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公开(公告)号：US06706322B2
公开(公告)日：2004-03-16
申请号：US10062506
申请日：2002-02-05
申请人： Kiyohisa Tateyama , Tsutae Omori
发明人： Kiyohisa Tateyama , Tsutae Omori
IPC分类号： B05D312
CPC分类号： H01L21/6715 , B05C11/08 , Y10T74/19074 , Y10T74/19102
摘要： A drive pulley is disposed to a driving motor. A plurality of follower pulleys are disposed to a rotating shaft of a spin chuck that vacuum sucks a substrate. A belt is passed from one follower pulley to the drive pulley. Belts are passed from the other follower pulleys to the drive shafts of a plurality of air motors. Since the air motors assist the driving of the driving motor, a large substrate can be rotated at a predetermined rotating acceleration. Thus, a film forming apparatus and a film forming method that allow the quantity of process solution supplied to be reduced and a film of process solution to be equally formed on a substrate can be provided.
摘要翻译： 驱动皮带轮设置在驱动马达上。 多个从动带轮设置在旋转卡盘的旋转轴上，真空吸附基板。 皮带从一个从动轮传递到驱动皮带轮。 皮带从其他从动滑轮传递到多个气动马达的驱动轴。 由于空气马达有助于驱动马达的驱动，因此可以以预定的旋转加速度旋转大的基板。 因此，可以提供允许提供的处理溶液量减少并且可以在基板上同样形成处理溶液膜的成膜装置和成膜方法。
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公开(公告)号：US06361600B1
公开(公告)日：2002-03-26
申请号：US09366959
申请日：1999-08-04
申请人： Kiyohisa Tateyama , Tsutae Omori
发明人： Kiyohisa Tateyama , Tsutae Omori
IPC分类号： B05C1102
CPC分类号： H01L21/6715 , B05C11/08 , Y10T74/19074 , Y10T74/19102
摘要： A drive pulley is disposed to a driving motor. A plurality of follower pulleys are disposed to a rotating shaft of a spin chuck that vacuum sucks a substrate. A belt is passed from one follower pulley to the drive pulley. Belts are passed from the other follower pulleys to the drive shafts of a plurality of air motors. Since the air motors assist the driving of the driving motor, a large substrate can be rotated at a predetermined rotating acceleration. Thus, a film forming apparatus and a film forming method that allow the quantity of process solution supplied to be reduced and a film of process solution to be equally formed on a substrate can be provided.
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公开(公告)号：US5695817A
公开(公告)日：1997-12-09
申请号：US512018
申请日：1995-08-07
申请人： Kiyohisa Tateyama , Kimio Motoda , Kenji Sekiguchi , Tsutae Omori
发明人： Kiyohisa Tateyama , Kimio Motoda , Kenji Sekiguchi , Tsutae Omori
摘要： A method of forming a coating film, in which the coating film is formed by supplying a coating liquid onto a surface of a substrate, while the substrate housed in a processing vessel is rotated together with the processing vessel, includes the steps of coating the surface of the substrate with a solvent, supplying the coating liquid to the substrate, rotating the substrate and the processing vessel at a first rotation speed to diffuse the coating liquid on the surface of the substrate, closing the processing vessel with a lid to seal the substrate in the processing vessel, and rotating the processing vessel with the lid and the substrate at a second rotation speed to uniform a film thickness of the coating film.
摘要翻译： 一种形成涂膜的方法，其中通过将涂覆液体供给到基材的表面上形成涂膜，同时容纳在处理容器中的基材与处理容器一起旋转，包括以下步骤：将表面 的溶剂，将涂布液供给到基板，以第一旋转速度旋转基板和处理容器，以将涂布液扩散到基板的表面上，用盖子封闭处理容器以密封基板 在处理容器中，并且以第二转速旋转具有盖和基板的处理容器以使涂膜的膜厚均匀。
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公开(公告)号：US06635113B2
公开(公告)日：2003-10-21
申请号：US09313860
申请日：1999-05-18
IPC分类号： B05C1110
CPC分类号： H01L21/6715
摘要： A substrate is held on a spin chuck, and resist solution is supplied to the surface of the substrate at a plurality of positions spaced at predetermined intervals from a plurality of resist nozzles provided the bottom surface of a resist pipe provided over a first direction across the surface of the substrate. Thereafter, the substrate is oscillated or rotated, thereby making the resist solution on the substrate a thin coating film with a uniform thickness. In the coating apparatus and method, which are excellent in responsiveness to a degree of viscosity of coating solution, various kinds of treatment agents with a wide range of viscosity can be used, and mechanical accuracy such as the space between the nozzles and the substrate, accuracy of the nozzle size, and the like can be loosened.
