专利检索 ap:("LAM RESEARCH CORPORATION") AND inv:"Eunsuk KO" 第 1 页

1.

发明公开
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRIP AND ETCH USING DUAL PLENUM SHOWERHEAD 审中-公开

公开(公告)号：US20230369076A1

公开(公告)日：2023-11-16

申请号：US18217696

申请日：2023-07-03

申请人： LAM RESEARCH CORPORATION

发明人： Dengliang YANG , Haoquan FANG , David CHEUNG , Gnanamani AMBUROSE , Eunsuk KO , Weiyi LUO , Dan ZHANG

IPC分类号： H01L21/67 , H01J37/32 , H01L21/311

CPC分类号： H01L21/67069 , H01J37/32422 , H01J37/32449 , H01J37/32724 , H01J37/32146 , H01J37/32623 , H01J37/32972 , H01L21/31138 , H01J37/3299 , B08B5/023

摘要： Several designs of a gas distribution device for a substrate processing system are provided. The gas distribution device includes a dual plenum showerhead. Additionally, designs for a light blocking structure used with the showerheads are also provided.

2.

发明公开
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRIP AND ETCH USING DUAL PLENUM SHOWERHEAD 审中-公开

公开(公告)号：US20240258130A1

公开(公告)日：2024-08-01

申请号：US18630683

申请日：2024-04-09

申请人： LAM RESEARCH CORPORATION

发明人： Dengliang YANG , Haoquan FANG , David CHEUNG , Gnanamani AMBUROSE , Eunsuk KO , Wei Yi LUO , Dan ZHANG

IPC分类号： H01L21/67 , B08B5/02 , H01J37/32 , H01L21/311

CPC分类号： H01L21/67069 , H01J37/32146 , H01J37/32422 , H01J37/32449 , H01J37/32623 , H01J37/32724 , H01J37/32972 , H01J37/3299 , H01L21/31138 , B08B5/023 , H01J37/321 , H01J2237/334

摘要： Several designs of a gas distribution device for a substrate processing system are provided. The gas distribution device includes a dual plenum showerhead. Additionally, designs for a light blocking structure used with the showerheads are also provided.

3.

发明公开
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRIP AND ETCH USING DUAL PLENUM SHOWERHEAD 审中-公开

公开(公告)号：US20240258131A1

公开(公告)日：2024-08-01

申请号：US18630726

申请日：2024-04-09

申请人： LAM RESEARCH CORPORATION

发明人： Dengliang YANG , Haoquan FANG , David CHEUNG , Gnanamani AMBUROSE , Eunsuk KO , Wei Yi LUO , Dan ZHANG

IPC分类号： H01L21/67 , B08B5/02 , H01J37/32 , H01L21/311

CPC分类号： H01L21/67069 , H01J37/32146 , H01J37/32422 , H01J37/32449 , H01J37/32623 , H01J37/32724 , H01J37/32972 , H01J37/3299 , H01L21/31138 , B08B5/023 , H01J37/321 , H01J2237/334

摘要： Several designs of a gas distribution device for a substrate processing system are provided. The gas distribution device includes a dual plenum showerhead. Additionally, designs for a light blocking structure used with the showerheads are also provided.