公开(公告)号:US20050006556A1

    公开(公告)日:2005-01-13

    申请号:US10618187

    申请日:2003-07-10

    摘要: Embodiments of the present invention are directed to adjusting the spacing between the substrate support and the faceplate of the gas distribution member to achieve improved uniformity of the layer formed on the substrate. One embodiment of the present invention is directed to a method of adjusting a spacing between a gas distribution member and a substrate support disposed generally opposite from the gas distribution member, wherein the substrate support is configured to support a substrate on which to form a layer with improved thickness uniformity. The method comprises forming a layer on the substrate disposed on the substrate support; measuring a thickness of the layer on the substrate; and calculating differences in thickness between a reference location on the substrate and a plurality of remaining locations on the substrate. The method further comprises computing spacing adjustment amounts for the remaining locations relative to the reference location based on the differences in thickness between the reference location and the remaining locations. The spacing adjustment amount is positive to increase the spacing between the substrate support at the location and the gas distribution member if the thickness is greater at the location than at the reference location. The spacing adjustment amount is negative to decrease the spacing between the substrate support at the location if the thickness is smaller at the location than at the reference location.

    摘要翻译: 本发明的实施例涉及调整衬底支撑件和气体分配构件的面板之间的间隔,以实现在衬底上形成的层的改进的均匀性。 本发明的一个实施例涉及一种调节气体分配构件和大致与气体分配构件相对设置的衬底支撑件之间的间隔的方法,其中衬底支撑件构造成支撑衬底,以在其上形成具有 改善厚度均匀性。 该方法包括在设置在基板支撑件上的基板上形成一层; 测量衬底上的层的厚度; 并且计算衬底上的参考位置与衬底上的多个剩余位置之间的厚度差异。 该方法还包括基于参考位置和其余位置之间的厚度差来计算相对于参考位置的剩余位置的间隔调整量。 如果位置处的厚度大于在参考位置处的厚度,则间距调节量是正的以增加位置处的衬底支撑件与气体分配构件之间的间隔。 如果在位置处的厚度小于在参考位置处的厚度,则间距调节量是负的,以减小位置处的衬底支撑件之间的间隔。

    In Situ Substrate Holder Leveling Method and Apparatus
    3.
    发明申请
    In Situ Substrate Holder Leveling Method and Apparatus 失效
    原位基板固定器调平方法和装置

    公开(公告)号:US20080286444A1

    公开(公告)日:2008-11-20

    申请号:US12182345

    申请日:2008-07-30

    IPC分类号: C23C16/52

    摘要: Embodiments of the present invention are directed to adjusting the spacing between the substrate support and the faceplate of the gas distribution member to achieve improved uniformity of the layer formed on the substrate. One embodiment of the present invention is directed to a method of adjusting a spacing between a gas distribution member and a substrate support disposed generally opposite from the gas distribution member, wherein the substrate support is configured to support a substrate on which to form a layer with improved thickness uniformity. The method comprises forming a layer on the substrate disposed on the substrate support; measuring a thickness of the layer on the substrate; and calculating differences in thickness between a reference location on the substrate and a plurality of remaining locations on the substrate. The method further comprises computing spacing adjustment amounts for the remaining locations relative to the reference location based on the differences in thickness between the reference location and the remaining locations. The spacing adjustment amount is positive to increase the spacing between the substrate support at the location and the gas distribution member if the thickness is greater at the location than at the reference location. The spacing adjustment amount is negative to decrease the spacing between the substrate support at the location if the thickness is smaller at the location than at the reference location.

    摘要翻译: 本发明的实施例涉及调整衬底支撑件和气体分配构件的面板之间的间隔,以实现在衬底上形成的层的改进的均匀性。 本发明的一个实施例涉及一种调节气体分配构件和大致与气体分配构件相对设置的衬底支撑件之间的间隔的方法,其中衬底支撑件构造成支撑衬底,以在其上形成具有 改善厚度均匀性。 该方法包括在设置在基板支撑件上的基板上形成一层; 测量衬底上的层的厚度; 并且计算衬底上的参考位置与衬底上的多个剩余位置之间的厚度差异。 该方法还包括基于参考位置和其余位置之间的厚度差来计算相对于参考位置的剩余位置的间隔调整量。 如果位置处的厚度大于在参考位置处的厚度,则间距调节量是正的以增加位置处的衬底支撑件与气体分配构件之间的间隔。 如果在位置处的厚度小于在参考位置处的厚度,则间距调节量是负的,以减小位置处的衬底支撑件之间的间隔。