摘要翻译： 将基板保持在旋转卡盘上，并且将抗蚀剂溶液以多个位置间隔开的多个位置从多个抗蚀剂喷嘴供应到基板的表面，所述多个抗蚀剂喷嘴设置在沿着第一方向设置的抗蚀剂管的底表面 基板的表面。 此后，基板振荡或旋转，从而使抗蚀剂溶液在基板上具有均匀厚度的薄涂层膜。 在对涂布液的粘度的响应性优异的涂布装置和方法中，可以使用具有宽范围粘度的各种处理剂，并且可以使用诸如喷嘴和基板之间的空间的机械精度， 可以使喷嘴尺寸的精度等松动。
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公开(公告)号：US5803970A
公开(公告)日：1998-09-08
申请号：US753768
申请日：1996-11-29
申请人： Kiyohisa Tateyama , Kimio Motoda , Kenji Sekiguchi , Tsutae Omori
发明人： Kiyohisa Tateyama , Kimio Motoda , Kenji Sekiguchi , Tsutae Omori
摘要： A method of forming a coating film, in which the coating film is formed by supplying a coating liquid onto a surface of a substrate, while the substrate housed in a processing vessel is rotated together with the processing vessel, includes the steps of coating the surface of the substrate with a solvent, supplying the coating liquid to the substrate, rotating the substrate and the processing vessel at a first rotation speed to diffuse the coating liquid on the surface of the substrate, closing the processing vessel with a lid to seal the substrate in the processing vessel, and rotating the processing vessel with the lid and the substrate at a second rotation speed to uniform a film thickness of the coating film.
摘要翻译： 一种形成涂膜的方法，其中通过将涂覆液体供给到基材的表面上形成涂膜，同时容纳在处理容器中的基材与处理容器一起旋转，包括以下步骤：将表面 的溶剂，将涂布液供给到基板，以第一旋转速度旋转基板和处理容器，以将涂布液扩散到基板的表面上，用盖子封闭处理容器以密封基板 在处理容器中，并且以第二转速旋转具有盖和基板的处理容器以使涂膜的膜厚均匀。
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公开(公告)号：US06969572B2
公开(公告)日：2005-11-29
申请号：US10706091
申请日：2003-11-13
CPC分类号： G03D3/065 , G03D3/06 , G03F7/30 , G03F7/3071 , H01L21/6715 , H01L21/67253
摘要： In this developing method and apparatus, a concentration measuring unit 222 picks part of developing fluid in a blending tank 186 to measure the resist concentration by an absorption photometry and feeds the detected resist concentration to a control unit 240. The control unit 240 controls respective valves 210, 212, 216 of a TMAH concentrate solution 200, a solvent pipe 204 and a drain pipe 208 in a manner that the developing fluid in the blending tank 186 has a TMAH concentration corresponding to a measured resist-concentration value to accomplish a constant developing rate, performing component control of the developing fluid. The developing fluid transferred from the blending tank 186 to a supply tank 188 is fed to a developer nozzle DN in a developing section 126 through a developer pipe 224 owing to the drive of a pump 228. Accordingly, even if the developing fluid is reused in the developing process in multiple times, it is possible to make sure of the uniformity in development.
摘要翻译： 在该显影方法和装置中，浓度测量单元222拾取混合罐186中的显影液的一部分，通过吸收测光法测量抗蚀剂浓度，并将检测到的抗蚀剂浓度供给到控制单元240。 控制单元240以这样的方式控制TMAH浓缩液200，溶剂管204和排水管208的各个阀210,212,216，使得混合罐186中的显影流体具有对应于测量的抗蚀剂层的TMAH浓度， 浓度值以实现恒定的显影速率，进行显影液的成分控制。 通过泵228的驱动，从混合罐186向供给罐188输送的显影液通过显影剂管道224被供给到显影部分126中的显影剂喷嘴DN。 因此，即使显影液在显影过程中重复使用多次，也可以确保显影的均匀性。
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公开(公告)号：US06207231B1
公开(公告)日：2001-03-27
申请号：US09066603
申请日：1998-04-27
申请人： Kiyohisa Tateyama
发明人： Kiyohisa Tateyama
IPC分类号： B05D312
CPC分类号： H01L21/6715 , B05C11/08 , B05D1/005 , B05D3/10 , G03F7/162
摘要： In forming a resist film by supplying a resist liquid onto a surface of an LCD substrate loaded in a rotation cup, a coating liquid is coated on the surface of the substrate by spraying the resist liquid onto the surface thereof while not rotating the substrate to thus form the coating film on the overall surface of the substrate, then the substrate is sealed into the rotation cup by closing the processing vessel by a lid member, and then a film thickness of the coating film is regulated by rotating the rotation cup and the substrate.
