公开(公告)号：US08122899B2

公开(公告)日：2012-02-28

申请号：US11809170

申请日：2007-05-31

申请人： Kyo-Woog Koo ,  Jung Keun Cho ,  Bo Ram Chan Sung

发明人： Kyo-Woog Koo ,  Jung Keun Cho ,  Bo Ram Chan Sung

IPC分类号： B08B3/12 ,  B08B6/00

CPC分类号： H01L21/67051 ,  H01L21/67028 ,  H01L21/67034

摘要： An apparatus is provided for supplying a plurality of chemicals or gases to the surface of a substrate to clean and dry the substrate. The apparatus includes a substrate support unit with a chuck on which a substrate is loaded, a bottom chamber having an open top and configured to surround the circumference of the chuck, a top chamber configured to open or close the top of the bottom chamber such that a drying treatment for the substrate is performed while the substrate is isolated from the outside, and an indirect injection nozzle installed at the edge of the top chamber and configured to inject drying fluid toward the center of the top chamber such that the drying fluid is indirectly injected to the substrate. According to the apparatus, it is possible to enhance a substrate drying efficiency, suppress external contamination, and prevent the formation of an oxide layer.

摘要翻译： 提供了一种用于将多种化学物质或气体供应到基底表面以清洁和干燥基底的装置。 该装置包括具有卡盘的基板支撑单元，其上装载有基板，底部室具有敞开的顶部并且构造成围绕卡盘的圆周;顶部腔室，其构造成打开或关闭底部腔室的顶部，使得 在将基板从外部隔离的同时进行基板的干燥处理，以及间接注入喷嘴，其安装在顶部室的边缘并且被配置为朝向顶部室的中心注入干燥流体，使得干燥流体间接地 注入基材。 根据该装置，能够提高基板干燥效率，抑制外部污染，防止形成氧化物层。

公开(公告)号：US08256774B2

公开(公告)日：2012-09-04

申请号：US11896351

申请日：2007-08-31

申请人： Jung Keun Cho ,  Kyo-Woog Koo ,  Bo Ram Chan Sung

发明人： Jung Keun Cho ,  Kyo-Woog Koo ,  Bo Ram Chan Sung

IPC分类号： B23B31/103

CPC分类号： B23B31/1269 ,  B23B2265/12 ,  H01L21/68728 ,  Y10T279/18

摘要： A chucking member configured to chuck the edge of a substrate includes a chucking pin which is eccentric from the rotation center. The chucking pin has a streamline shape and includes a first front-end portion disposed at the front end relative to the flow of an air current generated by the rotation of the substrate and a first back-end portion disposed at the back end relative to the flow of the air current. The first front-end portion includes a first tip, and the first front-end portion has a round shape.

摘要翻译： 构造成夹持基板的边缘的夹紧构件包括从旋转中心偏心的夹紧销。 夹紧销具有流线形状，并且包括相对于由基板的旋转产生的气流的流动而位于前端的第一前端部分和设置在后端相对于基板的第一后端部分 气流的流动。 第一前端部包括第一末端，第一前端部具有圆形。

公开(公告)号：US20080061519A1

公开(公告)日：2008-03-13

申请号：US11896351

申请日：2007-08-31

申请人： Jung Keun Cho ,  Kyo-Woog Koo ,  Bo Ram Chan Sung

发明人： Jung Keun Cho ,  Kyo-Woog Koo ,  Bo Ram Chan Sung

IPC分类号： B23B5/22

CPC分类号： B23B31/1269 ,  B23B2265/12 ,  H01L21/68728 ,  Y10T279/18

摘要： A chucking member configured to chuck the edge of a substrate includes a chucking pin which is eccentric from the rotation center. The chucking pin has a streamline shape and includes a first front-end portion disposed at the front end relative to the flow of an air current generated by the rotation of the substrate and a first back-end portion disposed at the back end relative to the flow of the air current. The first front-end portion includes a first tip, and the first front-end portion has a round shape.

摘要翻译： 构造成夹持基板的边缘的夹紧构件包括从旋转中心偏心的夹紧销。 夹紧销具有流线形状，并且包括相对于由基板的旋转产生的气流的流动而位于前端的第一前端部分和设置在后端相对于基板的第一后端部分 气流的流动。 第一前端部包括第一末端，第一前端部具有圆形。

公开(公告)号：US20080014358A1

公开(公告)日：2008-01-17

申请号：US11809170

申请日：2007-05-31

申请人： Kyo-Woog Koo ,  Jung Keun Cho ,  Bo Ram Chan Sung

发明人： Kyo-Woog Koo ,  Jung Keun Cho ,  Bo Ram Chan Sung

IPC分类号： B05C13/00

CPC分类号： H01L21/67051 ,  H01L21/67028 ,  H01L21/67034

摘要： An apparatus is provided for supplying a plurality of chemicals or gases to the surface of a substrate to clean and dry the substrate. The apparatus includes a substrate support unit with a chuck on which a substrate is loaded, a bottom chamber having an open top and configured to surround the circumference of the chuck, a top chamber configured to open or close the top of the bottom chamber such that a drying treatment for the substrate is performed while the substrate is isolated from the outside, and an indirect injection nozzle installed at the edge of the top chamber and configured to inject drying fluid toward the center of the top chamber such that the drying fluid is indirectly injected to the substrate. According to the apparatus, it is possible to enhance a substrate drying efficiency, suppress external contamination, and prevent the formation of an oxide layer.

摘要翻译： 提供了一种用于将多种化学物质或气体供应到基底表面以清洁和干燥基底的装置。 该装置包括具有卡盘的基板支撑单元，其上装载有基板，底部室具有敞开的顶部并且构造成围绕卡盘的圆周;顶部腔室，其构造成打开或关闭底部腔室的顶部，使得 在将基板从外部隔离的同时进行基板的干燥处理，以及间接注入喷嘴，其安装在顶部室的边缘并且被配置为朝向顶部室的中心注入干燥流体，使得干燥流体间接地 注入基材。 根据该装置，能够提高基板干燥效率，抑制外部污染，防止形成氧化物层。