摘要:
Embodiments of the present invention are directed to adjusting the spacing between the substrate support and the faceplate of the gas distribution member to achieve improved uniformity of the layer formed on the substrate. One embodiment of the present invention is directed to a method of adjusting a spacing between a gas distribution member and a substrate support disposed generally opposite from the gas distribution member, wherein the substrate support is configured to support a substrate on which to form a layer with improved thickness uniformity. The method comprises forming a layer on the substrate disposed on the substrate support; measuring a thickness of the layer on the substrate; and calculating differences in thickness between a reference location on the substrate and a plurality of remaining locations on the substrate. The method further comprises computing spacing adjustment amounts for the remaining locations relative to the reference location based on the differences in thickness between the reference location and the remaining locations. The spacing adjustment amount is positive to increase the spacing between the substrate support at the location and the gas distribution member if the thickness is greater at the location than at the reference location. The spacing adjustment amount is negative to decrease the spacing between the substrate support at the location if the thickness is smaller at the location than at the reference location.
摘要:
Embodiments of the present invention are directed to adjusting the spacing between the substrate support and the faceplate of the gas distribution member to achieve improved uniformity of the layer formed on the substrate. One embodiment of the present invention is directed to a method of adjusting a spacing between a gas distribution member and a substrate support disposed generally opposite from the gas distribution member, wherein the substrate support is configured to support a substrate on which to form a layer with improved thickness uniformity. The method comprises forming a layer on the substrate disposed on the substrate support; measuring a thickness of the layer on the substrate; and calculating differences in thickness between a reference location on the substrate and a plurality of remaining locations on the substrate. The method further comprises computing spacing adjustment amounts for the remaining locations relative to the reference location based on the differences in thickness between the reference location and the remaining locations. The spacing adjustment amount is positive to increase the spacing between the substrate support at the location and the gas distribution member if the thickness is greater at the location than at the reference location. The spacing adjustment amount is negative to decrease the spacing between the substrate support at the location if the thickness is smaller at the location than at the reference location.
摘要:
Embodiments of the present invention are directed to adjusting the spacing between the substrate support and the faceplate of the gas distribution member to achieve improved uniformity of the layer formed on the substrate. One embodiment of the present invention is directed to a method of adjusting a spacing between a gas distribution member and a substrate support disposed generally opposite from the gas distribution member, wherein the substrate support is configured to support a substrate on which to form a layer with improved thickness uniformity. The method comprises forming a layer on the substrate disposed on the substrate support; measuring a thickness of the layer on the substrate; and calculating differences in thickness between a reference location on the substrate and a plurality of remaining locations on the substrate. The method further comprises computing spacing adjustment amounts for the remaining locations relative to the reference location based on the differences in thickness between the reference location and the remaining locations. The spacing adjustment amount is positive to increase the spacing between the substrate support at the location and the gas distribution member if the thickness is greater at the location than at the reference location. The spacing adjustment amount is negative to decrease the spacing between the substrate support at the location if the thickness is smaller at the location than at the reference location.
摘要:
A method of adjusting a spacing between a gas distribution member and a substrate support includes forming a layer on a substrate disposed on the substrate support; measuring a thickness of the layer on the substrate; and calculating differences in thickness between a reference location on the substrate and a plurality of remaining locations on the substrate. The method further comprises computing spacing adjustment amounts for the remaining locations relative to the reference location based on the differences in thickness between the reference location and the remaining locations.
摘要:
A method of film deposition in a sub-atmospheric chemical vapor deposition (CVD) process includes (a) providing a model for sub-atmospheric CVD deposition of a film that identifies one or more film properties of the film and at least one deposition model variable that correlates with the one or more film properties; (b) depositing a film onto a wafer using a first deposition recipe comprising at least one deposition recipe parameter that corresponds to the at least one deposition variable; (c) measuring a film property of at least one of said one or more film properties for the deposited film of step (b); (d) calculating an updated deposition model based upon the measured film property of step (c) and the model of step (a); and (e) calculating an updated deposition recipe based upon the updated model of step (d) to maintain a target film property. The method can be used to provide feedback to a plurality of deposition chambers or to control a film property other than film thickness.
摘要:
There is described a system and computer-implemented method for providing a recommendation based on a sparse pattern of data. An exemplary method comprises determining a likelihood that an item for which no user preference data is available will be preferred. The exemplary method also comprises determining a likelihood that an item for which user preference data is available for users other than a particular user will be preferred based on the likelihood that the item for which no user preference data is available will be preferred. The exemplary method additionally comprises predicting that an item for which no user preference data relative to the particular user is available will be preferred if the likelihood that the particular user will prefer the item exceeds a certain level.
摘要:
A method is provided in one example embodiment and includes receiving media data at an adaptive streaming client; updating an estimated available bandwidth associated with a media stream associated with the media data; filtering the estimated available bandwidth; mapping the filtered estimated available bandwidth to a media bitrate for the media stream; and updating a target segment delay that is to control time intervals between consecutive segment downloads of the media stream.
摘要:
The present invention provides improved methods and devices for managing network congestion. Preferred implementations of the invention allow congestion to be pushed from congestion points in the core of a network to reaction points, which may be edge devices, host devices or components thereof. Preferably, rate limiters shape individual flows of the reaction points that are causing congestion. Parameters of these rate limiters are preferably tuned based on feedback from congestion points, e.g., in the form of backward congestion notification (“BCN”) messages. In some implementations, such BCN messages include congestion change information and at least one instantaneous measure of congestion. The instantaneous measure(s) of congestion may be relative to a threshold of a particular queue and/or relative to a threshold of a buffer that includes a plurality of queues.
摘要:
Embodiments of the present invention are directed to methods and systems for determining unknowns in rating matrices. In one embodiment, a method comprises forming a rating matrix, where each matrix element corresponds to a known favorable user rating associated with an item or an unknown user rating associated with an item. The method includes determining a weight matrix configured to assign a weight value to each of the unknown matrix elements, and sampling the rating matrix to generate an ensemble of training matrices. Weighted maximum-margin matrix factorization is applied to each training matrix to obtain corresponding sub-rating matrix, the weights based on the weight matrix. The sub-rating matrices are combined to obtain an approximate rating matrix that can be used to recommend items to users based on the rank ordering of the corresponding matrix elements.
摘要:
Various improvements are provided for prior art policing methods, including token bucket methods and virtual time policing methods. Some preferred methods of the invention involve assigning a non-zero drop probability even when the packet would otherwise have been transmitted according to a prior art policing method. For example, a non-zero drop probability may be assigned even when there are sufficient tokens in a token bucket to allow transmission of the packet. A non-zero drop probability may be assigned, for example, when a token bucket level is at or below a predetermined threshold or according to a rate at which a token bucket is being emptied. Some implementations involve treating a token bucket as a virtual queue wherein the number of free elements in the virtual queue is proportional to the number of remaining tokens in the token bucket. Such implementations may involve predicting a future virtual queue size according to a previous virtual queue size and using this predicted value to calculate a drop probability.