公开(公告)号：US08122899B2

公开(公告)日：2012-02-28

申请号：US11809170

申请日：2007-05-31

申请人： Kyo-Woog Koo ,  Jung Keun Cho ,  Bo Ram Chan Sung

发明人： Kyo-Woog Koo ,  Jung Keun Cho ,  Bo Ram Chan Sung

IPC分类号： B08B3/12 ,  B08B6/00

CPC分类号： H01L21/67051 ,  H01L21/67028 ,  H01L21/67034

摘要： An apparatus is provided for supplying a plurality of chemicals or gases to the surface of a substrate to clean and dry the substrate. The apparatus includes a substrate support unit with a chuck on which a substrate is loaded, a bottom chamber having an open top and configured to surround the circumference of the chuck, a top chamber configured to open or close the top of the bottom chamber such that a drying treatment for the substrate is performed while the substrate is isolated from the outside, and an indirect injection nozzle installed at the edge of the top chamber and configured to inject drying fluid toward the center of the top chamber such that the drying fluid is indirectly injected to the substrate. According to the apparatus, it is possible to enhance a substrate drying efficiency, suppress external contamination, and prevent the formation of an oxide layer.

摘要翻译： 提供了一种用于将多种化学物质或气体供应到基底表面以清洁和干燥基底的装置。 该装置包括具有卡盘的基板支撑单元，其上装载有基板，底部室具有敞开的顶部并且构造成围绕卡盘的圆周;顶部腔室，其构造成打开或关闭底部腔室的顶部，使得 在将基板从外部隔离的同时进行基板的干燥处理，以及间接注入喷嘴，其安装在顶部室的边缘并且被配置为朝向顶部室的中心注入干燥流体，使得干燥流体间接地 注入基材。 根据该装置，能够提高基板干燥效率，抑制外部污染，防止形成氧化物层。

公开(公告)号：US08256774B2

公开(公告)日：2012-09-04

申请号：US11896351

申请日：2007-08-31

申请人： Jung Keun Cho ,  Kyo-Woog Koo ,  Bo Ram Chan Sung

发明人： Jung Keun Cho ,  Kyo-Woog Koo ,  Bo Ram Chan Sung

IPC分类号： B23B31/103

CPC分类号： B23B31/1269 ,  B23B2265/12 ,  H01L21/68728 ,  Y10T279/18

摘要： A chucking member configured to chuck the edge of a substrate includes a chucking pin which is eccentric from the rotation center. The chucking pin has a streamline shape and includes a first front-end portion disposed at the front end relative to the flow of an air current generated by the rotation of the substrate and a first back-end portion disposed at the back end relative to the flow of the air current. The first front-end portion includes a first tip, and the first front-end portion has a round shape.

摘要翻译： 构造成夹持基板的边缘的夹紧构件包括从旋转中心偏心的夹紧销。 夹紧销具有流线形状，并且包括相对于由基板的旋转产生的气流的流动而位于前端的第一前端部分和设置在后端相对于基板的第一后端部分 气流的流动。 第一前端部包括第一末端，第一前端部具有圆形。

公开(公告)号：US20080061519A1

公开(公告)日：2008-03-13

申请号：US11896351

申请日：2007-08-31

申请人： Jung Keun Cho ,  Kyo-Woog Koo ,  Bo Ram Chan Sung

发明人： Jung Keun Cho ,  Kyo-Woog Koo ,  Bo Ram Chan Sung

IPC分类号： B23B5/22

CPC分类号： B23B31/1269 ,  B23B2265/12 ,  H01L21/68728 ,  Y10T279/18

摘要： A chucking member configured to chuck the edge of a substrate includes a chucking pin which is eccentric from the rotation center. The chucking pin has a streamline shape and includes a first front-end portion disposed at the front end relative to the flow of an air current generated by the rotation of the substrate and a first back-end portion disposed at the back end relative to the flow of the air current. The first front-end portion includes a first tip, and the first front-end portion has a round shape.

摘要翻译： 构造成夹持基板的边缘的夹紧构件包括从旋转中心偏心的夹紧销。 夹紧销具有流线形状，并且包括相对于由基板的旋转产生的气流的流动而位于前端的第一前端部分和设置在后端相对于基板的第一后端部分 气流的流动。 第一前端部包括第一末端，第一前端部具有圆形。

公开(公告)号：US20080014358A1

公开(公告)日：2008-01-17

申请号：US11809170

申请日：2007-05-31

申请人： Kyo-Woog Koo ,  Jung Keun Cho ,  Bo Ram Chan Sung

发明人： Kyo-Woog Koo ,  Jung Keun Cho ,  Bo Ram Chan Sung

IPC分类号： B05C13/00

CPC分类号： H01L21/67051 ,  H01L21/67028 ,  H01L21/67034

摘要： An apparatus is provided for supplying a plurality of chemicals or gases to the surface of a substrate to clean and dry the substrate. The apparatus includes a substrate support unit with a chuck on which a substrate is loaded, a bottom chamber having an open top and configured to surround the circumference of the chuck, a top chamber configured to open or close the top of the bottom chamber such that a drying treatment for the substrate is performed while the substrate is isolated from the outside, and an indirect injection nozzle installed at the edge of the top chamber and configured to inject drying fluid toward the center of the top chamber such that the drying fluid is indirectly injected to the substrate. According to the apparatus, it is possible to enhance a substrate drying efficiency, suppress external contamination, and prevent the formation of an oxide layer.