    In situ substrate holder leveling method and apparatus
    4.
    发明授权
    In situ substrate holder leveling method and apparatus 失效
    原位衬底保持器调平方法和装置

    公开(公告)号:US07413612B2

    公开(公告)日:2008-08-19

    申请号:US10618187

    申请日:2003-07-10

    IPC分类号: C23C16/00 C23F1/00 H01L21/306

    摘要: Embodiments of the present invention are directed to adjusting the spacing between the substrate support and the faceplate of the gas distribution member to achieve improved uniformity of the layer formed on the substrate. One embodiment of the present invention is directed to a method of adjusting a spacing between a gas distribution member and a substrate support disposed generally opposite from the gas distribution member, wherein the substrate support is configured to support a substrate on which to form a layer with improved thickness uniformity. The method comprises forming a layer on the substrate disposed on the substrate support; measuring a thickness of the layer on the substrate; and calculating differences in thickness between a reference location on the substrate and a plurality of remaining locations on the substrate. The method further comprises computing spacing adjustment amounts for the remaining locations relative to the reference location based on the differences in thickness between the reference location and the remaining locations. The spacing adjustment amount is positive to increase the spacing between the substrate support at the location and the gas distribution member if the thickness is greater at the location than at the reference location. The spacing adjustment amount is negative to decrease the spacing between the substrate support at the location if the thickness is smaller at the location than at the reference location.

    摘要翻译: 本发明的实施例涉及调整衬底支撑件和气体分配构件的面板之间的间隔,以实现在衬底上形成的层的改进的均匀性。 本发明的一个实施例涉及一种调节气体分配构件和大致与气体分配构件相对设置的衬底支撑件之间的间隔的方法,其中衬底支撑件构造成支撑衬底,以在其上形成具有 改善厚度均匀性。 该方法包括在设置在基板支撑件上的基板上形成一层; 测量衬底上的层的厚度; 并且计算衬底上的参考位置与衬底上的多个剩余位置之间的厚度差异。 该方法还包括基于参考位置和其余位置之间的厚度差来计算相对于参考位置的剩余位置的间隔调整量。 如果位置处的厚度大于在参考位置处的厚度,则间距调节量是正的以增加位置处的衬底支撑件与气体分配构件之间的间隔。 如果在位置处的厚度小于在参考位置处的厚度,则间距调节量是负的,以减小位置处的衬底支撑件之间的间隔。

    Expression of fatty acid desaturases in corn
    5.
    发明授权
    Expression of fatty acid desaturases in corn 有权
    脂肪酸去饱和酶在玉米中的表达

    公开(公告)号:US08378186B2

    公开(公告)日:2013-02-19

    申请号:US11578447

    申请日:2005-04-15

    摘要: The invention relates generally to the expression of desaturase enzymes in transgenic corn plants and compositions derived therefrom. In particular, the invention relates to the production of oils with improved omega-3 fatty acid profiles in corn plants and the seed oils produced thereby. Such oils may contain stearidonic acid, which is not naturally found in corn plants and has been shown to have beneficial effects on health.

    摘要翻译: 本发明一般涉及转基因玉米植物中去饱和酶的表达及其衍生物。 特别地,本发明涉及在玉米植物中生产具有改进的ω-3脂肪酸谱的油以及由此生产的种子油。 这样的油可以含有十八碳四烯酸,其在玉米植物中不是天然存在的,并且已经显示出对健康有益的效果。

    Expression of Fatty Acid Desaturases in Corn
    8.
    发明申请
    Expression of Fatty Acid Desaturases in Corn 有权
    脂肪酸去饱和酶在玉米中的表达

    公开(公告)号:US20080260929A1

    公开(公告)日:2008-10-23

    申请号:US11578447

    申请日:2005-04-15

    摘要: The invention relates generally to the expression of desaturase enzymes in transgenic corn plants and compositions derived therefrom. In particular, the invention relates to the production of oils with improved omega-3 fatty acid profiles in corn plants and the seed oils produced thereby. Such oils may contain stearidonic acid, which is not naturally found in corn plants and has been shown to have beneficial effects on health.

    摘要翻译: 本发明一般涉及转基因玉米植物中去饱和酶的表达及其衍生物。 特别地,本发明涉及在玉米植物中生产具有改进的ω-3脂肪酸谱的油以及由此生产的种子油。 这样的油可以含有十八碳四烯酸,其在玉米植物中不是天然存在的,并且已经显示出对健康有益的效果。