摘要翻译： 在通过将抗蚀剂液体供给到装载在旋转杯中的LCD基板的表面上来形成抗蚀剂膜时，通过将抗蚀剂液体喷涂到其表面上而在基板的表面上涂覆涂布液体，同时不旋转基板 在基板的整个表面上形成涂膜，然后通过盖构件封闭处理容器将基板密封到旋转杯中，然后通过旋转旋转杯和基板来调节涂膜的膜厚度 。
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公开(公告)号：US6159288A
公开(公告)日：2000-12-12
申请号：US935917
申请日：1997-09-23
申请人： Fumio Satou , Mitsuhiro Sakai , Takeshi Tsukamoto , Yoichi Honda , Kiyomitsu Yamaguchi , Kimio Motoda , Yoshitaka Matsuda , Tetsuya Sada , Kiyohisa Tateyama
发明人： Fumio Satou , Mitsuhiro Sakai , Takeshi Tsukamoto , Yoichi Honda , Kiyomitsu Yamaguchi , Kimio Motoda , Yoshitaka Matsuda , Tetsuya Sada , Kiyohisa Tateyama
CPC分类号： B05C11/08 , Y10S134/902
摘要： An apparatus for a treatment is provided, the apparatus comprising a vessel for recovering a treatment liquid flowing out or flying out when the object is treated, cleaning means for cleaning an inner wall surface of the vessel by supplying a cleaning liquid into the vessel, and a circulation system for recovering a discharged liquid discharged from the vessel when the inner wall surface of the vessel is cleaned by the cleaning means and supplying the recovered liquid to the cleaning means.
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公开(公告)号：US6090205A
公开(公告)日：2000-07-18
申请号：US152340
申请日：1998-09-14
申请人： Mitsuhiro Sakai , Kiyohisa Tateyama
发明人： Mitsuhiro Sakai , Kiyohisa Tateyama
CPC分类号： G03F7/40 , G03F7/3021 , B05C11/08
摘要： A method of processing a substrate having the steps of placing a substrate for forming an LCD on a support, mounting a cover on the substrate in such a manner that a clearance is formed from at least either surface of the substrate placed on the support, introducing developer or pure water into the clearance, bringing the developer or pure water into contact with at least either surface of the substrate, processing the substrate with the developer or pure water, removing the cover from the substrate, and discharging the substrate from the support.
摘要翻译： 一种处理基板的方法，该方法具有以下步骤：将用于形成LCD的基板放置在支撑体上，将盖安装在基板上，使得从放置在支撑体上的基板的至少任一表面形成间隙， 显影剂或纯水进入间隙，使显影剂或纯水与基材的至少任一表面接触，用显影剂或纯水处理基材，从基材上除去盖子，并从载体上排出基材。
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公开(公告)号：US6013317A
公开(公告)日：2000-01-11
申请号：US40267
申请日：1998-03-16
申请人： Kimio Motoda , Kiyohisa Tateyama
发明人： Kimio Motoda , Kiyohisa Tateyama
IPC分类号： B05C5/00 , B05C11/08 , B05D1/40 , B08B3/00 , B08B9/00 , G03F7/16 , H01L21/00 , H01L21/027 , B05D3/12
CPC分类号： H01L21/6715 , B05C11/08 , B08B3/00 , B08B9/00 , G03F7/162 , Y10S134/902
摘要： A coating apparatus comprises a rotary container rotatable about a rotational axis as the center, a rotary rest table, located in the rotary container to be movable vertically and rotatable about the rotational axis as the center, for supporting a target substrate thereon, coating solution supply pipe for applying a coating solution to the target substrate, cleaning solution supply pipe for spraying a cleaning solution to an inner surface of the rotary container, a seal member provided between the rotary rest table and the bottom wall of the rotary container and capable of sealing a gap between the rotary rest table and the bottom wall of the rotary container, and connecting mechanism for connecting the rotary container and the rotary rest table so as to rotate together. The cleaning solution supply pipe projects from a through hole formed in the upper portion of the rotary container to be coaxial with the rotational axis, and the coating solution supply pipe projects from the through hole of the rotary container to be coaxial with the rotational axis.
摘要翻译： 一种涂覆装置，包括以围绕作为中心的旋转轴线可旋转的旋转容器，旋转托架，位于旋转容器中，以可旋转轴线为中心垂直移动并可旋转，用于将目标基板支撑在其上， 用于将涂布溶液施加到目标基板的管道，用于将清洗溶液喷射到旋转容器的内表面的清洁溶液供给管，设置在旋转托架和旋转容器的底壁之间并且能够密封的清洁溶液供给管 旋转托架和旋转容器的底壁之间的间隙，以及用于连接旋转容器和旋转托架一起旋转的连接机构。 清洗液供给管从形成在旋转容器的上部的贯通孔突出成与旋转轴线同轴，涂布液供给管从旋转容器的贯通孔突出成与旋转轴线同轴。
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