摘要翻译： 提供了一种用于将多种化学物质或气体供应到基底表面以清洁和干燥基底的装置。 该装置包括具有卡盘的基板支撑单元，其上装载有基板，底部室具有敞开的顶部并且构造成围绕卡盘的圆周;顶部腔室，其构造成打开或关闭底部腔室的顶部，使得 在将基板从外部隔离的同时进行基板的干燥处理，以及间接注入喷嘴，其安装在顶部室的边缘并且被配置为朝向顶部室的中心注入干燥流体，使得干燥流体间接地 注入基材。 根据该装置，能够提高基板干燥效率，抑制外部污染，防止形成氧化物层。

公开(公告)号：US08038838B2

公开(公告)日：2011-10-18

申请号：US11945342

申请日：2007-11-27

申请人： Ju Won Kim ,  Ki Hoon Choi ,  Jung Keun Cho ,  Kyo Woog Koo ,  Jung Bong Choi

发明人： Ju Won Kim ,  Ki Hoon Choi ,  Jung Keun Cho ,  Kyo Woog Koo ,  Jung Bong Choi

IPC分类号： H01L21/68 ,  H01L21/027

CPC分类号： H01L21/68728 ,  H01L21/68742

摘要： A spin head includes chucking pins configures to chuck and unchuck a substrate. Contact portions of the chucking pins and the substrate are varied during a process to prevent a treating solution from remaining at the contact portions.

摘要翻译： 旋转头包括夹紧销配置为卡盘和解锁基板。 夹持销和基板的接触部分在防止处理溶液残留在接触部分的过程中变化。

公开(公告)号：US20080127888A1

公开(公告)日：2008-06-05

申请号：US11945342

申请日：2007-11-27

申请人： Ju Won Kim ,  Ki Hoon Choi ,  Jung Keun Cho ,  Kyo Woog Koo ,  Jung Bong Choi

发明人： Ju Won Kim ,  Ki Hoon Choi ,  Jung Keun Cho ,  Kyo Woog Koo ,  Jung Bong Choi

IPC分类号： B05C13/02 ,  B05D3/12 ,  B05C5/00 ,  B05C13/00

CPC分类号： H01L21/68728 ,  H01L21/68742

摘要： A spin head includes chucking pins configures to chuck and unchuck a substrate. Contact portions of the chucking pins and the substrate are varied during a process to prevent a treating solution from remaining at the contact portions.

摘要翻译： 旋转头包括夹紧销配置为卡盘和解锁基板。 夹持销和基板的接触部分在防止处理溶液残留在接触部分的过程中变化。

公开(公告)号：US08898926B2

公开(公告)日：2014-12-02

申请号：US11809308

申请日：2007-05-31

申请人： Jung Keun Cho ,  Kyo-Woog Koo

发明人： Jung Keun Cho ,  Kyo-Woog Koo

IPC分类号： H01L21/677 ,  F26B21/14 ,  H01L21/67

CPC分类号： H01L21/67034

摘要： The present invention is directed to a substrate dryer, a substrate treating apparatus including the substrate dryer, and a substrate treating method. The substrate dryer includes a chamber, a process chamber constituting one part of the chamber and provided for supplying supercritical fluid to a substrate to dry the substrate, and a high-pressure chamber constituting the other part of the chamber and provided for boosting the process chamber above a critical pressure. According to the present invention, the substrate drying chamber is boosted fast by the high-pressure chamber to change to a supercritical state and thus a substrate dry treatment is performed using supercritical fluid.

