POSITION DETECTION APPARATUS, POSITION DETECTION METHOD, AND NON-TRANSITORY COMPUTER-READABLE MEDIUM STORING POSITION DETECTION PROGRAM

    公开(公告)号:US20240292511A1

    公开(公告)日:2024-08-29

    申请号:US18588756

    申请日:2024-02-27

    IPC分类号: H05H1/00 G01B15/00

    CPC分类号: H05H1/0006 G01B15/00

    摘要: A position detection apparatus according to the present disclosure includes a first optical system configured to focus, among light including first light and second light generated along with EUV light from plasma generated by causing a condenser lens to focus laser light on a target, the first light by the condenser lens, a first position detector configured to detect the first light focused by the first optical system, a second optical system configured to focus the second light, a second position detector configured to detect the second light focused by the second optical system, and a position detection processing unit configured to detect change of a position of the plasma from change of a spot of the first light and change of the spot of the second light.

    MASK INSPECTION METHOD AND MASK INSPECTION APPARATUS

    公开(公告)号:US20220178847A1

    公开(公告)日:2022-06-09

    申请号:US17643151

    申请日:2021-12-07

    IPC分类号: G01N21/956

    摘要: Resolution is improved in a required direction while maintaining contrast in inspection of an anamorphic mask. A method for inspecting a mask with a reduction rate at the time of exposure in a longitudinal direction different from a reduction rate at the time of exposure in a lateral direction according to the present disclosure includes capturing an image of the mask using a photodetector including a rectangular pixel, a ratio of a dimension of the rectangular pixel in the longitudinal direction to a dimension of the rectangular pixel in the lateral direction being equal to an inverse ratio of the reduction rate in the longitudinal direction to the reduction rate in the lateral direction.

    OPTICAL DEVICE, AND METHOD FOR PREVENTING CONTAMINATION OF OPTICAL DEVICE

    公开(公告)号:US20210373447A1

    公开(公告)日:2021-12-02

    申请号:US17329042

    申请日:2021-05-24

    IPC分类号: G03F7/20

    摘要: Provided are an optical device capable of effectively preventing contamination and a method for preventing contamination of the same. An optical device according to an embodiment includes a light source that generates light containing EUV (Extreme UltraViolet) light or VUV (Vacuum UltraViolet) light, a chamber in which an object to be irradiated with the light is placed, an optical element placed inside the chamber to guide the light, an introduction unit that introduces hydrogen or helium into the chamber, a power supply that applies a negative voltage to the optical element in the chamber, an ammeter that measures an ion current flowing through the optical element, and a control unit that adjusts the amount of the hydrogen or the helium introduced according to a measurement result of the ammeter.

    INSPECTION DEVICE AND INSPECTION METHOD

    公开(公告)号:US20210247323A1

    公开(公告)日:2021-08-12

    申请号:US17168053

    申请日:2021-02-04

    摘要: An inspection device according to the present disclosure includes a spheroidal mirror configured to reflect illumination light as convergent light, a plane mirror configured to reflect the illumination light incident as the convergent light and cause the reflected illumination light to be incident on an object of inspection as incident light, a projection optical system configured to focus reflected light of the incident light reflected by the object of inspection, and a detector configured to detect reflected light focused by the projection optical system, wherein an angle of incidence of an incident optical axis being an optical axis of the incident light on the object of inspection is greater than 6 [deg], an angle of reflection of a reflected optical axis being an optical axis of the reflected light on the object of inspection is greater than 6 [deg].

    POSITION DETECTION APPARATUS, POSITION DETECTION METHOD AND NON-TRANSITORY  COMPUTER-READABLE MEDIUM

    公开(公告)号:US20240074022A1

    公开(公告)日:2024-02-29

    申请号:US18458913

    申请日:2023-08-30

    IPC分类号: H05G2/00 G01B11/14

    CPC分类号: H05G2/008 G01B11/14

    摘要: Provided are a position detection apparatus and a position detection method capable of detecting a position of plasma on a target. The position detection apparatus according to the present disclosure includes: a visible light optical system configured to condense visible light generated together with EUV light from plasma generated by condensing laser light onto a target with a condensing lens; a position detection sensor configured to detect the visible light condensed by the visible light optical system; and a position detection processing unit configured to detect a change in a position of the plasma on the target, from a change in a spot of the visible light detected by the position detection sensor.

    DETECTION METHOD, INSPECTION METHOD, DETECTION APPARATUS, AND INSPECTION APPARATUS

    公开(公告)号:US20190204235A1

    公开(公告)日:2019-07-04

    申请号:US16186227

    申请日:2018-11-09

    IPC分类号: G01N21/88 G01N21/956

    摘要: A detection method, an inspection method, a detection apparatus, and an inspection apparatus capable of preventing an error in a luminance unevenness correction and thereby accurately inspecting an object to be inspected are provided. A detection method according to the present disclosure includes illuminating an object to be inspected by using illumination light including pulsed light, acquiring image data of the object to be inspected by concentrating light from the object to be inspected illuminated by the illumination light and detecting the concentrated light by an inspection detector, acquiring image data of a luminance distribution of the illumination light, the luminance distribution being detected by illuminating a correction detector by using part of the illumination light, and detecting inspection image data by correcting the image data of the object to be inspected based on the image data of the luminance distribution.