摘要翻译： 本发明涉及一种基板干燥器，包括基板干燥器的基板处理装置和基板处理方法。 基板干燥器包括：室，构成室的一部分的处理室，用于向基板供应超临界流体以干燥基板;以及构成室的另一部分的高压室，用于将处理室 高于临界压力。 根据本发明，基板干燥室由高压室快速升压，变为超临界状态，因此使用超临界流体进行基板干燥处理。

公开(公告)号：US20110308458A1

公开(公告)日：2011-12-22

申请号：US13164229

申请日：2011-06-20

申请人： Bo Ramchan Sung ,  Kyo Woog Koo ,  Jung Keun Cho

发明人： Bo Ramchan Sung ,  Kyo Woog Koo ,  Jung Keun Cho

IPC分类号： C23C16/455 ,  C23C16/50 ,  C23C16/458

CPC分类号： C23C16/45565 ,  C23C16/5096 ,  C23C16/54 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32633 ,  H01J37/32743 ,  H01J37/32889 ,  H01J37/32899 ,  H01L21/67178 ,  H01L21/67742

摘要： Provided is a thin film deposition apparatus. The thin film deposition apparatus includes a substrate support unit configured to support a substrate; and a shower head disposed above the substrate support unit to supply a process gas to the substrate. The shower head includes: an upper plate including a plurality of gas channels forming process gas flow paths and gas injection holes formed in the gas channels, high-frequency power being applied to the upper plate to excite the process gas into plasma; a baffle plate disposed under the upper plate and including a plurality of holes to uniformly distribute the process gas; and an injection plate disposed under the baffle plate to inject the process gas supplied through the baffle plate to a substrate.

摘要翻译： 提供一种薄膜沉积设备。 薄膜沉积装置包括：基板支撑单元，其构造成支撑基板; 以及设置在所述基板支撑单元上方以将处理气体供应到所述基板的淋浴喷头。 淋浴头包括：上板，包括形成工艺气体流路的多个气体通道和形成在气体通道中的气体注入孔，高频功率施加到上板以将工艺气体激发成等离子体; 挡板，其设置在所述上​​板下方并且包括多个孔以均匀分布所述处理气体; 以及设置在所述挡板下方的注射板，以将通过所述挡板供给的工艺气体注入到基板。

公开(公告)号：US20080057219A1

公开(公告)日：2008-03-06

申请号：US11809169

申请日：2007-05-31

申请人： Hyun-Jong Kim ,  Kyo-Woog Koo ,  Jung Keun Cho

发明人： Hyun-Jong Kim ,  Kyo-Woog Koo ,  Jung Keun Cho

IPC分类号： C23C14/00 ,  B05C1/00

CPC分类号： H01L21/67051

摘要： A substrate treating apparatus includes a substrate support unit with a chuck on which a substrate is loaded; a bottom chamber having an open top and configured to surround the circumference of the chuck; a top chamber configured to open or close the top of the bottom chamber such that the substrate is dried while the top chamber is sealed from the outside; and a direct injection nozzle member installed at the top chamber to inject fluid directly to the substrate while the top of the bottom chamber is closed. According to the substrate treating apparatus, drying efficiency of an entire substrate is enhanced, external contaminants are blocked, and generation of an oxide layer is suppressed.

摘要翻译： 基板处理装置包括具有卡盘的基板支撑单元，基板被载置在该卡盘上; 底部室具有敞开的顶部并且构造成围绕卡盘的圆周; 顶部腔室，其构造成打开或关闭底部腔室的顶部，使得在顶部腔室与外部密封的同时干燥衬底; 以及安装在顶部腔室处的直接喷射喷嘴构件，以在底部腔室的顶部关闭的同时将流体直接喷射到基底。 根据基板处理装置，整个基板的干燥效率提高，外部污染物被堵塞，并且抑制氧化层的产生。

公开(公告)号：US07802579B2

公开(公告)日：2010-09-28

申请号：US11809169

申请日：2007-05-31

申请人： Hyun-Jong Kim ,  Kyo-Woog Koo ,  Jung Keun Cho

发明人： Hyun-Jong Kim ,  Kyo-Woog Koo ,  Jung Keun Cho

IPC分类号： B08B3/00

CPC分类号： H01L21/67051

摘要： A substrate treating apparatus includes a substrate support unit with a chuck on which a substrate is loaded; a bottom chamber having an open top and configured to surround the circumference of the chuck; a top chamber configured to open or close the top of the bottom chamber such that the substrate is dried while the top chamber is sealed from the outside; and a direct injection nozzle member installed at the top chamber to inject fluid directly to the substrate while the top of the bottom chamber is closed. According to the substrate treating apparatus, drying efficiency of an entire substrate is enhanced, external contaminants are blocked, and generation of an oxide layer is suppressed.

摘要翻译： 基板处理装置包括具有卡盘的基板支撑单元，基板被载置在该卡盘上; 底部室具有敞开的顶部并且构造成围绕卡盘的圆周; 顶部腔室，其构造成打开或关闭底部腔室的顶部，使得在顶部腔室与外部密封的同时干燥衬底; 以及安装在顶部腔室处的直接喷射喷嘴构件，以在底部腔室的顶部关闭的同时将流体直接喷射到基底。 根据基板处理装置，整个基板的干燥效率提高，外部污染物被堵塞，并且抑制氧化层的产生。